Md Mofasser Mallick1, Leonard Franke1, Andres Georg Rösch1, Holger Geßwein2, Yolita M Eggeler3, Uli Lemmer1,4. 1. Light Technology Institute, Karlsruhe Institute of Technology, 76131 Karlsruhe, Germany. 2. Institute for Applied Materials, Karlsruhe Institute of Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany. 3. Laboratory for Electron Microscopy, Karlsruhe Institute of Technology, 76131 Karlsruhe, Germany. 4. Institute of Microstructure Technology, Karlsruhe Institute of Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany.
Abstract
It has been a challenge to obtain high electrical conductivity in inorganic printed thermoelectric (TE) films due to their high interfacial resistance. In this work, we report a facile synthesis process of Cu-Se-based printable ink for screen printing. A highly conducting TE β-Cu2-δSe phase forms in the screen-printed Cu-Se-based film through ≤10 ms sintering using photonic-curing technology, minimizing the interfacial resistance. This enables overcoming the major challenges associated with printed thermoelectrics: (a) to obtain the desired phase, (b) to attain high electrical conductivity, and (c) to obtain flexibility. Furthermore, the photonic-curing process reduces the synthesis time of the TE β-Cu2-δSe film from several days to a few milliseconds. The sintered film exhibits a remarkably high electrical conductivity of ∼3710 S cm-1 with a TE power factor of ∼100 μW m-1 K-2. The fast processing and high conductivity of the film could also be potentially useful for different printed electronics applications.
It has been a challenge to obtain high electrical conductivity in inorganic printed thermoelectric (TE) films due to their high interfacial resistance. In this work, we report a facile synthesis process of Cu-Se-based printable ink for screen printing. A highly conducting TE β-Cu2-δSe phase forms in the screen-printed Cu-Se-based film through ≤10 ms sintering using photonic-curing technology, minimizing the interfacial resistance. This enables overcoming the major challenges associated with printed thermoelectrics: (a) to obtain the desired phase, (b) to attain high electrical conductivity, and (c) to obtain flexibility. Furthermore, the photonic-curing process reduces the synthesis time of the TE β-Cu2-δSe film from several days to a few milliseconds. The sintered film exhibits a remarkably high electrical conductivity of ∼3710 S cm-1 with a TE power factor of ∼100 μW m-1 K-2. The fast processing and high conductivity of the film could also be potentially useful for different printed electronics applications.
In
general, different chemical and physical synthesis methods such
as arc melting, solid-state reaction melt and growth, mechanical alloying,
and hydrothermal synthesis are employed to prepare various thermoelectric
(TE) materials.[1] Depending on the type
of material, a suitable synthesis method is implemented. The synthesis
processes are extremely important; they should be appropriate to get
an expected phase and high TE performance. The melt and growth method
is widely used to synthesize low-melting-temperature alloys, such
as telluride/selenide chalcogenides and Zintl phases. In this process,
metal elements with a stoichiometric ratio are kept in a vacuum-sealed
quartz tube followed by heating at elevated temperatures for several
hours to days so that all of the precursor elements interdiffuse to
form the desired phases.[2] The melting points
of the metal elements and annealing temperatures are generally determined
from the phase diagram of the targeted alloys. The resulting consolidated
ingots are ground into a powder and made into pellets using hot-pressing
or spark plasma sintering (SPS) to prepare TE components. The mechanical
alloying method has also been adopted to synthesize similar TE materials.[3−5] Here, powder elements are mixed in a stoichiometric ratio and ground
with a high-energy ball mill for several hours. The milling time and
rotation speed of the jar containing balls and the ingredients depend
on the formation energies of the alloys to be prepared. The resulting
homogeneous milled powder samples are then consolidated into pellets
using hot press or SPS. Sometimes, further heat treatment at high
temperatures is required to acquire the desirable phase. The Cu2Se chalcogenide phase is one of the most interesting TE phases
for its unique transport properties. The monoclinic α-Cu2Se is the common phase at room temperature (RT) and transforms
into the cubic disordered superionic β-Cu2Se phase
at elevated temperatures. In this phase, two separate sublattices,
“Cu” and “Se”, build the structure of
Cu2Se. A rigid crystalline symmetric framework is formed
by the large Se atoms that help transfer the charge carriers, and
the disordered Cu ions diffuse around the Se sublattices, resulting
in a strong phonon scattering, facilitating a low lattice thermal
conductivity. Therefore, the β-Cu2Se phase exhibits
