Literature DB >> 34057257

Double-Gate MoS2 Field-Effect Transistors with Full-Range Tunable Threshold Voltage for Multifunctional Logic Circuits.

Jiali Yi1, Xingxia Sun1, Chenguang Zhu1, Shengman Li1, Yong Liu1, Xiaoli Zhu1, Wenxia You1, Delang Liang1, Qin Shuai1, Yanqing Wu2, Dong Li1, Anlian Pan1.   

Abstract

Multifunctional reconfigurable devices, with higher information capacity, smaller size, and more functions, are urgently needed and draw most attention in frontiers in information technology. 2D semiconductors, ascribing to ultrathin body and easy electrostatic control, show great potential in developing reconfigurable functional units. This work proposes a novel double-gate field-effect transistor architecture with equal top and bottom gate (TG and BG) and realizes flexible optimization of the subthreshold swing (SS) and threshold voltage (VTH ). While the TG and BG are used simultaneously, as a single gate to drive the transistor, ultralow average SS value of 65.5 mV dec-1 can be obtained in a large current range over 104 , enabling the application in high gain inverter. While one gate is used to initialize the channel doping, full logic swing inverter circuit with high noise margin (over 90%) is demonstrated. Such device prototype is further extended for designing reconfigurable logic applications and can be dynamically switched and well maintained between binary and ternary logics. This study provides important concept and device prototype for future multifunctional logic applications.
© 2021 Wiley-VCH GmbH.

Entities:  

Keywords:  MoSzzm3219902; double-gate FETs; inverters; reconfigurable​ circuits; ternary logic

Year:  2021        PMID: 34057257     DOI: 10.1002/adma.202101036

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  2 in total

1.  Improving stability in two-dimensional transistors with amorphous gate oxides by Fermi-level tuning.

Authors:  Theresia Knobloch; Burkay Uzlu; Yury Yu Illarionov; Zhenxing Wang; Martin Otto; Lado Filipovic; Michael Waltl; Daniel Neumaier; Max C Lemme; Tibor Grasser
Journal:  Nat Electron       Date:  2022-06-02

2.  Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility.

Authors:  Peng Yang; Jiajia Zha; Guoyun Gao; Long Zheng; Haoxin Huang; Yunpeng Xia; Songcen Xu; Tengfei Xiong; Zhuomin Zhang; Zhengbao Yang; Ye Chen; Dong-Keun Ki; Juin J Liou; Wugang Liao; Chaoliang Tan
Journal:  Nanomicro Lett       Date:  2022-04-19
  2 in total

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