Pannan I Kyesmen1, Nolwazi Nombona2, Mmantsae Diale1. 1. Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028, South Africa. 2. Department of Chemistry, University of Pretoria, Private Bag X20, Hatfield 0028, South Africa.
Abstract
Copper (II) oxide (CuO) nanostructures were prepared on fluorine-doped tin oxide (FTO) using a three-step heat treatment process in a sol-gel dip-coating method. The precursor used for the dip-coating process was prepared using copper acetate, propan-2-ol, diethanolamine, and polyethylene glycol 400. Dip-coated films in layers of 2, 4, 6, 8, and 10 were prepared by drying each layer at 110 and 250 °C for 10 and 5 min, respectively, followed by calcination at 550 °C for 1 h. The films were applied toward photocatalytic hydrogen evolution from water. The X-ray diffraction (XRD) pattern of the films confirmed the tenorite phase of pure CuO. Raman spectroscopy revealed the 1Ag and 2Bg phonon modes of CuO, confirming the high purity of the films produced. The CuO films absorb significant photons in the visible spectrum due to their low optical band gap of 1.25-1.33 eV. The highest photocurrent of -2.0 mA/cm2 at 0.45 V vs reversible hydrogen electrode (RHE) was recorded for CuO films consisting of six layers under 1 sun illumination. A more porous surface, low charge transfer resistance, and high double-layer capacitance at the CuO/electrolyte interface observed for the films consisting of six layers contributed to the high photocurrent density attained by the films. CuO films consisting of six layers prepared using the conventional two-step heat treatment process for comparative purposes yielded 65.0% less photocurrent at 0.45 V vs RHE compared to similar films fabricated via the three-step heating method. The photocurrent response of the CuO nanostructures prepared using the three-step heat treatment process is promising and can be employed for making CuO for photovoltaic and optoelectronic applications.
Copper (II) oxide (CuO) nanostructures were prepared on fluorine-doped tin oxide (FTO) using a three-step heat treatment process in a sol-gel dip-coating method. The precursor used for the dip-coating process was prepared using copper acetate, propan-2-ol, diethanolamine, and polyethylene glycol 400. Dip-coated films in layers of 2, 4, 6, 8, and 10 were prepared by drying each layer at 110 and 250 °C for 10 and 5 min, respectively, followed by calcination at 550 °C for 1 h. The films were applied toward photocatalytic hydrogen evolution from water. The X-ray diffraction (XRD) pattern of the films confirmed the tenorite phase of pure CuO. Raman spectroscopy revealed the 1Ag and 2Bg phonon modes of CuO, confirming the high purity of the films produced. The CuO films absorb significant photons in the visible spectrum due to their low optical band gap of 1.25-1.33 eV. The highest photocurrent of -2.0 mA/cm2 at 0.45 V vs reversible hydrogen electrode (RHE) was recorded for CuO films consisting of six layers under 1 sun illumination. A more porous surface, low charge transfer resistance, and high double-layer capacitance at the CuO/electrolyte interface observed for the films consisting of six layers contributed to the high photocurrent density attained by the films. CuO films consisting of six layers prepared using the conventional two-step heat treatment process for comparative purposes yielded 65.0% less photocurrent at 0.45 V vs RHE compared to similar films fabricated via the three-step heating method. The photocurrent response of the CuO nanostructures prepared using the three-step heat treatment process is promising and can be employed for making CuO for photovoltaic and optoelectronic applications.
Hydrogen (H2) fuel is a fascinating clean energy alternative
owing to its large power density and release of water as a by-product
upon oxidation. It can be produced using fossil fuels, coal, natural
gas, and renewable sources, among others.[1,2] The
renewable methods of producing hydrogen include the gasification of
biomass[3] and photocatalysis of water.[4] The photocatalytic approach has attracted much
research interest over the years due to the abundance of solar radiation
and water; the raw resources needed for the production of hydrogen
fuel. Crucial to this approach is a semiconductor material that is
capable of capturing a significant portion of the solar radiation
to produce electron–hole pairs in a photocatalytic cell, which
are then utilized in electrolyzing water to yield H2. Many
semiconductors such as Cu2O, CuO, and CdS have been investigated
for use as photocathodes in the photocatalytic cell for water splitting.
The interest in CuO for use as a photocathode in photocatalytic H2 production is mainly because of its ability to harvest a
significant amount of solar radiation in the visible region due to
its small band gap of 1.21–1.7 eV.[5,6] Kushwaha
et al. prepared CuO nanoleaves and reported a photocurrent density
of −1.50 mA/cm2 at 0 V vs Ag/AgCl after applying
the films in photocatalytic water splitting in 0.1 M Na2SO4 electrolyte and under 1 sun illumination.[7] Meanwhile, Xia et al. fabricated CuO nanosheets
and achieved a maximum photocurrent density of 0.12 mA/cm2 at 0 V vs Ag/AgCl in a self-powered PEC device for water splitting.[8]Nanostructured CuO can be prepared using
various methods such as
electrodeposition,[9] sol–gel,[10] chemical vapor deposition,[11] spray pyrolysis,[12] thermal oxidation,[4] and reactive sputtering.[13] Subjecting the deposited films to different heat treatments to produce
CuO nanostructures is one of the key processes common to these methods.