a liquid-like behavior of the phonons and a crystal-like behavior
of the charge carriers, a “phonon-liquid electron-crystal”
behavior.[6] Hence, β-Cu2Se exhibits simultaneously high electrical conductivity and low thermal
conductivity. Both the “melt and growth” and mechanical
alloying synthesis processes are employed to prepare the bulk Cu2Se phase, followed by grinding, pressing, and dicing to design
Cu2Se-based bulk TE components. The complete synthesis
processes are reported to take up to 10 days.[7−11] Chemical synthesis methods have also been reported
to prepare Cu2Se, which also involves multiple steps.[12] Apart from a complex and long synthesis process,
the Cu2Se-based bulk TE components reported so far are
neither shape-conformal nor flexible. A flexible TE component would
potentially be advantageous over its bulk counterparts as this allows
wearable and complex geometry applications.[13,14] Hence, efforts have been put forward to synthesize flexible Cu2Se-based TE films using bulk or chemically prepared Cu2Se particles.[15,16] Recently, PEDOT:PSS/Cu2Se-based composite TE films prepared by the vacuum filtration and
pressing technique have been reported to exhibit good performance.[17,18] However, unlike printing technology, the synthesis processes of
these TE components are not low-cost and involve a set of complex
processes.Recently, we have reported Sb–Bi–Te/β-Cu2−δSe TE films prepared by sintering in a vacuum
oven. Nevertheless, there is a trade-off between high performance
and good flexibility in the films.[19−21] We have also reported
high-performance Ag2Se-based printed n-type TE films prepared
by a similar sintering process.[13,22,23] In this work, we have employed a fast photonic-curing technology
on printed Cu–Se-based films to address the drawbacks associated
with the traditional procedure to fabricate flexible β-Cu2−δSe-based TE films. We have used screen printing
to fabricate TE films with high spatial resolution, and a very fast
photonic-curing process is implemented to sinter the films. We have
discovered that the TE β-Cu2−δSe phase
is formed in less than 10 ms in the film, facilitating an ultrahigh
electrical conductivity and mechanical flexibility without damaging
the low-temperature substrates. The sintering time to form the Cu2−δSe phase reduces by 8 orders of magnitude from
∼106 s in bulk to ≤10–2 s in the printed film.
The
Cu–Se-based printable TE ink was prepared using a ball mill,
Fritsch Planetary Mill PULVERISETTE 5 premium line. The Cu and Se
elemental powders were mixed in a 2:1 atomic ratio in a PVP–NMP
(6:94) solution. The blend was then kept in a N2 purged zirconia jar
containing 10 mm zirconia balls followed by wet milling for 30 min
at 200 rpm. The weight ratio of the balls to the mixture was 10:1.
We printed the obtained Cu–Se-based ink on glass and flexible
substrates using a semiautomated screen printer ROKUPRINT machine
with a screen specification of 600 × 300 90–40 y/22°
Hitex. The printed films of the order of 10 μm were dried on
a hotplate after printing. After drying at 343 K, the printed films
were flash-sintered with 35 μPulses for 8–10 ms, varying
the external input flashlamp voltage (VP) in the range of 300–400 V using a PulseForge 1200 (Novacentrix)
photonic-curing machine. The temperatures of the top surface of the
printed film, at the interface, and at the bottom of the substrate
have been simulated using the interactive numerical model SimPulse
for PulseForge photonic-curing tools based on the heat transfer model.
It can be seen that the top and interface temperatures reach 973 for VP = 380 V where the substrate temperature remains
near RT (cf. Figure S1). The film temperature
decreases below 473 K within 50 ms.
Characterization
Techniques
The phase
and crystallographic analyses of the photonic-sintered printed films
were conducted using X-ray diffraction (XRD) on a Bruker D8 diffractometer
with a Lynxeye XE detector. The temperature-dependent transport parameters
of the films were studied using a Hall measurement setup (Linseis
HCS 10). The electrical conductivity is determined by the van der
paw method with four contacts. A magnetic field is applied perpendicular
to the film to produce a Hall voltage (VH). The Hall coefficient (RH) is determined
from the VH, which is essential to determine
the carrier concentration and mobility. The RT Seebeck coefficient
α of the sintered film with VP =
380 was measured using a custom-built setup. The working principle
of the custom-built setup is given in Supporting Information Note 2 of the previous report.[14] The thicknesses and surface morphologies of the printed
films were studied by a Bruker 3D microscope based on white-light
interferometry (WLI). Microstructural and elemental analyses of the
sintered films were conducted using an FEI Quanta 650 environmental
scanning electron microscope (ESEM) equipped with a Schottky field
emitter and an SSD detector operating with 5 and 15 kV.
