Here, the alpha amino acid l-alanine is employed as both a capping and stabilizing agent in the aqueous synthesis of submicron-sized metallic copper particles under ambient atmospheric conditions. The reduction of the copper(II) precursor is achieved using l-ascorbic acid (vitamin C) as the reducing agent. The nature of the complex formed between l-alanine and the copper(II) precursor, pH of the medium, temperature, and the relative proportion of capping agent are found to play a significant role in determining the size, shape, and oxidative stability of the resulting particles. The adsorbed l-alanine is shown to act as a barrier imparting excellent thermal stability to capped copper particles, delaying the onset of temperature-induced aerial oxidation. The stability of the particles is complemented by highly favorable sintering conditions, rendering the formation of conductive copper films at significantly lower temperatures (T ≤ 120 °C) compared to alternative preparation methods. The resulting copper films are well-passivated by residual surface l-alanine molecules, promoting long-term stability without hindering the surface chemistry of the copper film as evidenced by the catalytic activity. Contrary to the popular belief that ligands with long carbon chains are best for providing stability, these findings demonstrate that very small ligands can provide highly effective stability to copper without significantly deteriorating its functionality while facilitating low-temperature sintering, which is a key requirement for emerging flexible electronic applications.
Here, the alpha amino acid l-alanine is employed as both a capping and stabilizing agent in the aqueous synthesis of submicron-sized metallic copper particles under ambient atmospheric conditions. The reduction of the copper(II) precursor is achieved using l-ascorbic acid (vitamin C) as the reducing agent. The nature of the complex formed between l-alanine and the copper(II) precursor, pH of the medium, temperature, and the relative proportion of capping agent are found to play a significant role in determining the size, shape, and oxidative stability of the resulting particles. The adsorbed l-alanine is shown to act as a barrier imparting excellent thermal stability to capped copper particles, delaying the onset of temperature-induced aerial oxidation. The stability of the particles is complemented by highly favorable sintering conditions, rendering the formation of conductive copper films at significantly lower temperatures (T ≤ 120 °C) compared to alternative preparation methods. The resulting copper films are well-passivated by residual surface l-alanine molecules, promoting long-term stability without hindering the surface chemistry of the copper film as evidenced by the catalytic activity. Contrary to the popular belief that ligands with long carbon chains are best for providing stability, these findings demonstrate that very small ligands can provide highly effective stability to copper without significantly deteriorating its functionality while facilitating low-temperature sintering, which is a key requirement for emerging flexible electronic applications.
Metallic copper particles
with nano (<100 nm) and submicron
(<1 μm) dimensions are emerging as an attractive alternative
to silver for diverse applications.[1] Copper
offers significant potential advantages over silver, exhibiting similar
conductivity (Cu: 5.96 × 107 S/m vs Ag: 6.30 × 107 S/m), at around a hundredth of the
cost of silver, because of its relative abundance in the Earth’s
crust (Cu: 60 mg/kg vs Ag: 0.075 mg/kg).[2] However, nano or submicron copper particles have
been somewhat limited in their adoption in technologies, because of
their propensity to undergo rapid oxidation[3] compared to their bulk counterpart owing to the inevitable increase
in surface to volume ratio at these dimensions and the higher reactivity
compared to other coinage metal particles. This process results in
the rapid formation of surface oxides (Cu2O and CuO (via Cu(OH)2 in the presence of moisture and oxygen),[4] which affect the interfacial properties of the
material, particularly, its electrical conductivity. Although both
oxides are p-type semiconductors, their electrical
conductivity is significantly lower (0.1–0.01 S/m for Cu2O and 102–104 S/m for CuO)[5] compared to that of the pristine metal.Several approaches including (i) adopting a core–shell structure
with a more atmospherically stable metal such as gold, silver, or
nickel forming the outer shell;[3,6,7] (ii) alloying of copper;[8] (iii) use of
metal oxides or aluminum-doped zinc oxide as the shell material in
core–shell structures;[9,10] (iv) employing various
forms of graphene as a barrier layer;[3,11] and (v) use
of organic ligands as capping agents[3,12] have been
explored to achieve improved stability. Although these approaches
do limit the oxidation of copper, the properties of the metal are
significantly impacted by the overall properties of the hybrid structure.Organic ligands are an attractive choice as stabilizing agents;
however, the typical approach is to use ligands featuring long carbon
chains, as that will effectively form a hydrophobic barrier around
the particle improving stability. Most common ligand choices include
hexadecyltrimethylammonium bromide (CTAB),[3,13,14] alkyl amines (hexyl, octyl, hexadecyl),[15,16] thiol-terminated chains,[12] carboxylic
acid ligands,[17,18] and polymers such as polyvinylpyrrolidone.[19] Although these relatively larger ligands confer
significant stability to copper particles, the long carbon chain leads
to increased distance between neighboring particles. This means that
the capping material has to be nearly fully decomposed before contact
can be established between adjacent particles when fabricating conductive
films, thus requiring high sintering temperatures that approach the
decomposition temperature of the capping ligand or polymer. In the
case of thermal sintering, depending on the particle dimensions, the
atmosphere (N2, H2, or vacuum), capping ligand,
and solvents used, the exact temperature required for conductive film
formation can vary significantly but typically lies between 150 and
350 °C.[1,20,21] If the compact monolayers of long saturated ligands are not decomposed,
they can act as insulators, disrupting electron transport, resulting
in relatively poor electrical conductivity compared with the native
metal.[12,22] Conversely, their complete removal exposes
the copper particles, retarding stability significantly. Some relatively
smaller capping agents such as 1-amino-2-propanol[21] and nitrilotriacetic acid disodium salt[20] have been used to achieve lower temperature sintering compared
to other reports; however, some of these capping ligands and other
chemicals used in the synthesis can be associated with hazards imposing
a threat to safety (Table S1).Apart
from a capping/stabilizing agent, a strong reducing agent
is required to convert the copper salt to the metal. Hydrazine is
the most commonly used reducing agent for this purpose.[18,23] Another popular choice is oleylamine, which serves both as a solvent
and stabilizing agent.[12,16] Several other chemicals including
monoethylene glycol, isophorone, and diethylene glycol monobutyl ether[24,25] are also used in commercial copper ink formulations as solvents/additives.