This is key because of the significant role that temperature plays
in the formation of nanostructured materials and its influence on
their properties for photocatalytic applications.[14,15] Among these methods of CuO films preparation, the sol–gel
is a cheap and easily scalable approach.In the sol–gel
method, a chemical precursor solution is
prepared and deposited onto a substrate followed by heat treatment
of the films to produce the nanostructures. The two-step heat treatment
process where the first step is employed to dry the deposited films
(100–150 °C) and a second step is engaged to calcinate
the films at higher temperatures (400–700 °C) has been
mostly used for the preparation of CuO films using the sol–gel
method.[6,10,16] Another heat
treatment process could be introduced in which each layer of the deposited
films is treated at temperatures between 230–350 °C immediately
after drying. This can result in the layer-by-layer formation of a
mixed phase of CuO/Cu2O nanostructures before calcination
to form CuO films.[17,18] The layer-by-layer deposition
of nanostructures has been shown to encourage the columnar growth
of grains, improving electron mobility and film conductivity[19,20] that are vital for photocatalytic applications. Therefore, the systematic
utilization of a three-step heat treatment process for the preparation
of CuO films using the sol–gel method in which the deposited
films are first treated at two different temperatures before calcination
could alter the properties of the films to favor photocatalytic water
splitting.In this research, a three-step heat treatment process
was used
to prepare CuO nanostructures for photocatalytic hydrogen production.
The nanostructured CuO films were prepared on FTO substrates using
the sol–gel dip-coating deposition technique. Dip-coated films
in 2, 4, 6, 8, and 10 layers were prepared by drying each layer using
a two-step method. The films were first dried at 110 °C for 10
min and further treated for 5 min after raising the temperature to
250 °C. The films prepared were annealed at 550 °C for 1
h and allowed to cool naturally to room temperature. The photocatalytic
performance of CuO films consisting of six layers produced a maximum
photocurrent of −2.0 mA/cm2 at 0.45 V vs RHE. CuO
films consisting of six layers prepared using the conventional two-step
heat treatment process (dried at 110 °C and annealed at 550 °C)
for comparative purposes yielded the least photocurrent of −0.7
mA/cm2 at 0.45 V vs RHE. The three-step heat treatment
process for preparing CuO nanostructures developed in this study showed
a promising photoresponse during photocatalytic water splitting and
could be employed for making CuO films for photovoltaic and optoelectronics
applications.
Experimental Section
Precursor Preparation and Film Deposition
The precursor
used for the dip-coating process was obtained by
dissolving 0.25 M of copper acetate in 90% propan-2-ol, 10% diethanolamine,
and polyethylene glycol 400. The copper acetate salt was poured into
propan-2-ol and stirred using a magnetic stirrer for 1 h at room temperature.
Diethanolamine was then added to the mixture and further stirred for
1 h. Lastly, polyethylene glycol 400 was added, and the suspension
was stirred for an additional 1 h to obtain the precursor used for
film deposition.The FTO substrates used for CuO films deposition
were cleaned using acetone, ethanol, and deionized water for 15 min
each and dried with nitrogen gas. The FTO substrate was immersed into
the prepared precursor solution using a PTL-MM01 dip-coater and withdrawn
at the speed of 2 mm/s. The films were first dried on a hot plate
at 110 °C for 10 min; the temperature was raised to 250 °C,
and the films were further heated at that temperature for 5 min. The
same procedure was followed to produce films of 2, 4, 6, 8, and 10
layers, respectively. The films produced were taken into a heating
furnace preheated to 300 °C. The temperature of the furnace was
then raised to 550 °C at the rate of 10 °C/min, calcined
for 1 h, and allowed to naturally cool down to room temperature to
obtain CuO films. CuO films consisting of 2, 4, 6, 8, and 10 layers
were labeled CuO-2L, CuO-4L, CuO-6L, CuO-8L, and CuO-10L, respectively. Figure presents the diagrammatic
illustration of the experimental procedure used for the preparation
of the CuO films. Additional CuO films were prepared following the
same procedure as illustrated in Figure , except that a two-step heat treatment process
was used where the films were only dried and annealed at 110 and 550
°C, respectively, and labeled as CuO-6L-2S. The films were prepared
to compare their structural and photoresponse properties with the
films produced via the three-step heat treatment process.
Figure 1
A schematic
representation of the procedure used for the preparation
of CuO films.
A schematic
representation of the procedure used for the preparation
of CuO films.
Characterization
X-ray diffraction
(XRD) technique was engaged to study the structural properties of
the CuO films using Bruker D2 PHASER-e diffractometer of Cu Kα radiation at 0.15418 nm wavelength. Field-emission
gun scanning electron microscopy (FEG-SEM) was performed using the
Ultrafast 540 instrument to study the surface morphology of the films
and to obtain their cross-sectional images for film thickness estimation.
The FEG-SEM instrument was coupled to an energy-dispersive X-ray spectroscopy
(EDS) setup, which was used to perform elemental mapping on the CuO
film surfaces. The optical absorption of the films was studied using
the CARY 100 BIO UV–Vis (UV–visible) spectrometer. Raman
spectroscopy investigations were conducted on the films using a Jobin
Yvon Horiba TX64000 Raman spectrometer with an Ar excitation laser
of 514 nm.
Electrochemical Measurements
Electrochemical
measurements were done using a VersaSTAT 3F potentiostat from Princeton
Applied Research attached to the PEC cell. The cell consists of Ag/AgCl
in 3 M of KCl, 2 × 2 cm platinum mesh, and the FTO/CuO films
as the reference, counter, and working electrodes respectively, and
NaOH (pH = 13.6) as the electrolyte. Linear sweep voltammetry (LSV)
was conducted on the films under dark and light conditions at the
scan rate of 0.05 V/s to determine the photoresponse of the CuO photocathodes.
