| Literature DB >> 36042880 |
Xiaotong Li1, Qian Liu2, Jianghao Wang2, Hao Bin Wu3.
Abstract
Heterostructured catalysts based on Cu and oxides are promising for the efficient conversion of CO2 to multi-carbon products. In this protocol, we describe the fabrication and characterization of Cu/oxide heterostructured catalysts and the evaluation approach of electrochemical CO2 reduction reaction (CO2RR) performance in an H-type cell. We also provide the details of in situ surface-enhanced Raman measurement and theoretical calculations. The protocol can be useful for constructing self-supported electrodes and assessing the CO2RR performance of as-fabricated electrodes. For complete details on the use and execution of this protocol, please refer to Li et al. (2022).Entities:
Keywords: Chemistry; Energy; Environmental sciences; Material sciences; Physics
Mesh:
Substances:
Year: 2022 PMID: 36042880 PMCID: PMC9420537 DOI: 10.1016/j.xpro.2022.101637
Source DB: PubMed Journal: STAR Protoc ISSN: 2666-1667
Figure 1Photographs of the ZrO2-modified Cu electrode preparation
(A–H) Photo images of (A) pristine Cu foil, (B) mechanically polished Cu foil, (C) Cu foil with a defined working area by encapsulating the Cu foil with Teflon tape, (D) drop-coating and drying 16 μL of ZrO2 ink on one side of Cu on a hot plate at 110°C, (E) ZrO2-modified Cu electrode after first drying on a hot plate at 110°C (16 μL of ZrO2 ink), (F) ZrO2-modified Cu electrode after second drying on a hot plate at 110°C (32 μL in total), (G, H) the front and back sides of the Cu/ZrO2 electrode.
Figure 2Photographs of the surface-reconstructed Cu electrode preparation (take Cu-Cu2O as an example)
(A–D) Photo images of the front and back sides of (A) Cu/ZrO2 electrode, (B) Cu/ZrO2 electrode with removed Teflon tape, (C) Cu/ZrO2 electrode after sonication, (D) Cu-Cu2O electrode with a defined working area by encapsulating the electrode with Teflon tape.
Figure 3Photographs of the ZrO2-modified reconstructed Cu electrode preparation (take Cu/ZrO2-1-1 as an example)
(A and B) Photo images of (A) Cu-Cu2O electrode, (B) re-loading and drying ZrO2 ink on one side of Cu-Cu2O electrode on a hot plate at 110°C.
(C) Cu/ZrO2-1-1 electrode.
Figure 4Photographs of the electrochemical CO2 reduction measurement
Bio-Logic electrochemical workstation is used to apply a cathodic potential, the CO2RR is performed in an H-type cell, the CO2 gas flow rate is controlled by a mass flow controller (MFC), and the gas products are detected by online gas chromatography.
Figure 5GC traces from FID and TCD channels of standard gas
(A–D) GC traces from (A and B) FID channel and (C and D) TCD channel of (A and C) standard gas with low concentration and (B and D) standard gas with high concentration.
(E) Calibration curves for gas products.
The concentration of standard gases and the corresponding peak areas obtained from the GC traces
| Concentration (ppm) | H2 | CO | CH4 | C2H4 | C2H6 |
|---|---|---|---|---|---|
| Low concentration | 103 | 104 | 104 | 104 | 104 |
| High concentration | 1005 | 1007 | 1008 | 1014 | 1018 |
| Peak area | H2 | CO | CH4 | C2H4 | C2H6 |
| Low concentration | 965.5 | 79753.5 | 82726.5 | 158689.5 | 157761 |
| High concentration | 9777 | 804667 | 825807.5 | 1604148 | 1579314 |
Figure 6GC traces from FID and TCD channels of Cu/ZrO2 tested at -1.05 V vs RHE
(A and B) GC traces from (A) FID channel, and (B) TCD channel.
(C) The chronoamperogram curve (i-t curve) of Cu/ZrO2 tested at -1.05 V vs RHE.
Figure 71H NMR spectra of standard solution containing a mixture of liquid products
(A–D) (A) 15 mM of liquid products, (B) 7.5 mM of liquid products, (C) 1.5 mM of liquid products, and (D) 0.5 mM of liquid products.
(E) Calibration curves for liquid products.
Figure 81H NMR spectra of the catholyte after 90 min of CO2RR on Cu/ZrO2 at -1.05 V vs RHE
Figure 9Evaluation of electrochemical active surface area (ECSA)
(A and B) Cyclic voltammetry measurements on Cu and Cu/ZrO2 electrodes.
(C and D) (C) Electrochemical double-layer capacitance (Cdl) and (D) electrochemical active surface area (SECSA) of Cu and Cu/ZrO2 electrodes.