However, as summarized in Table S1, most
have significant drawbacks in terms of their toxicity and sustainability.
Their use also increases the overall cost of production because of
excess toxic waste generation and waste treatment, which is essential
for safe disposal. Recently, a handful of aqueous or biogenic synthetic
approaches using benign reducing agents supported by appropriate stabilizing
agents and surfactants have been reported,[26−29] where all chemicals and solvents
used can be strictly categorized as sustainable or “green”
(Table S1). However, although these reports[27−31] focus on the influence of reaction conditions and reagent ratios
on size and shape of the particles, technologically important parameters
have not been studied extensively.To this end, we report the
sustainable aqueous synthesis of submicron-sized
metallic copper particles with important technological properties
including high thermal stability, excellent oxidative stability (using
surface sensitive X-ray photoelectron spectroscopy (XPS)), low-temperature
sintering capability, electrical conductivity, and catalytic activity.
This work uses l-ascorbic acid as the reducing agent and l-alanine as the particle capping agent, both of which are highly
benign. l-Ascorbic acid is a naturally occurring vitamin
found in many fruits with very good reducing ability and antioxidant
effects. The latter makes ascorbic acid very attractive in the synthesis
of copper particles and preparation of films, as it can retard oxidation
owing to its oxygen scavenging abilities.[32]l-Alanine is a non-essential alpha amino acid that is used
in the biosynthesis of proteins. It is used as a component in infusion
solutions, a precursor in the synthesis of pharmaceutical products,
and in the food industry.[33]Amino
acids are an interesting class of ligands as they possess
amine as well as carboxylic acid terminal groups, which are important
as structure-directing agents, determining the size and shape of the
particles formed. Furthermore, the presence of additional functional
groups in some amino acids could also be beneficial. Specifically, l-cysteine[29,34] has been studied extensively
owing to the presence of an additional thiol functionalization, which
is known to interact strongly with metallic copper particles.[12] However, to the best of our knowledge, l-alanine has been used once previously in the synthesis of copper
nanoparticles by Deng et al.(18) and in the synthesis of short nanowires by Yu et al.(35) In both reports, l-alanine
has been used in conjunction with hydrazine hydrate as the reducing
agent. Moreover, although nanoparticles/short nanowires were synthesized,
the effect of proportion of l-alanine and reaction conditions
on size and shape of resulting particles, low-temperature thermal
sintering to form conductive films, long-term stability, thermal stability,
and surface properties including catalytic activity have not been
previously reported. Therefore, l-alanine was selected as
the capping agent for this study as it is a small amino acid, comprising
only three carbon atoms, hence a suitable capping agent for the investigation
of low-temperature sintering because diffusion and electron transport
through the layer should be favorable.Thus, our sustainable
approach for the synthesis of copper particles
is distinct in several aspects: (i) All chemicals and solvents used
are truly benign and strictly follow the tenets of sustainable and
green chemistry (particularly aligned with the concepts of using less
hazardous synthesis protocols, safer solvents and auxiliaries, and
inherently safer chemistry for accident prevention and minimizing
waste generation[36]); (ii) low-temperature
synthesis under ambient atmospheric conditions; (iii) stable aqueous
synthesis resulting in significantly low surface oxides as evidenced
by XPS studies; and (iv) low-temperature thermal sintering –
in the temperature range of 80–120 °C under vacuum –
to produce electrically conducting copper films with enhanced long-term
stability. Furthermore, owing to the low-temperature sintering capability,
these l-alanine-capped copper particles could be potential
candidates for emerging copper inks, and as demonstrated, they are
well-suited for flexible substrates, which are unable to withstand
high temperatures, typically ≥150 °C.
Aqueous
solutions (80
mL) containing CuCl2·2H2O (10 mM) and various
amounts of l-alanine (50, 100, 150, and 200 mM) were prepared
and heated to 75 °C in air. Upon reaching this temperature, NaOH
(1.25 M) was added dropwise until the pH of the solution reached 10. l-Ascorbic acid (1.3 M, 15 mL) was then added into the reaction
mixture via a syringe pump at a rate of 0.25 mL min–1. The gradual color change from deep blue, green,
yellow, orange to red is observed as l-ascorbic acid is added.
The reaction mixture was maintained at 75 °C and stirred at 450
rpm until the addition of l-ascorbic acid was complete. After
an additional 30 min, the reaction mixture was cooled and centrifuged
using a Thermo Scientific Heraeus Megafuge 8 centrifuge at 8000 rpm
for 15 min to separate the copper particles. The solid was washed
with absolute ethanol and dried under vacuum to isolate the copper
powder. The dried copper was stored in sealed vials. (All experiments
were performed under ambient conditions, unless otherwise stated.)
