| Literature DB >> 34974520 |
Peisong Wu1,2, Lei Ye3, Lei Tong3, Peng Wang4, Yang Wang1,5, Hailu Wang1,2, Haonan Ge1,2, Zhen Wang1,2, Yue Gu1,2, Kun Zhang1, Yiye Yu1,3, Meng Peng1,3, Fang Wang1, Min Huang1, Peng Zhou6, Weida Hu7,8.
Abstract
With the increasing demand for multispectral information acquisition, infrared multispectral imaging technology that is inexpensive and can be miniaturized and integrated into other devices has received extensive attention. However, the widespread usage of such photodetectors is still limited by the high cost of epitaxial semiconductors and complex cryogenic cooling systems. Here, we demonstrate a noncooled two-color infrared photodetector that can provide temporal-spatial coexisting spectral blackbody detection at both near-infrared and mid-infrared wavelengths. This photodetector consists of vertically stacked back-to-back diode structures. The two-color signals can be effectively separated to achieve ultralow crosstalk of ~0.05% by controlling the built-in electric field depending on the intermediate layer, which acts as an electron-collecting layer and hole-blocking barrier. The impressive performance of the two-color photodetector is verified by the specific detectivity (D*) of 6.4 × 109 cm Hz1/2 W-1 at 3.5 μm and room temperature, as well as the promising NIR/MWIR two-color infrared imaging and absolute temperature detection.Entities:
Year: 2022 PMID: 34974520 PMCID: PMC8720310 DOI: 10.1038/s41377-021-00694-4
Source DB: PubMed Journal: Light Sci Appl ISSN: 2047-7538 Impact factor: 17.782
Fig. 1BP/MoS2/Si van der Waals two-color infrared detector concept.
a Schematic of van der Waals two-color infrared photodetector, showing the working mode and external circuit of the photodetector. b Circuit configuration of device to demonstrate the performance of two-color photodetector. c Cross-sectional TEM image showing the bP/MoS2 interface. d Cross-sectional TEM image showing the Si/MoS2 interface. e Simulated energy band diagram with p-Si applied a negative voltage
Fig. 2Two-color performance characterization and colorimetric temperature measurement.
a Dark current characteristics of bP/MoS2 heterojunction photodiode in 300 K without illumination. Inset: the J-V characteristics of the device with or without a 1200 K blackbody source. b Dark current characteristics of Si/MoS2 heterojunction photodiode in 300 K without illumination. Inset: the J-V characteristics of the device with or without a 1200 K blackbody source. c Specific detectivity at different blackbody temperatures. d Normalized spectral response of the two-color photodetector during the back radiation. The 0.7–1.3 μm of the spectrum was measured by a grating spectrometer. The 1.3–4.5 μm of the spectrum was measured by FTIR. All FTIR and laser diode characterization were performed at a bias of 0 V (MWIR) and −0.5 V (NIR). e Specific detectivity as a function of wavelength measured for a bP/MoS2/Si heterojunction at room temperature as well as various commercially available and reported NIR/MWIR two-color photodetectors, including MCT/Si (Kunming Institute of Physics), InGaAs/Si (Hamamatsu K1713-08) and InAsSb/Si (Hamamatsu K1713-003). All FTIR and laser diode characterization was performed at a bias of 0 V. The black line in the figure is the performance limit of photovoltaic devices; the red line is the performance limit of thermoelectric device; the gray box is commercial thermistor. f Left axis, NIR and MWIR signals as a function of photodetector–blackbody distance. Right axis, the relationship between the NIR/MWIR ratio and photodetector–blackbody distance. g NIR/MWIR ratio depends on the blackbody temperature. Red dots show the measured NIR/MWIR ratio in each blackbody temperature
Fig. 3Ultralow crosstalk in bP/MoS2/Si two-color IR photodetector.
a Band diagram and depletion region distribution of heavily doped Si two-color devices in working mode. b Electric field distribution of heavily doped Si two-color devices in working mode. c Photocurrent of heavily doped Si two-color photodetector under a modulated illumination source (λ = 2 μm). Red and blue line are MWIR and NIR photocurrents, respectively. d Band diagram and depletion region distribution of light doped Si two-color devices in working mode. e Electric field distribution of light doped Si two-color devices in working mode. f Photocurrent of light doped Si two-color photodetector under a modulated illumination source (λ = 2 μm). g Photocurrent of light doped Si two-color photodetector under a modulated illumination source (White light) in front radiation mode. h Photocurrent of light doped Si two-color photodetector under a modulated illumination source (White light) in back radiation mode. i Crosstalk performance of bP/MoS2/Si devices and various reported two-color photodetectors
Fig. 4Temporal-spatial coexisting two-color IR imaging.
a Schematic diagram of simultaneous mode two-color imaging system. Inset: optical image of two-color vdWs infrared photodetector. b Photograph of target (carbon fiber heating tube) was captured by a silica-based camera. c Photograph of target (carbon fiber heating tube covered by silicon wafer) was captured by a silica-based camera. d NIR images of objects behind a silicon wafer. The black dotted circle marks the position of the silicon wafer. The white dotted box indicates the location of photocurrent I extraction. e MWIR images of objects behind a silicon wafer. The white dotted circle marks the position of the silicon wafer. The white dotted box indicates the location of photocurrent I extraction