Figure 10In situ surface-enhanced Raman spectroscopy
(A and B) (A) Photograph of the in situ electrochemical Raman spectroscopy system and (B) schematic diagram of the Raman cell (Adapted with permission from Gaoss Union).
| REAGENT or RESOURCE | SOURCE | IDENTIFIER |
|---|---|---|
| Potassium formate (HCOOK, 99%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 590-29-4 |
| Methanol (CH3OH, 99.5%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 67-56-1 |
| Potassium acetate (CH3COOK, 99.9% metals basis) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 127-08-2 |
| Ethanol (C2H5OH, 99.7%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 64-17-5 |
| Acetone (CH3COCH3, 99.5%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 67-64-1 |
| Acetaldehyde (CH3CHO, 99.5%) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 75-07-0 |
| Propionaldehyde (C2H5CHO, 98%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 123-38-6 |
| Ethylene glycol (OHCH2CH2OH, 99.5%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 107-21-1 |
| n-Propanol (C3H7OH, 99.5%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 71-23-8 |
| Dimethyl sulfoxide (C2H6SO, 99.7% with molecular sieves, water ≤ 50 ppm) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 67-68-5 |
| Deuterium oxide (D2O, 99.9% D, for NMR) | Energy Chemical (Shanghai, China) | CAS: 7789-20-0 |
| Copper foil (Cu, 99.5%, 0.1 mm thickness) | Tianjin Shentai Chemical Industry Co., Ltd. (Tianjin, China) | CAS: 7440-50-8 |
| Zirconium dioxide (ZrO2, 99.99% metal basis, 40–60 nm) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 1314-23-4 |
| Silicon dioxide (SiO2, 99.5%, 20–30 nm) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 14808-60-7 |
| Hafnium oxide (HfO2, 99.99% metal basis, 40–60 nm) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 12055-23-1 |
| Gallium oxide (Ga2O3, 99.8% metal basis, 500 nm) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 12024-21-4 |
| Aluminum oxide (Al2O3, 99.99% metal basis, 20–30 nm) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 1344-28-1 |
| Potassium bicarbonate (KHCO3, 99.5%) | Shanghai Aladdin Bio-Chem Technology Co., Ltd. (Shanghai, China) | CAS: 298-14-6 |
| Potassium phosphate dibasic (K2HPO4, 98%) | Shanghai Macklin Biochemical Co., Ltd. (Shanghai, China) | CAS: 7758-11-4 |
| Potassium chloride (KCl, 99.5%) | Sinopharm Chemical Reagent Co., Ltd. (Shanghai, China) | CAS: 7447-40-7 |
| DuPont™ Nafion® PFSA polymer dispersions (D-520, 5% in a mixture of lower aliphatic alcohol and water) | DuPont company (America) | N/A |
| Proton exchange membrane (Nafion 115) | DuPont company (America), pretreatment conditions are shown in | N/A |
| CO2 gas (99.995%) | N/A | N/A |
| Ar gas (99.99%) | N/A | N/A |
| Standard gas (containing H2, CO, CH4, C2H4, C2H6, N2) | N/A | N/A |
| 3,000 mesh silicon carbide paper | KAFUWELL (Hangzhou, China) | N/A |
| Deionized water (18.25 MΩ cm) | Made by the pure water machine | N/A |
| Au@SiO2 (Au core 55 nm, SiO2 shell thickness 2 nm) | Shiyanjia Lad (Hangzhou, China) | FMA2109073 |
| Tape for XAFS sample preparation | 3M Scotch | N/A |
| Teflon tape | N/A | N/A |
| Vienna ab initio simulation package (VASP) | N/A | |
| Gas chromatography (GC) | FULI | 9790II |
| 1H nuclear magnetic resonance (NMR, 600 MHz) | Agilent | DD2-600 |
| Scanning electron microscopy equipped with Energy dispersive spectrometer (SEM-EDS) | SEM: Hitachi | SU8010 |
| Transmission electron microscope equipped with Energy dispersive spectrometer (TEM-EDS) | TEM: JEOL | JEM-2100F |
| Ultra-high resolution Scanning electron microscopy- Focused ion beam equipped with Energy dispersive spectrometer (SEM-FIB-EDS) | TESCAN | GAIA3 |
| X-ray diffraction (XRD) | PANalytical | PANalytical X'Pert PRO |
| X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) | Thermo Fisher Scientific | Escalab 250Xi |
| X-ray absorption fine structure (XAFS) | Beijing Synchrotron Radiation Facility (BSRF) | 1W1B station |
| Raman | Renishaw | inVia Reflex Raman |
| Electrochemical station | BioLogic | MPG2 |
| Electrochemical station | CHI 760E | |
| Ultrasonic cleaning machine | Prima | PM2-600TD |
| Pure water machine | ULUPURE | UPH-II-10T |
| Analytical balance | OHAUS | PX124ZH |
| High-speed centrifuge | Hettich | Universal 320 |
| Gas mass flow controller (MFC) | HORIBA | STEC S500 |