Formation of Copper Films
Glass substrate slides were
cut (25 × 25 mm) from microscope slides and cleaned by sonicating
consecutively in a diluted solution of surfactant (Hellmanex III),
deionized water, acetone, and IPA for 20 min each followed by drying
with a stream of nitrogen. Dried copper particles (40 mg/mL) were
dispersed in a 1:1 solution of absolute ethanol and aqueous l-ascorbic acid (15 mM) and drop-cast (350 μL) on the cleaned
glass substrates. The substrates were then thermally sintered (80–120
°C for 45/120 min) under vacuum using a PELCO Mini Hot Vac vacuum
desiccator. After the samples reached room temperature, a Keithley
2401 source measurement unit was used to compute the sheet resistance
using the van der Pauw method. The thickness of the deposited film
was found to be 7.1 ± 1.3 μm using a KLA-Tencor Alpha-Step
D120 Stylus profilometer.
Characterization
The morphology
of the particles was
studied using a JEOL 2100F transmission electron microscope (TEM)
operating at 200 kV equipped with a Gatan Orius CCD camera and JEOL
scanning transmission electron microscopy (STEM) detectors. Image
J software was used to analyze the TEM images and compute particle
size distributions. Energy-dispersive X-ray spectroscopy (EDS) acquisition
was by an Oxford Instruments 80 mm X-Max detector and INCA software
and processed with Oxford Instruments Aztec software. Selected-area
electron diffraction (SAED) patterns were also acquired with the Gatan
Orius CCD camera. Calibration was done using an evaporated aluminum
film as a reference (from Agar Scientific). UV–visible absorption
spectra were obtained using an Agilent Cary UV–Vis–NIR
spectrophotometer. For TEM and UV–Vis analysis, copper particles
were dispersed in a 1:1 solution of absolute ethanol/IPA and aqueous l-ascorbic acid (15 mM). Zeta potential measurements were performed
using a Malvern Zetasizer (copper particles were dispersed in absolute
ethanol) together with DTS1070 disposable folded capillary cells purchased
from Malvern Instruments. Thermogravimetric analysis (TGA) was performed
using a TA instruments Discovery TGA instrument. Platinum HT sample
pans (957571.901) were used for the analysis. X-ray powder diffraction
(XRD) data was collected using a Panalytical material research diffractometer.
Loading of samples and data acquisition were performed in air. The
XRD peaks were assigned using the Mercury software and the CDS National
Chemical Database. XPS was performed using the Kratos AXIS ULTRA with
a monochromated Al Kα X-ray source (1486.6 eV) operated at 10
mA emission current and 12 kV anode potential (120 W). Spectra were
acquired with the Kratos VISION II software. A charge neutralizer
filament was used to prevent surface charging. Hybrid-slot mode was
used for measuring a sample area of approximately 300 × 700 μm.
The analysis chamber pressure was greater than 5 × 10–9 mbar. Three areas per sample were analyzed. A wide scan was performed
at low resolution (binding energy range 1400 eV to −5 eV, with
pass energy of 80 eV, step of 0.5 eV, sweep time of 20 min). High-resolution
spectra at a pass energy of 20 eV, step of 0.1 eV, and sweep time
of 10 min each were also acquired for photoelectron peaks from the
detected elements, and these were used to model the chemical composition.
Sample loading to the XPS was performed in air. The spectra were charge-corrected
by setting the C 1s peak to 284.7 eV. Morphologies of the thermally
sintered copper films supported on glass substrates were studied using
a JEOL 7100 field emission gun scanning electron microscope (FEG-SEM)
with an accelerating voltage of 15 kV.
Catalytic Activity of Sintered
Copper Films
An aqueous
solution of 4-nitrophenol (10–5 M) was prepared
followed by addition of excess NaBH4 (0.01 g). The above
solution (3 mL) was transferred to a cuvette together with a 4 ×
4 mm sample of a sintered copper film (thickness of 7.1 ± 1.3
μm) supported on flexible polyethylene terephthalate, and the
UV–Vis absorption was recorded at 90 s intervals. As a result
of the small size and light weight of the flexible substrate, the
copper film moves to the top surface of the solution, resulting in
no disruption during the measurement. Upon complete conversion of
4-nitrophenol to 4-aminophenol, the copper film was carefully removed
from the cuvette, gently washed with deionized water, and reused in
a similar reaction. This sequence was repeated for five consecutive
cycles. The reaction rate was calculated assuming pseudo-first-order
kinetics with respect to 4-nitrophenol.[37]
Results and Discussion
Copper particles were synthesized
in an aqueous medium under ambient
atmospheric conditions using l-ascorbic acid to chemically
reduce Cu(II) to Cu(0). The particles were first capped with l-alanine (Scheme ), an α-amino acid consisting of a carboxylic group (pKa value of 2.34) and an NH3+ group (pKa of 9.87).[2] Therefore, a pH of ∼10 is essential to ensure that
both these groups are deprotonated, hence available for complexing
with Cu(II) ions supplied from the precursor. Upon addition of l-alanine to Cu(II), a light blue solution is formed, which
turns into an intense deep blue color when the pH is gradually increased
to 10, resulting in the formation of a bidentate complex with l-alanine.[38] Subsequently, upon introducing l-ascorbic acid into the reaction mixture, copper is gradually
reduced to Cu(I) and finally to Cu(0).
