John E Halpin1, Benjamin Jenkins2, Michael P Moody2, Robert W H Webster1, Jan-Willem G Bos3, Paul A J Bagot2, Donald A MacLaren1. 1. SUPA, School of Physics and Astronomy, University of Glasgow, Glasgow G12 8QQ, U.K. 2. Department of Materials, University of Oxford, Department of Materials, Parks Road, Oxford OX1 3PH, U.K. 3. Institute of Chemical Sciences and Centre for Advanced Energy Storage and Recovery, School of Engineering and Physical Sciences, Heriot-Watt University, Edinburgh EH14 4AS, U.K.
Abstract
The performance of thermoelectric materials depends on both their atomic-scale chemistry and the nature of microstructural details such as grain boundaries and inclusions. Here, the elemental distribution throughout a TiNiCu0.1Sn thermoelectric material has been examined in a correlative study deploying atom-probe tomography (APT) and electron microscopies and spectroscopies. Elemental mapping and electron diffraction reveal two distinct types of grain boundary that are either topologically rough and meandering in profile or more regular and geometric. Transmission electron microscopy studies indicate that the Cu dopant segregates at both grain boundary types, attributed to extrusion from the bulk during hot-pressing. The geometric boundaries are found to have a degree of crystallographic coherence between neighboring grains; the rough boundaries are decorated with oxide impurity precipitates. APT was used to study the three-dimensional character of rough grain boundaries and reveals that Cu is present as discrete, elongated nanoprecipitates cosegregating alongside larger substoichiometric titanium oxide precipitates. Away from the grain boundary, the alloy microstructure is relatively homogeneous, and the atom-probe results suggest a statistical and uniform distribution of Cu with no evidence for segregation within grains. The extrusion suggests a solubility limit for Cu in the bulk material, with the potential to influence carrier and phonon transport properties across grain boundaries. These results underline the importance of fully understanding localized variations in chemistry that influence the functionality of materials, particularly at grain boundaries.
The performance of thermoelectric materials depends on both their atomic-scale chemistry and the nature of microstructural details such as grain boundaries and inclusions. Here, the elemental distribution throughout a TiNiCu0.1Sn thermoelectric material has been examined in a correlative study deploying atom-probe tomography (APT) and electron microscopies and spectroscopies. Elemental mapping and electron diffraction reveal two distinct types of grain boundary that are either topologically rough and meandering in profile or more regular and geometric. Transmission electron microscopy studies indicate that the Cu dopant segregates at both grain boundary types, attributed to extrusion from the bulk during hot-pressing. The geometric boundaries are found to have a degree of crystallographic coherence between neighboring grains; the rough boundaries are decorated with oxide impurity precipitates. APT was used to study the three-dimensional character of rough grain boundaries and reveals that Cu is present as discrete, elongated nanoprecipitates cosegregating alongside larger substoichiometric titanium oxide precipitates. Away from the grain boundary, the alloy microstructure is relatively homogeneous, and the atom-probe results suggest a statistical and uniform distribution of Cu with no evidence for segregation within grains. The extrusion suggests a solubility limit for Cu in the bulk material, with the potential to influence carrier and phonon transport properties across grain boundaries. These results underline the importance of fully understanding localized variations in chemistry that influence the functionality of materials, particularly at grain boundaries.
Thermoelectric (TE) generators are solid-state
devices that convert
waste heat directly into electricity. Extensive studies are driving
their deployment as part of global activities for improved energy
efficiency.[1,2] Their wide-scale adoption is impeded by
the high cost of scarce materials such as bismuth telluride and the
low heat-to-electricity conversion efficiencies that are typical of
more economic TE materials. Among a host of TEs, the intermetallic
materials known as half-Heusler alloys (hHAs) are leading candidates
for commercialization because they are based on abundant elements
as well as being chemically and mechanically stable, and they can
be designed with favorable intrinsic TE efficiency.[3] This broad family of materials adopts a face-centered cubic
(F4̅3m) structure with an
XYZ-type composition and is particularly amenable to optimization
through doping into “empty” crystallographic sites to
simultaneously enhance the electronic carrier concentration and introduce
phonon point scattering. These dual effects are important because
the ideal TE material is a good electrical conductor and poor thermal
conductor: it must produce usable electric current across a strong
thermal gradient. However, unlike doping into elemental semiconductors
such as Si and Ge, doping into hHAs can drive phase changes, segregation
effects, and nanostructuring that will affect TE performance. Additionally,
the polycrystalline nature of bulk TE materials introduces internal
grain boundaries (GBs) that often have differing chemical compositions
and tend to give rise to parasitic electrical resistances. Intriguingly,
on the other hand, there is potential to “engineer”
GBs as electron-transmitting, phonon-blocking layers that could mitigate
against losses and also improve performance, such as a recent study
of Te extrusion from Bi0.5Sb1.5Te3 during processing to induce favorable GB nanostructuring.[4] Such grain boundary engineering has recently
been discussed in a number of other thermoelectric systems, including
Mg3Sb2,[5] SnTe,[6] SrTiO3,[7] and Heusler alloys.[8−11] In developing high-performance TEs—as with many polycrystalline
functional materials—there is a need to characterize structural
details that span multiple length-scales. Here, we outline a methodology
derived from a variety of characterization techniques that provide
structural insight ranging from micrometer phase segregation down
to atomic-scale site occupancy.Our focus is TiNiSn, in which
we have previously shown Cu doping
to produce an n-type hHA with enhanced phonon point scattering that
usefully lowers lattice thermal conductivity.[12] It is also inexpensive compared to other candidate TEs and supports
commercially promising TE performance.[13] It is vital to understand the distribution of Cu throughout the
bulk material, to assess phase segregation effects that we have seen
in other hHA systems and to determine the nature of GB structures.
