| Literature DB >> 35445855 |
N A Isaac1, I Pikaar2, G Biskos3,4.
Abstract
To meet requirements in air quality monitoring, sensors are required that can measure the concentration of gaseous pollutants at concentrations down to the ppb and ppt levels, while at the same time they exhibiting high sensitivity, selectivity, and short response/recovery times. Among the different sensor types, those employing metal oxide semiconductors (MOSs) offer great promises as they can be manufactured in easy/inexpensive ways, and designed to measure the concentration of a wide range of target gases. MOS sensors rely on the adsorption of target gas molecules on the surface of the sensing material and the consequent capturing of electrons from the conduction band that in turn affects their conductivity. Despite their simplicity and ease of manufacturing, MOS gas sensors are restricted by high limits of detection (LOD; which are typically in the ppm range) as well as poor sensitivity and selectivity. LOD and sensitivity can in principle be addressed by nanostructuring the MOSs, thereby increasing their porosity and surface-to-volume ratio, whereas selectivity can be tailored through their chemical composition. In this paper we provide a critical review of the available techniques for nanostructuring MOSs using chemiresistive materials, and discuss how these can be used to attribute desired properties to the end gas sensors. We start by describing the operating principles of chemiresistive sensors, and key material properties that define their performance. The main part of the paper focuses on the available methods for synthesizing nanostructured MOSs for use in gas sensors. We close by addressing the current needs and provide perspectives for improving sensor performance in ways that can fulfill requirements for air quality monitoring.Entities:
Keywords: Air quality monitoring; Chemiresistive gas sensors; Metal oxides; Selectivity; Sensitivity
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Year: 2022 PMID: 35445855 PMCID: PMC9023411 DOI: 10.1007/s00604-022-05254-0
Source DB: PubMed Journal: Mikrochim Acta ISSN: 0026-3672 Impact factor: 6.408
Fig. 1Schematic diagram showing a particulate-based thin film deposited on an interdigitated substrate, and the interaction of the grain boundaries after the gas species adsorb on the metal oxide surface. Left: Illustration of a chemiresistive gas sensor consisting of the metal oxide semiconducting nanomaterial (orange film) deposited on an interdigitated substrate with two finger electrodes providing connections to a circuit for resistance measurement; Middle: Microstructural characteristics of the MOS film showing the grain boundaries (orange layers), Right: Ambient oxygen species adsorb on the metal oxide surface, depleting the electrons from the conduction band throughout the material. This creates a space charge layer (depletion region), and consequently a barrier to the charge carrier flow at the grain boundaries. For an n-type particulate MOS gas sensor in the presence of adsorbed target gas molecules (e.g., NO2), the space-charge region widens and the conduction band bending of the material increases from EC2 to EC1. This bending creates an increase of the potential barrier to the path of the charge carrier (e.g., electrons), which transduces to a change in resistance of the MOS film measured by an external circuit connected to the interdigitated electrodes
Oxygen species on SnO2 at various temperatures identified by Fourier-transform infrared (IR), temperature programmed desorption (TPD), and electron paramagnetic resonance (EPR). The dominant oxygen species changes from O2− at lower temperatures towards O− at temperatures around 175 ºC. Data extracted from Barsan and Weimar [42]
Threshold limits of common pollutants as set by European Union and US agencies, as well as LoD of best-performing sensors reported in literature
| Pollutant | EU Threshold Limits** | US Threshold Limits*** [ | LoD of best-performing sensor reported in literature | References |
|---|---|---|---|---|
| CO | 10 ppm | 9 ppm | 1 ppm | [ |
| NO2 | 50 ppb | 53 ppb | 5 ppb | [ |
| O3 | 120 ppb | 70 ppb | 20 ppb | [ |
| SO2 | 130 ppb | 75 ppb | 38 ppb | [ |
| CO2 | N/A | N/A | 150 ppb | [ |
**EU air quality standards described in Directive 2008/50/EU
***National Ambient Air Quality Standards (NAAQS) of the US
Fig. 2Dependence of the sensitivity of MOS gas sensors on the sensor operating temperature. An increase in temperature initially increases the adsorption (chemisorption and physisorption) of gas species. However, after a specific threshold (which varies depending on the MOS and the target gas molecule) the high thermal motion of the adsorbed species promotes desorption, which in turn decreases sensor sensitivity
