Laurent Lermusiaux1, Antoine Mazel2, Adrian Carretero-Genevrier3, Clément Sanchez4, Glenna L Drisko2. 1. Univ. Lyon, CNRS, École Normale Supérieure de Lyon, Laboratoire de Chimie, UMR 5182, 46 allée d'Italie, F-69007 Lyon, France. 2. CNRS, Univ. Bordeaux, Bordeaux INP, ICMCB, UMR 5026, F-33600 Pessac, France. 3. Institut d'Electronique et des Systèmes (IES), CNRS, Université de Montpellier, 860 Rue de Saint Priest, Montpellier 34095, France. 4. Laboratoire Chimie de la Matière Condensée, UMR 7574, Sorbonne Université-Collège de France-CNRS, 4 Place Jussieu, 75005 Paris, France.
Abstract
ConspectusThe properties of a material depend upon its physical characteristics, one of these being its crystalline state. Next generation solid-state technologies will integrate crystalline oxides into thermal sensitive processes and composite materials. Crystallization of amorphous phases of metal oxides in the solid state typically requires substantial energy input to induce the amorphous to crystalline phase transformation. In the case of silica, the transformation to α-quartz in a furnace occurs above 1300 °C and that of titania, above 400 °C. These calcination processes are costly in energy but also often degrade complex material architectures or compositions.Thus, low temperature crystallization techniques are required that preserve macro- and mesostructures and complex elemental composition (e.g., organic-, metal-, and semiconductor-metal oxide hybrids/composites). Some solution-based techniques exist to directly fabricate crystalline metal oxides. However, these are not always compatible with the specificities of the system or industrial constraints. A postsynthetic, solid-state approach that reduces crystallization temperature in metal oxides is metal-induced crystallization (MIC).MIC is the introduction of catalytic amounts of a cation, which can be an s-block, p-block, or d-block cation, that migrates through the solid metal oxide lattice. The cation is thought to temporarily break metal oxide bonds, allowing [MOx] polyhedra to rotate and reform bonds with neighboring [MOx] groups in a lower energy crystalline phase. Depending on the system, the cation can favor or defavor the formation of a particular crystalline phase, providing a means to tune the purity and crystalline phase ratios. An advantage of MIC is that, although the crystallization occurs in the solid state, the crystallization process can be accomplished for particle suspensions in liquid media. In this case, the energy required to induce the crystallization can come from, for example, a microwave or an ultrasound bath. The crystallization of particles in suspension avoids aggregation from particle-particle sintering. In the case of thin films, the energy for crystallization typically comes from a laser or calcination.MIC is only recently being used as a low temperature metal oxide crystallization technique, despite being widely used in the semiconductor industry. Here, the mechanism and previous studies in MIC are presented for titania, silica, and other oxides. The beauty of this technique is that it is extremely easy to employ: cations can be incorporated into the system postsynthetically and then are often expelled from the lattice upon phase conversion. We expect MIC to enrich materials for photochromic, optoelectronic, catalyst, biological, and other applications.
ConspectusThe properties of a material depend upon its physical characteristics, one of these being its crystalline state. Next generation solid-state technologies will integrate crystalline oxides into thermal sensitive processes and composite materials. Crystallization of amorphous phases of metal oxides in the solid state typically requires substantial energy input to induce the amorphous to crystalline phase transformation. In the case of silica, the transformation to α-quartz in a furnace occurs above 1300 °C and that of titania, above 400 °C. These calcination processes are costly in energy but also often degrade complex material architectures or compositions.Thus, low temperature crystallization techniques are required that preserve macro- and mesostructures and complex elemental composition (e.g., organic-, metal-, and semiconductor-metal oxide hybrids/composites). Some solution-based techniques exist to directly fabricate crystalline metal oxides. However, these are not always compatible with the specificities of the system or industrial constraints. A postsynthetic, solid-state approach that reduces crystallization temperature in metal oxides is metal-induced crystallization (MIC).MIC is the introduction of catalytic amounts of a cation, which can be an s-block, p-block, or d-block cation, that migrates through the solid metal oxide lattice. The cation is thought to temporarily break metal oxide bonds, allowing [MOx] polyhedra to rotate and reform bonds with neighboring [MOx] groups in a lower energy crystalline phase. Depending on the system, the cation can favor or defavor the formation of a particular crystalline phase, providing a means to tune the purity and crystalline phase ratios. An advantage of MIC is that, although the crystallization occurs in the solid state, the crystallization process can be accomplished for particle suspensions in liquid media. In this case, the energy required to induce the crystallization can come from, for example, a microwave or an ultrasound bath. The crystallization of particles in suspension avoids aggregation from particle-particle sintering. In the case of thin films, the energy for crystallization typically comes from a laser or calcination.MIC is only recently being used as a low temperature metal oxide crystallization technique, despite being widely used in the semiconductor industry. Here, the mechanism and previous studies in MIC are presented for titania, silica, and other oxides. The beauty of this technique is that it is extremely easy to employ: cations can be incorporated into the system postsynthetically and then are often expelled from the lattice upon phase conversion. We expect MIC to enrich materials for photochromic, optoelectronic, catalyst, biological, and other applications.
Danty, P. M. P.; Mazel,
A.; Cormary, B.; De Marco, M. L.; Allouche, J.; Flahaut, D.; Jimenez-Lamana,
J.; Lacomme, S.; Delville, M.-H.; Drisko, G. L. (1) The structure is preserved
in titania spheres, crystallized at 150 °C in suspension. This
article opens the door toward hybrid materials with postsynthetically
crystallized TiO2.Drisko, G. L.; Carretero-Genevrier,
A.; Perrot, A.; Gich, M.; Gàzquez, J.; Rodriguez-Carvajal,
J.; Favre, L.; Grosso, D.; Boissière, C.; Sanchez, C. (2) The relationship between
the cationic devitrification agent and the obtained crystal phase
is studied in the MIC of SiO2. Macrostructured hollow spheres
preserve their form during this crystallization process, leading to
hard, low density α-quartz structures.Carretero-Genevrier,
A.; Gich, M.; Picas, L.; Gazquez, J.; Drisko, G. L.; Boissiere, C.;
Grosso, D.; Rodriguez-Carvajal, J.; Sanchez, C. (3) We show MIC for the first
time in silica films crystallized on a silicon substrate. The epitaxial
relationship between the substrate and the gel dictates the direction
of α-quartz crystal growth. Mesostructures are preserved during
the epitaxial growth.Drisko, G. L.; Carretero-Genevrier,
A.; Gich, M.; Gàzquez, J.; Ferrah, D.; Grosso, D.; Boissière,
C.; Rodriguez-Carvajal, J.; Sanchez, C. (4) Macroperforated, mono-oriented α-quartz films are produced.