The light source used for the measurements was a Newport Oriel LCS
100 solar simulator under A.M1.5G illumination calibrated to 1 sun
intensity with a Newport 91,150 V reference cell. The area of the
CuO photocathodes exposed to light was 0.49 cm2. Electrochemical
impedance spectroscopy (EIS) was done on the photocathodes in the
dark at −0.4 V vs Ag/AgCl between 10,000 to 0.1 Hz and with
a 10 mV excitation amplitude. The results obtained from the EIS measurements
were fitted to an equivalent circuit model using the ZView software.
Mott–Schottky (M-S) measurements were conducted on the photocathodes
at 1000 Hz, AC potential amplitude of 10 mV, and DC potential range
of −0.6 to 0.6 V vs Ag/AgCl in dark conditions. The Nernst
relation in eq was
engaged in converting all the potential against Ag/AgCl reference
to the RHE scalewhere VRHE stands for
the potential in the RHE reference, 0.1976 V
is the estimation that represents the standard potential of Ag/AgCl
vs a normal hydrogen electrode (NHE) at 25 °C, and VAg/AgCl is the potential vs the Ag/AgCl reference electrode
used during the electrochemical measurements.[26,27]
Results and Discussion
Film
Properties
Structural Properties
Structural
properties were extracted from the XRD results of the CuO films presented
in Figure . The prominent
peaks at the (1̅11) and (111) planes were detected in the XRD
patterns of the films, indicating the formation of the tenorite crystal
structure of CuO with lattice parameters a = 4.64
Å, b = 3.4 Å, c = 5.09
Å, and β = 99.5° in line with JCPDS no.
05-0661. Other weak peaks of CuO were observed at the (110), (112),
(202), and (220) planes. Diffraction peaks of copper (Cu) and other
phases of its oxides were not seen in the XRD patterns, implying the
synthesis of CuO films of high quality. The intensity of the CuO diffraction
peaks increases with the number of deposited layers, which is an indication
of increasing film thickness.[21] The Debye–Scherrer
method was used to extract the crystal size (D) of the films using
the peak at (1̅11) in line with the formula D = 0.9λ/β cos θ, where λ is the wavelength,
β represents the full width at half maximum, and θ is
the diffraction angle. The films revealed crystal sizes in the range
of 19.31–20.65 nm. Increasing the film thickness through the
deposition of additional film layers and following the three-step
heat treatment approach adopted for the CuO preparation did show any
effect on their crystal size.
Figure 2
XRD results of CuO films consisting of the different
numbers of
film layers.
XRD results of CuO films consisting of the different
numbers of
film layers.The XRD pattern of sample CuO-6L-2S
prepared using the two-step
heat treatment process is presented in Figure S1. The films also revealed prominent peaks of CuO at the (1̅11)
and (111) planes. Similarly, the Debye–Scherrer method was
used to obtain the approximate crystal size (D) of
the films. A crystal size value of 16.95 nm was estimated for the
films, representing a 12% decrease compared to the values obtained
for CuO films prepared using the three-step heat treatment process.
A plot of the crystal size values for all the CuO films is presented
in Figure . Relatively
uniform crystal size values were observed for CuO films prepared using
the three-step heat treatment process, which decreases for CuO-6L-2S
films fabricated using the two-step heating approach. The increased
crystal size recorded for the films prepared using the three-step
heating approach is attributed to the layer-by-layer heat treatment
of the films at 250 °C. The layer-by-layer deposition of nanostructured
films has been shown to improve crystallization, which can consequently
enhance photocatalytic capabilities.[19,20]
Figure 3
The approximate
crystal size values of CuO films.
The approximate
crystal size values of CuO films.Raman spectroscopy studies done on the CuO films yielded additional
structural information of the films. The results of the Raman spectroscopy
measurements performed on the films are given in Figure and reveal the 2Bg and 1Ag vibrational phonon modes for CuO. The Raman peak
at 291.8 cm–1 is designated to the Ag mode, and the ones at 242.0 and 627.4 cm–1 represent
the Bg modes.[22] Raman peaks
belonging to copper (Cu) or other phases of its oxides were not observed,
affirming the high purity of the fabricated CuO films. The intensities
of all the Raman active peaks obtained for all the films are similar,
which is an indication of similar crystallinity for all the fabricated
CuO films.[23] This agrees with XRD analysis,
where similar crystal size values were obtained for all the CuO films
prepared using the three-step heating process.
Figure 4
Raman spectra of CuO
films consisting of various numbers of film
layers prepared using the three-step heat treatment process.
Raman spectra of CuO
films consisting of various numbers of film
layers prepared using the three-step heat treatment process.
Morphology, Film Thickness,
and Elemental
Mapping
The surface images obtained from the FE-SEM investigation
of the CuO films prepared using the three-step heating process are
presented in Figure a–e for films with 2, 4, 6, 8, and 10 layers, respectively.
The films revealed agglomerated spherical nanoparticles, which are
more compact for samples with two layers. The surface of the films
became less compact with additional film layers, producing the most
porous surface for films consisting of six layers. The grain sizes
of the films were not estimated due to the agglomeration of the particles.
