| Literature DB >> 34337418 |
Naihao Chiang1,2, Leonardo Scarabelli3, Gail A Vinnacombe-Willson1,2, Luis A Pérez3, Camilla Dore3, Agustín Mihi3, Steven J Jonas2,4,5,6, Paul S Weiss1,2,7,8.
Abstract
Micro- and nanoscale patterned monolayers of plasmonic nanoparticles were fabricated by combining concepts from colloidal chemistry, self-assembly, and subtractive soft lithography. Leveraging chemical interactions between the capping ligands of pre-synthesized gold colloids and a polydimethylsiloxane stamp, we demonstrated patterning gold nanoparticles over centimeter-scale areas with a variety of micro- and nanoscale geometries, including islands, lines, and chiral structures (e.g., square spirals). By successfully achieving nanoscale manipulation over a wide range of substrates and patterns, we establish a powerful and straightforward strategy, nanoparticle chemical lift-off lithography (NP-CLL), for the economical and scalable fabrication of functional plasmonic materials with colloidal nanoparticles as building blocks, offering a transformative solution for designing next-generation plasmonic technologies.Entities:
Year: 2021 PMID: 34337418 PMCID: PMC8323846 DOI: 10.1021/acsmaterialslett.0c00535
Source DB: PubMed Journal: ACS Mater Lett ISSN: 2639-4979