Two-dimensional (2D) materials combine the collective advantages of individual building blocks and synergistic properties and have spurred great interest as a new paradigm in materials science. Especially, exfoliation of 2D semiconductive materials into nanosheets is of significance for both fundamental and potential applications. In this report, silicon-germanium (Si-Ge) nanosheets were synthesized by sonication of porous Si-Ge powder. The raw material Si-Ge powder was obtained by leaching Li from Li13Si2Ge2 with ethanol; after that, it was crystallized by heat treatment at 500 °C. The thickness and the lateral size of the exfoliated Si-Ge nanosheets were about 3 nm and a few microns, respectively. The nanosheets were dispersed in 55 different organic solvents, and their Hansen solubility parameters were calculated and compared with those of the end member (Si and Ge) nanosheets and graphene.
Two-dimensional (2D) materials combine the collective advantages of individual building blocks and synergistic properties and have spurred great interest as a new paradigm in materials science. Especially, exfoliation of 2D semiconductive materials into nanosheets is of significance for both fundamental and potential applications. In this report, silicon-germanium (Si-Ge) nanosheets were synthesized by sonication of porous Si-Ge powder. The raw material Si-Ge powder was obtained by leaching Li from Li13Si2Ge2 with ethanol; after that, it was crystallized by heat treatment at 500 °C. The thickness and the lateral size of the exfoliated Si-Ge nanosheets were about 3 nm and a few microns, respectively. The nanosheets were dispersed in 55 different organic solvents, and their Hansen solubility parameters were calculated and compared with those of the end member (Si and Ge) nanosheets and graphene.
Silicon–germanium
(Si–Ge) is an alloy that can have
any proportion of its constituent elements and has the chemical formula
Si1–Ge. Among various applications, it has been used in integrated circuits
and heterojunction bipolar transistors as a semiconductor material
and in complementary metal oxide semiconductors (CMOSs) as a strain-inducing
layer material. Si1–Ge has also been used as a thermoelectric material
in high-temperature applications and can be fabricated on Si wafers
via conventional Si processing methods.[1−3] Therefore, Si1–Ge can be fabricated
at costs similar to those of Si CMOS manufacturing, which are lower
than the costs associated with other heterojunction technologies (e.g.,
GaAs).Organogermanium precursors such as isobutylgermane, alkylgermanium
trichlorides, and dimethylaminogermanium trichloride have been investigated
as less hazardous liquid alternatives to germanium hydrides for depositing
Ge-containing films (e.g., films of high-purity Ge, Si–Ge,
and strained Si) via metal–organic vapor-phase epitaxy.[4] However, monolayers of Si and Ge as well as those
of chalcogenide compounds and graphene have been active research topics.We have been studying the exfoliation and functionalization of
layered Si compounds in the liquid phase and have been successful
in the derivatization of various silicon nanosheets (SiNSs) from layered
silicon compounds.[5−8] The resulting sheet has a structure in which organic groups are
attached to the top and bottom of one layer of the silicon (111) plane,
and the lateral size is on the microscale. For example, the thickness
of the sheet terminated with a hydroxyl group is ca. 0.3 nm,[9] and when a phenyl group is added, the thickness
is ca. 1 nm.[10] Recently, we have derived
Si and GeH nanosheets from Li13Si4 and layered
germanene GeH, respectively,[11,12] and the model structure
of the obtained sheets is shown in Scheme . The Si nanosheet has the same structure
as diamond-type Si, with a thickness of ca. 4 nm and a lateral size
on the microscale. On the other hand, a GeH nanosheet has a Ge monoatomic
layer with the same atomic arrangement as the germanium (111) plane
of a diamond structure, with hydrogen terminations on the top and
bottom. The thickness of the obtained sheet was ca. 3 nm (equivalent
to about 10 GeH layers), and the lateral size is on the microscale,
as for SiNS. Since these sheets are expected to be applied to semiconductor
devices, it is necessary to produce ink in which the sheets are dispersed
with high yield. To solve this problem, our group has been using Hansen
solubility parameters (HSPs) to design such inks with well-dispersed
GeH sheets.[11−14] HSPs classify solvent–solvent interactions into dispersive,
polar, and hydrogen-bonding components. These components, in conjunction
with an interaction value, are also used to describe solute. Although
additional parameters can be used, these three components tend to
provide reliable results.[15] Whereas the
Hildebrand solubility is sufficient for developing ink formulations
of nonpolar substances, the surface chemistry of capped nanoparticles
usually necessitates that polar and hydrogen-bonding components be
considered in the development of nanoparticle-based inks.[16,17]
Scheme 1
Schematic Describing the Synthesis and Dispersion of (a) GeH Nanosheets
and (b) Si and/or Si–Ge Nanosheets
In this study, Si–Ge nanosheets were synthesized from Li13Si2Ge2 and the dispersion properties
of the obtained sheets were evaluated using their HSPs.[18−21] We also compared the HSPs of the obtained nanosheets with those
previously reported for Si and Ge nanosheets.
