Literature DB >> 34540143

Coherent-interface-induced strain in large lattice-mismatched materials: A new approach for modeling Raman shift.

Andrian V Kuchuk1, Fernando M de Oliveira1,2, Pijush K Ghosh3, Yuriy I Mazur1, Hryhorii V Stanchu1, Marcio D Teodoro2, Morgan E Ware1,3, Gregory J Salamo1.   

Abstract

Strain engineering as one of the most powerful techniques for tuning optical and electronic properties of Ill-nitrides requires reliable methods for strain investigation. In this work, we reveal, that the linear model based on the experimental data limited to within a small range of biaxial strains (< 0.2%), which is widely used for the non-destructive Raman study of strain with nanometer-scale spatial resolution is not valid for the binary wurtzite-structure group-III nitrides GaN and AlN. Importantly, we found that the discrepancy between the experimental values of strain and those calculated via Raman spectroscopy increases as the strain in both GaN and AlN increases. Herein, a new model has been developed to describe the strain-induced Raman frequency shift in GaN and AlN for a wide range of biaxial strains (up to 2.5%). Finally, we proposed a new approach to correlate the Raman frequency shift and strain, which is based on the lattice coherency in the epitaxial layers of superlattice structures and can be used for a wide range of materials. Electronic Supplementary Material: Supplementary material (Table S1: Values of bulk phonon deformation potentials and elastic constants for GaN and AlN from each reference used in Table 1, Fig. S1: Lattice parameters of SL layers using Eq. (8), and Fig. S2: Raman mapping using Eq. (7)) is available in the online version of this article at 10.1007/s12274-021-3855-4. © Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature 2021.

Entities:  

Keywords:  III-nitrides; Raman spectroscopy; high-resolution X-ray diffraction (HRXRD); lattice coherency; strain

Year:  2021        PMID: 34540143      PMCID: PMC8436015          DOI: 10.1007/s12274-021-3855-4

Source DB:  PubMed          Journal:  Nano Res        ISSN: 1998-0000            Impact factor:   10.269


Coherent-interface-induced strain in large lattice-mismatched materials: A new approach for modeling Raman shift
  21 in total

1.  Raman-scattering studies of aluminum nitride at high pressure.

Authors: 
Journal:  Phys Rev B Condens Matter       Date:  1993-02-01

2.  Electronic structure and properties of AlN.

Authors: 
Journal:  Phys Rev B Condens Matter       Date:  1994-03-15

3.  Nanoscale Electrostructural Characterization of Compositionally Graded Al(x)Ga(1-x)N Heterostructures on GaN/Sapphire (0001) Substrate.

Authors:  Andrian V Kuchuk; Petro M Lytvyn; Chen Li; Hryhorii V Stanchu; Yuriy I Mazur; Morgan E Ware; Mourad Benamara; Renata Ratajczak; Vitaliy Dorogan; Vasyl P Kladko; Alexander E Belyaev; Gregory G Salamo
Journal:  ACS Appl Mater Interfaces       Date:  2015-10-09       Impact factor: 9.229

4.  Polarization-induced hole doping in wide-band-gap uniaxial semiconductor heterostructures.

Authors:  John Simon; Vladimir Protasenko; Chuanxin Lian; Huili Xing; Debdeep Jena
Journal:  Science       Date:  2010-01-01       Impact factor: 47.728

5.  Electronic structure of GaN with strain and phonon distortions.

Authors: 
Journal:  Phys Rev B Condens Matter       Date:  1994-07-15

6.  Strain-Induced Band Gap Engineering in Selectively Grown GaN-(Al,Ga)N Core-Shell Nanowire Heterostructures.

Authors:  Martin Hetzl; Max Kraut; Julia Winnerl; Luca Francaviglia; Markus Döblinger; Sonja Matich; Anna Fontcuberta I Morral; Martin Stutzmann
Journal:  Nano Lett       Date:  2016-10-24       Impact factor: 11.189

7.  Polarization Effects in Graded AlGaN Nanolayers Revealed by Current-Sensing and Kelvin Probe Microscopy.

Authors:  Petro M Lytvyn; Andrian V Kuchuk; Yuriy I Mazur; Chen Li; Morgan E Ware; Zhiming M Wang; Vasyl P Kladko; Alexander E Belyaev; Gregory J Salamo
Journal:  ACS Appl Mater Interfaces       Date:  2018-02-09       Impact factor: 9.229

8.  Nanoscale Electronic Conditioning for Improvement of Nanowire Light-Emitting-Diode Efficiency.

Authors:  Brelon J May; Matthew R Belz; Arshad Ahamed; A T M G Sarwar; Camelia M Selcu; Roberto C Myers
Journal:  ACS Nano       Date:  2018-04-13       Impact factor: 15.881

9.  Investigation of AlGaN/GaN high electron mobility transistor structures on 200-mm silicon (111) substrates employing different buffer layer configurations.

Authors:  H-P Lee; J Perozek; L D Rosario; C Bayram
Journal:  Sci Rep       Date:  2016-11-21       Impact factor: 4.379

10.  Electron Scattering via Interface Optical Phonons with High Group Velocity in Wurtzite GaN-based Quantum Well Heterostructure.

Authors:  Kihoon Park; Ahmed Mohamed; Mitra Dutta; Michael A Stroscio; Can Bayram
Journal:  Sci Rep       Date:  2018-10-29       Impact factor: 4.379

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