Literature DB >> 6732711

Attenuation of epileptogenesis: proactive effect of a single epinephrine injection of amygdaloid kindling.

K A Welsh, P E Gold.   

Abstract

Repeated daily electrical stimulation of the amygdala can lead to a progressive increase in brain and behavioral seizures. This phenomenon, termed kindling, has been viewed as a model for epileptogenesis. The results reported here demonstrate that a single systemic epinephrine injection can significantly retard such epileptogenesis for a period of at least several days. These findings suggest that peripheral catecholamines, responding either to stress near the time of seizure initiation or to treatments administered at that time, may be important in regulating the development of epileptic states. In addition, the results indicate that an acute episode of high plasma epinephrine levels may result in a durable modification of brain function.

Entities:  

Mesh:

Substances:

Year:  1984        PMID: 6732711     DOI: 10.1016/s0163-1047(84)90279-6

Source DB:  PubMed          Journal:  Behav Neural Biol        ISSN: 0163-1047


  3 in total

Review 1.  Regulation of memory - from the adrenal medulla to liver to astrocytes to neurons.

Authors:  Paul E Gold
Journal:  Brain Res Bull       Date:  2014-01-07       Impact factor: 4.077

Review 2.  Physical activity and epilepsy: proven and predicted benefits.

Authors:  Ricardo M Arida; Esper A Cavalheiro; Antonio C da Silva; Fulvio A Scorza
Journal:  Sports Med       Date:  2008       Impact factor: 11.136

3.  Behavioral and Neurochemical Consequences of Pentylenetetrazol-Induced Kindling in Young and Middle-Aged Rats.

Authors:  Alexandre Ademar Hoeller; Cristiane Ribeiro de Carvalho; Pedro Leite Costa Franco; Douglas Affonso Formolo; Alexandre Kracker Imthon; Henrique Rodighero Dos Santos; Ingrid Eidt; Gabriel Roman Souza; Leandra Celso Constantino; Camila Leite Ferreira; Rui Daniel Prediger; Rodrigo Bainy Leal; Roger Walz
Journal:  Pharmaceuticals (Basel)       Date:  2017-09-13
  3 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.