Methods
Synthesis of
Si, Ge, and Si–Ge Nanosheets
According
to the previously reported method shown in Scheme b,[11,22] Si, Ge, and Si–Ge
nanosheets were synthesized by etching Li13Si4, Li13Ge4, and Li13Si2Ge2 alloys with ethyl alcohol, respectively. Li alloys
were prepared by radiofrequency heating of Li, Si, and Ge pieces.
Thereafter, the alloys (1 g) were reacted with ethyl alcohol (500
mL) and cooled at 0 °C to remove Li. The mixture was stirred
for 120 min at 0 °C, and the mixtures were filtered. The remaining
powder was added to acetic acid (200 mL) and was stirred for 60 min
at r.t. The filtered powders were dried at 100 °C in vacuum for
120 min. To crystallize the sample, the as-prepared powder was heated
under Ar at 500 °C for 1 h. The obtained sample was confirmed
to be free of Li salt (Li2CO3) by IR measurements.
Dispersion in Organic Solvents
The Si–Ge powder
(5 mg) was charged into 4 mL vials that were individually filled with
2 mL of probe liquid, according to a previously reported method.[11,12] There were a total of 55 probe liquids used, which were rationally
chosen to cover a wide variety of molecular interactions in terms
of HSPs. The vials containing the silicon nanosheet source powder
and probe liquids were sonicated for 10 min in an ultrasonic bath
and then photographed after 2 h, 1 day, and 2 days of sedimentation
to monitor dispersion stability. The intensities of light (divided
into three primary colors of red (R), green (G), and blue (B)) transmitted
through the dispersions (I, I, and I, respectively)
as well as the background light intensity (I, I, and I, respectively) were extracted from the image data for the dispersions.
The apparent light transmittance T of the dispersions
was then calculated using the following equation:T can
be transformed to the absorbance per unit length (A/l), which directly correlates to the concentration of nanosheets dispersed
in the probe liquids.In this study, it is assumed that the
light transmittance T is inversely correlated with
the exfoliated nanosheet
concentration in the dispersion. For the calculation of the HSP values,
the solvents were ranked “good” and “bad”
with marks ranging from 1 (good) to 4 (very poor). The center of this
sphere has also a set of HSPs and could be used in combination with
the database to find suitable solvents for the nanosheets. In the
present study, probe liquids with T < 60% (2 h
of sedimentation), 80% (1 day of sedimentation), and 85% (2 days of
sedimentation) for the exfoliation and dispersion of the Si–Ge
nanosheets were deemed as good solvents.The HSP is one of the
indicators for molecular interactions. It
is an effective tool to predict and/or examine the compatibility (e.g.,
dispersibility, solubility, and wettability) of two different materials.
The HSP consists of three terms that originate from corresponding
molecular interactions: δD (London dispersion
term), δP (polar term), and δH (hydrogen bonding term). The compatibility of two different
materials (with respective HSPs of [δD1, δP1, δH1] and [δD2, δP2, δH2]) can
be estimated by the HSP distance Ra, which
is defined as follows:A small R value indicates better
compatibility
of two different materials. Because the HSPs for typical organic solvents
are already known, the HSPs for the probe liquids used in this study
were obtained from the official HSP database and are listed in Table S1.[18] In addition,
the radius of the HSP sphere is referred to as the interaction radius R0, which is a tolerance indicator of a new material
to interact with other materials. This, however, depends on how stringent
the qualification criteria for a good solvent are chosen.
