The article presents the results of a study of thiophene oxidation in high-density C4H4S/O2 mixtures (ρThi = 0.12 and 0.15 mol/dm3, ρO2 = 0.74-1.26 mol/dm3), diluted with water vapor and argon (dilution level x D = 35-65% mol), at uniform heating (1 K/min) of a stainless-steel tubular reactor up to 823 K. It is established that the temperature of thiophene oxidation onset weakly depends on the nature of the diluent and the oxygen content in the reaction mixture. From the time dependences of the reaction mixtures on temperature and pressure, it follows that the oxidation of thiophene in the water vapor and argon media proceeds according to the mechanisms of homogeneous and heterogeneous reactions. Upon oxidation of thiophene in the stoichiometric mixtures in argon with a small amount of water vapor, as well as in the lean mixtures in water vapor, the contribution of reactions on the surface of the Pt-Rh/Pt thermocouple, inserted into the center of the reaction volume, is increased. Upon oxidation of thiophene in water vapor in the fuel-enriched and stoichiometric mixtures, reactions on the oxidized surface of the reactor wall (primarily iron oxides) prevail. Increasing the density of water vapor both reduces the contribution of heterogeneous reactions on the reactor wall and prevents complete carbon burnout. It is shown that the neutralization of sulfuric acid, resulting from the oxidation of thiophene, with calcium carbonate reduces the corrosion of stainless steel. The X-ray diffraction analysis revealed the presence of ferrochromite, iron and chromium oxides, iron, nickel, and chromium sulfates in the corrosion products.
The article presents the results of a study of thiophene oxidation in high-density C4H4S/O2 mixtures (ρThi = 0.12 and 0.15 mol/dm3, ρO2 = 0.74-1.26 mol/dm3), diluted with water vapor and argon (dilution level x D = 35-65% mol), at uniform heating (1 K/min) of a stainless-steel tubular reactor up to 823 K. It is established that the temperature of thiophene oxidation onset weakly depends on the nature of the diluent and the oxygen content in the reaction mixture. From the time dependences of the reaction mixtures on temperature and pressure, it follows that the oxidation of thiophene in the water vapor and argon media proceeds according to the mechanisms of homogeneous and heterogeneous reactions. Upon oxidation of thiophene in the stoichiometric mixtures in argon with a small amount of water vapor, as well as in the lean mixtures in water vapor, the contribution of reactions on the surface of the Pt-Rh/Pt thermocouple, inserted into the center of the reaction volume, is increased. Upon oxidation of thiophene in water vapor in the fuel-enriched and stoichiometric mixtures, reactions on the oxidized surface of the reactor wall (primarily iron oxides) prevail. Increasing the density of water vapor both reduces the contribution of heterogeneous reactions on the reactor wall and prevents complete carbon burnout. It is shown that the neutralization of sulfuric acid, resulting from the oxidation of thiophene, with calcium carbonate reduces the corrosion of stainless steel. The X-ray diffraction analysis revealed the presence of ferrochromite, iron and chromium oxides, iron, nickel, and chromium sulfates in the corrosion products.
Depletion of light oil
reserves and increased consumption of motor
fuels lead to the involvement in the processing of heavy oil raw materials
(heavy oil, bitumen, tar, and oil shale), characterized by a high
content of thiophene derivatives.[1−4] The accumulation of waste from the production
and processing of such raw materials causes environmental problems,
in particular, pollution of nearby water areas.[5,6] Incineration
of these wastes by conventional methods leads to the release of SO2 and aerosol particles (primarily soot) into the atmosphere.[7,8] Since these wastes are usually waterlogged, the use of high-density
water vapor or supercritical water (SCW: T > 647
K, P > 22.1 MPa) can become one of the ways of
their
environmentally safe processing.[9,10] The latter, in particular,
is determined by the fact that the final product of oxidation of S-containing
organic substances in an aqueous-oxygen mixture is sulfuric acid.[11,12] It is obvious that for the development of new technologies based
on the combustion of fuels and wastes in dense water vapor or SCW,
it is necessary to obtain data on the oxidation features of the individual
compounds in these media. Oxidation of several hydrocarbons and heteroatomic
compounds was studied earlier.[13−15] The present research is aimed
at identifying the features of thiophene oxidation, as the simplest
aromatic S-containing compound, in an aqueous medium.From the
analysis of the literature, it follows that in the absence
of oxidants, thiophene derivatives are thermally stable. Winkler et al.(16) used GC–MS to
study the composition of thiophene pyrolysis products within the temperature
range of 773–1373 K. It was established that at T < 1073 K, significant fragmentation of the thiophene skeleton
does not occur; only C–H bonds are cleaved, and the resulting
thiophenyl radicals recombine to form di- and terthiophenes as condensation
products. At T > 1173 K, skeleton fragmentation
becomes
more intense and the amount of small S-containing products, such as
CS2 and H2S increases.[16] Katritzky et al.(17) showed
that at 733 K, thiophene does not transform in SCW for 60 min. Patwardhan et al.,[18] when studying the conversion
of thiophene in SCW (673 K, 23.5 MPa, reaction time 31 min, autoclave
with stirrer, weight ratio H2O/C16H34 = 1:1), found that the degree of its desulfurization (the proportion
of sulfur atoms converted into H2S) did not exceed 3–5%.
