| Literature DB >> 34202858 |
Rui D Oliveira1, Ana Mouquinho1, Pedro Centeno1, Miguel Alexandre1, Sirazul Haque1, Rodrigo Martins1, Elvira Fortunato1, Hugo Águas1, Manuel J Mendes1.
Abstract
The pursuit of ever-more efficient, reliable, and affordable solar cells has pushed the development of nano/micro-technological solutions capable of boosting photovoltaic (PV) performance without significantly increasing costs. One of the most relevant solutions is based on light management via photonic wavelength-sized structures, as these enable pronounced efficiency improvements by reducing reflection and by trapping the light inside the devices. Furthermore, optimized microstructured coatings allow self-cleaning functionality via effective water repulsion, which reduces the accumulation of dust and particles that cause shading. Nevertheless, when it comes to market deployment, nano/micro-patterning strategies can only find application in the PV industry if their integration does not require high additional costs or delays in high-throughput solar cell manufacturing. As such, colloidal lithography (CL) is considered the preferential structuring method for PV, as it is an inexpensive and highly scalable soft-patterning technique allowing nanoscopic precision over indefinitely large areas. Tuning specific parameters, such as the size of colloids, shape, monodispersity, and final arrangement, CL enables the production of various templates/masks for different purposes and applications. This review intends to compile several recent high-profile works on this subject and how they can influence the future of solar electricity.Entities:
Keywords: colloidal lithography; light-trapping; photonics; self-cleaning; thin-film photovoltaics
Year: 2021 PMID: 34202858 DOI: 10.3390/nano11071665
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076