| Literature DB >> 34870978 |
Xi Wan1, EnZi Chen2, Jie Yao1, Mingliang Gao1, Xin Miao1, Shuai Wang1, Yanyun Gu1, Shaoqing Xiao1, Runze Zhan2, Kun Chen2, Zefeng Chen3, Xiaoliang Zeng4, Xiaofeng Gu1, Jianbin Xu5.
Abstract
Janus transition-metal dichalcogenides (TMDCs) are emerging as special 2D materials with different chalcogen atoms covalently bonded on each side of the unit cell, resulting in interesting properties. To date, several synthetic strategies have been developed to realize Janus TMDCs, which first involves stripping the top-layer S of MoS2 with H atoms. However, there has been little discussion on the intermediate Janus MoSH. It is critical to find the appropriate plasma treatment time to avoid sample damage. A thorough understanding of the formation and properties of MoSH is highly desirable. In this work, a controlled H2-plasma treatment has been developed to gradually synthesize a Janus MoSH monolayer, which was confirmed by the TOF-SIMS analysis as well as the subsequent fabrication of MoSSe. The electronic properties of MoSH, including the high intrinsic carrier concentration (∼2 × 1013 cm-2) and the Fermi level (∼ - 4.11 eV), have been systematically investigated by the combination of FET device study, KPFM, and DFT calculations. The results demonstrate a method for the creation of Janus MoSH and present the essential electronic parameters which have great significance for device applications. Furthermore, owing to the metallicity, 2D Janus MoSH might be a potential platform to observe the SPR behavior in the mid-infrared region.Entities:
Keywords: Janus; KPFM; MoS2; MoSH; MoSSe; plasma
Year: 2021 PMID: 34870978 DOI: 10.1021/acsnano.1c08531
Source DB: PubMed Journal: ACS Nano ISSN: 1936-0851 Impact factor: 15.881