In previous reports, we have shown that synthesis via hot-pressing
of elemental powders yields dense, polycrystalline TiNiCuSn materials. Bulk
diffraction has indicated excellent agreement with the expected F4̅3m structure, although clustering
and segregation effects of Cu at low dopant levels are difficult to
discern through Rietveld refinement of fits to diffraction data. Bulk
techniques including diffraction are also relatively insensitive to
spatially localized defect structures, including GBs, that can affect
performance. We previously used scanning transmission electron microscopy
(STEM) to reveal the formation of Cu “wetting layers”
that appear to facilitate the formation of coherent, low-angle GB
structures.[13] Here, we describe a second,
rougher GB structure with a three-dimensional (3D) character that
is hard to study with transmission electron microscopy (TEM) techniques
alone. We instead used atom-probe tomography (APT), which offers near-atomic-scale
characterization of microstructures in 3D and with full chemical resolution,
to explore the microstructure of these rough GBs and the composition
of the surrounding material. Metallic Cu is again found to segregate
at the GB, alongside oxide precipitates and other impurities that
can all be expected to affect both electronic and thermal transport.
There is no obvious nanostructuring within the bulk material, and
our results help to quantify the limit of Cu solubility in the bulk
TiNiSn matrix. As the nature of grain boundaries is essential to the
performance of a variety of advanced materials, from photovoltaics
to structural materials, we anticipate the methodology of complementary,
multilength-scale analyses outlined here to have broad applicability.
Methodology
The TiNiCu0.10Sn samples were
prepared by standard solid-state
methods as part of a larger batch with different compositions. Metal
powders of all four elements (Alfa Aesar, >99.99% purity) were
mixed
before being initially cold-pressed into 13 mm diameter pellets. These
were then annealed under various controlled conditions before being
finally hot-pressed; full details are provided in ref (13).Following synthesis,
samples were cleaved, mounted, and polished
for scanning electron microscopy (SEM) examination and APT/TEM specimen
preparation in a Thermo Scientific Helios G4 P-FIB UXe DualBeam FIB/SEM
instrument (University of Glasgow). Use of such Xe plasma focused
ion beam instruments as an alternative to Ga+ ion systems
has been growing in recent times; they offer advantages such as significantly
reduced sample beam damage, faster milling rates, and the possibility
to produce novel APT specimen geometries without the need for lift-out
methods.[14,15] In the current work, a key goal was to correlate
APT data through specific grain boundaries identified using EBSD.
Samples were FIB-milled with a series of fiducial marks, and EDS analysis
(Bruker Xflash) was performed during SEM to map the global chemistry
across 100 μm length-scales. Elemental quantification was performed
on a pixel-by-pixel basis by integrating the background-subtracted
X-ray counts within the Kα peaks of Ti, Ni, and Cu
and Lα peaks of Sn, with the summed signals collected
across the entire field of view normalized to the composition ratio
of the elemental powders used in synthesis. Electron backscattered
diffraction (EBSD, Bruker eFlash FS) was used to map the surface granularity
and to identify suitable grain boundaries, so that cross-sectional
specimens for TEM analysis and needle specimens for APT studied could
be produced from selected sites using standard lift-out methods.[16−18]Scanning transmission electron microscopy (STEM) incorporating
energy dispersive X-ray spectroscopy (EDS) and electron energy loss
spectroscopy (EELS) was performed on a JEOL ARMcFEG instrument that
was operated at 200 kV and was equipped with a Bruker XFlash EDS detector
and a Gatan Quantum EELS spectrometer. APT specimens were analyzed
on a Cameca LEAP 5000X HR (Oxford Materials). APT experiments were
conducted at a stage temperature of 50 K, using both laser pulsing
(100 pJ pulse energy, 355 nm ultraviolet laser) and voltage-pulsing
(25% pulse fraction) modes. A detailed assessment of the differences
between APT ionization mechanisms is provided elsewhere.[19] Broadly speaking, the laser-pulsed mode is favored
here for stoichiometric analysis, as it was found to yield more accurate
results than voltage-pulsing and is more reliable when looking at
inhomogeneous, oxide-decorated GBs, especially in these materials
of relatively low thermal conductivity. Voltage-pulsing, in contrast,
was preferable for crystallographic analysis of regions away from
the GBs. We previously identified a trend for lower laser pulse energies
returning more accurate chemistries in this material, but depending
on the needle geometry (including the tip radius, needle length and
diameter, support mounting, etc.), higher pulse energies did not always
compromise the accuracy of results. The resulting data were reconstructed
and analyzed using IVAS 3.8.8 visualization software (Cameca). Reconstructions
were carried out by voltage-profile fitting, using an averaged evaporation
field value for the three main alloying elements and ensuring all
reconstructed densities were close (within ∼5%) to known material
density.