In photocatalytic water splitting, a porous nanostructured morphology
is desirable for improving efficiency because it can promote the separation
of photogenerated charge carriers and can provide more active sites
for redox reactions during photocatalysis.[24,25]Figure f presents
the surface morphology of CuO-6L-2S prepared using the two-step heat
treatment process. The CuO-6L-2S films appeared to consist of more
compact and agglomerated nanoparticles when compared to the surface
morphology of CuO-6L films (Figure c). This could limit its photocatalytic activity during
water splitting.[26−28]
Figure 5
FEG-SEM micrographs of CuO films prepared using the three-step
heat treatment process consisting of (a) 2, (b) 4, (c) 6, (d) 8, and
(e) 10 layers, respectively. (f) Micrograph of CuO-6L-2S fabricated
via the two-step heating approach.
FEG-SEM micrographs of CuO films prepared using the three-step
heat treatment process consisting of (a) 2, (b) 4, (c) 6, (d) 8, and
(e) 10 layers, respectively. (f) Micrograph of CuO-6L-2S fabricated
via the two-step heating approach.The thicknesses of the CuO films produced were estimated from their
cross-sectional views using ImageJ software. Figure a,b shows the cross-sectional view of the
CuO films consisting of 2 and 10, layers, respectively. The cross-sectional
views of all the CuO films prepared using the three-step heating approach
are presented in Figure S2, and their estimated
thicknesses are shown in Table . As expected, the thickness of the films increases with the
number of deposited film layers. For efficient light absorption and
charge transport, an optimal film thickness will be paramount for
achieving better photocatalytic reactions.[9,29]
Figure 6
FEG-SEM
cross-sectional views of CuO films consisting of (a) 2
and (b) 10 layers, respectively.
Table 1
Film Thickness of Prepared CuO Samples
Consisting of Different Film Layers
sample
film thickness (nm)
CuO-2L
142 ± 15
CuO-4L
264 ± 28
CuO-6L
419 ± 37
CuO-8L
543 ± 52
CuO-10L
690
± 33
CuO-6L-2S
232 ±
36
FEG-SEM
cross-sectional views of CuO films consisting of (a) 2
and (b) 10 layers, respectively.The film
thickness of CuO-6L-2S prepared using the two-step heat
treatment process was extracted from the film’s cross-sectional
view given in Figure S3c and Table . The film thickness of the
CuO-6L-2S sample was 44.6% less than that of the CuO-6L films prepared
using the three-step heating approach despite having the same number
of film layers. The single-step drying of Cu precursor deposited on
FTO and dried at 110 °C in air was not high enough to result
in the formation of some CuO/Cu2O nanostructures. This
may have allowed some of the Cu-based films dried on FTO to dissolve
in the precursor solution during the deposition of subsequent layers,
leading to the decreased film thickness obtained for CuO-6L-2S films.Elemental mapping was performed on samples CuO-2L, CuO-6L, and
CuO-6L-2S to investigate the distribution of the constituent elements
of CuO on the surface of the films. The results are presented in Figure a–c for samples
CuO-2L, CuO-6L, and CuO-6L-2S, respectively. The EDS maps show uniform
distribution of Cu and O on the surface of the films. Tin (Sn) was
also detected in the EDS maps due to the SnO2 content of
the FTO substrates used to deposit the films. More Sn was detected
in CuO-2L and CuO-6L-2S samples, as seen in their EDS maps, due to
their reduced film thicknesses relative to CuO-6L films (Table ).
Figure 7
The EDS maps of (a) CuO-2L,
(b) CuO-6L, and (c) CuO-6L-2S films,
respectively.
The EDS maps of (a) CuO-2L,
(b) CuO-6L, and (c) CuO-6L-2S films,
respectively.
Optical
Properties
UV–Vis
studies done on the films yielded the absorption spectra and optical
band gaps of the CuO nanostructures prepared using the three-step
heating approach. Figure presents the absorption spectra of the CuO samples. The films
exhibited impressive absorption in the visible spectrum, absorbing
significant photons at wavelengths between 400 and 700 nm. Natural
solar radiation is estimated to consist of 52% infrared radiation
(700–2500 nm), 43% visible light (400–700 nm), and 5%
ultraviolet (300–400 nm).[30] Therefore,
the absorption region of the CuO films prepared is very desirable
for application in photocatalytic hydrogen production. The absorbance
of the films increases with the number of layers because of the higher
atomic concentration resulting from increasing film thickness.
Figure 8
UV–Vis
absorption spectra of CuO films consisting of the
different numbers of film layers.
UV–Vis
absorption spectra of CuO films consisting of the
different numbers of film layers.The Tauc approximation was used to extract the indirect and direct
band gaps of the films[22] that are shown
in Figure a,b. The
optical indirect band gap of the CuO films ranges between 1.25–1.33
eV, which was lower than the values reported by several authors for
the films.[9,31−33] The low band gap obtained
for the CuO films makes them suitable for photocatalytic applications.
Before the final heat treatment of the films at 550 °C, each
of the film’s layers was dried at 110 and 250 °C. Treating
each layer at 250 °C is enough for the formation of the CuO/Cu2O composite nanostructure, which gets oxidized to pure CuO
with the third heat treatment at 550 °C. The layer-by-layer deposition
of the nanostructured films during the second heat treatment process
may have encouraged the columnar growth of the grains and improved
crystallization. These may have led to a reduction in the number of
scattering centers for light and increased its attenuation coefficient,
resulting in improvement in light absorption and consequently decreasing
the band gap of the CuO films produced.[34] The indirect band gap of 2.18 ± 0.03 was estimated for the
CuO films, which was also lower than some reported values in the literature.[32,33]
Figure 9
Estimated
(a) indirect and (b) direct optical band gaps of the
CuO films prepared using the three-step heat treatment process.