Scheme 1
Reaction Scheme Showing
the Key Steps in the Synthesis of l-Alanine-Capped Copper
Particles
In order to investigate the
effect of l-alanine on the
stability of the copper particles, the content of l-alanine
was varied so that the Cu(II):l-alanine ratios were 1:5 (Cu-Ala5),
1:10 (Cu-Ala10), or 1:20 (Cu-Ala20). The pH of the medium, concentration
of l-ascorbic acid, rate of addition of l-ascorbic
acid, temperature of the reaction mixture, and amount of l-alanine influenced the size and shape of the synthesized copper
particles (Figure S1). At pH = 8–9,
a high rate of introducing the reducing agent, and at lower temperatures
(45–65 °C), a mixture of rods as well as particles were
observed (Figure S1). This result could
be attributed to an alteration in the nature of the complex formed
between Cu(II) and l-alanine, as a pH below 10 is insufficient
to deprotonate the NH3+ group, hindering the
formation of the bidentate complex, since the nitrogen atom of l-alanine is not available for complexation. Therefore, the
nucleation and growth of particles are affected rendering a change
in the shape.[39] At temperatures between
45–65 °C, the rate of growth is such that both rods and
particles are formed. Although higher concentrations of ascorbic acid
(1.7 and 1.9 M) yielded slightly smaller particles, a mix of particles
and rods was observed and therefore was unsuitable for this particular
study. Thus, in order to synthesize particles, an l-ascorbic
acid solution having a concentration of 1.3 M introduced to the reaction
mixture at a rate of 0.25 mL min–1 was deemed optimum.The R-group in the amino acids has been shown to greatly influence
the shape of the copper particles formed.[35] This work also demonstrates that the same ligand can be employed
to synthesize different shapes and sizes of copper particles by varying
the aforementioned reaction conditions. It is plausible to suggest
that a mix of rods and particles observed at Cu-Ala5 and Cu-Ala10
samples is likely caused by a structuring role of l-alanine,
which is influenced by the relative proportions of Cu(II) ions and l-alanine. This type of role is not surprising as amino acids
are used as structure-directing agents enabling control of the size
and shape of metal nanoparticles.[35] However,
this observation could also be attributed to the complex formation
of l-alanine in water,[40] which
could in turn affect the manner in which l-alanine interacts
with copper depending on whether they are free l-alanine
molecules or l-alanine complexes. For the purpose of this
study, the reaction conditions were controlled (see the Experimental Section) in order to favor the formation of particles
with a very low proportion of rods. The presence of rods diminishes
as the proportion of l-alanine increases, and they are undetectable
in the Cu-Ala20 sample (Figure S1 and Figure ).
Figure 1
Representative TEM (a,e,i,j);
high-angle annular dark-field (HAADF)/annular
dark-field (ADF) – STEM images (b,f,k) and STEM -EDS elemental
maps of the copper particles corresponding to copper (c,g,l); and
overlays (d,h,m); showing the distribution of copper, oxygen, and
carbon for copper particles with a Cu(II):l-alanine ratio
of 1:5 (a–d); 1:10 (e–h), and 1:20 (i–m).
Representative TEM (a,e,i,j);
high-angle annular dark-field (HAADF)/annular
dark-field (ADF) – STEM images (b,f,k) and STEM -EDS elemental
maps of the copper particles corresponding to copper (c,g,l); and
overlays (d,h,m); showing the distribution of copper, oxygen, and
carbon for copper particles with a Cu(II):l-alanine ratio
of 1:5 (a–d); 1:10 (e–h), and 1:20 (i–m).The TEM images, corresponding size distributions,
and EDS data
are shown in Figures and . It is clear
that an increase in the amount of l-alanine decreases the
particle size. This diminution is accompanied by a narrowing of the
distribution of particle sizes, with Cu-Ala5 showing the broadest
distribution and Cu-Ala20 showing a distribution of particle sizes
between 50 and 350 nm with a mean of ∼192 nm. The corresponding
elemental maps and EDS data confirm that the particles are copper,
together with the presence of oxygen and carbon (Figure S2). The existence of nitrogen, however, is not confirmed
by EDS measurements, perhaps because this element is present in very
low amounts and therefore was undetected by EDS (as the amounts of
carbon and oxygen are also very low in intensity compared to copper
and nitrogen is expected to be much lower). However, as will be shown
later, more surface-sensitive XPS confirms the presence of nitrogen
and therefore l-alanine on the surface of the synthesized
copper particles.
Figure 2
Representative particle size distributions (a,c,e) and
EDS analysis
of copper particles (b,d,f) corresponding to a Cu(II):l-alanine
ratio of 1:5 (a,b); 1:10 (c,d), and 1:20 (e,f). Particle size distribution
has been computed considering at least 100 particles for each type.
Representative particle size distributions (a,c,e) and
EDS analysis
of copper particles (b,d,f) corresponding to a Cu(II):l-alanine
ratio of 1:5 (a,b); 1:10 (c,d), and 1:20 (e,f). Particle size distribution
has been computed considering at least 100 particles for each type.The d spacings calculated from
the SAED patterns
(Figure S3) collected for the copper particles
are in good agreement with the standard ICSD – 43493, indicating
the presence of an FCC (space group: Fm3̅m) crystal structure. The crystal structure is further corroborated
by X-ray powder diffraction studies (Figure S4). Notably, no evidence of oxides is observed even though sample
preparation was performed in air and each sample was exposed to air
for at least 40 min from loading the sample to completion of data
acquisition.The trend in particle size distribution is also
confirmed by UV–visible
absorption spectroscopy (Figure a), which show that an increase in the proportion of l-alanine leads to a shift in the characteristic plasmon peak
toward a shorter wavelength. Cu-Ala20, with the smallest particles,
exhibits a surface plasmon resonance peak maximum (λSPR) at 587 nm, which shifts to 594 and 601 nm for Cu-Ala10 and Cu-Ala5,
respectively. This type of size-dependent shift in the λSPR in metal nanoparticles is associated with changes in absorption
and scattering of light.[41] The decrease
in the proportion of l-alanine also results in the broadening
of the peak. This observation could be attributed to the presence
of rods, larger particles as well as the wider range of particle sizes,
and their differential contribution to absorption and scattering.