The importance of the cation concentration within the gel on the MIC
process is explored and demonstrated.
Introduction
The physical properties of a material
are highly dependent on its
crystalline phase, and many crystalline materials have significantly
different properties from their amorphous counterpart and other crystal
allotropes. The classic example is that of carbon, which can exist
as charcoal (amorphous state), diamond (face centered cubic structure),
or graphite (either hexagonal or rhombohedral structure), each allotrope
exhibiting vastly different physical properties. In the example of
silicon particles, the intensity and the frequency of their optical
resonances are highly influenced by the crystalline state.[10] Turning to a metal oxide, the photocatalytic
activity[11] and the toxicity[12] of titania are both highly dependent on crystalline
phase. Piezoelectricity is well-known in α-quartz but absent
in amorphous silica.Crystallization is most often achieved
via calcination, where a
sample is heated to high temperatures to initiate the amorphous to
crystalline transition. Calcination can pose several problems; principally,
it can lead to particle–particle sintering and is highly energy
consuming. In the case of SiO2, the oxide typically remains
amorphous until at least 1300 °C,[13] making it hard to preserve mesostructured materials upon crystallization.
One way to decrease crystallization temperature, conserve energy,
retain the mesostructure, and ensure crystalline phase purity or produce
hybrid crystalline materials is to use a technique called metal-induced
crystallization (MIC) (Figure ). MIC is a fully solid-state process, whereupon one material
crystallizes at a lower temperature via contact with a metal that
does not form part of the lattice.[7]
Figure 1
Presence of
devitrification agents in an amorphous oxide lowers
the crystallization temperature but also impacts the crystalline phase,
allowing phase ratios to be finely tuned.
Presence of
devitrification agents in an amorphous oxide lowers
the crystallization temperature but also impacts the crystalline phase,
allowing phase ratios to be finely tuned.The first report of MIC was in 1970 with the crystallization of
amorphous germanium by noble metals, aluminum, and tin.[14] Soon after, amorphous silicon was also devitrified
at a lowered temperature by metals.[15] The
terminology “metal-induced crystallization” is not used
often with regard to silica crystallization, but the concept of devitrification
using lattice modifiers has been known since the early 1900s.[8,9] The effect of dopants on titania crystallization via laser irradiation
was first noticed in 1996.[17] Ten years
later, the first MIC of titania during classical calcination via metal
contamination was reported.[18,19] However, despite the
past 25 years of research into the MIC of oxides, this Account is
the first overview on this topic. Here, we present the advances in
titania, silica, and other metal oxides crystallized using MIC.
Titania
Crystalline Phase Control
Crystalline
titania appears in a wide variety of applications, as photocatalysts
and photovoltaics, and in a number of food and agricultural products,
its crystalline phase is one of the factors impacting its properties.
There are three common phases in titania: anatase, brookite, and rutile
with anatase and rutile being the most commonly obtainable forms and
anatase requiring the least energy to be achieved. Not only do metal
cations impact the amorphous to anatase transition, but also they
can promote or retard the transformation to either brookite or
rutile. In these sections, we will briefly discuss the impact of metal
cations on crystalline phase transition; see refs (20−24) for a deeper discussion of this topic. A summary of titania materials
produced to date via MIC is presented in Table .
Table 1
Metal-Induced Crystallization
Conditions
for Amorphous Titania
devitrification
agent
onset temperature
(°C)
phase
comments
reference
Co(NO3)2
223
anatase, rutile
powder containing 2 mol % Co relative to TiO2, 514.5 nm
laser used, energy density of 15 W/mm2
(17)
HAuCl4
80
anatase
sonochemical treatment of
a powder combined with MIC
(19)
AgNO3
190
anatase, rutile
thermal treatment of nanoparticles,
phase transition temperature dependent on the atmosphere (air vs N2)
(32)
AgNO3
250
anatase, rutile
thermal annealing of thin
films
(33)
AgNO3
250
anatase, rutile
thermal annealing of nanoparticles
(34)
Cu
210
anatase
thermal annealing of thin
films, postsynthetic diffusion
(26)
Ni
220
anatase
thermal annealing of thin
films, postsynthetic diffusion
(25)
Au
250
anatase
thermal annealing of thin
films, postsynthetic diffusion
(27)
Ni,
Au, or Pt
350
anatase
thermal annealing of thin
films, postsynthetic diffusion
(35)
Zn(NO3)2, NaNO3, Co(NO3)2, La(NO3)3, Al(NO3)3,
Ca(NO3)2, KNO3, and BaNO3
350
anatase, rutile
thermal annealing of powders
(36)
KCl, CoCl2, NiCl2, CuCl2, ZnCl2, MnCl2, and
AlCl3
150
anatase
microwave irradiation of
titania microspheres
(1)
Mechanism
of Metal-Induced Crystallization
in Titania
Several studies on the mechanism of MIC reported
that the metal diffuses throughout the titania structure, whether
or not it was originally in the gel.[24−28] The cations, typically acting as crystallization
catalysts, do not systematically dope the final oxide. Yang et al.