Sensitivities of SnO2-based MOS sensors, fabricated by different methods, when exposed to 50 ppm CO. The sensitivities reported are calculated using Eq. 1
| Structure and decorating nanoparticles on SnO2 nanomaterials | Synthesis method | Sensitivity | References |
|---|---|---|---|
| Nanosheets—Ni/Zn | Hydrothermal process | 7.3 | [ |
| Nanoparticles—Pt | Flame spray | 1.5 | [ |
| Nanowire | Chemical Vapor Deposition | 2.5 | [ |
| Nanopowder—Zn/Fe | Sol gel synthesis | 2.0 | [ |
| SnO2 thin films | Pulsed laser deposition | 4.0 | [ |
Fig. 3Schematic diagram showing typical response and recovery of the resistance of an n-type MOS gas sensor in the presence of an oxidizing target gas. The resistance of the sensing material is stabilized after exposure to the ambient atmosphere and thus is dominated by the adsorption of oxygen species (region I). Upon introduction of the target gas (region II), the resistance begins to rise, reaching a final/saturation value. The time required to reach 90% of the final resistance value is defined as the response time of the sensor (tres). Upon removal of the target gas (region III), the resistance of the sensing material decreases, reaching its initial value prior exposure to the target gas. The time required for the resistance of the sensing material to reach values close (typically 10% higher) to the initial value is the recovery time of the sensor (trec)
Optimal operating temperatures and response/recovery times of ZnO nanomaterials for H2S gas sensing
| Structure of nanomaterials | Concentration of H2S used | Operating Temperature (˚C) | References | ||
|---|---|---|---|---|---|
Colloidal ZnO Quantum dots | 50 | 25 | 16 | 820 | [ |
| ZnO comb-like | 0.1 | 25 | 48 | 540 | [ |
| ZnO dendrites | 100 | 25 | 20 | 50 | [ |
| ZnO thin films – Al | 600 | 200 | 90 | 209 | [ |
| MoO3/ZnO cages | 100 | 270 | 13 | 29 | [ |
Fig. 4Iillustration showing the interaction of adsorbed water molecules on the surface of a metal oxide, which can deteriorate the performance of gas sensors [81].Water molecules can either adsorb on the metal oxide surface via their (a) H or (b) O atoms. In the first case, adsorbed H atoms form OH-M bonds on the surface, extracting O atoms from the metal oxide surface and thus create O vacancies (V). In the second case, when water molecules approach the MOS surface via the O atoms, the H of the water molecule chemically interact with the MOS lattice O atoms, incorporating an OH group within the metal oxide surface. Key: M: metal atom; O: oxygen atom; V: oxygen vacancy; OH: Hydroxyl group; H: Hydrogen atom
Fig. 5Illustration of the four different bottom-up approaches for nanomaterial synthesis. Vapor phase synthesis methods include formation of vapor atoms or molecules which are subsequently collected on a substrate. Liquid phase methods rely on the formation of atoms/molecules in the liquid phase and on their subsequent deposition on the substrate. Aerosol- or colloidal-based synthesis, employ nanoparticles that are formed in the gas or liquid phase, respectively, before being deposited on a substrate
Summary of common techniques used for nanomaterial synthesis
| Synthesis Method | Working principle | Advantages | Disadvantages | Materials synthesized | Refs | ||
|---|---|---|---|---|---|---|---|
| TOP | Lithography | Photolithography—a multistep process yielding nanopatterns on a surface by exposure to light. The first step almost always involves coating the surface with a thin layer of polymer called photoresist | High reliability, low temperature, process simplicity | High amounts of waste produced, high operational cost, masks required, limited morphologies | Silicon-based nanomaterials, conductive inks, MOS nanomaterials | [ | TOP |
| E-beam lithography—a process where an electron beam is used for patterning a surface | No mask template is required, high resolution | Slow and expensive process | Metallic nanomaterials, polymers | [ | |||
| Milling | Ion beam milling—a process whereby a beam of ions is focused onto a thin film or bulk material until the required nanostructure is attained | Production of precise nanostructures | Intricate machinery involved, low throughput, time consuming process | Metal and carbon nanoparticle | [ | ||
| High energy ball milling – a process where bulk material is placed in a mill with milling balls transferring their kinetic energy to break the material into small nanoparticles | High throughput | Contamination, polydisperse nano-powders, noise pollution | Metallic and MOS nanomaterials | [ | |||