Estimated
(a) indirect and (b) direct optical band gaps of the
CuO films prepared using the three-step heat treatment process.
Electrochemical Studies
Photocurrent Density Measurements
The photocurrent
densities of the CuO photocathodes were obtained
from the negative linear voltammetry scan conducted on the films in
dark and light conditions, and the results are given in Figure a for films prepared
using the three-step heat treatment process. The least photocurrent
value of −1.1 mA/cm2 at 0.45 V vs RHE was obtained
for films with two layers. The low photocurrent is ascribed to the
poor light absorption resulting from the limited thickness of the
films and the compact nature of the nanoparticles at the film’s
surface, which caused poor charge separation and reduced photocatalytic
efficiency. The maximum photocurrent density of −2.0 mA/cm2 at 0.45 V vs RHE was attained for films with six layers.
The highest photocurrent density attained for the pristine CuO films
was well above many photoresponses that have been reported for the
films at that potential and illumination condition.[9,25,35−38]Table compares the maximum photocurrent attained
by the CuO films in this project with other reported values in the
literature. The enhanced photocurrent obtained for the films with
six layers in this project is largely related to the porous nature
of the film’s surface, which created a larger area and increased
active sites for water reduction reactions, thus enhancing the photocurrent.
In addition, the thickness of the films with six layers may have been
optimal for both light absorption and charge separation relative to
the other films. A further increase in the number of film layers to
8 and 10, which increases the thickness of the films, resulted in
a decreased photocurrent density at 0.45 V vs RHE. The further increase
in film thickness enhanced photon absorption (Figure ) and the number of photogenerated electron–hole
pairs. However, it did not result in the enhancement of the photocurrent
response. This is attributed to two reasons. First, the carrier diffusion
length of CuO is about 200 nm,[39] and as
a result, the photogenerated charge carriers generated in the bulk
of the thicker films may recombine before getting to the surface to
contribute to the reduction of water. Secondly, the porosity of films
with 8 and 10 film layers appeared to have decreased in comparison
to the ones with six layers as seen in their SEM images (Figure ), which will result
in poor charge separation at the surface, thus reducing their photocurrent.
All the CuO films had similar onset potential (Vonset) for photocurrent at 0.9 V vs RHE, which is more positive
than many reported values in other studies[25,35,36] and is an advantage for their application
in photocatalysis.[25] The flat band potential
that will be discussed in Section and the open circuit voltage (Voc) combines to determine the Vonset of the photocathodes. Larger Voc values are beneficial in reducing the Vonset of a photocathode.[40]
Figure 10
(a)
Photocurrent response of CuO photocathodes with the different
numbers of film layers prepared using the three-step heat treatment
process. (b) Comparison of the photoresponse of CuO-6L-2S fabricated
using the two-step heat treatment approach with those of the CuO-6L
and CuO-2L films.
Table 2
Photocurrent
Density (J) Achieved for Different CuO Photocathodes
of Different Nanostructures
Prepared Using Various Methods
material
and morphology
preparation method
photocurrent density (J)
reference
CuO
nanoparticles
sol–gel dip-coating
–2.0 mA/cm2 at 0.45 V vs RHE, 1 M NaOH electrolyte,
and under 1 sun
this work
CuO
nanowires
facile thermal treatment
–1.4
mA/cm2 at 0 V vs RHE, 1 M Na2SO4 electrolyte,
and under 1 sun (100 mW/cm2)
(35)
CuO nanoparticles
electrodeposition
–0.49
μA/cm2 at −0.55 V vs Ag/AgCl,
1 M KOH electrolyte, and 1 sun
(36)
CuO pyramid structures
electrodeposition
–0.50 mA/cm2 at 1.23 V vs Ag/AgCl, 0.5 M
Na2SO4 electrolyte, and under 1 sun
(9)
CuO nanoparticles
sol–gel dip-coating
–0.94 mA/cm2 at 0 V vs RHE, 1 M Na2SO4 electrolyte, and under 240 mW/cm2 irradiation
(41)
CuO intermingled nanosheets
microwave-assisted
–1.15 mA/cm2 at 0 V vs RHE, 0.1 M Na2SO4 electrolyte, and under 1 sun
(38)
CuO nanoleaves
hydrothermal
–1.50
mA/cm2 at 0 V vs Ag/AgCl, 0.1 M Na2SO4 electrolyte, and under 1 sun
(38)
CuO nanowires
electrodeposition
–1.40
mA/cm2 at −0.4 V vs Ag/AgCl,
1 M NaOH electrolyte, and under 320 mW/cm2 irradiation.
(42)
CuO nanoparticles
thermal condensation
–0.50 mA/cm2 at 0 V vs RHE, 0.1 M Na2SO4 electrolyte, and under 1 sun.