Results
and Discussion
Characterization of the Nanosheets
Similar to the previously
reported Si nanosheet derived from Li13Si4,[11,22] Li13Si2Ge2 in ethyl alcohol resulted
in black precipitation with hydrogen generation. The X-ray diffraction
(XRD) patterns for bulk Si–Ge powder together with that for
Si and Ge powders prepared from Li13Si4 and
Li13Ge4 are shown in Figure . The bulk samples after ethanol treatment
were amorphous, giving a broad halo in all systems. Although a small
amount of Si that did not react with Li during preparation of Li–(Si,
Ge) alloys remained in the Si and Si–Ge powders (Figure a), all samples became crystalline
when heated at 500 °C under argon as shown in Figure b. The peaks for the Si and
Ge powders were assigned to a diamond-type structure. In this study,
peaks due to Si–Ge are observed between those of Si and Ge,
indicating that Si–Ge is a solid solution of the end member.
A small amount of TaGe2 is observed in the enlarged image
of the Ge nanosheet in Figure b; it has been reported that a small amount of TaSi2 is formed when the Ta crucible is reused during the synthesis of
CaSi2.[23] In this study, because
the same Ta crucible was used for the synthesis of Li13Ge4 and LiSi2Ge2, a small amount
of TaGe2 is thought to have been generated as a byproduct
during the synthesis of Li13Ge4. To evaluate
the long-term stability of the nanosheets, XRD measurements were performed
on samples dispersed in the solvent for 2 days and for 4 months. After
2 days, the exfoliated nanosheets retained their crystal structure.
However, after 4 months of dispersion in the atmosphere, the crystalline
Si sheets had become amorphous. XRD patterns for a sample dispersed
and stored in ethyl alcohol and DMSO, respectively, are shown in Figure S1. This result may be explained by the
slow reactivity of oxygen with the sheet surface. Raman spectroscopy
has been used to characterize the strain and composition of Si1–Ge dots
grown on Si substrates via various methods such as MBE and CVD.[24−26] Si and Ge crystallize in the same structure as diamond and comprise
two interpenetrating face-centered cubic lattices, which yields a
single triply degenerate optical vibration mode at zero wavevector
at 520 cm–1 for Si and 300 cm–1 for Ge at room temperature (Figure c). The Raman spectrum of this Si–Ge material
shows three main peaks: the Ge–Ge (286 cm–1), Si–Ge (405 cm–1), and Si–Si (486
cm–1) vibrational modes (Figure c). Shin et al. reported
that in the Si1–Ge alloy system, the Si–Si and Ge–Ge
mode frequencies as functions of x are best fitted
with a linear function, while the Si–Ge mode is best fitted
with a fourth-order polynomial.[24] That
is, the Si–Si (Ge–Ge) mode frequency decreases (increases)
with x, while the Si–Ge mode frequency increases
for x ≤ 0.56 and decreases for x > 0.56. According to the previous report, the composition of
the
present Si–Ge sample was calculated to be Si0.52Ge0.48, which was in good agreement with the prepared
composition. In the reaction system, the removed Li exists as LiOH,
which is considered to be Li2CO3 when exposed
to the atmosphere. As no −OH (∼3000 cm–1) or −CO3 (∼1700 cm–1)
groups were observed in Figure d, it was concluded that no Li remained in the sample.
Figure 1
XRD patterns
for porous Si, Si–Ge, and Ge: (a) as-prepared
samples, (b) samples after heating at 500 °C under argon for
1 h (inset; enlarged XRD pattern of Ge), (c) Raman spectra and (d)
FTIR spectra of (b). In the FTIR spectra, the slight baseline distortion
at 2000–2300 cm–1 is caused by the strong
background absorption of the diamond ATR crystal.
XRD patterns
for porous Si, Si–Ge, and Ge: (a) as-prepared
samples, (b) samples after heating at 500 °C under argon for
1 h (inset; enlarged XRD pattern of Ge), (c) Raman spectra and (d)
FTIR spectra of (b). In the FTIR spectra, the slight baseline distortion
at 2000–2300 cm–1 is caused by the strong
background absorption of the diamond ATR crystal.In Figure a,b,
particles with a diameter of ∼20 to ∼50 μm are
observed, which have an interior that formed a layered structure.