Results
“Bulk” Analysis
The internal microstructure
and composition of the TiNiCu0.1Sn sample is illustrated
in Figure , which
summarizes several analysis techniques. Contrast in the SEM image
(Figure a) is dominated
by white features that relate to Ti oxides at some grain boundaries,
and dark features relating to surface roughness (notably the dark
crosses that were FIB-milled as fiducial marks). Figure b is a map of granularity derived
from an EBSD analysis, where the colors relate to the orientation
of the crystallographic surface normal. Grains range in size from
∼2 to 20 μm diameter and a majority of the grain boundaries
appear rough and meandering, consistent with what are termed “general”
grain boundaries elsewhere[20] and which
lack well-defined crystallographic orientations. One such grain boundary
is indicated by the first arrow in Figure a and is evident in both the SEM image and
the oxygen map (Figure d). There is a smaller proportion of more geometric, regular boundaries
that we find (see below) to have a degree of crystallographic alignment:
one of these is indicated by the second arrow in Figure a. It is difficult to discern
in SEM contrast but appears as a straight boundary in Figure b and lacks any obvious features
in the oxygen map (Figure d). Figure c–g show maps of the elemental distributions derived from
EDS, which indicate good uniformity of the main alloying elements.
Each map is overlaid with an indication of the grain boundaries derived
from the EBSD map, which together suggest a tendency for O and Cu
enhancement at grain boundaries. Peaks in the O map are often found
to coincide with slightly enhanced Ti and depleted Ni signals. (Ni
depletion is most readily observed within the vertical stripe where
the grain boundary overlay has been omitted for clarity, but the Ti
enhancement is more subtle to discern.) Some of the largest features
in the Cu map coincide with peaks in the Sn map and depleted regions
of Ti and Ni, consistent with the formation of a trace volume-fraction
of Cu–Sn alloy, similar to that discussed in a related hHA
study[21] and linked to a mineralizing effect
that promotes grain growth and chemical homogeneity. The brightest
feature in the O map, lying at the bottom right of Figure d, coincides with a peak in
the Cu map (Figure f) and suggests a very low volume-fraction of copper oxide impurity.
We find, however, that most of the copper exists in alloy or elemental
form rather than as an oxide (see below) and do not find copper oxides
to be significant. Finally, Figure h summarizes the compositional analysis, with the elemental
ratios measured at each pixel positioned within a Ti–Ni–Sn
phase diagram. The global composition derived from EDS has been normalized
to the ratio of elemental powders used in synthesis, and the main
observation is that the data are dominated by a single feature at
the centroid, which is a clear indication of the presence of the TiNiSn
phase. The peak’s sharp appearance indicates a relatively narrow
degree of compositional variation across the sample. For example,
the formation of a full-Heusler TiNi2Sn phase would produce
a second spot immediately above the centroid but is not observed here.
Even the Cu–Sn alloy phase identified above is insignificant.
This relatively homogeneous composition is important because it indicates
that nanocharacterization of a small number of samples extracted from
the center of grains should be representative of the bulk material.
In contrast, we have previously described hHA samples with pronounced
compositional inhomogeneity, both within and between grains.[22,23]
Figure 1
Electron-beam
analysis of a polished TiNiCu0.1Sn surface.
(a) An SEM image, with a scale-bar that relates to all subsequent
images. The prominent cross features are reference markers milled
into the sample using a focused ion beam. Arrow 1 indicates a “rough”
grain boundary that is found to be decorated by oxides that appear
white in the SEM image; arrow 2 indicates a more regular grain boundary
that lacks oxides and so is harder to discern in SEM; see text for
discussion. (b) An EBSD map of grains, with colors indicating the
grain orientation (see key, inset). The white dot indicates the grain
selected for analysis of “bulk” composition. (c–g)
EDS elemental maps of Ti, O, Ni, Cu, and Sn, each overlaid with a
semitransparent image of the grain boundaries derived from EBSD, except
for a vertical band lying to the left of center of each image. The
composition appears uniform but with concentrations of O and Cu at
some grain boundaries. (h) A compositional phase diagram derived from
the EDS data and indicating the Ti:Ni:Sn elemental ratio across the
surface to be strongly peaked at 1:1:1.
Electron-beam
analysis of a polished TiNiCu0.1Sn surface.
(a) An SEM image, with a scale-bar that relates to all subsequent
images. The prominent cross features are reference markers milled
into the sample using a focused ion beam. Arrow 1 indicates a “rough”
grain boundary that is found to be decorated by oxides that appear
white in the SEM image; arrow 2 indicates a more regular grain boundary
that lacks oxides and so is harder to discern in SEM; see text for
discussion. (b) An EBSD map of grains, with colors indicating the
grain orientation (see key, inset). The white dot indicates the grain
selected for analysis of “bulk” composition. (c–g)
EDS elemental maps of Ti, O, Ni, Cu, and Sn, each overlaid with a
semitransparent image of the grain boundaries derived from EBSD, except
for a vertical band lying to the left of center of each image. The
composition appears uniform but with concentrations of O and Cu at
some grain boundaries. (h) A compositional phase diagram derived from
the EDS data and indicating the Ti:Ni:Sn elemental ratio across the
surface to be strongly peaked at 1:1:1.Figure summarizes
the results from two atom-probe needles extracted from two different
grains, the first of which is indicated by the white spot in Figure b, representing the
atom maps in Figure a. This was analyzed under laser mode (100 pJ). The data set reveals
a uniform, homogeneous distribution of all elements with no evidence
of phase segregation or clustering. The overall composition from this
specimen was found to be Ti35.1–Ni30.0–Sn32.6–Cu2.1 (at.%), in reasonable
agreement with the nominal chemistry (Ti32.8–Ni32.8–Sn32.8–Cu1.6). The slightly high Ti/low Ni content is attributed to proportionally
more Ni ions evaporating as partial hits, as documented previously,[19] so that the actual composition is expected to
have slightly more Ni and slightly less Ti than determined here. In
our previous study,[19] laser pulse mode
was found to yield compositions that are closer to the known stoichiometry.