Qi et al.,[19] when studying
the conversion of thiophene in SCW (673 K, 23.5 MPa, reaction time
60 min, autoclave with stirrer, weight ratio H2O/C14H30 = 1:1) determined that the degree of desulfurization
was equal to 18.8%. According to Timko et al.,[20] the SCW conversion of S-containing compounds
proceeds via the formation of free radicals, while
the transfer of the H atom from the neighboring C–H bond to
the sulfur atom is a limiting stage. Kang et al.,[21] based on the results of thermal decomposition
and SCW conversion of hexyl sulfide and hexanethiol (673 K, 24.7–25.6
MPa, reaction time ≤30 min, autoclave) concluded that water
can act as a H-transfer catalyst and reactant; in the absence of water,
aromatic sulfur compounds such as thiophenes are produced due to the
hydrogen deficiency in thermal decomposition.The results obtained
by Khalil et al.(22) show
that the degree of hydrothermal conversion
of thiophene increases with increasing reaction time (≈72 h),
temperature (393–553 K), and hematite concentration (≈0.1
wt %) but decreases with increasing thiophene/water ratio (from 3:7
to 7:3). Yoshida et al.,[23] when studying the conversion of thiophene in SCW (673 K, 10–60
min exposure time, Hastelloy C-276 alloy autoclave) in the presence
of NaOH (1–5 mol/dm3) and iron powder (≤0.1
mol, 300 mesh), revealed that its complete desulfurization was achieved
at the maximum exposure times and the concentration of additives.
The authors suggested[23] that in the presence
of NaOH, thiophene desulfurization proceeds according to the ionic
mechanism, while in the absence of iron powder, the process is catalyzed
by the reactor wall.Based on the large activation barrier (>125.5
kJ/mol) of direct
oxidation of thiophene by ground-state oxygen, Song et al.(24) concluded that this reaction might
be important only in high-temperature processes. In the presence of
a catalyst, the activation barrier decreases and a high degree of
thiophene conversion can be achieved at moderate temperatures.[25] From the above overview, it follows that the
amount of data on the thiophene oxidation in a water–oxygen
mixture is severely limited, and the mechanisms for the involvement
of water and oxygen in this process are not clearly understood.The present work aims at identifying the effect of the fuel equivalence
ratio and dilution level of the C4H4S/O2 mixture on the mechanisms of thiophene oxidation in water
vapor and argon at uniform slow heating in a context of the high density
of reagents and the diluent. Since argon is an inert diluent, a comparison
of the thiophene oxidation in water vapor and argon will allow revealing
the role of H2O molecules in this process.
Results and Discussion
Taking into account the fact that
the final oxidation product of
S-containing organic compounds in the water medium is sulfuric acid,[11,12] oxidation of thiophene by oxygen is described by the following gross
reactionHere and below, the reference data[26−29] were used in the calculation
of thermochemical quantities; the superscripts (g) and (s) correspond
to the gaseous and solid state of the substance, respectively.In this paper, we investigate the oxidation features of high-density
C4H4S/O2 mixtures diluted with argon
and water vapor. Table shows the partial pressure of reagents and diluents fed into the
reactor, their amount [n0(C4H4S), n0(O2), n0(D), and n0(CaCO3)], the fuel equivalence ratio φ, and the dilution level xD of the mixture. As can be seen, tests were
carried out with rich, stoichiometric, and lean C4H4S/O2 mixtures (φ = 0.80–1.33) at their
dilution level xD ranging from 35 to 64%
mol.
