| Literature DB >> 35744461 |
Shanling Ji1, Jianxiong Zhu1,2,3, Yuan Yang1, Hui Zhang1, Zhihao Zhang1, Zhijie Xia1, Zhisheng Zhang1.
Abstract
Nanoscale coating manufacturing (NCM) process modeling is an important way to monitor and modulate coating quality. The multivariable prediction of coated film and the data augmentation of the NCM process are two common issues in smart factories. However, there has not been an artificial intelligence model to solve these two problems simultaneously. Focusing on the two problems, a novel auxiliary regression using a self-attention-augmented generative adversarial network (AR-SAGAN) is proposed in this paper. This model deals with the problem of NCM process modeling with three steps. First, the AR-SAGAN structure was established and composed of a generator, feature extractor, discriminator, and regressor. Second, the nanoscale coating quality was estimated by putting online control parameters into the feature extractor and regressor. Third, the control parameters in the recipes were generated using preset parameters and target quality. Finally, the proposed method was verified by the experiments of a solar cell antireflection coating dataset, the results of which showed that our method performs excellently for both multivariable quality prediction and data augmentation. The mean squared error of the predicted thickness was about 1.6~2.1 nm, which is lower than other traditional methods.Entities:
Keywords: data-driven modeling; generative adversarial network; nanoscale coating manufacturing; self-attention
Year: 2022 PMID: 35744461 PMCID: PMC9230861 DOI: 10.3390/mi13060847
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 3.523
Figure 1The schematic diagrams of (a) an ANN, (b) a self-attention mechanism, and (c) an auxiliary classifier GAN.
Figure 2Overview of NCM process modeling using AR-SAGAN.
Figure 3Specific architecture of AR-SAGAN includes (a) Generator, (b) Feature extractor, Discriminator and regressor.
Figure 4PECVD-based SiNx thin-film deposition process. (a) The real production process. (b) The schematic diagram of PECVD reaction process. (c–h) The data of control parameters collected from sensors.
MAPE of generated control parameters under different training conditions.
| Control Parameter | TC1 | TC2 | TC3 |
|---|---|---|---|
| 1 | 0.07353 | 0.05976 | 0.03904 |
| 2 | 0.03534 | 0.02876 | 0.03092 |
| 3 | 0.03125 | 0.02440 | 0.02318 |
| 4 | 0.01832 | 0.01118 | 0.00921 |
| 5 | 0.00370 | 0.00648 | 0.00096 |
| 6 | 0.00607 | 0.00614 | 0.00562 |
| 7 | 0.01228 | 0.01033 | 0.01106 |
| 8 | 0.01398 | 0.00966 | 0.00938 |
| 9 | 0.00921 | 0.00920 | 0.00976 |
| 10 | 0.01981 | 0.01504 | 0.01319 |
| 11 | 0.01209 | 0.01176 | 0.01114 |
| 12 | 0.01481 | 0.01546 | 0.01664 |
| 13 | 0.04192 | 0.05158 | 0.04206 |
| 14 | 0.01348 | 0.02008 | 0.02158 |
| 15 | 0.01931 | 0.01913 | 0.01945 |
| 16 | 0.03966 | 0.02920 | 0.03228 |
| 17 | 0.03939 | 0.03530 | 0.04110 |
| 18 | 0.03316 | 0.02360 | 0.02082 |
| 19 | 0.01759 | 0.02021 | 0.03367 |
| 20 | 0.00813 | 0.00608 | 0.00610 |
| Mean ± Std. | 0.0232 ± 0.0169 | 0.0207 ± 0.0146 | 0.0199 ± 0.0127 |
Predicted quality under different training conditions.
| Quality Variable | Metrics | TC1 | TC2 | TC3 | |||
|---|---|---|---|---|---|---|---|
| Train | Test | Train | Test | Train | Test | ||
| Thickness (nm) | MSE | 2.0678 | 2.6034 | 1.7089 | 2.0579 | 1.6627 | 2.0111 |
| MAPE | 0.0163 | 0.0185 | 0.0127 | 0.0148 | 0.0128 | 0.0149 | |
| Refractive index | MSE | 6.588 × 10−5 | 6.232 × 10−5 | 6.775 × 10−5 | 6.186 × 10−5 | 7.072 × 10−5 | 6.194 × 10−5 |
| MAPE | 0.0030 | 0.0028 | 0.0031 | 0.0029 | 0.0031 | 0.0029 | |
Figure 5Schematic diagram of practical application in NCM process.
Predicted quality under different methods.
| Method | SVM | CGAN | AR-SAGAN | |||
|---|---|---|---|---|---|---|
| TN (nm) | RI | TN (nm) | RI | TN (nm) | RI | |
| Train MSE | 3.7215 | 0.0068 | 3.4107 | 8.5 × 10−5 | 1.6627 | 7.1 × 10−5 |
| Test MSE | 4.1665 | 0.0065 | 2.8082 | 8.6 × 10−5 | 2.0111 | 6.2 × 10−5 |