An additional synthesis with an intermediate Cu(II) to l-alanine
ratio of 1:15 (Cu-Ala15) was synthesized to get a better understanding
on particle size distribution (Figure S5). These particles have an average particle size of ∼309 nm
and a λSPR of 597 nm (Figure S6).
Figure 3
(a) UV–Vis absorption spectra of copper particles with various
ratios of Cu(II): l-alanine; and zeta potential measurements
of copper particles with Cu(II): l-alanine ratios of (b)
1:5, (c) 1:10, and (d) 1:20.
(a) UV–Vis absorption spectra of copper particles with various
ratios of Cu(II): l-alanine; and zeta potential measurements
of copper particles with Cu(II): l-alanine ratios of (b)
1:5, (c) 1:10, and (d) 1:20.The interaction of the copper atoms on the surface of the particles
with l-alanine has been shown to involve both the nitrogen
atom of the amine and the oxygen atom of the carboxylate group in
vacuum conditions.[42] However, the change
in pH (from pH 10 to pH 4–5 upon completion of the reaction)
caused by introducing the reducing agent could also affect the interaction
between copper and the capping ligand. In order to elucidate the binding
interactions between l-alanine and copper, zeta potential
(ζ) analysis was done, which showed that the potential at the
slipping plane was negative, and the magnitude of the zeta potential
increased with the amount of l-alanine (Figure b–d and Figure S7). The negative charge is indicative
of free COO– groups, which are not bound to copper.
A higher magnitude of the measured zeta potential is associated with
a more stable suspension where there is an appreciable degree of electrostatic
repulsion between adjacent particles ensuring they remain suspended
in the medium. Small zeta potentials indicate stronger attractive
forces, which outweigh repulsive forces causing a disruption in suspension
stability, resulting in subsequent flocculation. A zeta potential
of at least ±30 mV is reported to indicate a stable suspension
stabilized exclusively by electrostatic repulsion.[43] For Cu-Ala5 and Cu-Ala10, the zeta potential is slightly
below −30 mV (−25.6 ± 0.8 and −27.9 ±
0.6 mV, respectively) but reaches −36.9 ± 0.9 mV for Cu-Ala20,
demonstrating increased stability resulting from improved electrostatic
repulsion. Additionally, the dried powder showed no aggregation or
clump formation and could be re-suspended with no apparent difference
in properties following 5 months of storage.The XPS data (Figure ) clearly confirm
the presence of Cu(0) with 2p3/2 and
2p1/2 peaks at 932.56 ± 0.05 and 952.52 ± 0.05
eV, respectively, for all l-alanine ratios.[44] Copper LMM Auger spectral peaks (Figure S8) observed at a kinetic energy range of 918.64–918.78
eV (corresponding binding energy range is 567.47–567.75 eV)
corroborates the presence of Cu(0).[44] For
Cu-Ala5, a weak satellite peak indicative of copper oxides and hydroxides
is visible together with evidence of Cu(OH)2 (934.65–935.25
and 954.55–956.05 eV).[44] Importantly,
as the amount of l-alanine increases, the intensity of the
satellite peaks and the amount of surface hydroxides gradually decrease
and oxides/hydroxides are extremely low for the Cu-Ala20 sample. This
observation is also confirmed by XPS in the oxygen region, which indicates
a peak in the range of 530.2–531.3 eV, which corresponds to
Cu2O and/or Cu(OH)2,[4,44] and
the intensity of this peak decreases as the amount of l-alanine
increases. If the more stable higher oxide, CuO, was present, a peak
at a slightly lower binding energy of 529.68 ± 0.05 eV is expected.[44] Cu(OH)2 could arise from the direct
reaction of trace Cu(II) with NaOH, as it is a strong base. Alternatively,
Cu(OH)2 could indicate a metastable state of oxidation
observed in the presence of water/moisture, which subsequently leads
to the formation of the more stable oxide, CuO.[4,45] Cu2O is an oxidation product resulting from the reaction of Cu(0)
with adsorbed oxygen due to electron transfer from Cu(0) to oxygen,
driven by the difference in Fermi levels.[4,46] Therefore,
in the presence of both water and oxygen, Cu(OH)2, Cu2O, and CuO are all possible oxidation products;[4,46] thus, considering that all experiments have been conducted under
ambient atmospheric conditions in an aqueous medium, the amount of
surface oxides present is significantly low, indicating that l-alanine plays an important role in passivating copper.
Figure 4
XPS measurements
and peak assignments corresponding to Cu 2p (a,c,e)
and O 1s (b,d,f) core levels for copper particles synthesized with
Cu(II):l-alanine ratios of 1:5 (a,b); 1:10 (c,d); and 1:20
(e,f).