The Si–Ge powder was ultrasonicated in ethanol for 30 min and
centrifuged at 13,000 rpm for 3 min, corresponding to a relative centrifugal
acceleration of 40,000 at the cell bottom. Then, the supernatant liquid
was spin coated onto a Si substrate at 1000 rpm for 30 s for atomic
force microscopy (AFM) evaluation. As shown Figure c,d, sheets consisting of about 10 Si–Ge
layers were observed with a width of several micrometers and a thickness
of about 3 nm with a flat surface. This value is almost the same as
that for Si and Ge nanosheets.[11,12] In our experiments,
the delithiation process produces layered structures with apparent
anisotropy. This anisotropy might be related to the crystallographic
structure of Li13Si2Ge2 and associated
energy barriers for the Li ion reaction and diffusion (or lithium
ionic mobility). Wu et al. conducted theoretical
considerations, reporting that nanosheet formation is induced by stress
due to delithium from Li13Si2Ge2.[22]
Figure 2
(a) Scanning electron microscopy (SEM) and (b) enlarged
SEM images
of Si–Ge crystalline powder. (c) AFM image of Si–Ge
nanosheet. (d) Line profile taken along the blue line in (c). (e)
Schematic model of Si–Ge nanosheet.
(a) Scanning electron microscopy (SEM) and (b) enlarged
SEM images
of Si–Ge crystalline powder. (c) AFM image of Si–Ge
nanosheet. (d) Line profile taken along the blue line in (c). (e)
Schematic model of Si–Ge nanosheet.
Dispersions of Si–Ge Nanosheets
The stability
of Si–Ge nanosheets was qualitatively evaluated by noting which
solvents achieved stable dispersions versus those in which the nanosheets
agglomerated and precipitated over the time of the experiment. Immediately
after sonication, Si–Ge crystalline samples were dispersed
into 55 different probes as shown in Table S1, and each parameter of HSP was determined.Figure and Figures S1 and S2 are the Si–Ge dispersions in the probe solution
after 10 min of sonication and subsequent sedimentation (2 h, 1 day,
and 2 days). After 2 h, however, dimethyl sulfoxide (DMSO in Figure , No. 31) and alcohols
gave little to no sediment. After 2 days, a decrease in concentration
and eventual sedimentation in the alcohol solutions were observed
and Si–Ge dispersions in DMSO exhibited high stability. The
raw data for the apparent intensity of light transmitted through the
Si–Ge dispersions and the background light apparent intensity
were obtained from the image data in Figure and Figures S1 and S2, and the results are summarized in Tables S2–S4. The T values were calculated using eq .
Figure 3
Si–Ge nanosheet dispersions in
55 different probe liquids
after 2 h of sedimentation.
Si–Ge nanosheet dispersions in
55 different probe liquids
after 2 h of sedimentation.Using the transmittance values for the dispersions after the exfoliation
and sedimentation experiments (2 h, 1 day, and 2 days), HSP spheres
and their center values are plotted as shown in Figure , which are depicted by green spheres and
green solid circles, respectively. The good solvents inside and outside
the HSP sphere are plotted as blue solid circles and blue open circles,
respectively, and the poor solvents outside and inside the HSP sphere
are plotted as red solid squares and red open squares, respectively.
The probe near the center can easily disperse the Si–Ge nanosheets.
DMSO was found to be a good solvent in this study.
Figure 4
HSP plots of good and
poor solvents for Si–Ge nanosheet
dispersions, which are determined by the transmittance values of the
dispersions after exfoliation and sedimentation experiments conducted
for (a) 2 h, (b) 1 day, and (c) 2 days.
HSP plots of good and
poor solvents for Si–Ge nanosheet
dispersions, which are determined by the transmittance values of the
dispersions after exfoliation and sedimentation experiments conducted
for (a) 2 h, (b) 1 day, and (c) 2 days.The HSP values obtained by the HSP sphere method are summarized
in Table including
the previous data. Note that Si–Ge nanosheet #1, #2, and #3
are based on the data obtained by sedimentation after 2 h, 1 day,
and 2 days, respectively. Si nanosheets #1–3 are synthesized
from the Li13Si4 system,[11] which is the same synthesis method used for the Si–Ge.
In Si nanosheets #1–3, the surface is considered to be terminated
with −OH or Si–O–Si because ethanol is used during
synthesis. On the other hand, GeH nanosheets #1–3 are synthesized
by exfoliating layered germanene (GeH) in each organic solvent, so the surface is considered to be terminated
with Ge–H bonds as shown in Scheme a. The thickness of the obtained sheet is
about 3 nm, the lateral size is also on the microscale, and the size
is almost similar for Si, Si–Ge, and Ge nanosheets, which can
be explained by the surface termination groups.