(43)
CuO nanoparticles
electrodeposition
–1.39 mA/cm2 at 0 V vs RHE, 0.1 M Na2SO4 electrolyte, and under 1 sun
(44)
CuO hollow spheres
doctor-blade
–1.47
mA/cm2 at −0.3 V vs Ag/AgCl,
0.5 M Na2SO4 electrolyte, and under 1 sun
(45)
CuO nanoparticles
sol–gel spin-coating
–0.35 mA/cm2 at 0.5 V vs RHE, 0.1 M Na2SO4 electrolyte, and under 1 sun
(29)
CuO nanoparticles
sputtering
–1.68
mA/cm2 at 0 V vs RHE, 0.1 M Na2SO4 electrolyte, and under 1 sun
(46)
(a)
Photocurrent response of CuO photocathodes with the different
numbers of film layers prepared using the three-step heat treatment
process. (b) Comparison of the photoresponse of CuO-6L-2S fabricated
using the two-step heat treatment approach with those of the CuO-6L
and CuO-2L films.The photocurrent density of CuO-6L-2S
films prepared using the
two-step heat treatment process was measured in order to compare its
photoresponse with the ones fabricated using the three-step heating
approach. Figure b presents a comparison of the photocurrent density of CuO-6L-2S,
CuO-6L, and CuO-2L photocathodes. CuO-6L-2S films yielded the least
photocurrent of 0.7 mA/cm2 at 0.45 V vs RHE, which was 65.0% less
than the value attained by CuO-6L films at the same potential. The
thickness of CuO-6L-2S was lower than that of CuO-6L, which may limit
its photon absorption and photocatalytic activity.[9,46] However,
the photocurrent density obtained for CuO-6L-2S is less than the value
achieved for CuO-2L films by 36.4% despite being 63.4% thicker. This
confirmed that the films prepared using the three-step heat treatment
process (CuO-6L and CuO-2L) yielded superior photo response compared
to the ones produced via the two-step heating approach (CuO-6L-2S).
The low photocurrent response of CuO-6L-2S is largely associated with
two major reasons. First, the surface morphology of the films appeared
to be more compact and agglomerated compared to the ones prepared
using the three-step heat treatment process (Figure ) ,which can limit charge separation and
photocatalytic activity.[27] Second, the
poor crystallization of CuO-6L-2L films compared to the ones prepared
using the three-step heating process can limit electron mobility in
the films,[19] which will negatively affect
their photocatalytic efficiency.The solar conversion efficiency
(ηc) of the CuO
films were calculated using eq where Jph (mA/cm2) is the measured photocurrent
density, Vapp is the applied potential
vs RHE in volts
(V), and Pin (mW/cm2) is the
input power of the solar radiation.[47,48] The ηc values estimated for the CuO films are given in Figure . The highest and
lowest ηc values were 1.92 and 0.98% at 0.4 V vs
RHE for the CuO films prepared using the three-step heating approach,
respectively. The conversion efficiency of CuO-6L-2S films prepared
using the two-step heat treatment process was 0.61% at 0.4 V vs RHE.
This was 68.2 and 37.8% lower than the maximum and minimum values
attained by the CuO films fabricated via the three-step heating process
at the same potential, respectively.
Figure 11
The solar conversion efficiency of CuO
films.
The solar conversion efficiency of CuO
films.The proposed energy diagram, band
bending, and charge transport
mechanism of the CuO films in a photocatalytic cell are illustrated
in Figure . When
a p-type semiconductor is immersed into an electrolyte, the transfer
of charges will occur at the surface of the photocathode, resulting
in the system attaining an equilibrium state. The majority charge
carries, which are holes in this case, will be moved from the CuO
films to the oxidized species in the electrolyte. Eventually, the
system will attain equilibrium, and a space charge layer will be formed
at the surface of the films characterized by the depletion of holes.
This will create an electric field in the semiconductor liquid (SCL)
region, which will cause the energy bands to bend downward. The band
bending will lead to the formation of a potential barrier (Ebr) against the movement of holes in the photocathode.[49] During photocatalysis, photoexcited electrons
in the VB of the photocathode will get driven by the electric field
in the SCL to the surface of films to perform the reduction reaction,
while the holes are transferred to the FTO back contact.[7]
Figure 12
Energy diagram and band bending of CuO films in a photocatalytic
cell.
Energy diagram and band bending of CuO films in a photocatalytic
cell.
EIS
Analysis
The impedance response
of the CuO photocathodes was obtained from their EIS studies performed
under dark conditions to understand the charge transport kinetics
that happens at the film’s surface. The EIS response of the
CuO films obtained at 0.6 V vs RHE is represented in the Nyquist plots
given in Figure , with the inset showing the simple Randles circuit used to model
the data obtained. In the circuit model, Rs represents the summation of the resistance of the FTO interface,
the ionic solution, and the external wires that connect the electrodes
to the potentiostat.[50] The constant phase
element (CPE) stands for the capacitance at the photoelectrode/liquid
interface, also known as the double-layer capacitance, and Rct represents the charge transfer resistance
at the CuO/electrolyte interface. The semicircles obtained from the
Nyquist plots of the EIS data appeared to be depressed, which is a
sign of nonideal capacitance that may arise from the nonuniformity
of the CuO film surface.[50,51] Hence, CPE components
were utilized to depict the nonideal capacitive response of the films.
Figure 13
Nyquist
plots of the EIS analysis conducted on CuO photocathodes.
The dashed colored lines show the raw experimental data, gray solid
lines represent the corresponding curves obtained after fitting the
raw EIS data with ZView software, and the inset presents the modeled
equivalent circuit used in fitting the measured EIS data.
Nyquist
plots of the EIS analysis conducted on CuO photocathodes.