Table 1
Experimental Conditionsa
partial
pressure (MPa)
amount of components
(mmol)
test (diluent)
O2
Ar
n0(C4H4S)
n0(O2)
n0(CaCO3)
n0(D)
φ
xD (% mol)
PR (MPa)c
1 (Ar + H2O)
1.87
3.82
7.6
48.6
100.6 (1.7)b
1.01
64
4.72
2 (Ar + H2O)
2.52
3.85
10.1
65.4
100.4 (1.7)b
1.01
57
3 (H2O)
10.1
50
2.60
4 (H2O)
1.92
10.1
49.5
50
1.33
46
1.26
5 (H2O)
2.52
10.1
65.4
50
1.01
40
1.38
6 (H2O)
3.18
10.1
82.5
50
0.80
35
1.76
7 (H2O)
3.22
10.1
82.0
20.2
50
0.80
35
1.94
8 (H2O)
3.17
10.1
80.9
100
0.81
52
1.62
Here φ = 6.5n0(C4H4S)/n0(O2) is the fuel
equivalence ratio according to
the stoichiometric coefficients of reaction and xD (%) =
100n0(D)/[n0(D) + n0(C4H4S)
+ n0(O2)] is the dilution level
of the C4H4S/O2 mixture.
Residual amount of water in the
heated part of the reactor calculated using the reference data[27] is given in brackets.
PR is
the pressure in the reactor after the end of the test at a temperature
of 298 K.
Here φ = 6.5n0(C4H4S)/n0(O2) is the fuel
equivalence ratio according to
the stoichiometric coefficients of reaction and xD (%) =
100n0(D)/[n0(D) + n0(C4H4S)
+ n0(O2)] is the dilution level
of the C4H4S/O2 mixture.Residual amount of water in the
heated part of the reactor calculated using the reference data[27] is given in brackets.PR is
the pressure in the reactor after the end of the test at a temperature
of 298 K.
Oxidation
of Thiophene in the Argon Medium
in the Presence of a Small Amount of Water Vapor
The oxidation
of thiophene in the argon/water vapor medium was studied in C4H4S/O2 stoichiometric mixtures at their
dilution levels xD = 64 and 57% mol (tests
1 and 2, respectively). Figures a and 2a show the change in
the temperature difference ΔT = Tin – Tout as a function
of time t and temperature Tout during thiophene oxidation in tests 1 and 2, respectively.
Here and below, Tout corresponds to a
given increase in the reactor wall temperature at a rate of 1 K/min,
and Tin is the temperature of the reaction
mixture measured by an internal thermocouple. Note that the initial
and final sections of the curves ΔT(t, Tout) lie in the negative
region of ΔT due to the lag in the temperature
of the reaction mixture from the reactor wall temperature during heating.
Figure 1
Dependence
of the temperature increment ΔT (curve 1) (a),
the pressure P (curve 1′)
of the reaction mixture, and the rate of pressure change dP/dt (curve 1″) (b) on the time t and the set reactor temperature Tout during the oxidation of thiophene in argon with a small
amount of water vapor in test 1 (xD =
64% mol). Time t = 0 corresponds to the start of
reactor heating. The numbers of the curves correspond to the numbers
of tests in Table .
Figure 2
Dependence of the temperature increment ΔT (curve 2) and the pressure P (curve 2′)
of the reaction mixture (a); the temperature of the thermocouples T1–T3 and
the power of the resistive heater W (b) on the time t and set reactor temperature Tout during the oxidation of thiophene in argon with a small amount of
water vapor in test 2 (xD = 57% mol).
The insert shows a scaled-up area of sharp changes in temperature
measured by T1–T3 thermocouples. Time t = 0 corresponds
to the start of reactor heating. The numbers of the curves correspond
to the numbers of tests in Table .
