| Literature DB >> 34947690 |
Yu Lu1, Lin Kai1, Qing Yang2, Guangqing Du1, Xun Hou1, Feng Chen1.
Abstract
Nano-structures have significant applications in many fields such as chip fabrications, nanorobotics, and solar cells. However, realizing nanoscale structures on hard and brittle materials is still challenging. In this paper, when processing the silica surface with a tightly focused Bessel beam, the smallest nanohole with ~20 nm diameter has been realized by precisely controlling the interior and superficial interaction of the silica material. An effective surface window assisted nano-drilling (SWAN) mechanism is proposed to explain the generation of such a deep subwavelength structure, which is supported by the simulation results of energy depositions.Entities:
Keywords: Bessel beam; femtosecond nano-fabrication; surface window assisted nano-drilling
Year: 2021 PMID: 34947690 PMCID: PMC8708907 DOI: 10.3390/nano11123340
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1(a) schematic diagram of the Bessel beam assisting the nanofabrication system. The BBO generates a 515 nm laser. A dichroic mirror separates the 1030 and 515 nm lasers. An axicon shapes the 515 nm laser beam into the Bessel beam. Long-focal lens and objective project compress the Bessel beam onto the silica sample. L: lens; DM: dichroic mirror; M: mirror; NDF: neutral density filter; OL: objective lens. (b) Longitude and (c) radial intensity distribution of the Bessel beam. (d) The energy distribution of the center spot Bessel beam along the propagation direction.
Figure 2(a) the scheme of changing the relative position between the Bessel beam and the sample surface; (b–e) scanning electron microscopy (SEM) image of surface morphology (b) at the “original position” and when lowering the sample on the moving stage by (c) 50 nm, (d) 100 nm, and (e) 200 nm along the beam propagation direction; the pulse energy is 0.8 μJ. The scale bar: 100 nm.
Figure 3Simulation results for energy deposition by lowering the sample of (a) 0 nm, (b) 100 nm and (c) 200 nm along the beam propagation direction; tick label unit in (a–c): μm, tick label unit for color bar: J/m3. The 0 nm position corresponds to the surface of the silica sample, (d) Energy deposition along the Bessel beam axis inside silica with different beam locations; green and dashed line: 0 nm; red and solid line: 100 nm; blue and dotted line: 200 nm; black and horizontal line: energy density for boiling.