XPS measurements
and peak assignments corresponding to Cu 2p (a,c,e)
and O 1s (b,d,f) core levels for copper particles synthesized with
Cu(II):l-alanine ratios of 1:5 (a,b); 1:10 (c,d); and 1:20
(e,f).The XPS in the nitrogen (Figure S9)
and oxygen regions provide more information on the nature of interaction
between copper and l-alanine. The peak appearing at 400.30
± 0.35 eV, which is also observed for pure l-alanine
(Figure S10), is indicative of the nitrogen
atom of the amino group.[47] The XPS of copper
particles in this region have an additional peak appearing at 397.20
± 0.35 eV and is characteristic of a copper-nitrogen interaction,
typical for nitrogen adsorbed on copper (and other transition metals).[48,49] A third peak is observed for Cu-Ala20, which could perhaps correspond
to a small proportion of free amino groups, which are not interacting
with the surface atoms of copper, as these particles contain the highest
amount of l-alanine. As reported for XPS of other amino acids,
an asymmetry is observed at the high energy end of the peak (corresponding
to COO– of l-alanine) in the oxygen XPS,
which can be attributed to surface charging (Figure S10).[50]The XPS corresponding
to carbon for copper particles and pure l-alanine shows similar
chemical shifts, indicating a similar
chemical environment (Figure S11). The
intensity of the carbon XPS is shown to increase as the proportion
of l-alanine increases, indicating that Cu-Ala20 has the
highest density of surface ligands. Therefore, XPS and negative zeta
potential values in combination corroborate and establish that the
copper particles are indeed capped with the anionic form of l-alanine where the amino group is interacting directly with the surface
atoms of the copper particles, while the carboxylate end, which remains
uncoordinated to the surface, facilitates the formation of a stable
suspension. Additionally, l-alanine is believed to be located
mainly on the surface of the particles because of the low intensity
of STEM-EDS response to carbon at their center and because (as will
be shown later) the resulting low-temperature sintered films show
very high conductivity.The thermal properties of l-alanine-capped copper particles
were studied using TGA carried out in air (Figure ). As the TGA was performed in air, a weight
gain is observed because of the oxidation of copper with the gradual
increase in temperature. Therefore, organic matter removal is not
evident because of the cumulative effects of decomposition of l-alanine and gradual oxidation of copper in the temperature
range of 125–250 °C. Considering the Cu-Ala5 sample, the
first step in weight gain observed at ∼250 °C can be associated
with the formation of Cu2O followed by a relatively slow
increase in weight between 250 and 360 °C, which is possibly
related to the formation of a metastable Cu3O2 phase observed during low-temperature oxidation of copper.[51,52] Subsequently, beyond a temperature of ∼360 °C, the formation
of CuO occurs. Interestingly, as the proportion of l-alanine
increases, there is a rise in the temperature at which oxidation commences.
The onset of oxidation for Cu-Ala5, Cu-Ala10, and Cu-Ala20 samples
occurs at 129, 148, and 176 °C, respectively, demonstrating increased
thermal stability. The onset of oxidation for Cu-Ala20 approaches
the temperature at which pure l-alanine begins to decompose
(Figure S12), suggesting that Cu-Ala20
has a very good compact coverage of the capping agent. It is also
noted that, as the onset temperature of oxidation increases, the two
distinct steps of oxidation corresponding to the formation of Cu2O and CuO become less sharp such that the metastable state
of Cu3O2 is absent for the copper particles
with the highest amount of l-alanine, suggesting the rapid
formation of Cu2O and subsequently CuO when oxidation commences
at an elevated temperature.
Figure 5
TGA curves (in air) of synthesized copper particles
with various
Cu(II):l-alanine ratios.
TGA curves (in air) of synthesized copper particles
with various
Cu(II):l-alanine ratios.The copper particles were dispersed in a mixed solvent containing
absolute ethanol and aqueous l-ascorbic acid and drop-cast
on glass substrates followed by sintering in a hot vacuum desiccator.
A small amount (15 mM) of l-ascorbic acid was introduced
as it has been proven to provide self-reduction and self-protection
properties when mixed with the copper ink paste,[53] mitigating temperature-induced oxidation.[32] There is a significant reduction in the measured sheet
resistance (Rsh) and resistivities as
the sintering temperature is increased from 80 to 120 °C (Figure ). As the temperature
is gradually increased, the solvent and organics are displaced leading
to particle interdiffusion and coalescence, which can be observed
in the SEM images of the sintered films (Figure a–d). At 80 °C, small particles
corresponding to the size obtained for Cu-Ala20 are observed with
negligible fusion, but as the temperature increases to 120 °C,
the proportion of larger particles increases, indicating continuous
growth. When the sintering time was extended to 2 h, a further decrease
in Rsh is observed. To provide evidence
for the potential use of these particles in the fabrication of flexible
conductive films, copper films (Cu-Ala20) were fabricated on a flexible
polyethylene terephthalate substrate, yielding an Rsh of 1.77 ± 0.33 Ω sq–1 (Figure S13). Importantly, the films were compact
and did not crack or delaminate from the substrate surface. This is
clearly visible from the films fabricated on flexible PET substrates,
which do not crack or disintegrate when distorted or bent (Figure S13).
Figure 6
Representative SEM images of copper particles
with a Cu(II):l-alanine ratio of 1:20 thermally sintered
at (a) 80 °C
for 45 min, (b) 100 °C for 45 min, (c) 120 °C for 45 min,
and (d) 120 °C for 120 min. (e) Sheet resistance and (f) resistivity
of copper films (measured at room temperature) sintered at different
temperatures. Inset in panel (e): photograph of copper films before
(i) and after (ii) thermal sintering; inset in panel (f): side-view
SEM image of a sintered copper film showing the underlying glass substrate
(bottom) and copper particles (top). The scale in all SEM images corresponds
to 1 μm.
Representative SEM images of copper particles
with a Cu(II):l-alanine ratio of 1:20 thermally sintered
at (a) 80 °C
for 45 min, (b) 100 °C for 45 min, (c) 120 °C for 45 min,
and (d) 120 °C for 120 min. (e) Sheet resistance and (f) resistivity
of copper films (measured at room temperature) sintered at different
temperatures. Inset in panel (e): photograph of copper films before
(i) and after (ii) thermal sintering; inset in panel (f): side-view
SEM image of a sintered copper film showing the underlying glass substrate
(bottom) and copper particles (top). The scale in all SEM images corresponds
to 1 μm.The resistivities of the copper
films are higher than that of bulk
metallic copper (1.7 × 10–6 Ω cm), and
this observation is expected as a sintering temperature of ≤120
°C is inadequate to achieve complete fusion of the copper particles.