Dependence
of the temperature increment ΔT (curve 1) (a),
the pressure P (curve 1′)
of the reaction mixture, and the rate of pressure change dP/dt (curve 1″) (b) on the time t and the set reactor temperature Tout during the oxidation of thiophene in argon with a small
amount of water vapor in test 1 (xD =
64% mol). Time t = 0 corresponds to the start of
reactor heating. The numbers of the curves correspond to the numbers
of tests in Table .Dependence of the temperature increment ΔT (curve 2) and the pressure P (curve 2′)
of the reaction mixture (a); the temperature of the thermocouples T1–T3 and
the power of the resistive heater W (b) on the time t and set reactor temperature Tout during the oxidation of thiophene in argon with a small amount of
water vapor in test 2 (xD = 57% mol).
The insert shows a scaled-up area of sharp changes in temperature
measured by T1–T3 thermocouples. Time t = 0 corresponds
to the start of reactor heating. The numbers of the curves correspond
to the numbers of tests in Table .Table shows the
following parameters of the curves ΔT(t, Tout) and the reaction mixture: Tout* and Tin* are the temperatures of the reactor wall and
the reaction mixture, respectively, at which oxidation begins; Toutf and Tinf are the temperatures corresponding to the
end of oxidation and reaching the curve of the baseline; tox is the duration of oxidation; Toutmax and Tinmax are the temperatures corresponding to the maximum on the curve ΔT(t, Tout);
ΔTmax is the maximum increase in
the temperature of the reaction mixture; ΣCv is the heat capacity of the reaction mixture at a temperature
of 700 K, calculated using the reference data;[26,27,30] ΔTad is
calculated temperature increment of the reaction mixture due to heat
release during reaction under adiabatic conditions. The calculation method of the above
values is described in detail in some works.[13,14]
Table 2
Characteristic Points of Curves in Figures , 2, 5, and 7 and
Thermodynamic Parameters of the Reaction Mixtures
test (φ; xD)
Tout* (K)
Tin* (K)
Toutf (K)
Tinf (K)
tox (min)
Toutmax (K)
Tinmax (K)
ΔTmax (K)
ΣCv (J/K)
ΔTad (K)
Argon
+ Water Vapor
1 (1.01; 64)
424
419
799
797
375
705
727
23
3.47
6073
2 (1.01; 57)
424
419
607
604
182
534
953
419
4.21
6675
Water Vapor
4 (1.33; 46)
427
421
568
565
142
548
548
0
4.11
5133
5 (1.01; 40)
425
419
614
612
189
532
533
1
4.51
6226
6 (0.80; 35)
424
419
738
736
313
648
844
196
4.92
7137
7 (0.80; 35)
715
713
629
753
124
4.92
7137
8 (0.81; 52)
423
417
717
715
294
632
854
222
6.71
5238
It is obvious that in the context
of the present work, the temperature Tin, recorded by the internal thermocouple, will
be determined by the endothermic evaporation processes of thiophene
and water (the enthalpy of their evaporation at 400 K is ΔHev = 29.0 and 39.3 kJ/mol, respectively),[27,30] endothermic decomposition reactions of thiophene and intermediates,
and exothermic oxidation reactions in the gas phase and on the surface
of the Pt–Rh/Pt thermocouple. The exothermic reactions on the
reactor wall almost do not affect the indications of the thermocouple Tin due to the high heat capacity C = 548 J/kg·K and the thermal conductivity λ = 21 W/m·K
of stainless steel,[31] as well as the stabilizing
effect of the thermoprogrammer, which regulates the reactor heating
by reducing the heater power. Note that under adiabatic conditions,
heat release at complete thiophene oxidation (n0(C4H4S) = 7.6 and 10.1 mmol, Q = 21.1 and 28.0 kJ) in reaction could have led to an increase in the reactor
temperature, whose mass was mr = 3.6 kg,
by ≈ 10.7 and 14.2 K, or the temperature of the gas contained
in the reactor at homogeneous combustion—by several thousand
degrees (Table ).The thiophene oxidation onset temperature in tests 1 and 2 is Tin* = 419 K and does not depend on the dilution level xD (Table ). However, with a further increase in temperature, the thiophene
oxidation dynamics in tests 1 and 2 differ. As can be seen in Figure a, the dependence
ΔT(t, Tout) obtained in test 1 has two maxima at Toutmax = 546
and 705 K (ΔTmax = 14 and 23 K,
respectively). The first maximum on the curve ΔT(t, Tout) corresponds
to the minimum of the pressure change rate dP/dt(t, Tout),
while the second more intense maximum is not reflected in the pressure
change (Figure b).