Results and Discussion
The crystallographic and phase
analyses of the nonsintered and
sintered films were extensively studied using the X-ray diffraction
(XRD) technique (cf. Figure ). XRD patterns of the sintered films for different VP from 300 to 400 V were collected while keeping
the sintering time constant at 10 ms. The XRD pattern of the nonsintered
printed film corresponds to the two unreacted Cu and Se. The β-Cu2−δSe phase starts to grow when VP reaches 320 V and is found to be fully developed for VP ≥ 380 V (cf. Figure a). To get insight into the crystallographic
structure of the β-Cu2−δSe phase, Rietveld
refinement of the XRD pattern of the sintered film for VP = 380 V was performed (cf. Figure b). The results indicate that the XRD pattern
corresponds to a main cubic β-Cu2−δSe
phase with space group Fm3̅m and a fraction of unreacted Cu. The nonstoichiometry “δ”
is estimated to be up to 0.1. Most probably, the δ is responsible
for the RT β-Cu2−δSe phase as it is
also reported that δ = 0.03 can enable a phase transformation
of the conventional α-Cu2−δSe phase
to the cubic β-Cu2Se phase. The lattice parameter
of the unit cell of the β-Cu2−δSe phase
is estimated to be a = 5.7(6) Å. The Se atoms
in the β-Cu2−δSe crystal form a rigid
face-centered cubic cell occupying the Wyckoff position 4a (0, 0,
0), and the Cu atoms occupy two different Wyckoff positions 8c (1/4,
1/4, 1/4) and 32f (x, x, x).
Figure 1
VP-dependent XRD patterns
of the Cu–Se-based
printed films at RT (a). Rietveld refinement results of the film for VP = 380 V (b). β-Cu2−δSe is identified as the main phase with a small fraction of unreacted
Cu. Unit cell and lattice structure of β-Cu2−δSe (c, d).
VP-dependent XRD patterns
of the Cu–Se-based
printed films at RT (a). Rietveld refinement results of the film for VP = 380 V (b). β-Cu2−δSe is identified as the main phase with a small fraction of unreacted
Cu. Unit cell and lattice structure of β-Cu2−δSe (c, d).The detailed microstructural and
morphological analyses of the
printed sintered and nonsintered films are included in Figure . The screen printability of
the Cu–Se-based film was checked using the ROKUPRINT screen-printing
machine (cf. Figure a). Macroscopic morphologies of the printed Cu2Se films
for sintering and nonsintering conditions were studied using three-dimensional
(3D) microscopy; see Figure b–d. The morphology of the nonsintered film shows segregated
island-like structures of the Cu–Se material. SEM images of
the nonsintered and sintered films also show that the film was compacted
after sintering with VP = 380 V and becomes
denser (cf. Figure e,g). The elemental mapping of the printed films indicates that the
Cu and Se elements were segregated in the nonsintered film and they
almost fully reacted to form the β-Cu2Se phase in
the sintered film. The b/w regions in the elemental mappings in Figure h correspond to the
potholes created due to the expulsion of the organic constituents
from the film during the sintering process. A sufficient number of
data from potholes did not reach the energy-dispersive X-ray analysis
(EDX) detector.
Figure 2
Screen-printed sintered Cu2Se film on the poly(ethylene
terephthalate) (PET) substrate (a). Surface morphologies of the nonsintered
film (b), sintered film with VP = 340
V (c), and sintered film with VP = 380
V (d) captured by a WLI 3D microscope. The microstructures and elemental
maps of the nonsintered film (e, f) and the sintered film with VP ≥ 340 V (g, h).
Screen-printed sintered Cu2Se film on the poly(ethylene
terephthalate) (PET) substrate (a). Surface morphologies of the nonsintered
film (b), sintered film with VP = 340
V (c), and sintered film with VP = 380
V (d) captured by a WLI 3D microscope. The microstructures and elemental
maps of the nonsintered film (e, f) and the sintered film with VP ≥ 340 V (g, h).The remnant of organic binder PVP could be present in the films;
however, it constitutes only 1.6 wt % (<10 vol %) of the films.
After sintering, it decomposes releasing <3 vol % of carbon in
the film, which is far below the percolation threshold to influence
the transport properties.[24] The mechanical
flexibility of a 15 mm sintered film for VP = 380 V has been checked by a semicircular bending test multiple
times. The normalized resistance of the film was found to be 1.5 after
10 bending cycles (cf. Figure S2).
Thermotransport Properties of Photonic-Cured
Films
The temperature-dependent transport properties were
studied for VP ≤ 380 V (cf. Figure ). The mechanical
flexibility and the electrical conductivities σ of the printed
film deteriorate for VP > 380 V. The
nonsintered
film is found to be insulating and becomes highly conductive after
sintering. All of the films show p-type conduction, and the σ
increases with increasing VP, altering
the transport properties and the nature of the films for VP > 340 V (cf. Figure a). The negative value of (RH) at T > 323 K for the film with VP = 320 V indicates alteration of the conduction nature,
from p-type to n-type, as the β-Cu2Se phase is not
formed. Although the Hall carrier concentration (pH) decreases with increasing VP, the σ increases because of significant enhancement of the
carrier mobility (μH) (cf. Figure b,d). The films for VP ≥ 360 V show a metallic-like nature, consistent with
the previously reported transport phenomena of the pristine β-Cu2Se-based film.[20]
Figure 3
Variation of electrical
conductivity σ (a), Hall carrier
concentration pH (b), Hall coefficient RH (c), and Hall carrier mobility μH (d) of the Cu–Se-based printed film with temperature
for different VP, 320 ≤ x ≤ 380.
