| Literature DB >> 35515851 |
Bolin Guo1,2, Bai Sun1,2, Wentao Hou3, Yuanzheng Chen1, Shouhui Zhu1,2, Suangsuo Mao1,2, Liang Zheng2, Ming Lei2, Bing Li4, Guoqiang Fu5.
Abstract
It is the consensus of researchers that the reuse of natural resources is an effective way to solve the problems of environmental pollution, waste and overcapacity. Moreover, compared with the case of inorganic materials, the renewability of natural biomaterials has great prominent advantages. In this study, keratin, which was first extracted from hair due to its high content in hair, was chosen as a functional layer for the fabrication of a resistance switching device with the Ag/keratin/ITO structure; in this device, a stable resistive switching memory behavior with good retention characteristic was observed. Via mechanism analysis, it is expected that there is hopping conduction at low biases, and the formation of a conductive filament occurs at high biases. Furthermore, our device exhibited a stable switching behavior with different conductive materials (Ti and FTO) as bottom electrodes, and the influence of Ag and graphite conductive nanoparticles (NPs) doped into the keratin layer on the switching performance of the device was also investigated. This study not only suggests that keratin is a potential biomaterial for the preparation of memory devices, but also provides a promising route for the fabrication of bio-electronic devices with non-toxicity, degradability, sustainability etc. This journal is © The Royal Society of Chemistry.Entities:
Year: 2019 PMID: 35515851 PMCID: PMC9063690 DOI: 10.1039/c8ra10643f
Source DB: PubMed Journal: RSC Adv ISSN: 2046-2069 Impact factor: 4.036
Fig. 1The schematic of the preparation of the Ag/keratin/ITO memory device and the chemical structure of keratin.
Fig. 2The resistive switching characteristics of the Ag/keratin/ITO memory device. (a) Typical I–V curves with different laps under single logarithmic coordinates. (b) Distribution of the HRS and LRS over 150 consecutive cycles. (c) Retention characteristics of both resistance states.
Fig. 3The I–V curve for the Ag/keratin/ITO memory device on a double logarithmic scale. (a) LRS at positive bias. (b) HRS at positive bias.
Fig. 4The switching mechanism of the Ag/keratin/ITO memory device. The hollow dotted round circle represents the defect center. The solid dotted round circle represents the defect center occupied by charge carries.
Fig. 5(a and b) The I–V curve for a keratin-based memristor and the distribution of the HRS and LRS over 100 consecutive cycles with Ti as the bottom electrode. (c and d) The I–V curve for a keratin-based memristor and the distribution of the HRS and LRS over 100 consecutive cycles with FTO as the bottom electrode.
Fig. 6(a) I–V curves for the doped device and undoped devices. Graphite is denoted by the abbreviation “C.” (b) Resistance for the HRS and the LRS, represented by the blue curve and magenta curve, respectively.