| Literature DB >> 35745289 |
Duy Thanh Cu1, Tien Dat Pham1, Vu Tuan Hung Le2, Meng Chi Li3, Hung Pin Chen4, Chien Cheng Kuo1.
Abstract
Diffraction gratings are becoming increasingly widespread in optical applications, notably in lasers. This study presents the work on the characterization and evaluation of Multilayer Dielectric Diffraction Gratings (MDG) based on the finite element method using Comsol MultiPhysics software. The optimal multilayer dielectric diffraction grating structure using a rectangular three-layer structure consisting of an aluminum oxide Al2O3 layer sandwiched between two silicon dioxide SiO2 layers on a multilayer dielectric mirror is simulated. Results show that this MDG for non-polarized lasers at 1064 nm with a significantly enhanced -1st diffraction efficiency of 97.4%, reaching 98.3% for transverse-electric (TE) polarization and 96.3% for transverse-magnetic (TM) polarization. This design is also preferable in terms of the laser damage threshold (LDT) because most of the maximum electric field is spread across the high LDT material SiO2 for TE polarization and scattered outside the grating for TM polarization. This function allows the system to perform better and be more stable than normal diffraction grating under a high-intensity laser.Entities:
Keywords: diffraction efficiency; high laser damage threshold; multilayer dielectric grating
Year: 2022 PMID: 35745289 PMCID: PMC9227052 DOI: 10.3390/nano12121952
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.719
Figure 1Dispersion of diffraction orders in reflection and transmission.
Figure 2Schematic of MDG.
Figure 3The −1st diffraction efficiency of rectangular−shaped grating for (a) TM polarization, (b) TE polarization, (c) unpolarized light, and (d) unpolarized light at f = 0.5.
Rectangular shaped grating parameters.
| Parameters | Value |
|---|---|
| Incident wavelength | 1064 nm |
| Period | 760 nm |
| Incident angle | 44.43° |
| Duty cycle | 0.5 |
| Grating’s height | 2130 nm |
| Reflective layer | Gold |
| The thickness of the matching layer (SiO2) |
|
| Refractive index of the substrate (Glass) | 1.50664 |
| Refractive index of SiO2 | 1.44964 |
Figure 4The reflectance of a dielectric multilayer was simulated using the Essential Macleod.
Figure 5MDG diffraction efficiency at different wavelengths.
Figure 6Schematic of three−layer MDG.
Figure 7−1st diffraction efficiency of rectangular−shaped grating for (a) TE polarization and (b) TM polarization, (c) unpolarized light, and (d) diffraction efficiency of the optimum design.
Figure 8Normalized electric field distribution for (a) TE polarization and (b) TM polarization.
Parameter of the three-layer MDG.
| Parameters | Value |
|---|---|
| Grating’s shape | Rectangular |
| Incident wavelength | 1064 nm |
| Period | 760 nm |
| Incident angle | 44.43° |
| Duty cycle | 0.5 |
| Grating’s depth/height | 2130 nm (409, 150, 1571) |
| The thickness of the matching layer (SiO2) |
|
| Refractive index of the substrate (Glass) | 1.50664 |
| Refractive index of SiO2 | 1.44964 |
| Refractive index of Al2O3 | 1.6509 |
| Refractive index of Ta2O5 | 2.10000 |
| Reference wavelength | 1164 nm |
| Reflective multilayer layer structure | Substrate| (HL)^13 H|Air |