Variation of electrical
conductivity σ (a), Hall carrier
concentration pH (b), Hall coefficient RH (c), and Hall carrier mobility μH (d) of the Cu–Se-based printed film with temperature
for different VP, 320 ≤ x ≤ 380.A surprisingly high σ ∼3710 S cm–1 is achieved at RT in the flexible printed film for VP = 380 V. The σ value is much higher than those
of most reported Cu2Se-based bulk materials[6−9] because of leftover unreacted Cu elements in the film. The electrical
conductivity σ and Hall mobility μH of the
printed film increase with increasing the flashlamp voltage VP, which is directly proportional to the sintering
temperature of the film. The insulating organic ingredients in the
printed film start to be removed with increasing VP. The elemental Cu and Se then react to form β-Cu2Se with further increase of VP, enhancing the σ of the sintered film (Figure ). At first, the charge carrier concentration pH of the film increases with increasing VP for ≤ 340 V due to the removal of the
insulating organic constituents, leaving partially unreacted Cu and
Se in the printed film, as shown in Figure a.
Figure 4
Variation of the transport parameters σ, pH, and μH with the input flashlamp
voltage VP (a). Electric conductivity
is modeled, and
the line through the data points is a fit (b). Temperature-dependent
α and power factor of the photonic-cured film for VP = 380 V (c). Semicircular bending test of a 15 mm sintered
film for VP = 380 V to check its mechanical
flexibility (d).
Variation of the transport parameters σ, pH, and μH with the input flashlamp
voltage VP (a). Electric conductivity
is modeled, and
the line through the data points is a fit (b). Temperature-dependent
α and power factor of the photonic-cured film for VP = 380 V (c). Semicircular bending test of a 15 mm sintered
film for VP = 380 V to check its mechanical
flexibility (d).The amount of the unreacted
elements decreases with increasing VP for VP > 340 V
resulting in the decrease of pH in the
film. As the pH of the Cu element (∼8.55
× 1022 cm–3) is one order of magnitude
higher than that for the β-Cu2Se phase (<5 ×
1021 cm–3), with decreasing unreacted
Cu, the overall σ decreases for VP > 340 V. The temperature-dependent electrical transport of the
film
for VP = 380 V is modeled using a metal-semiconducting
transport equation.[25] The film is found
to be metallic in nature (cf. Figure b). The RT σ of the sintered film stored in the
air atmosphere for VP = 380 V was measured
after many weeks and it is found to be decreased slightly. Storing
in an N2 or inert gas environment could prevent decreasing the conductivity.
Due to the presence of unreacted Cu elements, the Seebeck coefficient
(α) is also found to be lower. A positive α ∼16
μV K–1 and a TE power factor of ∼95
μW m–1 K–2 are achieved
in the film at RT (cf. Figure c). The power factor value is twice as high as the previously
reported vacuum-sintered β-Cu2Se film.[20] Unfortunately, we could not determine the thermal
conductivity of the film due to the nature of the synthesis process
and film specification. However, the thermal conductivity value could
be higher compared to the β-Cu2Se film, resulting
in lower ZT due to its high conductivity. In addition
to TE applications, the highly conductive p-type β-Cu2Se film could be potentially employed for printed sensors and optoelectronic
applications.[26−28]
Conclusions
A long
sintering process at elevated temperatures is one of the
most important steps to synthesis a TE phase. However, in printed
thermoelectrics, low-temperature substrates with printed precursor
materials do not withstand the high-temperature sintering process
to form a TE phase. This work employs photonic-curing technology to
sinter the printed Cu–Se-based material without damaging the
flexible low-temperature substrates. The TE β-Cu2Se phase is formed within 10 ms through the photonic curing in the
printed film. The obtained sintered flexible film exhibits a remarkably
high electrical conductivity of 3710 S cm–1 with
a TE power factor of 95 μW m–1 K–2 at RT.
Authors: Md Mofasser Mallick; Leonard Franke; Andres Georg Rösch; Sarfraz Ahmad; Holger Geßwein; Yolita M Eggeler; Magnus Rohde; Uli Lemmer Journal: ACS Appl Mater Interfaces Date: 2021-12-15 Impact factor: 9.229
Authors: Paweł Nieroda; Anna Kusior; Juliusz Leszczyński; Paweł Rutkowski; Andrzej Koleżyński Journal: Materials (Basel) Date: 2021-06-30 Impact factor: 3.623