proposed that the metals help to rearrange the Ti–O bonds into
an energetically more favorable crystalline arrangement.[25] The Ti–O bond weakens when a metal cation
partially transfers valence electrons to the antibonding orbitals
of the Ti–O bond. Heat, coming from an external source, breaks
the weakened Ti–O bonds as well as the metal–oxygen
bond. Crystalline TiO2, having free energy lower than that
of its amorphous counterpart,[29] results
in the cation remaining mobile in the gel. By studying the effect
of cation dopants on the phase transition of anatase to rutile,[29] Nair et al. proposed that cations having a radius
comparable to Ti4+ (60.5 pm) and a charge of less than
+4 can occupy a lattice point and thus increase the oxygen vacancy
concentration. However, larger cations find themselves in interstitial
positions and thus decrease oxygen vacancies. They correlated increased
oxygen vacancy concentration with a lower onset of crystal nucleation,[29] which is complementary to the mechanism proposed
by Yang et al.[25] Electron paramagnetic
resonance studies of the local metals’ environment within titania
gels and crystals have indicated that the cation does not diffuse
alone but with some of its ligands.[30]
Crystallization Coupling Metal-Induced Crystallization
to Different Annealing Techniques
Laser
Annealing
Raman lasers can
be used to anneal doped and nondoped titania samples to produce thin
films containing crystalline anatase and/or rutile phases.[17] Camacho-López et al. demonstrated that
the required power density to induce phase transformation is 20 times
lower in the presence of 2 mol % Co2+ than without the
metal additive.[31] Moreover, the quantity
of crystalline material increased with time, and the type of crystalline
phase depended on the quantity of cobalt in the titania film.[31]
Ultrasound Treatment
Sonochemistry,
combined with MIC, was first reported as a means to crystallize titania
in 2006.[19] For example, in ethylene glycol,
sonicating amorphous titania led to its crystallization when in the
presence of HAuCl4.
Convective
Heating
Convective heating
has been combined with the MIC of titania in two main ways, via incorporation
of a cation prior to the sol–gel transition and by postsynthetic
diffusion of a metal from a metallic contact layer. Both methods have
similar crystallization temperatures.Rodríguez-Talavera
et al. observed the MIC of titania using La, Zn Al, K, Na, Ca, Ba,
and Co.[36] The onset crystallization temperature
did not depend on the nature of the cation employed, but there was
a good correlation between the temperature of the phase transition
from anatase to rutile. The authors attributed the stabilization of
the anatase phase to the cation size and oxidation state.García-Serrano
et al. studied the addition of AgNO3 to the precursor mixture
before the sol–gel reaction and
found that crystallite size decreased with increasing AgNO3 concentration.[32] Small crystallite size
is commonly observed in MIC because, according to Amarjargal et al.,
the cation lowers the crystallization temperature, leading to widespread
nucleation and a high density of grain boundaries.[34] However, the cation is then typically ejected from the
lattice, as its size is incompatible with insertion/substitution.
As the cation moves to the crystallite surface, the impetus for grain
boundary migration decreases.The MIC of titania is achievable
by conductive heating of TiO2 in contact with a metallic
layer. The mechanism of crystallization
of thin films using a gold layer was studied via Raman imaging and
showed that very small and sparse crystallites appear at 250 °C.[27] The density of crystallites increases with annealing
temperature; it seems that the crystallites do not grow in size, but
rather, more small crystallites nucleate within the film. Yang et
al.[27] found that, when TiO2 was
deposited on a thin contact film, Ni and Cu participated in the MIC
to a higher degree than Au and NiO contact films. Cu or Ni migrates
from a bottom layer to the top layer of TiO2, producing
fully crystalline anatase. The difference in the metals was attributed
to their difference in electronegativity, which is inversely proportional
to their ability to transfer electrons from the metal to the antibonding
orbitals of the Ti–O bond. Similarly, metallic layers can be
deposited above amorphous titania to create crystalline thin film
transistors.[37] Shin et al.[37] showed that Al-, Mo-, and Ti-induced crystallization at
relatively low temperatures, but Al produced larger grain sizes, a
higher degree of crystallization, and enhanced electron transport
(Figure ). In the
Ti and Mo films, crystallization occurred close to the metal oxide/titania
interface. The films produced via Al-induced crystallization displayed
enhanced electrical transport performance in the semiconductor film.
Figure 2
High resolution
electron microscopy images of thin films with a
top coat of either aluminum (left) or molybdenum (right) with diffraction
patterns showing their overall degree of crystallinity and local crystallinity
at both the metal oxide/TiO2 interface and the TiO2/glass substrate interface. Adapted from ref (37). Copyright 2020 American
Chemical Society.
High resolution
electron microscopy images of thin films with a
top coat of either aluminum (left) or molybdenum (right) with diffraction
patterns showing their overall degree of crystallinity and local crystallinity
at both the metal oxide/TiO2 interface and the TiO2/glass substrate interface. Adapted from ref (37). Copyright 2020 American
Chemical Society.
Microwave
Irradiation
We were the
first to combine MIC and microwave heating, where using both techniques
in concert lowers the temperature of titania crystallization (Figure ).[1] The heat treatment temperature reduced from a minimum of
400 °C in a classical convective heating process to 150 °C
in the microwave. Treatment time is similarly reduced from several
hours in a furnace to 10 min (including heating and cooling times).
An advantage of this combinatorial approach is that titania nanomaterials
can be crystallized in water, avoiding particle–particle sintering
and maintaining the particles in solution, which can readily be processed
into a material.
Figure 3
SEM images of amorphous titania (a) before and (b) after
MIC under
microwave irradiation. (c) X-ray diffractograms of titania before
treatment (red), after calcination of Mn2+ doped titania
at 150 °C (blue), after microwave treatment of TiO2 at 150 °C (green), and after of Mn2+-containing
titania at 150 °C (black). Reproduced from ref (1). Copyright 2020 American
Chemical Society.
