| Literature DB >> 35057189 |
Paolo Canepa1, Giuseppe Firpo2, Elena Gatta3, Roberto Spotorno4, Paolo Giannoni5, Rodolfo Quarto5,6, Maurizio Canepa1,7, Ornella Cavalleri1.
Abstract
We present a two-step surface modification process to tailor the micro and nano morphology of niobium oxide layers. Niobium was firstly anodized in spark regime in a Ca- and P-containing solution and subsequently treated by acid etching. The effects of anodizing time and applied potential on the surface morphology is investigated with SEM and AFM, complemented by XPS compositional analysis. Anodizing with a limiting potential of 250 V results in the fast growth of oxide layers with a homogeneous distribution of micro-sized pores. Cracks are, however, observed on 250 V grown layers. Limiting the anodizing potential to 200 V slows down the oxide growth, increasing the anodizing time needed to achieve a uniform pore coverage but produces fracture-free oxide layers. The surface nano morphology is further tuned by a subsequent acid etching process that leads to the formation of nano-sized pits on the anodically grown oxide surface. In vitro tests show that the etching-induced nanostructure effectively promotes cell adhesion and spreading onto the niobium oxide surface.Entities:
Keywords: AFM; ASD; Ca/P; SEM; XPS; etching; niobium; osteoblast
Year: 2022 PMID: 35057189 PMCID: PMC8778385 DOI: 10.3390/ma15020473
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623
Figure 1Representative top view SEM images (E–T detector) of anodized sample at limiting potential of 200 V (left column) and 250V (right column) in different conditions: for (a,b) galvanostatic process, (c,d) galvanostaic/potentiostatic (60 s), (e,f) galvanostaic/potentiostatic (300 s), and (g) galvanostaic/potentiostatic (30 min). (h) High magnification of the fractures (circled) observed in samples anodized in pure galvanostatic regime at 250 V (10 s).
Figure 23D visualization of typical 30 µm × 30 µm (4 µm z-scale) AFM images of (a) Nb200V60s and (b) Nb250V60s samples.
Roughness values (nm) calculated on 100 µm × 100 µm scan size areas.
| Anodizing Conditions | Galvanostatic | 60 s | 300 s | 30 min |
|---|---|---|---|---|
|
| 480 | 570 | 550 | 660 |
|
| 710 | 820 | 620 | - |
Figure 3Representative XPS high-resolution spectra of (a) Ca2p and (b) P2p core regions of anodized niobium.
Figure 4High resolution SEM images of post-anodizing etching effects: (a) a pore border of a typical anodized sample; (b) nano-sized pits on a pore border after etching.
Figure 5SEM images at (a,b) low and (c,d) high magnification of MG-63 osteosarcoma cells after 48 h incubation on (a,c) Nb200V and (b,d) Nb200V + etching.