The pressure drop of the reaction mixture against the background of
an increase in temperature at Tout = 540–552
K is apparently caused by a decrease in the number of reacting species
due to condensation reactions, which is consistent with the data.[16] The formation of condensation reaction products
was indicated, in particular, by the fact that the surface of the
thermocouple (Figure a) and the inner surface of the reactor were covered with a uniform
layer of soot. According to Zhao et al.,[32] the formation and growth of soot particles are
promoted by sulfates formed during the combustion of fuel. It is obvious
that the second maximum on the curve ΔT(t, Tout) is due to the oxidation
of thiophene and/or the products resulting from condensation reactions
directly on the surface of the Pt–Rh/Pt thermocouple, which
does not cause an additional increase in the temperature and pressure
of the reaction mixture. Note that the thermal consumption for heating
the open section of the thermocouple (the junction diameter was 1.0
mm, the diameter and length of the conductors were 0.35 and 12 mm,
respectively) per 100 K were 0.8 J, and corresponded to the heat released
during oxidation of ≈0.4 μmol of thiophene in reaction . The heat capacity
and density of platinum were assumed to be equal to CPt = 132 J/kg·K and ρPt = 21.45
g/cm3.
Figure 3
Photos of the Pt–Rh/Pt thermocouple after tests
1 (a), 2
(b), and 5 (c). Photos were taken by one of the authors.
Photos of the Pt–Rh/Pt thermocouple after tests
1 (a), 2
(b), and 5 (c). Photos were taken by one of the authors.Obviously, the oxidation of thiophene directly on the surface
of
the Pt–Rh/Pt thermocouple results from dissociative adsorption
of thiophene and oxygen on the platinum surface. Stöhr et al.,[33] when studying the transformation
of thiophene on the Pt(111) surface, revealed that the cleavage of
the C–S bond and the formation of a metallocycle intermediate
occur during chemisorption, in which the S atom is replaced by a Pt
surface atom. Using NEXAFS spectroscopy, it was found[34] that the cleavage of the C–S bond begins at 290
K and ends at 470 K; the Pt–S bond remains stable up to 1000
K. Bonzen and Ku,[35] when studying the kinetics
of O2 adsorption on the pure surface of Pt(111) within
the temperature range of 486–673 K, revealed that the initial
sticking coefficient decreases exponentially with increasing coverage.
According to Zyubin et al.,[36] upon adsorption onto the platinum surface, the O2 molecule
forms peroxide, where each oxygen atom is bound to a platinum atom.
When heated, the O–O bond is broken, and the bound oxygen is
stored on the platinum surface.[36] Since
the dissociation energy of the O2 molecule[29] is 498 kJ/mol and the dissociation energy of the Pt–O
bond decreases from 405 to 270 kJ/mol with an increase in the coverage
of platinum with oxygen,[36] the oxidation
of thiophene on the platinum surface occurs at lower activation barrier
than in the gas phase.An increase in the amount of thiophene
and oxygen (a decrease in
the dilution level xD) in test 2 (Table ) led to more intense
oxidation compared to test 1. As can be seen in Figure a, the oxidation of thiophene in test 2 was
accompanied by an explosion. It is obvious that the process was initiated
on the surface of the Pt–Rh/Pt thermocouple and then propagated
into the gas phase. This contributed not only to an increase in the
temperature increment to ΔTmax =
419 K (Tinmax = 953 K) but also to an increase in the
reactor wall temperature above the set value. Figure b shows the dependence of the temperature
of thermocouples T1–T3 and the change in the power of the resistive heater W on time t and set temperature Tout in test 2. It is seen that at the moment
of maximum heat release at Toutmax = 534 K, the temperature
of thermocouples T1, T2, and T3 increased by 8,
15, and 5 K, respectively, relative to the set value. The difference
in the temperature increment of thermocouples T1–T3 results from the different
heat removal and a specific quantity of metal of the reactor parts.
