Literature DB >> 35535757

The Trend of 2D Transistors toward Integrated Circuits: Scaling Down and New Mechanisms.

Yang Shen1, Zuoyuan Dong2, Yabin Sun2, Hao Guo3, Fan Wu1, Xianglong Li2, Jun Tang3, Jun Liu3, Xing Wu2, He Tian1, Tian-Ling Ren1.   

Abstract

2D transition metal chalcogenide (TMDC) materials, such as MoS2 , have recently attracted considerable research interest in the context of their use in ultrascaled devices owing to their excellent electronic properties. Microprocessors and neural network circuits based on MoS2 have been developed at a large scale but still do not have an advantage over silicon in terms of their integrated density. In this study, the current structures, contact engineering, and doping methods for 2D TMDC materials for the scaling-down process and performance optimization are reviewed. Devices are introduced according to a new mechanism to provide the comprehensive prospects for the use of MoS2 beyond the traditional complementary-metal-oxide semiconductor in order to summarize obstacles to the goal of developing high-density and low-power integrated circuits (ICs). Finally, prospects for the use of MoS2 in large-scale ICs from the perspectives of the material, system performance, and application to nonlogic functionalities such as sensor circuits and analogous circuits, are briefly analyzed. The latter issue is along the direction of "more than Moore" research.
© 2022 Wiley-VCH GmbH.

Entities:  

Keywords:  device engineering; new mechanisms; physical models; scaling down; two-dimensional semiconductors; very large-scale integration

Year:  2022        PMID: 35535757     DOI: 10.1002/adma.202201916

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   32.086


  1 in total

Review 1.  Two dimensional semiconducting materials for ultimately scaled transistors.

Authors:  Tianyao Wei; Zichao Han; Xinyi Zhong; Qingyu Xiao; Tao Liu; Du Xiang
Journal:  iScience       Date:  2022-09-20
  1 in total

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