William Chiappim1,2, Giorgio Testoni1, Felipe Miranda1, Mariana Fraga3, Humber Furlan4, David Ardiles Saravia5, Argemiro da Silva Sobrinho1, Gilberto Petraconi1, Homero Maciel1,6, Rodrigo Pessoa1. 1. Laboratório de Plasmas e Processos, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, Brazil. 2. i3N, Departamento de Física, Universidade de Aveiro, Campus Universitário de Santiago, 3810-193 Aveiro, Portugal. 3. Instituto de Ciência e Tecnologia, Universidade Federal de São Paulo, Rua Talim 330, São José dos Campos 12231-280, Brazil. 4. Centro Estadual de Educação Tecnológica Paula Souza, Programa de Pós-Graduação em Gestão e Tecnologia em Sistemas Produtivos, São Paulo 01124-010, Brazil. 5. Laboratoire TIMA, Université Grenoble Alpes, 38000 Grenoble, France. 6. Instituto Científico e Tecnológico, Universidade Brasil, São Paulo 08230-030, Brazil.
Abstract
The chemical, structural, morphological, and optical properties of Al-doped TiO2 thin films, called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si <100> and commercial SLG glass were discussed. High-quality PEALD TiO2/Al2O3 nanolaminates were produced in the amorphous and crystalline phases. All crystalline nanolaminates have an overabundance of oxygen, while amorphous ones lack oxygen. The superabundance of oxygen on the crystalline film surface was illustrated by a schematic representation that described this phenomenon observed for PEALD TiO2/Al2O3 nanolaminates. The transition from crystalline to amorphous phase increased the surface hardness and the optical gap and decreased the refractive index. Therefore, the doping effect of TiO2 by the insertion of Al2O3 monolayers showed that it is possible to adjust different parameters of the thin-film material and to control, for example, the mobility of the hole-electron pair in the metal-insulator-devices semiconductors, corrosion protection, and optical properties, which are crucial for application in a wide range of technological areas, such as those used to manufacture fluorescence biosensors, photodetectors, and solar cells, among other devices.
The chemicn class="Chemical">al, structural, morphological, and optical properties of Al-dopedTiO2 thin films, called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si <100> and commercialSLG glass were discussed. High-quality PEALDTiO2/Al2O3 nanolaminates were produced in the amorphous and crystalline phases. All crystalline nanolaminates have an overabundance of oxygen, while amorphous ones lack oxygen. The superabundance of oxygen on the crystalline film surface was illustrated by a schematic representation that described this phenomenon observed for PEALDTiO2/Al2O3 nanolaminates. The transition from crystalline to amorphous phase increased the surface hardness and the optical gap and decreased the refractive index. Therefore, the doping effect of TiO2 by the insertion of Al2O3 monolayers showed that it is possible to adjust different parameters of the thin-film material and to control, for example, the mobility of the hole-electron pair in the metal-insulator-devices semiconductors, corrosion protection, and optical properties, which are crucial for application in a wide range of technological areas, such as those used to manufacture fluorescence biosensors, photodetectors, and solar cells, among other devices.
Authors: Saima Ali; Taneli Juntunen; Sakari Sintonen; Oili M E Ylivaara; Riikka L Puurunen; Harri Lipsanen; Ilkka Tittonen; Simo-Pekka Hannula Journal: Nanotechnology Date: 2016-09-27 Impact factor: 3.874