| Literature DB >> 35808121 |
Fabrizio Corrado Adamo1, Federica Ciuchi2, Maria Penelope De Santo2, Paola Astolfi1, Isabelle Warner3, Eric Scharrer3, Michela Pisani1, Francesco Vita1, Oriano Francescangeli1.
Abstract
Bent-core mesogens (BCMs) are a class of thermotropic liquid crystals featuring several unconventional properties. However, the interpretation and technological exploitation of their unique behavior have been hampered by the difficulty of controlling their anchoring at surfaces. To tackle this issue, we report the nanoscale structural characterization of BCM films prepared using the Langmuir-Blodgett technique. Even though BCMs are quite different from typical amphiphilic molecules, we demonstrate that stable molecular films form over water, which can then be transferred onto silicon substrates. The combination of Brewster angle microscopy, atomic force microscopy, and X-ray reflectivity measurements shows that the molecules, once transferred onto a solid substrate, form a bilayer structure with a bottom layer of flat molecules and an upper layer of upright molecules. These results suggest that Langmuir-Blodgett films of BCMs can provide a useful means to control the alignment of this class of liquid crystals.Entities:
Keywords: Langmuir–Blodgett films; X-ray reflectivity; bent-core mesogens
Year: 2022 PMID: 35808121 PMCID: PMC9268441 DOI: 10.3390/nano12132285
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.719
Figure 1(a) Chemical structure and phase diagram of OC4-2MePh(mono2MeODBP) upon heating and cooling; (b) 3D model of the molecule with typical dimensions and bending angle.
Figure 2(a–i) Isotherm of a complete compression (leftward arrow) and expansion (rightward arrow) cycle and corresponding sequence of BAM images (the scale bar in each image corresponds to 100 μm). The compression/expansion rate was 70 cm2/min. The dashed lines indicate the deposition parameters.
Figure 3(a,b) AFM images of Langmuir–Blodgett films deposited on silicon at Π = 12 mN/m, taken at different positions and magnifications. (c) Thickness profile measured along the green bar in (b).
Figure 4(a) XRR curve: experimental data (blue dots) and fitting curve (red line). (b) Structural model of the BCM film over the silicon and silicon oxide layers (grey and light grey, respectively). (c) Electron density (ρ) vs. film thickness (z), as obtained from fitting the XRR curve with the multilayer model described in the text. Grey dashed lines show the resulting thickness of each layer (see Table 1).
Thickness d, electron density ρ, and roughness σ of the layer stack used to model the sample: a Si substrate, an intermediate layer of native SiO2, and four sections for the BCM film. The thickness and roughness values were provided by the fitting procedure together with the values S = 69.1 Å2 and n = 1.92. The electron density of each BCM layer was calculated from these values using the model described in the text. The Si substrate parameters and the electron density of SiO2 were taken from the literature and kept fixed.
| Si | ∞ | 0.70 | 1.5 |
| SiO2 | 7.0 | 0.66 | 3.6 |
| BCM 1 | 8.1 | 0.47 | 1.5 |
| BCM 2 | 5.0 | 0.47 | 2.2 |
| BCM 3 | 24.1 | 0.30 | 4.5 |
| BCM 4 | 11.8 | 0.10 | 8.9 |