| Literature DB >> 34885447 |
Tomasz Rerek1, Beata Derkowska-Zielinska2, Marek Trzcinski1, Robert Szczesny3, Mieczyslaw K Naparty1, Lukasz Skowronski1.
Abstract
Copper layers with thicknesses of 12, 25, and 35 nm were thermally evaporated on silicon substrates (Si(100)) with two different deposition rates 0.5 and 5.0 Å/s. The microstructure of produced coatings was studied using atomic force microscopy (AFM) and powder X-ray diffractometer (XRD). Ellipsometric measurements were used to determine the effective dielectric functions <ε˜> as well as the quality indicators of the localized surface plasmon (LSP) and the surface plasmon polariton (SPP). The composition and purity of the produced films were analysed using X-ray photoelectron spectroscopy (XPS).Entities:
Keywords: microstructure; optical properties; thin copper layers
Year: 2021 PMID: 34885447 PMCID: PMC8658243 DOI: 10.3390/ma14237292
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623