SEM images of amorphous titania (a) before and (b) after
MIC under
microwave irradiation. (c) X-ray diffractograms of titania before
treatment (red), after calcination of Mn2+ doped titania
at 150 °C (blue), after microwave treatment of TiO2 at 150 °C (green), and after of Mn2+-containing
titania at 150 °C (black). Reproduced from ref (1). Copyright 2020 American
Chemical Society.We tested the ability
of Mn2+, Co2+, Ni2+, Al3+, Cu2+, and Zn2+ to
devitrify titania in the microwave reactor.[1] All of these cations created anatase at 150 °C in the microwave
with the crystallite size being dependent on the ionic radius of the
cation. The migration of the cation throughout the TiO2 lattice occurred prior to crystallization (Figure ). Oddly, we noticed that titania microspheres
seemed either amorphous or well crystalline (Figure b,c), but partially crystallized microspheres
were rarely observed. As the crystalline grains are small in all cases,
it is hard to understand why the onset of nucleation occurs at different
times in different microspheres, but once initiated, the amorphous
material quickly converts to a polycrystalline sample.
Figure 4
Bright field TEM images
of ultramicrotomed sections of beads (a)
prior to contact and after (b) 5, (c) 10, and (d) 90 min of exposure
to the cation and microwaves. The scale bars represent 1 μm.
The inset represents the SAED pattern of a large collection of particles
from each sample. (e) The XRD diffraction pattern, ranging from no
treatment (gray) to 90 min of irradiation time (dark blue). (f–h)
The EDX analysis for Mn (red) for the corresponding micrographs of
(b–d). (i) SEM image and scanning Auger mapping of a single
particle treated with microwaves for 10 min containing (j) titanium,
(k) manganese, and (l) oxygen. Adapted from ref (1). Copyright 2020 American
Chemical Society.
Bright field TEM images
of ultramicrotomed sections of beads (a)
prior to contact and after (b) 5, (c) 10, and (d) 90 min of exposure
to the cation and microwaves. The scale bars represent 1 μm.
The inset represents the SAED pattern of a large collection of particles
from each sample. (e) The XRD diffraction pattern, ranging from no
treatment (gray) to 90 min of irradiation time (dark blue). (f–h)
The EDX analysis for Mn (red) for the corresponding micrographs of
(b–d). (i) SEM image and scanning Auger mapping of a single
particle treated with microwaves for 10 min containing (j) titanium,
(k) manganese, and (l) oxygen. Adapted from ref (1). Copyright 2020 American
Chemical Society.
Applications
One of the major advantages
of the MIC of titania is the ability to get relatively pure phases
of rutile at relatively low temperature,[24] which show better wettability and increased optical absorption in
the red, needed for photocatalytic antimicrobial coatings. Many electronic
and optoelectronic devices are fabricated on substrates that are thermally
unstable.[27] Titania can be used in resistive
switching for use in memory devices; however, its crystalline form
must be obtained, preferably on a glass substrate. These metal-containing
titania films produced photoluminescent films with tailorable switching
properties.[24]Further research efforts
should also examine the role of the metal’s chemical nature,
concentration, and oxidation state. For instance, it was observed
that AuCl3 and clusters of Au113+ incorporated into TiO2 influenced both phase purity and
catalytic activity.[38] The reasons why different
phases are observed when a different devitrification agent is observed
remain obscure.
Silica
Crystalline
Phase Control
There are
three common polymorphs of crystalline SiO2: α-quartz,
cristobalite, and tridymite, where α-quartz is the most stable.[16] MIC commonly yields either α-quartz or
cristobalite with many aspects impacting the MIC of silica, including
the morphology of the vitreous material, the type and quantity of
cation used, and the presence of a crystalline interface with the
silica gel (leading to epitaxial crystal growth). SiO2 materials
produced using MIC are presented in Table . Silicates can also occur for certain cations,
particularly if cation concentration in the SiO2 lattice
is too high.[2] Just as in classical crystallization
techniques, the degree of crystallinity will increase by increasing
the time and temperature of the crystallization.[19] The obtained crystalline phase and the ratio of quartz
to cristobalite are also dependent on the calcination time and temperature.
Table 2
Metal-Induced Crystallization Conditions
for Amorphous Silica
devitrification
agent
onset temperature
(°C)
phase
comments
reference
CaCO3
975
α-quartz
peak intensity increases
with calcination temperature
(41)
CaCO3
1100
α-cristobalite
(41)
AgNO3
500
cristobalite
(16)
HAuCl4
950
β-cristobalite
(19)
Au3+ or Na+
900
cristobalite
2.2 wt % Au with 0.6–1.3% Na contained
in the SiO2
(42)
CaCl2, Sr(NO3)2, or BaCl2
800
α-quartz
0.01–0.03 mol % devitrification agent/Si
(3, 4)
MgCl2, CaCl2, SrCl2, and BaCl2
α-quartz
0.1 mol % Mg2+, 0.025 mol % Ca2+, 0.02 mol % Sr2+, and
0.01 mol % Ba2+ in
SiO2
(2)
LiNO3
870
α-quartz
infiltrated with a 0.5 M solution
(43)
MgCl2
1100
α-quartz
0.1 mol % Mg2+
(44)
SrCl2
1000
α-quartz
0.03–0.10 ratio of Sr/SiO2
(45)
Na2O flux
750
cristobalite
SiO2 spheres
contained in a carbon matrix containing the flux
(6)
MIC
in silica is thought to occur via the reorganization of [SiO4] tetrahedra, as is the case for TiO2. In both
the amorphous and crystalline states, the oxygen atoms forming the
vertices are shared by two adjacent tetrahedra.[39] Network modifiers, which are typically mobile cation species,
break the connections between these [SiO4] tetrahedra,
allowing them to freely move to reorganize into a lower energy, crystalline
phase.[39,40]
Impact of Amorphous Silica
Morphology on Crystallization
The morphology of silica can
impact the capacity of MIC in two
ways. The first is the distribution of devitrification agents throughout
the material; the second is related to the ability of the SiO2 to shrink as it crystallizes. Although the ions move through
solid-state silica, mesoporosity allows a homogeneous distribution
of these ions throughout the material before heat treatment begins.