| Etching | Plasma etching – a dry etching process during which material surface gets exposed to plasma and bombarded by molecules, ions, electrons, and photons stimulating expulsion of material from the surface, and thus leading to nano-structuring | High resolution, easy to control, no liquid chemical wastes | High cost, poor selectivity, potential radiation damage | Silicon-based, metallic, and composite nanomaterials | [ | ||
| Wet etching—a process to remove material and carry it away in the liquid phase using acid or bases that dissolve the material to be etched | Low cost, simple process, high selectivity | Chemical contamination, dependence on crystal orientation, undercutting | Silicon-based nanomaterials,metallic and metal oxide nanoparticles, composite materials | [ | |||
| BOTTOM-UP NANOSYNTHESIS | Chemical Vapor Deposition (CVD) | Processes during which a precursor compound (vapor) is introduced into a reacting chamber in a controlled way with a carrier gas. Upon encountering the substrate (typically maintained at a high temperature), the precursor undergoes a chemical reaction and deposits as a solid film on the substrate | Applied to a wide variety of base materials, coat precision equipment | High temperatures, stresses induced on the substrate creating mechanical instabilities in the deposited films, Use of potentially toxic precursors, pyrophoric or corrosive | Metal oxides, non-oxides, composite materials | [ | GAS PHASE SYNTHESIS TECHNIQUES |
| Physical Vapor Deposition (PVD) | Sputtering—a vacuum based process in which atoms are ejected from target material and deposited on a nearby surface to form films through momentum transfer | Stable, long-life vaporization source, reactive depositions possible with the right gas species, small volume deposition chamber possible | Low production rates, expensive target materials | Metal oxides, non-oxides, composite materials | [ | ||
| E-beam evaporation—electron beam is used to vaporize a target material which is transported and condensed onto a surface | Good strength and durability of deposited films, low contamination | High capital cost | Metallic films, carbon nanomaterials, MOS nanomaterials | [ | |||
| Laser/pulsed laser ablation—a focused laser beam is used to evaporate the target material which is then condensed onto a surface | Multilayer growth and chemical reaction on substrates due to high energy particles | Non-uniform film thickness, extremely small particles when not desired | Carbon nanomaterials, MOS nanomaterials, core shell nanoparticles, quantum dots | [ | |||
| Electrohydrodynamic spray deposition (Electrospray) | A solution-based method in which a precursor solution is passed through a high-voltage tube forming a spray of charged droplets. The droplets are evaporated on their path to a grounded electrode/substrate where the resulting nanoparticles are deposited | Single-step process, low cost, low amounts of byproducts produced | Low throughput, use of cross-linking agents in pre-cursors | Metal oxides, non-oxides, composite materials | [ | LIQUID PHASE SYNTHESIS TECHNIQUES | |
| Electrospinning | A subcategory of electrospray, producing nanofibers rather than nanoparticles | Simple instrumentation, continuous process | Jet instability, toxic precursors | Polymers, ceramic-based materials | [ | ||
| BOTTOM-UP NANOSYNTHESIS | Green synthesis (biological) | A process whereby organisms such as algae or fungi holding metal ions form nanoparticles through a series of intra and extra cellular activities, making these organisms the bio-factories | Environment friendly, controllable growth, stable nanomaterials | Wide range pf particle sizes, slow process | Metal and carbon-based nanoparticles, polymers | [ | |
| Spark Ablation | A process whereby vaporous produced by repeated sparks on an electrodes are cooled rapidly to form atomic clusters, which further grow by condensation and coagulation to create nanoparticles | Relatively low cost as it avoids the use of expensive energy source. Avoids the contamination of the material through surfactants and solvent impurities | Limited particle production rates, agglomerated particles | Metallic and metal oxides nanoparticles, intermetallic alloyed nanoparticles | [ | AEROSOL TECHNIQUES | |
| Arc discharge | A process where an electric arc formed between two electrodes leads to the formation of plasma, producing vapors from the electrode material that subsequently cool down and nucleate to nanoparticles | Simple method that produces consistent high-purity nanomaterials. High throughput production that can be scaled up | Production of highly agglomerated particles | Metallic and semiconducting nanoparticles, alloy nanoparticles, quantum dots | [ | ||