This figure also shows the results from a specimen extracted from
the center of a nearby grain and analyzed in voltage-pulsed mode. Figure b shows the resulting
atom maps, in this case presenting data as if looking down the needle
axis, revealing crystallographic poles deriving from the alloy’s
fcc structure. (NB. The bands across the data set do not indicate
regions of low density within the needle but arise from the crystallographic
orientation and are known as zonelines.[24]) The microstructures in these atom maps again appear homogeneous,
as does the resulting 1D composition profile in Figure c. The composition of this needle is determined
to be Ti34.5–Ni32.5–Sn31.3–Cu1.7, close to both the nominal composition and
that from the laser-pulsed mode specimen. The differences are ascribed
to a combination of slight compositional variations between grains
as well as minor differences in field evaporation behavior between
the two analysis modes, as outlined previously.[19] Finally, the plots in Figure d illustrate the outcomes from a nearest-neighbor
analysis[25] (N = 10) for
all four species. Within each plot, the solid colored curves show
the statistical separation of each M–M atomic pair, while the
dotted curves are derived from the same atomic coordinates but with
all ion identities now randomized. The real and randomized curves
are coincident for all species, confirming homogeneous microstructures
with no evidence of nanoscale clusters. Both the bulk composition
and its uniform nature shown here also agree with findings of a preliminary
study on this same material optimizing the atom-probe analysis conditions.[19]
Figure 2
Atom-probe tomography analyses from bulk regions of TiNiCu0.1Sn. (a) Atom maps (side-on view) showing distribution of
Ni + Cu and Sn + Ti atoms from a specimen extracted from the grain
indicated by the white spot in Figure b. Data collected in laser-pulsed mode (100 pJ). (b)
Atom maps (head-on view) showing distribution of Ni + Cu and Sn +
Ti from a specimen extracted from a neighboring grain. Data collected
in voltage-pulsed mode, with major crystallographic poles labeled.
(c) One-dimensional composition profiles along the needle axis for
the sample in (b), showing a uniform composition with no segregation
or clustering apparent. (d) Nearest-neighbor analyses for Ti, Ni,
Sn, and Cu from the sample shown in (b), where colored lines for each
element overlap with dotted lines derived from a random distribution,
indicating a lack of identifiable clustering. (y-Axes
all scaled to (common) arbitrary units).
Atom-probe tomography analyses from bulk regions of TiNiCu0.1Sn. (a) Atom maps (side-on view) showing distribution of
Ni + Cu and Sn + Ti atoms from a specimen extracted from the grain
indicated by the white spot in Figure b. Data collected in laser-pulsed mode (100 pJ). (b)
Atom maps (head-on view) showing distribution of Ni + Cu and Sn +
Ti from a specimen extracted from a neighboring grain. Data collected
in voltage-pulsed mode, with major crystallographic poles labeled.
(c) One-dimensional composition profiles along the needle axis for
the sample in (b), showing a uniform composition with no segregation
or clustering apparent. (d) Nearest-neighbor analyses for Ti, Ni,
Sn, and Cu from the sample shown in (b), where colored lines for each
element overlap with dotted lines derived from a random distribution,
indicating a lack of identifiable clustering. (y-Axes
all scaled to (common) arbitrary units).An EELS analysis of the grain indicated by the
white spot in Figure b yields a uniform
composition of Ti: (32.5 ± 0.5)%, Ni: (37.0 ± 0.8)%, Sn:
(30.5 ± 0.4)%, each expressed as the (mean ± standard deviation)
atomic percent, determined from a spectrum image[26] data set. Cu was undetectable to EELS because of the low
doping level and because the Cu L2,3 EELS feature is broad
and difficult to distinguish from the strong background in the EELS
data set: this was one motivation for the APT analysis. The reason
for the apparent enhancement of the Ni content measured by EELS is
unclear and is being investigated separately.The uniform composition
is an important observation because segregation
of full-Heusler or dopant-rich nanoparticles within the half-Heusler
matrix has been used to introduce lattice-matched phonon scattering
centers that reduce thermal conductivity without impairing electrical
conductivity.[27,28] Here, we find no evidence for
either full-Heusler alloy inclusions or Cu-rich nanostructures within
grains, in agreement with our previous diffraction studies,[13] which suggests that at low concentrations, excess
metal dopants are distributed randomly throughout vacant crystallographic
sites in the hHA matrix. The formation of Cu-rich “full-Heusler”
inclusions only became apparent in TiNiCuSn for Cu concentrations (x) above 0.1 (i.e., 3.2
at. %). Detecting such inclusions can be very difficult to find with
other composition analysis techniques because the Cu dopant here is
at a low percentage concentration and to detect inhomogeneities in
the distribution of Cu requires high sensitivity
to compositional fluctuations at near-atomic-scale, which is achievable
using APT.
Grain Boundary Analysis
Figure summarizes a TEM/STEM analysis of a ∼10
μm wide lamella extracted from a region close to that of the
APT results. The low-magnification TEM image of Figure a indicates the structure beneath the surface
of Figure to have
similar (and therefore isotropic) polycrystalline character to that
of the surface. Contrast in the image is dominated by diffractive
effects, and abrupt changes in the curved bend-contour fringes indicate
grain boundaries, where there is an abrupt change in crystal orientation.