However, it is important to note that the copper films fabricated
using the Cu-Ala20 particles show lower resistivity compared to other
copper structures sintered at this temperature range (≤120
°C).[18,21,54−57] Furthermore, some reports use a mix of either copper micro and nanoparticles
or copper salts and particles to achieve conductivity at a lower temperature,[21,58−60] whereas our work utilizes only the synthesized submicron
copper particles and annealing has been performed at significantly
lower temperatures than other studies that report low-temperature
sintering.[20,59,61] The observed conductivity at this low temperature could be attributed
to the fact that the submicron copper particles synthesized in this
work are capped with a compact layer of l-alanine ligands
and, as proven by XPS studies, the l-alanine ligands interact
with the surface atoms of copper by a Cu–N bond, which leaves
the carboxylate end of the ligand free to facilitate solvation. The
ink formulation uses water as part of the solvent system; therefore,
the surface-anchored l-alanine ligands can also interact
with water through favorable non-covalent interactions of the carboxylate
group. The nature of the interaction, structural parameters, and energetics
associated with the l-alanine–water interaction may
vary depending on how many water molecules solvate a single ligand.[40] This interaction also favors solvation, enabling
the formation of a stable ink, which is further assisted by mixing
with ethanol. Subsequently, when the ink is drop-cast on substrates
and subjected to heat under vacuum during sintering, the water molecules
are gradually removed by evaporation. The evaporation of water desolvates
the l-alanine capping ligands, reducing the effective distance
between two adjacent particles, thus, promoting coalescence and probably
interaction between ligands from neighboring particles resulting in
local destabilization of the capping layer, which leads to gradual
growth in their size. The growth of particles may also be facilitated
by particle diffusion, which reduces porosity and densifies the film.
Furthermore, as the particles are of a size range, good packing is
achieved with fewer pores, resulting in good contact between adjacent
particles. Therefore, although this relatively low temperature (T ≤ 120 °C) is insufficient to completely sinter
the submicron-sized copper particles, the particles are sufficiently
in contact with surrounding particles (as l-alanine is a
small ligand) for electron transport, rendering the films conductive
at significantly lower temperatures than other systems. The existence
of a mix of particle sizes contributes toward enhancing the packing
density, which minimizes cracking[59] and
also facilitates low-temperature sintering.[21]This observed conductivity could be accredited to the relatively
low amount of surface oxides on the synthesized particles which were
used to form the films as well as low surface oxides observed following
sintering (Figure and Figure S14). As the film is electrically
conductive at all sintered temperatures, it is evident that the residual
capping layer of l-alanine on the surface of the particles
following sintering is sufficiently thin such that electrons can move
between adjacent particles. It is also evident from the XPS corresponding
to the oxygen region (Figure b, d and Figure S15) that the copper
film formed using particles synthesized with a higher amount of l-alanine (Cu-Ala20) has undergone significantly less oxidation.
Therefore, the combined influence of both l-ascorbic acid,
which is known for its antioxidant properties,[32] and l-alanine successfully mitigates the oxidation
of copper, facilitating the fabrication of relatively highly conductive
copper films via thermal sintering at a significantly
lower temperature than present systems.
Figure 7
XPS measurements and
peak assignments corresponding to (a) Cu 2p
and (b) O 1s core levels for conductive copper films prepared with
copper particles with a Cu(II):l-alanine ratio of 1:20, sintered
at 120 °C for 120 min under vacuum at t = 5
days and (c) Cu 2p and (d) O 1s core levels for conductive copper
films for t = 5 months after fabrication. Insets
of panels (a) and (c) represent N 1s XPS measurements corresponding
to t = 5 days and t = 5 months,
respectively.
XPS measurements and
peak assignments corresponding to (a) Cu 2p
and (b) O 1s core levels for conductive copper films prepared with
copper particles with a Cu(II):l-alanine ratio of 1:20, sintered
at 120 °C for 120 min under vacuum at t = 5
days and (c) Cu 2p and (d) O 1s core levels for conductive copper
films for t = 5 months after fabrication. Insets
of panels (a) and (c) represent N 1s XPS measurements corresponding
to t = 5 days and t = 5 months,
respectively.To study the effect of l-alanine on the long-term stability
of the copper films, they were stored under ambient conditions for
5 months and XPS measurements were conducted to evaluate the degree
of surface oxidation caused by atmospheric oxygen and moisture. As
shown in Figure c,
although oxidation is inevitable under these conditions, resulting
in an increase in the amount of surface hydroxides and oxides (Cu2O and CuO), the degree of oxidation is remarkably small considering
the time period exposed to air. The proportion of surface hydroxides
(and Cu2O) is notable compared to the higher oxide, CuO,
indicating early stages of oxidation.[4] Therefore,
it is evident that the layer of l-alanine capping molecules
present on the copper surface is adequately compact to provide highly
effective passivation enabling significant reduction in surface oxidation
during long-term exposure to atmospheric oxygen and moisture yet is
sufficiently thin enough such that the particles are not electrically
isolated from one another, facilitating the formation of electrically
conductive films at low temperature.To further establish that
the surface l-alanine molecules
do not adversely interfere and affect the inherent properties of copper,
the catalytic activity of annealed copper films was tested. For this
purpose, the catalytic reduction of 4-nitrophenol to 4-aminophenol
was used as it is a well-known and trusted model to study the catalytic
activity of metal particles.[62] A flexible
sintered copper film of dimensions 4 × 4 mm was used to reduce
4-nitrophenol to 4-aminophenol. Upon completion of the reaction, the
copper film was carefully removed, washed with deionized water, and
used in a subsequent reaction. This process was repeated for five
successive cycles.As shown in Figure , at all reaction cycles, the rate of the
reaction is significantly
faster (∼3.5 × 103 times for Reaction 1 and
∼1.0 × 102 times for Reaction 5) than in the
absence of a catalyst. Interestingly, the rate of the reaction for
the first cycle was higher than similar reports in the literature
that utilize various copper nanoparticles[63,64] and comparable with the rates obtained by Yang et al.(37) Although the reaction rate decreases
with successive reaction cycles, even the slowest reaction is two
orders of magnitude faster than the reaction in the absence of copper.