Mesoporosity additionally accommodates volume changes, permitting
the lattice to shrink during crystallization.Garníca-Romo
et al. studied the impact of the amorphous silica structure on crystallization
by changing the H2O/TEOS molar ratio during synthesis.[16] The authors obtained highly crystalline cristobalite
after heat treatment at 800 °C at the relatively low H2O/TEOS molar ratio of 3.5. However, as the quantity of water in the
sol–gel solution increased, the quality of the crystallization
diminished.To study the influence of porosity on the crystallization
behavior,
mesoporous (SBA-15) and nonporous SiO2 (Cab-O-Sil) were
functionalized with gold nanoparticles and treated at 900 °C.[42] SBA-15 crystallized to cristobalite, while Cab-O-Sil
remained amorphous. The authors believe that the difference is due
to the sample’s structure.[42] SBA-15
has thin walls and a large pore volume that would better accommodate
local volume changes upon crystallization. Cab-O-Sil has large grains,
which are more likely to preserve the structure of the amorphous material.Okabayashi et al. attempted the crystallization of spherical particles
with three different spatial distributions of calcium (Figure ).[41] When heated to 1000 °C for an hour, only the particles with
Ca placed in the core did not crystallize. The authors concluded that
crystallization must begin at the particle surface.
Figure 5
Diffractograms of spherical particles containing the devitrification
agent partitioned throughout, solely in the shell or solely in the
core. Adapted with permission from ref (41). Copyright 2005 The Chemical Society of Japan.
Diffractograms of spherical particles containing the devitrification
agent partitioned throughout, solely in the shell or solely in the
core. Adapted with permission from ref (41). Copyright 2005 The Chemical Society of Japan.
Nature and Quantity of
the Devitrification
Agent
We previously showed that, among many different cations,
only Sr2+, Ba2+, and Ca2+ demonstrated
epitaxial growth of macroporous α-quartz films on (100) silicon
substrates.[4] To understand the mechanism,
the ratio of Sr2+ to SiO2 was varied and correlated
to the quality and orientation of α-quartz films (Figure a,b).[45] For ratios larger than 0.05, the microstructure is dominated by
α-quartz densification that significantly decreases the mosaicity
of the films (Figure c).
Figure 6
(a) XRD θ–2θ scan results of epitaxial quartz
films with different Sr/SiO2 ratios (RSr). (b) Relationship between the fwhm of rocking curves
of α-quartz (100) and RSr. (c) Influence
of RSr on the area covered by α-quartz.
Adapted with permission from ref (45). Copyright 2019. Accessible via the Royal Society
of Chemistry Creative Commons Attribution 3.0.
(a) XRD θ–2θ scan results of epitaxial quartz
films with different Sr/SiO2 ratios (RSr). (b) Relationship between the fwhm of rocking curves
of α-quartz (100) and RSr. (c) Influence
of RSr on the area covered by α-quartz.
Adapted with permission from ref (45). Copyright 2019. Accessible via the Royal Society
of Chemistry Creative Commons Attribution 3.0.In our work in thin films, we reported testing Li+,
Na+, Sr2+, Mn2+, Fe2+ /Fe3+, Ca2+, Ce3+, and La3+,
where only some of these led to SiO2 crystallization.[4] Of the series of cations that did not induce
silica crystallization,[4] it is likely that
at least some of these are able to crystallize silica but that the
conditions were not suitable. We showed that, in the crystallization
of hollow silica particles using alkaline earth metals, the minimum
salt concentration needed to induce crystallization decreases as the
cation radius increases (Figure ).[2] When the concentration
was suboptimal, residual amorphous silica was present. Higher quantities
of devitrification agent are needed for smaller cations than for larger
ions, as the ratio of nonbridging oxygens/Si in glass increases as
a function of cation size.[46] Venezia et
al. found differing results: for larger atoms, namely, potassium and
cesium, crystallization only occurred with high concentrations of
alkali ions.[5] Moreover, the concentration
of sodium impacted the transition temperature of silica to cristobalite:
the higher the concentration of devitrification agent, the lower was
the temperature of the transition.
Figure 7
Diffractograms and corresponding SEM images
of hollow quartz spheres
produced from different alkaline earth devitrification agents. Adapted
with permission from ref (2). Copyright 2015 The Royal Society of Chemistry.
Diffractograms and corresponding SEM images
of hollow quartz spheres
produced from different alkaline earth devitrification agents. Adapted
with permission from ref (2). Copyright 2015 The Royal Society of Chemistry.Matsuno et al. infiltrated a colloidal crystal of silica
with Li+ and, then, encased the silica spheres in a matrix
of poly(furfuryl
alcohol).[43] Li+ melted the silica
completely, followed by crystallization within a carbon scaffold,
producing a monocrystalline quartz superlattice with grains several
micrometers in size (Figure ). This same group has recently adapted their synthesis method
using NaNO2 dissolved into a phenolic resin to serve as
the carbon scaffold to achieve mesoporous cristobalite.[6]
Figure 8
(a) Diffractograms and corresponding (b) SEM, (c) TEM,
and (d)
selected area electron diffraction images of monocrystalline hollow
quartz spheres. Adapted with permission from ref (43). Copyright 2016. Accessible
via Wiley/VCH Creative Commons Attribution 4.0.
(a) Diffractograms and corresponding (b) SEM, (c) TEM,
and (d)
selected area electron diffraction images of monocrystalline hollow
quartz spheres. Adapted with permission from ref (43). Copyright 2016. Accessible
via Wiley/VCH Creative Commons Attribution 4.0.
Epitaxial Relationships
Silica films
in contact with Si-(100) demonstrate mono-oriented α-quartz
upon MIC (Figure ).[3] The crystalline substrate may suppress the formation
of silicates and crystal phases other than α-quartz, which are
otherwise observed.[2] The crystallization
is not induced by the epitaxial relationship, but the crystal phase
and orientation are selected by the substrate.