The red box indicates the location of a higher magnification analysis
that is described in subsequent panels, lying ∼5 μm beneath
the surface in Figure and straddling the boundary between three grains. Figure b is a dark-field STEM image
of the threefold GB, where the brightest features correspond to the
heaviest elements and materials. It indicates two main GBs: one running
vertically through the whole image and characterized by a string of
dark regions; and another GB running roughly horizontally on the right
of the image, characterized by a narrow, lighter band. These two GBs
are of the same two types as those identified in Figure . Figure c is an electron diffraction pattern that
was collected from the lower-right grain of Figure a and which is typical of the grains running
throughout the sample. It is consistent with diffraction from the F4̅3m structure, viewed along a [001]
direction.
Figure 3
TEM/STEM analysis of the structure beneath the surface illustrated
in Figure . (a) Low-magnification
cross-sectional TEM image of a lamella extracted from a region close
to the point indicated in Figure , with the surface plane indicated at the top. (b)
STEM detail of the three-way grain boundary indicated in the TEM image.
(c) Selected area electron diffraction pattern collected from the
lower-right grain of image (b), consistent with scattering from a
single crystal F4̅3m structure
along the [001] direction. (d) High-resolution STEM image of the boundary
between the two grains lying to the right of image (b) with (inset)
overlaid Fourier transforms showing crystallographic alignment, red
features deriving from the lower grain and cyan features from the
upper grain. (e–i) Elemental maps derived from EDS analysis
within the rectangular region indicated in (b). (j) Overlaid maps
of the Cu (red) and O signals (cyan) collected from the same three-way
grain boundary.
TEM/STEM analysis of the structure beneath the surface illustrated
in Figure . (a) Low-magnification
cross-sectional TEM image of a lamella extracted from a region close
to the point indicated in Figure , with the surface plane indicated at the top. (b)
STEM detail of the three-way grain boundary indicated in the TEM image.
(c) Selected area electron diffraction pattern collected from the
lower-right grain of image (b), consistent with scattering from a
single crystal F4̅3m structure
along the [001] direction. (d) High-resolution STEM image of the boundary
between the two grains lying to the right of image (b) with (inset)
overlaid Fourier transforms showing crystallographic alignment, red
features deriving from the lower grain and cyan features from the
upper grain. (e–i) Elemental maps derived from EDS analysis
within the rectangular region indicated in (b). (j) Overlaid maps
of the Cu (red) and O signals (cyan) collected from the same three-way
grain boundary.Figure d is a high-magnification
STEM image of a region of the GB between the two grains lying to the
right of Figure a,
straddling the light band observed in dark-field STEM. The atomic
lattice is evident in both upper and lower portions of the image.
The inset shows fast Fourier transforms of top (cyan) and bottom (red)
grains—the sharp spots, similar to diffraction patterns, are
clearly aligned, indicating crystallographic registry of the two grains:
the image is consistent with a typical low-angle grain boundary. No
such registry was evident across the rough GB.Figure e–j
summarizes EDS analysis within the region indicated by the red box
in Figure b. Ti, Ni,
and Sn appear uniform in all three grains, except for the rough GB
region, indicating the internal grain composition to be relatively
homogeneous and without obvious segregation or nanostructuring effects.
These images are dominated, however, by the rough GB features, which
are rich in Ti and O (Figure e,h). The dark features in Figure b are therefore identified as titanium oxides.
The Cu map, Figure i, shows a low Cu signal throughout the image, consistent with uniform
dissolution within the grains themselves. It also indicates a thin
band of Cu enrichment at both types of GBs, which accounts for their
brighter appearance in dark-field STEM. For the smooth GB, the segregation
of Cu and observation of coherent lattices on either side are consistent
with the formation of Cu “wetting layers” that we have
described previously and are attributed to extrusion of Cu from the
bulk matrix during hot-pressing.[13] These
GBs are important because their structure suggests that they will
have little impact on electronic conduction, but their structure could
scatter long-wavelength phonons and thereby impair thermal conductivity.
We will not discuss them further here. The segregation of Cu at the
rough GBs is also interesting: segregation is, presumably, driven
by the thermodynamics of limited solubility of Cu in the bulk hHA
matrix—and the extrusion of impurities to grain boundaries
has been observed in many other polycrystalline systems.[20] Our previous diffractive studies of Cu-doped
TiNiSn indicated a contraction of the bulk lattice parameter upon
hot-pressing the samples during synthesis, which is consistent with
the extrusion or dissolution of Cu from the bulk matrix.[13,29]Figure j, which
is a false-color superposition of the O (in cyan) and Cu (in red)
maps and clearly indicates that although both Ti oxides and Cu decorate
this GB type, they are not completely coincident. There appears to
be a low level of Cu throughout the GB and evidence for occasional
Cu-rich precipitates (e.g., the red spot at the center of the three-way
GB).Resolving the structure of the precipitates at rough GBs,
both
copper and titanium oxides, is challenging in transmission electron
microscopy because the images collected are the two-dimensional projections
of these inherently 3D structures and because the spectroscopic signals
from Cu, in either EELS or EDS, are weak and hard to distinguish from
the background. We therefore turned to APT to discern the 3D structure
of these features.Figure presents
APT atom maps (collected under laser pulse mode) from a ∼6
μm long needle with a rough GB running along its axis. Analysis
of two subvolumes (cylindrical, 300 × 15 nm, centered on the
dashed lines in Figure a and avoiding the oxide particles) yields a composition of Ti35.2–Ni29.3–Sn33.0–Cu1.6 for the upper grain and with the lower returning Ti35.4–Ni28.5–Sn33.6–Cu1.8. With the numerical counting errors on each typically ±0.05%
(±0.01% in the case of Cu), the data are hinting at possible,
slight variations in composition between grains, as commented above.