Hence, it is evident that the l-alanine-capped copper films
are not only extremely effective in reducing 4-nitrophenol to 4-aminophenol
but also very efficient as a reusable catalyst. This result corroborates
the postulate that residual l-alanine present on the surface
of the copper film does not impede certain surface properties inherent
to copper. Notably, it may be possible to further increase the reusable
catalytic activity by washing the film with l-ascorbic acid
or glacial acetic acid (instead of deionized water) to remove any
surface oxides, which would enable the achievement of an improved
rate in successive cycles, (i.e., minimize the reduction of the reaction
rate in consecutive reactions). The latter, glacial acetic acid, is
specifically known to selectively remove copper oxides.[65]
Figure 8
(a) Reaction scheme showing the catalytic conversion of
4-nitrophenol
to 4-aminophenol in an aqueous medium under ambient conditions; UV–Vis
spectra showing the progress of the reaction over time in the (b)
absence of copper and (c–g) presence of copper, in five consecutive
reaction cycles. Inset of panel (c) shows a photograph of the 4 ×
4 mm annealed flexible copper film (placed in the cuvette) used for
the catalytic conversion.
(a) Reaction scheme showing the catalytic conversion of
4-nitrophenol
to 4-aminophenol in an aqueous medium under ambient conditions; UV–Vis
spectra showing the progress of the reaction over time in the (b)
absence of copper and (c–g) presence of copper, in five consecutive
reaction cycles. Inset of panel (c) shows a photograph of the 4 ×
4 mm annealed flexible copper film (placed in the cuvette) used for
the catalytic conversion.
Green
Chemistry Comparison with Existing Protocols
Hydrazine hydrate,
which is the predominantly used reducing agent
in the synthesis of copper particles, is industrially produced by
four main methods: (i) the Raschig process, which is the original
method by which hydrazine was produced, based on the oxidation of
ammonia using sodium hypochlorite; (ii) the Schestakov synthesis where
urea is used as the nitrogen source; (iii) the Bayer process in which
ammonia is oxidized in the presence of an aliphatic ketone, resulting
in the formation of ketazine, which is subsequently hydrolyzed; and
(iv) the Pechiney–Ugine–Kuhlmann or peroxide-ketazine
process where hydrogen peroxide is used to oxidize ammonia in the
presence of a ketone.[66] All these processes
are highly energy-intensive. There are many concerns in all these
processes, especially the production of a large amount of chlorine
byproducts and the instability of chloramine and hydrazine in (i)
and (ii).[67] Moreover, as a result of the
combustible nature of hydrazine, extreme care must be taken to prevent
accidents. Conversely, the benign l-ascorbic acid used in
this work is industrially produced by modification of the classical
Reichstein process using d-glucose as the precursor with
over 90% yield in each step.[68] Furthermore,
most of the l-ascorbic acid produced globally is made by
the fermentative oxidation of l-sorbose using Ketogulonicigenium vulgare.[68] The stabilizing and capping agent used in this work, l-alanine,
is traditionally produced by the enzymatic conversion of l-aspartic acid, which utilizes immobilized microbial cells.[69] However, similar to the industrial production
of many amino acids, the production of l-alanine by fermentation
is preferred owing to the renewable and inexpensive nature of feedstock
sugars such as d-glucose. Additionally, many improvements
in the latter have been reported by careful engineering of microorganisms
used in the fermentation process.[69]Therefore, our approach to synthesize and fabricate copper films
uses nontoxic chemicals and solvents, reduces waste generation, and
promotes safer chemistry than existing synthesis methods while also
producing highly stable copper particles and conductive films by means
of low-temperature sintering.
Conclusions
A
green, low temperature, aqueous synthetic approach for the preparation
of submicron-sized copper particles under ambient atmospheric conditions
using l-alanine as the capping agent provides a less hazardous
and easy route to the colloids compared with existing approaches.
The ratio of copper precursor to amino acid influences significantly
the size, shape, and susceptibility of particles towards oxidation.
It is demonstrated that high proportions of capping ligand give smaller
particles with excellent stability toward ambient and thermal oxidation.
The copper particles attain stability partially through a copper–nitrogen
interaction between the metal and the amino acid. The small size of
the capping ligand provides adequate barrier properties to the particles
without disrupting electron transport dramatically, ensuring the formation
of a conductive film when sintered at a low temperature (≤120
°C) compared with other systems. The residual l-alanine
capping molecules on the surface of the copper facilitate long-term
passivation of sintered metal films, mitigating oxidation under normal
atmospheric conditions without negatively impacting the surface properties.
To prove this property, the copper films have been employed as effective
and reusable catalysts in the reduction of 4-nitrophenol to 4-aminophenol.The use of chemicals and solvents that are more benign and sustainable
than those used habitually for copper inks and the low-temperature
processing conditions together with the synergistic combination of
favorable technical features make these copper particles potentially
beneficial to existing materials in a number of applications. Particularly,
as demonstrated, the high conductivities achieved at relatively low
temperatures would be beneficial to the flexible electronics industry
because the tolerance of flexible substrates to high processing temperatures
is inadequate.