| H-type cell | Gaoss Union | N/A |
| Gaoss Union | C031-3 | |
ZrO2 inks with different concentration
| Reagent | Final concentration | Amount |
|---|---|---|
| ZrO2 | 0.5, 1, 2.5, 5, 10, 20 mg/mL | 0.5, 1, 2.5, 5, 10, 20 mg |
| DI water | N/A | 480 μL |
| Ethanol | N/A | 480 μL |
| Nafion | N/A | 40 μL |
HfO2 ink
| Reagent | Final concentration | Amount |
|---|---|---|
| HfO2 | 10 mg/mL | 10 mg |
| DI water | N/A | 480 μL |
| Ethanol | N/A | 480 μL |
| Nafion | N/A | 40 μL |
Al2O3 ink
| Reagent | Final concentration | Amount |
|---|---|---|
| Al2O3 | 10 mg/mL | 10 mg |
| DI water | N/A | 480 μL |
| Ethanol | N/A | 480 μL |
| Nafion | N/A | 40 μL |
SiO2 ink
| Reagent | Final concentration | Amount |
|---|---|---|
| SiO2 | 10 mg/mL | 10 mg |
| DI water | N/A | 480 μL |
| Ethanol | N/A | 480 μL |
| Nafion | N/A | 40 μL |
Ga2O3 ink
| Reagent | Final concentration | Amount |
|---|---|---|
| Ga2O3 | 10 mg/mL | 10 mg |
| DI water | N/A | 480 μL |
| Ethanol | N/A | 480 μL |
| Nafion | N/A | 40 μL |
KHCO3 solution
| Reagent | Final concentration | Amount |
|---|---|---|
| KHCO3 | 0.1 M | 0.1 mol |
| DI water | N/A | 1 L |
KCl solution
| Reagent | Final concentration | Amount |
|---|---|---|
| KCl | 0.1 M | 0.1 mol |
| DI water | N/A | 1 L |
K2HPO4 solution
| Reagent | Final concentration | Amount |
|---|---|---|
| K2HPO4 | 0.1 M | 0.1 mol |
| DI water | N/A | 1 L |
DMSO dissolved in D2O
| Reagent | Final concentration | Amount |
|---|---|---|
| DMSO | 2 mM | 0.2 mmol |
| D2O | N/A | 100 mL |
Four standard solutions for liquid products
| Reagent | Final concentration | Amount |
|---|---|---|
| HCOOK | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| CH3OH | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| CH3COOK | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| C2H5OH | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| CH3CHO | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| CH3COCH3 | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| C2H5CHO | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| OHCH2CH2OH | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| C3H7OH | 15, 7.5, 1.5, 0.5 mM | 1.5, 0.75, 0.15, 0.05 mmol |
| DI water | N/A | 100 mL |
Low concentration standard gas
| Reagent | Final concentration | Amount |
|---|---|---|
| H2 | 103 ppm | N/A |
| CO | 104 ppm | N/A |
| CH4 | 104 ppm | N/A |
| C2H4 | 104 ppm | N/A |
| C2H6 | 104 ppm | N/A |
| N2 as carrier gas | n/a | N/A |
High concentration standard gas
| Reagent | Final concentration | Amount |
|---|---|---|
| H2 | 1,005 ppm | N/A |
| CO | 1,007 ppm | N/A |
| CH4 | 1,008 ppm | N/A |
| C2H4 | 1,014 ppm | N/A |
| C2H6 | 1,018 ppm | N/A |
| N2 as carrier gas | N/A | N/A |
| Stock reagent | |
|---|---|
| Reagent | Storage conditions |
| Mechanically polished Cu foil | It should be freshly prepared. |
| Technique | Condition |
| X-ray diffraction (XRD) | Using an X'Pert PRO, PANalytical diffractometer with a Cu Kα radiation source at a scan speed of 5° min−1. |
| Scanning electron microscopy (SEM) | Acceleration voltage: 30 kV |
| Transmission electron microscope (TEM) | Acceleration voltage: 200 kV |
| Focused ion beam (FIB) | Gallium ion source |
| Raman | Using an inVia Reflex Raman microscope (Renishaw) equipped with a diode laser (633 nm) and a water immersion objective (50 ×) in a modified cell. Each spectrum was recorded using 50% laser power, 10s of exposure time, and by averaging 2 scans in extended mode. |
| Technique | Condition |
| Gas chromatography (GC) | Warming procedure: warm-up from 65°C (holding for 3.6 min) to 125°C with 15°C/min, then hold for 7.6 min at 125°C, and finally cool down to 65°C. |
| 1H nuclear magnetic resonance (NMR) | Resonance frequency:600 MHz |
| Electrochemical measurement | Condition |
| Cyclic voltammetry test (CV) | Perform at the potential ranging from +0.2 V to -0.6 V vs RHE at a scan rate of 50 mV s-1 for forty cycles |
| Linear sweep voltammetry test (LSV) | Perform at the potential ranging from -0.61 V to -1.81 V vs Ag/AgCl at a scan rate of 5 mV s-1 |
| Chronoamperometry test (CA) | Perform at a selected cathodic potential ranging from -0.8 V to -1.1 V vs RHE for 1 h |
| Chronopotentiometry test (CP) | Perform at -17.2 mA cm-2 |
| iR-compensated | The solution resistances at all potential are automatically compensated by an electrochemical workstation (85% iR-compensated) |