Figure 4
Atom maps
highlighting detected species within an APT needle containing
a grain boundary. (a,b) Ni and Cu distributions (blue and orange points)
with a TiO isosurface in yellow. The map in (a) is rotated 90°
relative to (b) and subsequent panels in order to highlight the flat
grain boundary structure. (c,d) The same volume showing maps of (c)
Sn and a Cu isosurface (in green and orange, respectively) and (d)
the Ti and C distributions (in gray and maroon). The grain boundary
is decorated by nanoscale precipitates, all of which appear enriched
in TiO, Cu, and C, as clearly shown by
the respective isoconcentration surfaces (2% TiO, 3.5% Cu, and 0.6%
C). For explanation of dotted lines in (a), refer to the main text.
Atom maps
highlighting detected species within an APT needle containing
a grain boundary. (a,b) Ni and Cu distributions (blue and orange points)
with a TiO isosurface in yellow. The map in (a) is rotated 90°
relative to (b) and subsequent panels in order to highlight the flat
grain boundary structure. (c,d) The same volume showing maps of (c)
Sn and a Cu isosurface (in green and orange, respectively) and (d)
the Ti and C distributions (in gray and maroon). The grain boundary
is decorated by nanoscale precipitates, all of which appear enriched
in TiO, Cu, and C, as clearly shown by
the respective isoconcentration surfaces (2% TiO, 3.5% Cu, and 0.6%
C). For explanation of dotted lines in (a), refer to the main text.Figure a,b shows
the same data viewed (a) along the GB and (b) perpendicular to the
GB. The Ni distribution is indicated in blue, Cu is indicated in orange,
and Ti oxides are indicated by the yellow isosurfaces that encapsulate
volumes above 2 at. % TiO. From these images, it is apparent that
the grain boundary is decorated with a number of discrete nanoscale
clusters rich in Ti and O that correlate well with the titanium oxides
revealed in projection by STEM. These vary in size from ∼10
up to ≥100 nm and present as both discrete and interconnected
regions that are flattened within the grain boundary plane. Determining
the precise stoichiometry of oxides can be complicated in APT by the
production of neutral oxygen species that are not detected,[30] and we therefore refer to the presence of TiO although consider the measured stoichiometry
to be too rich in Ti to be consistent with TiO2, even accounting
for underdetection of oxygen. In addition to TiO species, the precipitates are also rich in Cu (Figure c shows the 3.5% isosurface)
and C (Figure d shows
the 0.6% isosurface), as shown by the respective isoconcentration
surfaces of these in Figure c,d. The Cu distribution is more obvious when viewed without
the TiO isosurfaces, and the high spatial correlation between Cu,
C, and TiO inclusions in all of these
maps clearly suggest a degree of cosegregation. The dashed ellipse
in Figure b indicates
a region where the Cu lies on the outside of the Ti oxide, and this
spatial relationship between elemental distributions is explored in
more detail below. Oxygen is a common trace impurity in TiNiSn hHAs[21] and is attributed to oxidation of the elemental
powders used for synthesis and/or oxidation of the alloy surface during
the first annealing stage of synthesis. Carbon is assumed to derive
from impurities in the starting materials.Figure focuses
on distinct regions of interest (ROIs) within the needle of Figure . Three ROIs (20
× 20 × 26 nm) cut across the grain boundary to investigate
volumes containing the TiO inclusions
(ROIs 1 and 3) and the alloy region (ROI 2). A fourth ROI, indicated
by the dotted box (25 × 45 × 550 nm) in Figure b, captures all inclusions
and neighboring matrix atoms to assess the overall GB chemistry.
Figure 5
(a) Atom
maps through the GB illustrated in Figure , showing the distributions of Cu, Ti, and
C. Regions of interest (ROIs) are indicated and used to determine
localized concentrations through the TiO inclusions (1,3) and in surrounding
metal (2). (b) The same data, viewed at 90° to that of panel
(a), in the plane of the GB. The dashed box demarks the ROI (4) used
to define the whole GB volume. (c) Composition profiles through the
black and white box indicated in panel (b), straddling the GB.
(a) Atom
maps through the GB illustrated in Figure , showing the distributions of Cu, Ti, and
C. Regions of interest (ROIs) are indicated and used to determine
localized concentrations through the TiO inclusions (1,3) and in surrounding
metal (2). (b) The same data, viewed at 90° to that of panel
(a), in the plane of the GB. The dashed box demarks the ROI (4) used
to define the whole GB volume. (c) Composition profiles through the
black and white box indicated in panel (b), straddling the GB.The compositions of all four regions are shown
in Table , which indicates
that the whole
GB (ROI 4) contains, on average, ∼5% Cu, around 3 times that
of the bulk grains on either side of the GB. Within localized regions
in close proximity to the TiO inclusions
(ROIs 1 and 3), the Cu content is significantly higher, approaching
20 at. %, consistent with the proposed extrusion of Cu to the GBs
during hot-pressing and the clear segregation observed in STEM. In
contrast, in the hHA regions located between the inclusions (ROI 2),
there is a depletion of Cu (1.4 at. %) compared to the bulk value;
indeed, three additional ROIs placed similarly between the inclusions
(not shown) all returned Cu contents of around 1 at. %. This degree
of nanometer-scale, 3D chemical inhomogeneity would be very difficult
to localize using STEM techniques alone.