When the temperature of thermocouple T2 increased above the set value, the resistive heater was turned off
(W = 0 W), which, due to the lag effect, has led
the reactor temperature to decrease below the set value of Tout (see the insert in Figure b). The subsequent sharp increase in the
heater power ensured that the reactor reached the set temperature
mode. Based on the fact that the explosion was short-lived and ended
with almost complete burning-out of thiophene [reducing ΔT to the base level (Figure a)], we assumed that in test 2, there was a detonation
of the reaction mixture, which was initiated by the occurrence of
a shock wave in the near-surface region of the Pt–Rh/Pt thermocouple.
The detonation led to the destruction of the ceramic shell of the
thermocouple (Figure b) and damage to the strain gage transducers, which was manifested
in a sharp decrease in its readings after the passage of the shock
wave (Figure a).The results of the mass spectrometric analysis of thiophene oxidation
products, as well as the values of the degree of carbon burnout XC and the carbon balance YC, calculated from these data, are given in Table . Carbon oxides, propene, propanal,
and a residual amount of thiophene were found in the composition of
the products. Obviously, the presence of C3H6 in the products resulted from the decomposition of thiophene on
the platinum surface[33] and the presence
of C2H5CHO as a result of partial oxidation
of propene. The presence of a small amount of O2 and thiophene
in the products is due to their residue in capillary connecting the
reactor to the adjusting valve. A smaller amount of unreacted thiophene
and a larger XC value was obtained in
test 2, where the largest temperature increment ΔTmax was detected (Table ). The maximum loss of carbon (XC = 96.6% mol) was detected in test 1, which is explained by
the significantly larger amount of soot on the thermocouple surface
(Figure a) and the
fact that its annealing was carried out without analysis of gas products
(see Section ).
Table 3
Composition and Amounts of the Products
of Thiophene Oxidation in Argon and Water Vapor (mmol)a
argon + water vapor
water vapor
products
1
2
4
5
6
7
8
Ar
100.6
100.4
O2
0.45
0.40
0.40
0.39
7.57
9.76
3.39
CO
0.30
0.40
0.36
0.27
0.32
0.63
0.23
CO2
26.61
37.46
32.91
36.00
39.17
39.12
37.53
CH3–CH=CH2
0.16
0.21
0
0.01
0.01
0
0.01
CH3–CH2–CHO
0
0.03
0.02
0.02
0.02
0.02
0.03
CH2=CH–COOH
0
0
0.01
0.01
0.02
0
0.01
C4H4S
0.27
0.06
0.06
0.24
0.14
0.05
0.40
XC (mol %)
87.5
92.7
81.5
89.1
97.0
92.9
(CO)R
0.18
0.06
0.12
0.32
0.59
0.13
(CO2)R
0.72
0.81
6.56
1.91
5.25
0.52
YC (mol %)
96.6
98.2
99.7
98.0
99.5
113.5
99.4
Subscript R refers
to substances
produced via annealing the reactor at 873 K for 90
min.
Subscript R refers
to substances
produced via annealing the reactor at 873 K for 90
min.
Oxidation
of Thiophene in the Water Vapor
The transformation of thiophene
in water vapor was studied in the
absence of O2, in rich, stoichiometric, and lean C4H4S/O2 mixtures at a dilution level xD ranging from 35 to 52 mol % (Table ). Figure shows the temperature dependences of the
saturated vapor pressure of water and thiophene, as well as the pressure
of water vapor after its complete evaporation in the isochoric process.
Based on the values of n0(C4H4S) and n0(H2O)
(Table ), the reactor
volume occupied by gas, and the reference P–ρ–T data,[27,37] it is easy to estimate that thiophene
will completely transfer into the gas phase at Tev = 424 K, while water—at Tev = 502 (tests 3–7) and 542 K (test 8). As can be seen in Figure , at T < 444 K, the partial pressure and hence the density of saturated
thiophene vapor is greater than that of water vapor. From these data,
it also follows that part of the heat released during the oxidation
of thiophene will be spent on its evaporation and evaporation of water
up to Tev.