Figure 9
Crystallinity in a macroporous
quartz film after MIC using strontium,
as shown using (A) X-ray diffraction, (B) a rocking curve, and (C)
a pole figure. (D) The epitaxial relationship between the silicon
substrate (in gray) and the α-quartz film (in orange) is depicted
using a 3D ball-and-stick model. Reproduced with permission from ref (3). Copyright 2013 AAAS.
Crystallinity in a macroporous
quartz film after MIC using strontium,
as shown using (A) X-ray diffraction, (B) a rocking curve, and (C)
a pole figure. (D) The epitaxial relationship between the silicon
substrate (in gray) and the α-quartz film (in orange) is depicted
using a 3D ball-and-stick model. Reproduced with permission from ref (3). Copyright 2013 AAAS.
Maintaining Structure during
Crystallization
Thanks to MIC, we were able to produce the
first quartz-based nanomaterials
on a substrate via a bottom-up synthesis (Figure ).[3] Silica with
three different pore morphologies spanning from mesopores to macropores
were prepared and then crystallized on a silicon substrate using either
Sr2+ or Ba2+ to induce crystallization. Crystallization
started in the silica top-layer and, then, propagated into the silicon
substrate as the substrate oxidized, creating a quartz layer of tunable
thickness. The macropores and the larger mesopores of ∼30 nm
maintained their structure upon crystallization, whereas the smaller
mesopores produced crystal domains with a trapezoidal habit.
Figure 10
(A, D, G)
SEM images of amorphous silica films and (B, E, H) AFM
images of crystalline α-quartz structured thin films after the
MIC. (C, F, I) Diagram of the morphology of the crystalline thin film.
Reproduced with permission from ref (3). Copyright 2013 AAAS.
(A, D, G)
SEM images of amorphous silica films and (B, E, H) AFM
images of crystalline α-quartz structured thin films after the
MIC. (C, F, I) Diagram of the morphology of the crystalline thin film.
Reproduced with permission from ref (3). Copyright 2013 AAAS.To probe the range of mesopores that could be retained, we used
several PB–PEO diblock copolymers as templating agents to make
amorphous silica films with varying wall thicknesses and mesopore
diameters (Figure ). These were then crystallized by infiltrating the mesopores with
an alkaline earth metal salt and heating in a furnace. Pores larger
than 25 nm were retained upon crystallization.[47] In samples where the mesoporosity was preserved upon crystallization,
the d-spacing of the original silica film was maintained (Figure ). Typically, mesopore
structures are lost during the crystallization of silica due to the
relatively slow nucleation rate followed by the extremely fast growth
rate of quartz,[48] which generates crystallites
much larger than the original pore structures. However, we have observed
that the MIC method often generates smaller crystallite sizes than
those produced via high temperature calcination.
Figure 11
Large mesopores remain
intact upon MIC using either Ba2+ or Sr2+ of
structured silica films. Reproduced with permission
from ref (47). Copyright
2014 The Royal Society of Chemistry.
Large mesopores remain
intact upon MIC using either Ba2+ or Sr2+ of
structured silica films. Reproduced with permission
from ref (47). Copyright
2014 The Royal Society of Chemistry.In addition to curvature, wall thickness also likely affects the
ability to conserve the mesopore structure during crystallization.
Thus, we studied whether or not very thin walls (10 nm) permitted
structural preservation during MIC.[2] In
the absence of mesoporosity, the heat treatment time needed to be
tripled to achieve crystallization. However, even with SiO2 wall thicknesses below 10 nm, the macropore structure remained upon
transformation into a crystalline phase.We further studied
morphological preservation in structured nanoparticles
here, exploring the impact of the metal ion radius on crystallization
behavior (Figure ).[2] During the crystallization process,
the mesopores in the silica wall, having a diameter of several nanometers,
lost their structure to produce a densified 20 nm shell around a hollow
center (∼80 nm). The progressive collapse of the mesoporosity
with increasing treatment temperature can be observed in the SEM micrographs
and in the disappearance of a hysteresis loop in the nitrogen adsorption–desorption
experiments (Figure ). The shell was polycrystalline with the average crystallite size
depending on the treatment temperature.
Figure 12
SEM (above) and TEM
(below) micrographs of hollow amorphous silica
spheres previously soaked in alkaline metal salt and calcined for
5 h under air at (a) 800 °C (purple), (b) 900 °C (orange),
and (c) 1000 °C (green). (d) Nitrogen sorption isotherms of particles
calcined at 800, 900, and 1000 °C. (e) X-ray diffraction patterns
showing the change in pattern intensity with crystallization temperature.
Reproduced with permission from ref (2). Copyright 2015 The Royal Society of Chemistry.
SEM (above) and TEM
(below) micrographs of hollow amorphous silica
spheres previously soaked in alkaline metal salt and calcined for
5 h under air at (a) 800 °C (purple), (b) 900 °C (orange),
and (c) 1000 °C (green). (d) Nitrogen sorption isotherms of particles
calcined at 800, 900, and 1000 °C. (e) X-ray diffraction patterns
showing the change in pattern intensity with crystallization temperature.
Reproduced with permission from ref (2). Copyright 2015 The Royal Society of Chemistry.
Material Fabrication
The major advantage
of MIC is the ability to retain a complex and delicate morphology
upon crystallization. Putz et al. were able to 3D print hierarchically
porous silica into a lattice-like scaffold structure.[44] The mesoporosity was then infiltrated using a MgCl2 solution and then calcined, crystallizing to α-quartz
(Figure ).
Figure 13
(a) Low quartz
printed into a 3D scaffold. (b) Retention of the
macroporous network upon crystallization. (c) X-ray diffraction of
the crystalline scaffold. Reproduced with permission from ref (44). Copyright 2018. Accessible
via Wiley/VCH Creative Commons Attribution 4.0.