Table 1
Composition (at. %) of the Grains
Indicated in Figure , the ROIs Indicated in Figure , and the Oxide Inclusions Discussed in the Main Texta
Region
Ti
Ni
Sn
Cu
O
C
Upper
grain
34.1
30.2
32.6
2.0
-
-
Lower grain
34.4
30.6
31.7
1.7
-
-
ROI
1 (inclusions)
34.7
13.5
12.4
19.9
14.1
3.0
ROI 2 (GB alloy)
34.1
31.3
32.2
1.5
0.3
0.2
ROI 3 (inclusions)
29.5
22.4
26.6
15.7
4.0
0.9
ROI
4 (whole GB)
34.3
27.9
29.0
5.46
2.0
0.7
Oxide inclusions
45.2
10.3
10.5
5.1
23.8
2.8
The regions of interest (ROIs)
select volumes that are predominantly oxide inclusions (ROI1 &
ROI3), the alloy between the inclusions (ROI2), or the whole grain
boundary, including both alloy and oxide inclusions.
The regions of interest (ROIs)
select volumes that are predominantly oxide inclusions (ROI1 &
ROI3), the alloy between the inclusions (ROI2), or the whole grain
boundary, including both alloy and oxide inclusions.Figure c shows
a 1D composition profile through the GB, derived from the region highlighted
in black/white in Figure b. Segregation of O and Cu at the GB is clear, alongside trace
quantities of C that are attributed to impurities in the starting
materials segregating out from the bulk. Although colocated with O,
the Cu distribution is broader and therefore is inconsistent with
the Cu existing as an oxide, which is discussed in more detail below.
Ni and Sn contents both diminish at the GB, in agreement with the
EDS images of Figure , each dropping to ∼20% at.%, while the enhancement of titanium
arises from the presence of titanium oxides. Very similar segregation
effects, with enhanced Ti and O concentrations and depleted Ni and
Sn, were recently observed in thin film studies of TiNiSn, where we
speculated that trace oxygen drew Ti out of the hHA matrix during
deposition.[21]Finally, we return
to the relationship between Cu and Ti oxides
at the GB. Figure shows isosurfaces for TiO (2 at. %) and Cu (3.5 at. %) in a small section of the GB
to highlight the matrix–inclusions interface. While the exact
choice of isosurface values is somewhat open to interpretation, for
all reasonable values for both TiO and
Cu, Cu is located slightly outwith the TiO, clearly indicating clustering of Cu to the interface of the titanium
oxide particles. This clustering explains the broader Cu profile shown
in Figure c and also
the distributions of O and Cu illustrated in Figure j. It indicates the Cu to be present in metallic
rather than oxide form, which was also the case for the Cu wetting
layers observed in the more regular grain boundaries.[13] The proximity histogram of Figure b shows aggregate composition profiles along
the surface normal of the TiO inclusions,
summed over all TiO inclusions. It clearly
demonstrates that Cu is most concentrated at the interface between
the oxygen-rich inclusions and the surrounding alloy matrix (approximate
interface position as marked by vertical dotted line in Figure b). The TiO inclusions are also enriched in trace levels of C and N and
therefore appear to have mopped up the main impurities from the bulk
matrix. The overall composition of material within the TiO isosurfaces
is indicated in the last row of Table . Nearly all of the oxygen is detected in APT as TiO+ molecular ions, with only trace levels (0.5%) of TiO2 present. There is approximately a 2:1 ratio of titanium detected
as TiO vs Ti, as also apparent by eye in the proxigram, suggesting
that the inclusions are either oxygen-rich regions or substoichiometric
oxides that contain high Cu levels. Again, the presence of TiO inclusions rather than TiO2 was
also observed in TiNiSn thin films;[21] the
present study may indicate that the oxides in the thin film case derived
directly from the source material rather than forming in situ. Other
oxides were not detected at significant levels. Although it would
be expected that Ti oxides would form preferentially in a low-oxygen
environment, the existence of elemental Cu and the lack of other notable
oxides do suggest that the TiO inclusions
and the Cu enrichment at grain boundaries arise from two distinct
processes. For example, Cu extrusion may be expected to occur at high
temperatures, while the segregation of already-formed TiO particles could occur earlier in the synthesis process.
The resulting structures are not, for example, consistent with the
diffusion of oxygen through the alloy to form oxides.
Figure 6
(a) Detail of the atom
map of Figure , showing
TiO (2 at. %) and Cu (3.5 at. %)
isosurfaces in yellow and orange. Cu clearly decorates the perimeter
of TiO-rich inclusions. (b) Proximity histogram (averaged from all
TiO inclusions) confirms Cu-segregation peaks at the interface between
the alloy matrix (left of vertical dotted line) and TiO-rich inclusions
(right of dotted line).
(a) Detail of the atom
map of Figure , showing
TiO (2 at. %) and Cu (3.5 at. %)
isosurfaces in yellow and orange. Cu clearly decorates the perimeter
of TiO-rich inclusions. (b) Proximity histogram (averaged from all
TiO inclusions) confirms Cu-segregation peaks at the interface between
the alloy matrix (left of vertical dotted line) and TiO-rich inclusions
(right of dotted line).