| Laser /Flame Spray Pyrolysis | A family of processes during which a solution is atomized inside a reactor where the resulting droplets undergo evaporation, solute concentration, and thermolysis to give porous nanomaterial. Either lasers or flames can be used as the source of thermal energy in such systems | Effective preparation of powders consisting of ultrafine and spherical grains/particles. Good reproducibility in terms of particle size and quality | High cost associated with production of spherical and ultra-pure particles | Metallic and metal oxide nanoparticless, metal composites | [ | AEROSOL TECHNIQUE | |
| Hydrothermal route | A process where nanomaterials are fabricated in a closed process system flowing in an aqueous solution above 100 °C. Process parameters that are usually controlled include initial pH of the medium, duration of the process, as well as pressure and temperature conditions | Environment friendly, versatile functionality, controllable particle morphology | High cost of autoclaving, safety issues | Metallic, metal oxide, and ceramics nanoparticles | [ | COLLOIDAL SYNTHESIS TECHNIQUE | |
| Sol–gel | A wet chemistry processing method where colloidal particles in liquids undergo gelation, forming interconnected long polymeric chains. Solution is eventually dried to form the required nanomaterial | Homogeneous materials, low operating temperatures, inexpensive instrumentation | High product purity is affected by sol–gel matrix components, expensive metal-based reactants | Metal and metal oxide nanoparticles, metal composites, carbon supported nanoparticles | [ |
Summary of the synthesis processes that can be employed to produced MOS nanomaterials of different classes. The minimum structure sizes reported for metal oxide gas sensors for different morphologies is listed. The material structures are classified according to the type of the building blocks (0D, 1D, 2D, or 3D), which can attribute specific characteristics to the resulting nanomaterial. Zero dimensional (0D) refers to building blocks with all dimensions in the nano-range, while three dimensional (3D) refers to building blocks with all three dimensions larger than the nano-range (> 100 nm)
| Dimensions | Nanostructured features of the MOS material | Synthesis processes | Examples of Structure Sizes |
|---|---|---|---|
| 0D | Nanoparticles, nanoclusters, nanocrystals, quantum dots | Zero dimensional nanomaterials have all dimensions within less than 100 nm. They can be synthesized by physical (e.g., thermal evaporation, sputtering or lithography) or chemical (e.g., template method for core–shell nanoparticles, hydrothermal process, aerosol assisted CVD) processes | 5 nm nanocrystals [ 30 nm nanoparticles [ |
| 1D | Nanowires, nanotubes, nanorods, nanoribbons | Sputtering and thermal evaporation techniques have proved reliable for high quality nanostructures with 1 dimension above the nanoscale. Spray pyrolysis has been used to grow ZnO:WOx nanowires. A chemical route involving electrochemical methods can be employed for MnO2 nanowire-nanotubes growth. Sol–gel technique can also be used for its simplicity and flexibility. Scaled up CVD is employed at industrial scale for production of nanowires. Laser pyrolysis is employed for giving different sizes/shapes to TiO2 nanomaterials | 50—150 nm nanorods with 15 µm length[ 80 × 20 × 30 nm nanoribbons[ |
| 2D | Nanosheets, nanowalls, nanodisks, nanobelts, thick films, thin films | Two dimensional nanostructures include structures that have two dimensions above the nanoscale. Thermal evaporation has been used for growth of SnO2 nanodisks and Ga2O3 nanosheets. ZnO nanoleafs can be grown through pulsed laser ablation in a liquid. Chemical routes can also be employed to produce array of MnO2 nanowalls. Hydrothermal process has been reported for fabricating NiO nanoplates | Nanosheet thickness 1.2 nm, over an area of (300–500 nm) [ |
| 3D | Spring-like nanocoils, nanoflowers, bridge structures | Fabrication techniques are used to control the alignment of structures during growth and morphology. Sputtering offers precise morphology control. Lithography and arc discharge are other reported methods used to obtain free-form structures. Low cost electrochemical routes offer high purity 3D nanoflowers. ZnO and SnO2 nanostructures can be grown through hydrothermal processes | Micron sized Nanoflowers made from < 100 nm nanowires [ |
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| NO2 + Mx+
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| 2 | Reaction 8 |
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