(a) Low quartz
printed into a 3D scaffold. (b) Retention of the
macroporous network upon crystallization. (c) X-ray diffraction of
the crystalline scaffold. Reproduced with permission from ref (44). Copyright 2018. Accessible
via Wiley/VCH Creative Commons Attribution 4.0.The MIC of silica films leads to epitaxial crystallization of the
silica phase thanks to the small mismatch with the crystalline silicon
substrate. Patterned substrates are no different. Zhang et al. have
shown that silica xerogels containing a small amount of SrCl2 can be patterned using soft imprint lithography (Figure ).[45] All of the pillars produced on the substrate contained the same
crystallographic phase. There are other methods to micropattern quartz
surfaces, and of these, the thinnest quartz crystals are about 10
μm.[49] However, when a patterned silica
film is crystallized using MIC, α-quartz films as thin as 200
nm are possible, allowing the operating frequency of the material
to be 50 times higher than previously fabricated devices.[49]
Figure 14
(a, b) Crystallized, epitaxial α-quartz pillars
organized
on a silicon substrate produced using soft imprint lithography. (c)
TEM image and electron diffraction of a monocrystalline pillar. (d)
X-ray diffractogram showing the (100) α-quartz crystallographic
orientation. (e) Synthetic protocol. Reproduced with permission from
ref (45). Copyright
2019. Accessible via the Royal Society of Chemistry Creative Commons
Attribution 4.0.
(a, b) Crystallized, epitaxial α-quartz pillars
organized
on a silicon substrate produced using soft imprint lithography. (c)
TEM image and electron diffraction of a monocrystalline pillar. (d)
X-ray diffractogram showing the (100) α-quartz crystallographic
orientation. (e) Synthetic protocol. Reproduced with permission from
ref (45). Copyright
2019. Accessible via the Royal Society of Chemistry Creative Commons
Attribution 4.0.The ability to retain
the mesostructure and use epitaxy to select
for a particular phase orientation is interesting in terms of the
piezoelectric properties of silica. The piezoelectric response in
α-quartz films can be measured using piezoelectric force microscopy[4] and direct piezoelectric force microscopy.[50] When direct piezoelectric force microscopy was
used, the first direct measurement of the d33 piezoelectric
coefficient in these epitaxial quartz thin films was made.[45] The piezoelectric response was similar to bulk
crystals and homogeneous irrespective of the macrostructuration, demonstrating
structural and functional homogeneity within films grown by MIC.The integration of piezoelectric
quartz onto silicon in the single crystalline form can trigger development
in sensors.[51] Quartz finds a place in many
application areas, ranging from biology to electronics. Its nanostructuration
receives attention due to its piezoelectricity and biocompatibility.
However, the current techniques for quartz-based devices on silicon
substrates are limited in terms of device thickness and their integration,
which directly affects the overall performance and increases the integration
cost. Thanks to the MIC of sol–gel silica films combined with
nanoimprint lithography and microfabrication techniques, the first
α-quartz (100)-based microcantilever device was fabricated on
a silicon–insulator–silicon (SOI) (100) substrate (Figure ).[52,53] The parameters that directly affect the device performance, such
as the crystal quality, piezoelectric functionality, and quality factor
of the quartz, were preserved during the microfabrication process.
These ultrasensitive quartz devices are capable of measuring tiny
masses (<10 pg) or forces through a variation in the resonant frequency.
Figure 15
General
schematic of the microfabrication steps of piezoelectric
nanostructured epitaxial quartz-based micro- and nanoelectromechanical
devices. Reproduced with permission from ref (53). Copyright 2021. Accessible
via Wiley/VCH Creative Commons Attribution 4.0.
General
schematic of the microfabrication steps of piezoelectric
nanostructured epitaxial quartz-based micro- and nanoelectromechanical
devices. Reproduced with permission from ref (53). Copyright 2021. Accessible
via Wiley/VCH Creative Commons Attribution 4.0.
Other Oxides
Alumina
Alumina
is an important material
possessing several crystalline phases of different chemical, electrical,
and mechanical properties. Among them, α-alumina is stable at
high temperatures and therefore widely used in modern industries.
It is usually prepared by the first dehydration of amorphous alumina
at 500 °C to form γ-alumina, followed by an annealing step
at 1100 °C. The temperature of the γ-to-α transition
can be influenced by some cation additives. Although some cations
were found to accelerate the transition (Fe2+, Cu2+, Mn2+, Cr3+, or Ti4+),[54−57] most cations, such as the monovalent (Li+, Na+, Ag+, K+, Rb+, and Cs+)[58,59] or divalent cations (Co2+, Ni2+, Mg2+, Ca2+, Sr2+, and
Ba2+), had no effect or retarded the transition.[56]It has been reported that the addition
of small amounts of specific fluoride salts can decrease the polymorphous
transformation temperature of the α-Al2O3 phase. Živkovic et al. showed that the addition of 2% fluoride
using AlF3, MgF2, and CaF2 decreased
the crystallization temperature by up to 400 °C, whereas alkali
fluoride salts (NaF, LiF, and Na3AlF6) did not
impact the phase transition of aluminum oxide.[60] Whereas Wu et al. found AlF3 and ZnF2 to be effective accelerating agents for the gamma to alpha phase
transformation,[57] Li et al. found contradictory
results: LiF and AlF3 were capable of inducing Al2O3 crystallization at a much lower temperature than the
pure oxide, but ZnF2 did not.[61] Choi et al. later expanded the study of fluoride salts, adding chloride
salts to the devitrification agent mixture.[62] In the case of sodium ions, the chloride salts promoted larger and
more homogeneous crystal growth.
Semiconductor
Oxides
Amorphous semiconductor
oxides, such as ZnSnO3 (ZTO), InGaZnO (IGZO), and InGaO
(IGO), have attracted considerable attention as an alternative to
current silicon-based semiconductors due to their superior properties,
such as high mobility, low-temperature fabrication, good transparency,
and a low leakage current. They have been widely used as key elements
of versatile optoelectronics and are promising candidates for active
materials for high-performance thin-film transistors. However, crystalline
oxide semiconductors are more performant and more likely to meet the
requirements of next-generation optoelectronics, such as higher field
effect mobility. Recently, Jeong’s group demonstrated that
the MIC processes of vacuum-deposited amorphous semiconductors yield
high-quality crystalline ZnSnO3 semiconductors at low temperatures
(Figure a).[63] This achievement was obtained by applying a
tantalum metal capping layer to the back surface of the metal oxide.
