| Literature DB >> 35559149 |
Alice Chinghsuan Chang1, Shu-Han Hung1, Yi-Hsuan Pan1, Yi-Hung Liu1, Wei-En Fu1, Yu-Ju Lin2, Fang-Hsin Lin1.
Abstract
The semiconductor industry continues to shrink the device sizes while applying more complex shapes and using diverse materials, which requires parallel improvements in the quality of ultrapure reagents. The need for ultrapure reagents has led to ever-higher demands for the performance of analytical instruments used to detect ultratrace impurities. In this study, nonvolatile impurities in ultrapure reagents were quantified using a scanning mobility particle sizer (SMPS). The performances of three different sample introduction systems, i.e., an electrospray (ES), an aerosol generator with a heating chamber and a Nafion desolvation membrane (NB-II), and a MicroMist nebulizer with a heated cyclonic spray chamber and a three-stage Peltier-cooled desolvation system (MM-APEX), were evaluated for the lower limit of detection of a SMPS. The MM-APEX equipped with the SMPS was able to detect NaCl additives at a concentration of 100 parts per trillion (ppt, ng/L) in ultrapure water, which was approximately 104- and 102-fold lower than those of ES and NB-II, respectively. The practical application of MM-APEX with the SMPS for commercial isopropanol samples was also studied. The results clearly demonstrate that the impurity concentrations presented by the NaCl-equivalent concentrations among different sources of isopropanol were at the ppt to parts-to-billion (ppb) scale. The SMPS system equipped with MM-APEX is capable of recognizing impurities with concentrations ranging from tens ppt to thousands of parts per million (ppm), which is beneficial for an ultratrace analysis of nonvolatile impurities in semiconductor process chemicals.Entities:
Year: 2022 PMID: 35559149 PMCID: PMC9088961 DOI: 10.1021/acsomega.1c07168
Source DB: PubMed Journal: ACS Omega ISSN: 2470-1343
Figure 1Scheme for the characterization of residual particles in the reagents. The three major factors for the estimation of the impurity concentration among the aqueous reagents are (a) nebulization and condensation of the impurity residues and (b) performance of the nebulizer depending on the dominant size and variance of the generated droplets. (c) Evaluation of the impurity concentration by fitting the detected residue volume to the calibration curve of the additive model.
Figure 2(a) Residue particle size distribution at different sucrose concentrations. (b) Correlation between the measured residue diameter and the concentrations of the sucrose solution.
Figure 3Droplet diameter distribution of the primary aerosols generated using two different nebulizers (NB-II and MM).
Parameter Values Associated with the Determination of Nebulization Efficiency Using the Three Sample Introduction Systems
| nebulizer | ES | NB-II | MM-APEX |
|---|---|---|---|
| droplet size | 145 nm | 1.1 μm | 2.0 μm |
| [NaCl] (g/L) | 0.1 | 0.001 | 0.001 |
| drying temperature (°C) | 20 | 140 | 140 |
| carrier gas flow rate (L/min) | 1.5 | 3 | 1 |
| mass detected by SMPS (g/L) | 6.41 × 10–12 | 2.98 × 10–8 | 1.06 × 10–5 |
| sample flow rate (μL/min) | 0.066 | 227 | 154 |
| nebulization efficiency (ε) | 1.5 × 10–3 | 3.93 × 10–1 | 6.88 × 101 |
Figure 4Calibration curve of different sample introduction systems.
Figure 5(a) Calibration curve of NaCl spiked in IPA and (b) impurity concentration of seven batch IPA.