Literature DB >> 34342320

Vanadium, niobium and tantalum complexes with terminal sulfur radical ligands.

Rui Wei1, Jingwen Hu1, Xiuting Chen2, Yu Gong2.   

Abstract

Sulfur radicals terminally bound to the metal center can be considered as the one-electron reduction products of complexes with terminal sulfido ligands which serve as the reactive sites in enzymes and precursors. However, there is limited information regarding this kind of metal stabilized sulfur radical, which contrasts the more commonly known metal stabilized thiyl radical. In this work, we report the preparation of vanadium, niobium and tantalum radical complexes in the form of M(O)(S)F2 from the reactions of laser-ablated metal atoms and SOF2 in cryogenic matrixes. Combined with the results from infrared spectroscopy and density functional theory calculations, the sulfur ligand in M(O)(S)F2 is characterized to be a terminally bound radical with the unpaired electron located on the sulfur 3p orbital. Besides this radical complex, calculations also predict the existence of MF2(η2-SO) with a side-on SO ligand, but this less stable isomer is not observed as a result of high exothermicity along with its formation from metal atoms and SOF2 that is large enough to overcome the energy barrier towards the occurrence of M(O)(S)F2.

Entities:  

Year:  2021        PMID: 34342320     DOI: 10.1039/d1dt01956b

Source DB:  PubMed          Journal:  Dalton Trans        ISSN: 1477-9226            Impact factor:   4.390


  1 in total

1.  Tantalum, easy as Pi: understanding differences in metal-imido bonding towards improving Ta/Nb separations.

Authors:  Alexander B Weberg; Subhajyoti Chaudhuri; Thibault Cheisson; Christian Uruburo; Ekaterina Lapsheva; Pragati Pandey; Michael R Gau; Patrick J Carroll; George C Schatz; Eric J Schelter
Journal:  Chem Sci       Date:  2022-05-12       Impact factor: 9.969

  1 in total

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