Figure 4
Temperature dependences
of the saturated vapor pressure of water
(1) and thiophene (4), the water vapor pressure corresponding to the
density ρ(H2O) = 0.761 (2) and 1.481 mol/dm3 (3), plotted based on the reference P–ρ–T data.[27,37] The insert shows a scaled-up
temperature range of 350–475 K. The arrows indicate the conditions
corresponding to the complete evaporation of water and thiophene.
Temperature dependences
of the saturated vapor pressure of water
(1) and thiophene (4), the water vapor pressure corresponding to the
density ρ(H2O) = 0.761 (2) and 1.481 mol/dm3 (3), plotted based on the reference P–ρ–T data.[27,37] The insert shows a scaled-up
temperature range of 350–475 K. The arrows indicate the conditions
corresponding to the complete evaporation of water and thiophene.Dependences of the increments of temperature, the
pressure of the
reaction mixture, and the rate of pressure change on time and set
reactor temperature in tests 3–5 are shown in Figure . Here also shown are the dependencies
3° that characterize the behavior of the reaction system in the
absence of thiophene and oxygen (in test 3°, the reactor was
filled with water and nitrogen; see Section ). From a comparison of the dependencies
ΔT(t, Tout), it can be seen (Figure a) that curve 3 is located above curve 3° up to
770 K. Obviously, this is due to the greater thermal conductivity
of the C4H4S/H2O/N2 mixture
than the H2O/N2 mixture. The dip in curve 3,
as well as in curves 4 and 5, within the temperature range of 380–420
K can be associated with the evaporation of thiophene. The smaller
dip in curves 4 and 5 than in curve 3 is the result of the superposition
of endothermic evaporation and exothermic oxidation. The type of dependencies P(t, Tout)
and dP/dt(t, Tout), obtained in test 3 corresponds to a larger
number of species in the gas phase and a higher rate of pressure increase
due to thiophene evaporation at T < 424 K than
in test 3° (Figures b,c). The maximum of the dP/dt derivative (curves 3 and 3°) corresponds to the complete evaporation
of water.
Figure 5
Dependence of the temperature increment ΔT (a), the pressure P of the reaction mixture (b),
and the rate of pressure change dP/dt (c) at time t and the set reactor temperature Tout during gasification (test 3) and oxidation
of thiophene in water vapor in tests 4 and 5 (φ = 1.33 and 1.01,
respectively). Curves 3° characterize the system’s behavior
in the absence of thiophene. Time t = 0 corresponds
to the start of reactor heating. The numbers of the curves correspond
to the numbers of tests in Table .
Dependence of the temperature increment ΔT (a), the pressure P of the reaction mixture (b),
and the rate of pressure change dP/dt (c) at time t and the set reactor temperature Tout during gasification (test 3) and oxidation
of thiophene in water vapor in tests 4 and 5 (φ = 1.33 and 1.01,
respectively). Curves 3° characterize the system’s behavior
in the absence of thiophene. Time t = 0 corresponds
to the start of reactor heating. The numbers of the curves correspond
to the numbers of tests in Table .The gas products formed
in test 3 include the following components
(mmol): H2—0.02, CH4—0.01, CO—0.03,
and CO2—0.12. The absence of H2S in the
composition of volatile products may be due to both its solubility
in water (0.378 wt % at 298 K)[38] and sulfidation
of the reactor wall.[39] The degree of thiophene
conversion (≈0.4% mol), calculated based on the amount of CO2, CO, and CH4, turned out to be an order of magnitude
less than in the works.[18,19] One of the reasons
for this could be the polymerization of thiophene on the surface of
the reactor wall at the initial stage of its heating. As established
by Cheng et al.,[40] upon
adsorption on the iron surface, thiophene loses both H atoms at position
2 relative to the sulfur atom, which leads to its polymerization and
desorption of H2. Harraz et al.(41) observed the formation of a polythiophene layer
on the surface of α-Fe2O3 nanoparticles.
