Literature DB >> 3607506

Characterization of two plasma membrane proteins abundant in rat brain.

H W Steisslinger, V J Aloyo, L Vitković.   

Abstract

Plasma membranes were isolated from rat brain cortices and their proteins characterized by two-dimensional electrophoresis. Approximately 500 polypeptides with relative molecular weights (mol. wt.) between 20 kDa and 120 kDa and isoelectric points (pI) between 4.2 and 8.5 were visualized by silver staining. Two proteins, MP1 and MP2, comprised about 5% each of the total by mass. Their mol. wts. were 56 kDa and 43 kDa, and their pIs were 4.2 and 4.3, respectively. The two proteins were present in membranes of cultured granule neurons and cortical astrocytes and absent in liver and kidney. They were both substrates for phosphorylation by protein kinase C. MP2 is similar, if not identical, to a major phosphoprotein in growth cones, pp46 (also termed GAP-43, B-50, F1).

Entities:  

Mesh:

Substances:

Year:  1987        PMID: 3607506     DOI: 10.1016/0006-8993(87)90224-1

Source DB:  PubMed          Journal:  Brain Res        ISSN: 0006-8993            Impact factor:   3.252


  4 in total

1.  Identification, localization, and primary structure of CAP-23, a particle-bound cytosolic protein of early development.

Authors:  F Widmer; P Caroni
Journal:  J Cell Biol       Date:  1990-12       Impact factor: 10.539

2.  The 43-kDa neuronal growth-associated protein (GAP-43) is present in plasma membranes of rat astrocytes.

Authors:  L Vitković; H W Steisslinger; V J Aloyo; M Mersel
Journal:  Proc Natl Acad Sci U S A       Date:  1988-11       Impact factor: 11.205

3.  Growth-associated protein 43 is down-regulated in cultured astrocytes.

Authors:  L Vitković; M Mersel
Journal:  Metab Brain Dis       Date:  1989-03       Impact factor: 3.584

4.  Regulation of immunoreactive GAP-43 expression in rat cortical macroglia is cell type specific.

Authors:  A da Cunha; L Vitković
Journal:  J Cell Biol       Date:  1990-07       Impact factor: 10.539

  4 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.