Table 1
Comparison of the HSPs Obtained for
the Si–Ge, Si, and Ge Nanosheets after Different Sedimentation
Timesa
HSP [(J/cm3)1/2]
sample
δD
δP
δH
R0
FIT
remark
ref
Si-Ge
nanosheet #1
23.1
15.4
19.6
15.9
0.63
G/T = 14/55
this
work
Si-Ge
nanosheet #2
25.8
14.7
19.5
19.9
0.44
G/T = 15/55
Si-Ge nanosheet #3
26.2
15.3
18.6
19.9
0.47
G/T = 13/55
Si nanosheet #1
20.4
15.9
14.1
13.0
0.34
G/T = 32/55
([11])
Si nanosheet #2
23.8
18.7
14.1
17.1
0.45
G/T = 18/55
Si nanosheet #3
26.0
16.7
17.9
19.9
0.48
G/T = 13/55
GeH nanosheet #1
23.2
14.6
13.9
17.9
0.53
G/T = 19/34
([12])
GeH nanosheet #2
24.7
11.2
17.7
17.9
0.51
G/T = 10/34
graphene
20.0
11.2
7.3
6.7
1
G/T = 5/12
([19])
FIT values indicate the quality
of sphere fitting (FIT = 1 means perfect fitting without anomalies).
G/T values indicate the number of good solvents/that of total probe
liquids.
FIT values indicate the quality
of sphere fitting (FIT = 1 means perfect fitting without anomalies).
G/T values indicate the number of good solvents/that of total probe
liquids.The δH (hydrogen bonding term) values for
the Si–Ge nanosheets are higher than those for the other nanosheets
immediately after dispersion (while the δP values
are about the same as those for Si nanosheets), suggesting the presence
of a large number of −OH groups (rather than Si=O and
Ge=O groups analogous to high-δP carbonyl-groups)
on the surface. This may be due to the difference in the surface of
the Si and Ge nanosheets dispersed in various probe liquids, where
the corresponding Si–H and Ge–H are oxidized by moisture
in the reaction system and gradually converted to Si–OH and
Ge–OH.On the other hand, the Si nanosheets were synthesized
by dispersing
Li13Si4 in ethyl alcohol, which is the same
method used for the synthesis of the Si–Ge nanosheets in this
study, but the substitution of germanium makes it easier to be oxidized
by moisture in the solvent. The δD (London
dispersion term) values for the Si–Ge nanosheets also increased
with time, as in the case for the Si nanosheets, suggesting that the
−OH bonds of the Si–Ge nanosheets gradually shrank and
Si–O–Si or Ge–O–Ge bonds were formed.
The δD value is dependent on the size of the
constituent atoms as well as on the molecular size and the atomic
bonding state. Therefore, the Si–Ge nanosheets are considered
to have gradually aggregated due to the condensation of the −OH
groups.More precisely, δD is correlated
with the
polarizability of the functional groups of constituents. The δD and δH values for the Si–Ge
nanosheets were significantly larger than those initially calculated
for graphene. This was especially true for the δD value for the Si–Ge nanosheets (∼26 [J/cm3]1/2), which was extraordinarily large in comparison with
those for the common chemical compounds (15–20 [J/cm3]1/2) that are primarily composed of hydrocarbons, oxygen,
and nitrogen.
Conclusions
Si–Ge nanosheets
were synthesized, and their dispersions
in organic solvents were investigated. For the GeH and Si nanosheets,
initially δP > δH. However,
with increasing sedimentation time, δH >
δP. Since the Si–Ge nanosheets in this
study have
a large number of −OH groups added to the backbone from the
beginning (large δH and large δP, δP < δH), the surface of the sheets was terminated with–OH groups
during synthesis. We have identified several organic solvents (DMSO)
in which Si–Ge nanosheets can form dispersions with long-term
stability. By using solvent properties found in the literature as
well as Hansen solubility parameters, we identified a library of organic
solvents that disperse Si–Ge nanosheets. This study of dispersion
stability of 2D nanomaterials in organic solvents could lead to advances
in many functional applications. Thus, HSP is an effective index to
determine the surface morphology change of the exfoliated sheets in
the liquid phase.
Authors: Jesse B Tice; Andrew V G Chizmeshya; Radek Roucka; John Tolle; Brian R Cherry; John Kouvetakis Journal: J Am Chem Soc Date: 2007-06-05 Impact factor: 15.419