| Literature DB >> 34308034 |
Haiyang Wang1, Jinlong Wang1, Miaomiao Liang1, Zemin He1, Kexuan Li1, Wenqi Song1, Shaopeng Tian1, Wenyuan Duan1, Yuzhen Zhao1, Zongcheng Miao1.
Abstract
NiS/NiO nanoparticles are successfully fabricated through a simple dealloying method and an ion-exchange process. X-ray diffraction demonstrates the existence of NiO and NiS phases, and scanning electron microscopy and transmission electron microscopy imply the nanopore distribution nature and the nanoparticle morphology of the produced material. The electrochemical behaviors are studied by cyclic voltammetry and galvanostatic charge-discharge measurements. The NiS/NiO electrode shows an enhanced specific capacitance of 1260 F g-1 at a current density of 0.5 A g-1. The NiS/NiO//AC device provides a maximum energy density of 17.42 W h kg-1, a high power density of 4000 W kg-1, and a satisfactory cycling performance of 93% capacitance retention after 30,000 cycles.Entities:
Year: 2021 PMID: 34308034 PMCID: PMC8296023 DOI: 10.1021/acsomega.1c01717
Source DB: PubMed Journal: ACS Omega ISSN: 2470-1343
Scheme 1Fabrication Schematic of the NiS/NiO Sample
Figure 1(a) XRD patterns of dealloyed Al91Ni9 calcined at 350 °C and NiS/NiO; XPS spectra of the (b) survey spectrum, (c) Ni 2p, and (d) S 2p of NiS.
Figure 2FESEM and side-view images of (a,b) NiO and (c,d) NiS/NiO, respectively.
Figure 3(a,c) TEM images with different magnifications; (b) SAED and (d) HRTEM images of as-prepared NiS/NiO.
Figure 4Electrochemical characterization of NiS/NiO and NiO electrodes. (a) CV curves of electrodes at 20 mV s–1; (b) GCD profiles of electrodes at 0.5 A g–1; (c) CV curves of the NiS/NiO electrode at 2–50 mV s–1; (d) GCD curves of the NiS/NiO electrode at 0.5–10 A g–1; (e) capacitance of NiS/NiO and NiO electrodes against current density; and (f) Nyquist plots.
Comparison of Electrochemical Properties between the NiS/NiO Electrode and Literature Reports
| electrode | current density (A g–1) | capacitance (F g–1) | electrolyte | synthesis route | references |
|---|---|---|---|---|---|
| NiO/C | 1.0 | 686 | 2 M KOH | sacrificial template-assisted protocol | ( |
| NiO | 2.0 | 1161 | 6 M KOH | template-assisted method | ( |
| C/NiO | 1.0 | 585 | 2 M KOH | chemical-bath deposition | ( |
| ZnO@C@NiO | 1.43 | 677 C/g | 3 M KOH | hydrothermal chemical bath | ( |
| NiO/NiS@CNT | 1.0 | 809.7 | 6 M KOH | microwave method | ( |
| NiS2 | 1.0 | 1020.2 | 6 M KOH | solution route | ( |
| graphene oxide@NiO | 1.0 | 1093 | 6 M KOH | plasma electrolysis | ( |
| NiS/NiO | 0.5 | 1260 | 2 M KOH | dealloying | this work |
| 1.0 | 1055 | ||||
| 2.0 | 960 | ||||
| 5.0 | 727 | ||||
| 10.0 | 650 |
Figure 5(a) Schematic of the assembled HSC configuration adopting the NiS/NiO positive electrode and the AC negative electrode; (b) CV curves of the NiS/NiO and AC electrodes; (c) CV curves of NiS/NiO//AC obtained at 10 mV s–1 in a varied voltage window of 1.4–1.8 V; (d) CV curves of NiS/NiO//AC at 5–30 mV s–1; (e) GCD curves of NiS/NiO//AC at 0.2–5 A g–1; (f) specific capacitance vs. current density curve; and (g) cycling performance of NiS/NiO//AC at 5 A g–1.