During the annealing process, the Ta film oxidizes to form TaOx and
releases electrons to the underlying layer. These electrons weaken
the metal oxide bonds. The bonds eventually break and reform into
a crystalline phase (Figure b). The approach was successfully extended to other oxide
semiconductors, such as InGaZnO,[64] ZnON,[65] and IGO.[66] They all
exhibit improved performances and long-term stability, thanks to the
tantalum oxide layer encapsulation, for applications in the display
industry and flash memory application.[67]
Figure 16
(a) Representation of the IGZO crystallization mechanism induced
by a Ta layer. (b) Cross-sectional TEM images of the IGZO layer with
the Ta layer after thermal annealing layer after thermal annealing
at (top) 200 °C and (bottom) 300 °C under an O2 atmosphere. Selected area electron diffraction patterns near the
top and bottom interface are shown in the insets. Adapted with permission
from ref (64). Copyright
2017. Accessible via Springer Creative Commons Attribution 4.0.
(a) Representation of the IGZO crystallization mechanism induced
by a Ta layer. (b) Cross-sectional TEM images of the IGZO layer with
the Ta layer after thermal annealing layer after thermal annealing
at (top) 200 °C and (bottom) 300 °C under an O2 atmosphere. Selected area electron diffraction patterns near the
top and bottom interface are shown in the insets. Adapted with permission
from ref (64). Copyright
2017. Accessible via Springer Creative Commons Attribution 4.0.
NiO, TiO, and SnO
During an attempt to incorporate a NiO hole-transporting layer into hybrid organic–inorganic
perovskite
solar cells, Hou et al. discovered that the sintering temperature
of a NiO layer could be lowered by 100
°C by embedding it in a Au phase.[35] The metal not only induces amorphous-to-crystalline physical transformation
but also catalyzes the condensation of the sol–gel precursors.
MIC was shown to occur in a variety of sol–gel materials, including
NiO using either Au or Ag; TiO using Ni, Au, or Pt; SnO using Ni.
LiCoO2
LiCoO2 is the most widely used cathode material in thin
film batteries,
which is usually fabricated as amorphous thin films requiring heat
treatment to crystallize and function optimally. Complete crystallization
is achieved at 700 °C, which is too high for microelectronics.
Cho et al. prepared LiCoO2 thin films by deposition using
magnetron sputtering.[68] They demonstrated
that the Al-induced crystallization of LiCoO2 was achieved
at 600 °C and showed better structural and electrochemical properties
than the reference.
MoO3
Cheyns et al. demonstrated
that MoO3 thin films could be used as thickness-tunable
transport layers in organic photovoltaics if doped with small amounts
of metal.[69] The samples were prepared by
thermal evaporation and deposition on a substrate without annealing.
The improved crystallinity enhanced the conductivity with the onset
crystallization temperature being reduced from 450 °C to approximately
room temperature.Seeing the diversity of systems that respond
to MIC, we can conclude that this is a very generalizable phenomenon.
It is worth doing further research to optimize the crystallization
temperature, the degree of crystallinity, and the phase control to
better increase material performance and to produce crystalline temperature-sensitive
hybrid and composite materials.
Conclusions
and Perspectives
MIC is a powerful tool to crystallize amorphous
materials at low
temperature and tackle industrial challenges. It is still a growing
domain in metal oxides, despite its large spread usage in silicon
and germanium crystallization. The basis of the MIC method is that
metal cations result in the recombination of oxide bonds and a large
variety of cations can be used as devitrification agents; however,
the optimum concentration varies as a function of cation size and
oxidation state and the metal oxide. Different cations affect the
temperature of crystallization, the size of crystal domains, and the
crystalline phase(s) obtained. Mixtures of cations can provide fine
control over the mix of different crystal phases.[70] However, the mechanisms involved in MIC are not yet well
enough understood to have a model that predicts the effects of a given
cation on the crystallization temperature of a given oxide. Many different
techniques can be used to provide the energy needed for the phase
transformation, including microwaves, sonochemistry, lasers, and classical
calcination methods. It is possible that, in some of these techniques,
a mixture of crystallization mechanisms occurs simultaneously, for
instance, dissolution–reprecipitation of crystalline phases
in tandem with MIC.One aspect that still needs to be examined
is crystal nucleation
and growth during MIC. There are some instances where a film or a
nanosized object is either perfectly crystalline or completely amorphous.
We have observed this occurrence in thin films where a certain percentage
does not crystallize upon heat treatment, while others are completely
crystalline across the entire thin film.[71] The same is visible in batches of particles where some are crystalline
while others remain amorphous.[1,41]Future research
will certainly focus on hybrid and composite materials.
For instance, a metal oxide could be crystallized on heat sensitive
plastic substrates,[25] or crystallization
could be induced at low temperature in the presence of metals, circumventing
metal melting and dewetting.
Authors: Paul M P Danty; Antoine Mazel; Benoit Cormary; Maria L De Marco; Joachim Allouche; Delphine Flahaut; Javier Jimenez-Lamana; Sabrina Lacomme; Marie-Hélène Delville; Glenna L Drisko Journal: Inorg Chem Date: 2020-04-23 Impact factor: 5.165
Authors: Maria Letizia De Marco; Sanaa Semlali; Brian A Korgel; Philippe Barois; Glenna L Drisko; Cyril Aymonier Journal: Angew Chem Int Ed Engl Date: 2018-02-22 Impact factor: 15.336
Authors: A Carretero-Genevrier; M Gich; L Picas; J Gazquez; G L Drisko; C Boissiere; D Grosso; J Rodriguez-Carvajal; C Sanchez Journal: Science Date: 2013-05-17 Impact factor: 47.728
Authors: Adolfo A Mosquera; Jose M Albella; Violeta Navarro; Debabrata Bhattacharyya; Jose L Endrino Journal: Sci Rep Date: 2016-08-30 Impact factor: 4.379