Discussion
A previous study of TiNiCu0.25Sn and TiNiCu0.1Sn samples[13] showed the GB chemistry to
be enriched in Cu and focused on well-defined low-angle grain boundaries.
Here, we have used a variety of techniques, spanning different length-scales,
to characterize the chemistry of “rough” GBs first observed
by SEM. The APT data presented here has shown that the GB in this
TiNiCu0.1Sn material is again enriched in Cu but also in
O, C, and N. The structure of rough GBs has a great deal of localized
variation, with Cu segregating adjacent to oxygen-rich inclusions.
These inclusions are substoichiometric oxides of titanium, containing
2–3 at. % of both C and N in addition to the elevated levels
of Cu. Even within these there is further variation in the Cu distribution:
on average around 5 at. % at the core but reaching 3–4 times
this concentration at the interface between the matrix and titanium
oxide inclusions. The morphology of the latter exist both as discrete
regions and interconnected domains all lying along the plane of the
grain boundary, between 10 and 100 nm in length. In contrast, in between
the TiO-rich inclusions, the Cu content is actually depleted compared
to the matrix, at around 1 at. % It is clear that these types of GB
will impact both electronic and thermal transport and therefore impact
on the performance of these materials as thermoelectrics. A main conclusion
of this study is that better control over trace oxide formation is
essential, and we note that to achieve this within an economic manufacturing
process will be a challenge.Segregation of impurities at GBs
is well-known and has been observed
in a number of materials systems, including other TEs.[31−33] However, the inhomogeneous nature of the GBs described here is unusual.
Extrusion of Cu to the grain boundaries during hot-pressing is of
particular interest for a number of reasons. First, it suggests that
the Cu acts as an efficient homogenizer and is mobile during synthesis,
producing dense TE materials with largely homogeneous grain compositions
and high-quality GBs that together improve electrical conductivity.
Second, Cu extrusion would suggest a thermodynamic limit on the solubility
of Cu within the TiNiSn hHA matrix around 2 at. %, which is surprisingly
low. The half-Heusler alloys have long been seen as a remarkably tunable
materials system, with vacant sites that can be readily doped to produce
an alloy series ranging from XYZ to XY2Z, the “full”-Heusler.
In practice, it is known that segregation into full- and half-Heusler
alloys is favored over a uniform alloy series, but here, we have segregation
in the form of the extrusion of excess metal rather than formation
of FH inclusions. In contrast, we have shown that in the case of excess
Ni and Co, segregation into full-Heusler domains will occur at similar
dopant levels to those used here—the comparison is particularly
relevant because of the similar atomic sizes and therefore of the
lattice strain effects expected in each case.Most intriguingly,
extrusion of Cu to GBs in hHAs is similar to
the liquid extrusion that has recently been used to boost the TE performance
of Bi2Te3 and CoSb3 skutterudites:
when molten Te (Sb) is extruded during pressure assisted consolidation,
dense dislocation networks are observed to form at interfaces. Remarkably,
these reduce the lattice component of thermal conductivity and improve
electrical conductivity, leading to a 50% improvement in the thermoelectric
performance (measured as “ZT”, a standard figure of
merit for TEs[27]). The advance suggests
it is possible to effectively decouple electrical and thermal scattering
at GBs, and this type of GB engineering now needs to be explored in
greater detail in the hHAs.
Conclusions
We have demonstrated a multitechnique,
multilength-scale approach
to examine the micro and nanostructure of a TiNiCu0.1Sn
thermoelectric material, utilizing SEM, EDS, EBSD, TEM, STEM, EELS,
and APT methods. In this alloy, two main grain boundary types have
been identified: GBs that appear rough in SEM imaging and are found
to be decorated by discrete oxide precipitates and elemental impurities
and more geometric GBs of well-defined crystallographic character.
Copper is found to segregate at both GB types and has the potential
to enhance thermoelectric performance. The nanoscale inclusions observed
at rough GBs are a substoichiometric titanium oxide that capture excess
Cu in addition to C and N contaminants. While copper colocates on
these inclusions, it appears to concentrate at the matrix–inclusion
interface and is furthermore depleted from the bulk value at purely
metallic intersections between the two grains. The oxide formation
at rough GBs will diminish electric transport through the bulk material
and is expected to compromise thermoelectric performance. These findings
suggest that routes to control the structure and chemistry of grain
boundaries are essential to optimize the performance of future thermoelectrics.
Authors: Sang Il Kim; Kyu Hyoung Lee; Hyeon A Mun; Hyun Sik Kim; Sung Woo Hwang; Jong Wook Roh; Dae Jin Yang; Weon Ho Shin; Xiang Shu Li; Young Hee Lee; G Jeffrey Snyder; Sung Wng Kim Journal: Science Date: 2015-04-03 Impact factor: 47.728
Authors: T Philippe; F De Geuser; S Duguay; W Lefebvre; O Cojocaru-Mirédin; G Da Costa; D Blavette Journal: Ultramicroscopy Date: 2009-06-21 Impact factor: 2.689
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Authors: Sonia A Barczak; John E Halpin; Jim Buckman; Rodolphe Decourt; Michael Pollet; Ronald I Smith; Donald A MacLaren; Jan-Willem G Bos Journal: ACS Appl Mater Interfaces Date: 2018-01-25 Impact factor: 9.229