| Literature DB >> 35517128 |
Neelima Singh1, Hadi Bakhshi1, Wolfdietrich Meyer1.
Abstract
Urethane-methacrylate photo-monomers were prepared via a non-isocyanate route for the 3D printing application. The monomers were synthesized through reacting aliphatic amines, i.e. 1,6-hexanediamine, 1,4-butanediol bis(3-aminopropyl) ether, or n-butylamine, with cyclic carbonates, i.e. ethylene carbonate or propylene carbonate, followed by the methacrylation of the generated hydroxylurethanes. The effects of the chemical structure of monomers on their photo-reactivity and physicomechanical properties of the cured samples were studied. Propylene carbonate generated side methyl groups within the urethane block, which significantly limited the crystallization of the monomers resulting in high photo-reactivity (R p,max = 6.59 × 10-2 s-1) and conversion (DBCtotal = 85%). The ether bonds of 1,4-butanediol bis(3-aminopropyl) ether decreased the intermolecular hydrogen bonding between urethane blocks, which not only improved the photo-reactivity (R p,max = 8.18 × 10-2 s-1) and conversion (DBCtotal = 86%) of the monomer but led to a high crosslinking density (ν c = 5140 mol m-3) and more flexibility for the cured sample. An ink was developed based on the monomers and successfully 3D printed on a digital light processing machine. In the absence of toxic isocyanates and tin compounds, the non-isocyanate route can be employed to develop urethane-methacrylates with desirable photo-reactivity and physicomechanical properties as good candidates to formulate inks for 3D printing of biomedical materials. This journal is © The Royal Society of Chemistry.Entities:
Year: 2020 PMID: 35517128 PMCID: PMC9058492 DOI: 10.1039/d0ra06388f
Source DB: PubMed Journal: RSC Adv ISSN: 2046-2069 Impact factor: 4.036
Fig. 1Two-step non-isocyanate route for the synthesis of urethane-methacrylate monomers.
Fig. 21H-NMR (a) and 13C-NMR (b) spectra for UrDMA1 in DMSO-d6.
Thermal properties and photo-reactivity of urethane-methacrylatesa
| Monomer | DSC | Photo-DSC | ||||||
|---|---|---|---|---|---|---|---|---|
|
| Δ |
|
|
| Δ | DBCtotal (%) |
| |
| UrDMA1 | 76 | 109.9 | 25 | 4.72 × 10−3 | 61.4 | 5.8 | 2 | 99.3 |
| 80 | 2.68 × 10−2 | 13.3 | 121.2 | 47 | 49.6 | |||
| UrDMA2 | — | — | 25 | 6.59 × 10−2 | 13.4 | 254.8 | 85 | 33.6 |
| UrDMA3 | 31 | 5.0 | 25 | 8.18 × 10−2 | 10.9 | 182.9 | 86 | 29.1 |
| UrMA1 | 3 | 34.1 | 25 | 6.61 × 10−2 | 19.5 | 247.5 | 98 | 32.9 |
T p: temperature of photo-curing, Rp,max: maximum photo-curing rate, tmax: time to reach Rp,max, ΔHp,total: total generated photo-curing heat, DBCtotal: total double bond conversion, t95%: time to reach 95% of DBCtotal.
Fig. 3Photo-curing rate (a and c) and double bond conversion (b) for urethane-methacrylates obtained from photo-DSC data.
Thermal and viscoelastic properties of cured samplesa
| Sample | DSC | DMA | ||||||
|---|---|---|---|---|---|---|---|---|
|
|
| tan |
|
|
|
| ||
| 1st cycle | 2nd cycle | |||||||
| XUrDMA1 | 50 | 100 | 126 | 0.41 | 2100 | 24 | 140 | 2360 |
| XUrDMA2 | 45 | 81 | 85 | 0.32 | 1720 | 105 | 127 | 10 550 |
| XUrDMA3 | 45 | 57 | 80 | 0.40 | 1670 | 49 | 108 | 5140 |
| XUrMA1 | 25 | 24 | 51 | 1.50 | 1070 | 20 | 55 | 2500 |
tan δmax: loss coefficient (loss modulus/storage modulus) at Tg, : storage modulus at 25 °C, : storage modulus in the rubbery region, T: the absolute temperature at the beginning of the rubbery plateau.
Fig. 4Storage modules and tan δ curves for cured samples.
Physical properties and thermal stability of cured samplesa
| Sample | Gel content (%) | Water absorption (%) in PBS after 7 d | TGA | ||
|---|---|---|---|---|---|
|
|
|
| |||
| XUrDMA1 | 100 ± 1 | 4 ± 1 | 290 | 429 | 479 |
| XUrDMA2 | 99 ± 1 | 4 ± 1 | 212 | 402 | 472 |
| XUrDMA3 | 99 ± 1 | 4 ± 1 | 217 | 405 | 451 |
| XUrMA1 | 89 ± 4 | 2 ± 1 | 215 | 357 | 436 |
T 5%: temperature with weight loss of 5%, T50%: temperature with weight loss of 50%, T90%: temperature with weight loss of 90%.
Fig. 5Pictures for XUrDMA1 before (left) and after (right) immersion in PBS.
Fig. 6Pictures for 3D printed test object using an ink based on the monomers.