The dashed colored lines show the raw experimental data, gray solid
lines represent the corresponding curves obtained after fitting the
raw EIS data with ZView software, and the inset presents the modeled
equivalent circuit used in fitting the measured EIS data.The values extracted for the modeled circuit elements after
fitting
the raw EIS data with ZView is presented in Table . Low series resistance in the range of 8.33–12.88
Ω was obtained for the CuO photocathodes. The CuO films prepared
using the three-step heating approach yielded the least resistance
to charge transfer of 1.71 kΩ at the CuO/electrolyte interface
for films consisting of six layers. This was 3.8 times lower than
the value obtained for films consisting of two layers, which recorded
the highest resistance among films prepared via the three-step heating
process. The compact nature of the grains for films with two layers
limited charge separation and is largely responsible for the high Rct experience by the films. The films with six
layers had the most porous morphology, which provides a wider surface
area for efficient charge separation and more active sites for hydrogen
evolution reaction during water splitting. The highest capacitance
at the photocathode/electrolyte interface was observed for CuO films
with six layers, while those that consisted of two layers produced
the lowest value. High capacitance at the electrode/electrolyte interface
enhances the electrode’s ability to retain charge carriers
at its surface and further reflects the high electrochemical surface
area available for water reduction reactions.[52,53] The decreased charge transfer resistance and the high capacitance
values at the CuO/electrolyte interface recorded by films with six
layers prepared using the three-step heating method are responsible
for the high photocurrent density attained by the films.
Table 3
Approximate Values for Modeled Circuit
Elements after Fitting the Raw EIS Data Recorded for the CuO Films
Using ZView Software
sample
Rs (Ω)
Rct (kΩ)
CPE (μF)
CuO-2L
11.74
6.49
49.97
CuO-4L
12.66
6.29
66.82
CuO-6L
8.33
1.71
194.66
CuO-8 L
9.75
3.51
182.35
CuO-10L
10.07
4.05
172.4
CuO-6L-2S
12.88
6.76
27.1
The CuO-6L-2S films consisting of
six layers and prepared using
the two-step heating process for comparative purposes yielded higher Rct values and lower double-layer capacitance
compared to all the samples prepared via the three-step heating process,
as shown in Figure and Table . The Rct value obtained for sample CuO-6L-2S is 3.78
times more than the resistance recorded for CuO-6L films prepared
via the three-step heating approach. Also, the double-layer capacitance
value of 27.1 μF observed for CuO-6L-2S films increased by 7.2-fold
when the three-step heating approach was adopted. The high Rct and low capacitance values observed for CuO-6L-2S
are responsible for the low photocurrent response attained by the
films (Figure b).
The surface of the CuO-6L-2S films consists of highly compact and
agglomerated nanoparticles (Figure f), which will limit the surface area and the number
of active sites available for hydrogen evolution reaction. This will
inhibit charge separation during photocatalysis and increase the Rct at the film’s surface, leading to
the poor photocatalytic activity observed in the films.The
Bode plots of log |Z| vs log frequency and
phase angle against the log frequency of the CuO films are presented
in Figure a,b. The
plot of log |Z| vs log frequency produced the least
magnitude of log |Z| for films having six layers
prepared using the three-step heating process. A lower log |Z| value implies a drop in the resistance to charge transfer
at the junction between the CuO film and the electrolyte, which also
explains the high photocurrent response attained by the CuO-6L films.
Also, the plot of phase angle vs log frequency showed peaks with the
least negative phase angle for CuO-6L films prepared using the three-step
heating process. This indicates an improvement in the mobility of
charge carriers at the region between the CuO-6L photocathodes and
the electrolyte, which is consistent with the observations in Figure and Table .[9] The Bode plots for sample CuO-6L-2S prepared using the two-step
process for comparative purposes revealed the highest magnitude of
log |Z| and the most negative phase angle in the
plots of log |Z| vs log frequency and phase vs log
frequency, respectively. These results also agree well with the observations
made in the Nyquist plots of the films in Figure and the data in Table .
Figure 14
The Bode plots of (a) log |Z| vs log frequency
and (b) phase angle vs log frequency obtained from the EIS analysis
done on the prepared CuO films.
The Bode plots of (a) log |Z| vs log frequency
and (b) phase angle vs log frequency obtained from the EIS analysis
done on the prepared CuO films.
Mott–Schottky (M-S) Analysis
The
M-S plots obtained from the voltage–capacitance measurements
performed on the CuO films prepared using the three-step heating process
are presented in Figure . The plots exhibited a negative slope for all the CuO photocathodes,
affirming their p-type property and justifying the photocathodic current
response observed for the films in Figure . The flat band potential (Vfb) and charge carrier density (NA) values were deduced from the CuO photocathodes in line with
the M-S relation for a p-type material given in eq (54)where C is
the space charge capacitance, e stands for the electronic
charge, K is the Boltzmann constant, V is the applied voltage, A is the area of the photocathode’s
surface, T is the temperature, ε = 18.1 is
the dielectric constant for CuO films,[55] and ε0 is the vacuum permittivity. The NA values for the photocathodes were extracted
from the slope of the MS plots in line with eq . Also, the Vfb of the CuO films were deduced from the intersection of fitting the
linear portion of the MS plots on the potential axis at 1/C = 0.
Figure 15
MS plots of CuO films consisting of the different
number of film
layers; prepared using the three-step heating approach.
MS plots of CuO films consisting of the different
number of film
layers; prepared using the three-step heating approach.The approximate NA and Vfb extracted from the MS plots of the CuO films
are given
in Table S1. Similar Vfb values of 1.144–1.157 V vs RHE were obtained
for the CuO films prepared using the three-step heating approach,
which explains why identical onset potential for photocurrent was
observed for the films (Figure ). The least charge carrier density of 2.8 × 1020 cm–3 was estimated for CuO films consisting
of two layers, and the maximum value of 18.1 × 1020 cm–3 was obtained for films with eight layers.
