Literature DB >> 34074056

Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors.

Chen Chong1, Hongxia Liu1, Shulong Wang1, Shupeng Chen1, Haiwu Xie1.   

Abstract

Tunneling field-effect transistors (TFETS) can reduce the subthreshold swing (SS) to below 60 mV/decade due to their conduction mechanism with band-to-band tunneling (BTBT), thereby reducing power consumption. T-shaped gate tunneling field-effect transistors (TGTFET) adapt double source and T-shaped gates to enhance the on-state current and to generate the tunneling probability. In this paper, TGTFET subjected to heavy-ion irradiation is studied by technology computer-aided design (TCAD) simulation for the first time. The results show that as the drain bias and linear energy transfer (LET) increase, the transient current and collected charge also increase. When LET = 100 MeV·cm2/mg and Vd = 0.5 V, the transient current of TGTFET is as high as 10.63 mA, which is much larger than the on-state current. This means that TGTFET is more sensitive to single-event effect (SEE) than FDSOI. By simulating a heavy-ion strike on different locations in TGTFET, the tunneling junction is the most sensitive region of SEE. This provides guidance for future research on the antiradiation application of TFET-based devices.

Entities:  

Keywords:  T-shaped gate tunneling field-effect transistors (TGTFET); fully depleted silicon on insulator (FDSOI); linear energy transfer (LET); single-event effect (SEE); tunneling field-effect transistors (TFETS)

Year:  2021        PMID: 34074056     DOI: 10.3390/mi12060609

Source DB:  PubMed          Journal:  Micromachines (Basel)        ISSN: 2072-666X            Impact factor:   2.891


  3 in total

1.  Tunnel field-effect transistors as energy-efficient electronic switches.

Authors:  Adrian M Ionescu; Heike Riel
Journal:  Nature       Date:  2011-11-16       Impact factor: 49.962

2.  Infrared Plasmonic Refractive Index Sensor with Ultra-High Figure of Merit Based on the Optimized All-Metal Grating.

Authors:  Ruifang Li; Dong Wu; Yumin Liu; Li Yu; Zhongyuan Yu; Han Ye
Journal:  Nanoscale Res Lett       Date:  2017-01-03       Impact factor: 4.703

3.  Analog/RF Performance of T-Shape Gate Dual-Source Tunnel Field-Effect Transistor.

Authors:  Shupeng Chen; Hongxia Liu; Shulong Wang; Wei Li; Xing Wang; Lu Zhao
Journal:  Nanoscale Res Lett       Date:  2018-10-12       Impact factor: 4.703

  3 in total

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