Increased charge carrier density can help improve the conductivity
of the films and boost photocatalytic efficiency. However, the surface
properties of the films can play key roles in determining charge transfer
kinetics during photocatalytic reactions. The CuO films prepared are
of different thicknesses. This can help in optimizing photon absorption[9] and maximizing the short minority carrier diffusion
length of CuO films,[39] which can affect
their photocatalytic activity. Therefore, due to the influence of
film thickness and surface properties on photocatalytic water splitting,
a direct correlation of the charge carrier’s density and the
photocurrent response of the films was not observed.
Stability
Chronoamperometry measurements
were performed on samples CuO-6L and CuO-6L-2S prepared using the
three- and two-step heating processes, respectively, at a fixed potential
of 0.6 V vs RHE to study the stability of their photocurrent response
over time. The results are presented in Figure . CuO-6L films were studied because of the
high photocurrent response attained by the films. CuO-6L films retained
over 56.7 and 51% of their photocurrent density after 200 and 300
s, respectively. CuO-6L-2S exhibited similar photocurrent–time
responses with those of CuO-6L, retaining about 53.7 and 47.0% of
their photocurrent after 200 and 300 s, respectively. These results
are comparable with previous observations made on the stability of
pristine CuO films.[35,55] The poor stability exhibited
by the films are attributed to the reduction of CuO to Cu2O by accumulated photogenerated electrons at the film’s surface.[35] Cots et al., in their study, retained less than
5% of photocurrent density for pristine CuO photocathodes during photocatalysis
and recorded a Faraday efficiency of 45% due to photocorrosion.[42] They attributed the photocurrent density obtained
for the films to both photocorrosion and H2 evolution reaction.
In this work, the photocurrent response measured for the CuO films
given in Figure are not entirely due to H2 evolution reaction as part
of the observed current may have been due to photocorrosion.[35,42,56] The photogenerated electrons
will be more useful for proton reduction to H2 during photocatalysis
if photocorrosion in the films is inhibited. The stability of the
CuO films could be improved by the coating of its surface with a thin
layer of activated carbon,[57] deposition
of a protective layer of a more stable metal oxide such as TiO2,[41] and surface decoration with
a metal such as nickel (Ni).[47] The stability
of photoelectrodes in an electrolyte is vital for their application
in photocatalytic hydrogen production.[58,59] Therefore,
in subsequent studies, it will be important to prioritize enhancing
the stability of the CuO films prepared via the three-step heat treatment
process by exploring one or more of the possible ways of limiting
photocorrosion in the films during photocatalysis.
Figure 16
Chronoamperometry study
of samples CuO-6L and CuO-6L-2S prepared
using the three- and two-step heating approaches, respectively.
Chronoamperometry study
of samples CuO-6L and CuO-6L-2S prepared
using the three- and two-step heating approaches, respectively.
Conclusions
Nanostructured
CuO films were prepared on FTO using a three-step
heat treatment process in a sol–gel dip-coating method. Dip-coated
films in 2, 4, 6, 8, and 10 layers were deposited on FTO. Each layer
of the deposited films was subjected to a two-step drying approach
at 110 and 250 °C for 10 and 5 min, respectively. The films were
further treated at 550 °C for 1 h to obtain nanostructured CuO
films that were then applied as photocathodes toward photocatalytic
water splitting for hydrogen production. The XRD pattern of the films
confirmed the tenorite phase of the pure CuO films. Raman spectroscopy
revealed the 1Ag and 2Bg phonon modes of CuO,
further confirming the high purity of the films produced. Low optical
band gap values ranging between 1.25 and 1.33 eV were estimated for
the CuO films, making them suitable for photocatalytic applications.
A maximum photocurrent of −2.0 mA/cm2 at 0.45 V
vs RHE was recorded for CuO films consisting of six layers, while
the least value of 1.1 mA/cm2 was observed for films with
two layers at the same potential under 100 mW/cm2 solar
irradiance at AM 1.5 G condition. CuO films consisting of six layers
prepared using the conventional two-step heat treatment process for
comparative purposes yielded 65.0% less photocurrent at 0.45 V vs
RHE compared to similar films fabricated via the three-step heating
method. CuO films prepared using the three-step heating method and
consisting of six layers were more porous compared to the other films
as revealed by FE-SEM studies, allowing for easier charge separation
of photogenerated charge carriers and leading to the improved photocurrent
observed. EIS analysis revealed the least charge transfer resistance
at the CuO/electrolyte interface for films consisting of six layers
prepared using the three-step heating method, agreeing with the high
photocatalytic response achieved for the films. The stability test
performed on sample CuO-6L showed that the films could only retain
about 56.7% of their photocurrent density after 300 s because of the
photocorrosion of the CuO films. Therefore, the photocurrent response
measured for the CuO films are not entirely due to H2 evolution
reaction, as part of the observed current may have been due to photocorrosion.
Notwithstanding, the three-step heat treatment process for preparing
CuO nanostructures developed in this study showed promising photocatalytic
response and could also be employed for making CuO films for photovoltaic
and optoelectronic applications.
Authors: Zhiliang Wang; Lei Zhang; Tobias U Schülli; Yang Bai; Sabiha Akter Monny; Aiju Du; Lianzhou Wang Journal: Angew Chem Int Ed Engl Date: 2019-10-22 Impact factor: 15.336