Our assumption is also based on the fact that after opening the reactor,
a dark bloom was detected on its wall (not observed in other tests),
which could be removed only after repeated annealing and mechanical
cleaning.At oxidation of thiophene in water vapor (tests 4
and 5), the temperature
increment ΔTmax was significantly
less than that at oxidation in argon with a small amount of water
vapor (test 2). At the same time, the temperature of the thiophene
oxidation onset in tests 5 and 2 coincided (Tin* = 419 K), while
in test 4, it was slightly higher (Tin* = 421 K) due
to the lower amount of n0(O2) (Tables and 2). An increase in the amount of n0(O2) in test 5 increased the contribution
of homogeneous reactions, as indicated by an increase in the oxidation
time tox and the area under the curve
ΔT(t, Tout) (Figure a). As in tests 3 and 3°, the presence of the first maxima on
the dP/dt(t, Tout) curves (Figure c), obtained in tests 4 and 5, is associated
with complete evaporation of water. The second maxima on curves 4
and 5 at Tout = 703–723 K, respectively,
characterize the oxidation of the products of condensation reactions.
The composition of the oxidation products obtained in tests 4 and
5 was almost the same, except for a larger amount of unburned thiophene
in test 4 [see XC and (CO2)R values in Table ]. In contrast to the results of Khalil et al.,[22] maleic acid and SO2 were
not detected in the products obtained in tests 4 and 5, which is explained
by their further oxidation by a water–oxygen mixture to acrylic
acid (eventually to CO2) and H2SO4, respectively. As can be seen in Figure , the soot particle size in test 5 was larger
than in tests 1 and 2, apparently due to the larger amount of sulfates
formed.[32]Comparison of the thiophene
oxidation in tests 2 and 5, corresponding
to the same amount of n0(C4H4S) and n0(O2)
(Table ), indicates
that the contribution of homogeneous oxidation reactions in water
vapor is significantly less than in argon (Figures a and 5a). This can
be assumed to be caused not only by the higher heat capacity of water
vapor,[27] which prevents the development
of intense combustion, but also by the involvement of H2O molecules in the heterogeneous oxidation of thiophene on the surface
of the reactor wall (the surface of iron oxides). As noted by Khalil et al.,[22] upon the oxidation
of thiophene by lattice oxygen from hematite, the latter is transformed
into magnetite; however, due to interaction with water, magnetite
again is transformed into hematite. A similar conclusion was made
by Hosseinpour et al.(42) based on the research results of the SCW conversion of heavy oil
in the presence of iron oxide nanoparticles. Even though in the present
work, the inner surface of the reactor was annealed in an atmosphere
of O2 (see Section ) to obtain the oxide layer before each test, the formation
of FeO could
also be caused by the oxidation of iron with water[43] or a water–oxygen mixture. Besides, in this work,
the Fe3O4 → Fe2O3 transition could have also occurred in the reaction of magnetite
with molecular or atomic oxygen. Note that both magnetite and hematite
were detected in corrosion products isolated from the reactor after
the end of the tests (see below). This means that in the present study,
heterogeneous catalytic oxidation of thiophene occurred on the surface
of both the Pt–Rh/Pt thermocouple and the reactor wall (iron
oxides) in a Fenton-like process.[44] We
also do not exclude the effect of other metals (e.g., chromium) contained in stainless steel on the oxidation reactions.
However, based on the results of a study of SCW oxidation of aromatic
compounds in the presence of a Cr2O3/Al2O3 catalyst[45] and data
on the stability of Cr2O3 in this process,[46] it follows that the contribution of chromium
oxides to the oxidation of thiophene is secondary.The dependences
of the temperature increment, the pressure of reaction
mixture, and the rate of pressure change on the time and set reactor
temperature in tests 6–8 conducted with the lean C4H4S/O2 mixtures are shown in Figure . Test 7 differs from test
6 by the presence of CaCO3 in the reaction system, while
test 8 differs from test 6 by a twofold increase in the amount of
water. As it follows from the data shown in Figures and 6, the thiophene
oxidation dynamics in tests 6–8 differs from that in tests
4 and 5, primarily by a longer duration of oxidation tox and a larger temperature increment ΔTmax (Table ). It is obvious that the latter proceeds from an increase in the
O2 content in the reaction mixture and, as a consequence,
an increase in the degree of platinum coverage with oxygen, resulting,
according to O’Brein et al.,[47] to increase the oxidation rate. As a result, the maximum
temperature increment in tests 6, 7, and 8 was ΔTmax = 196, 124, and 222 K, respectively. Moreover, in
tests 6 and 8, this increment in temperature was reflected in the
time dependences of pressure (Figures b,c). At the same time, unlike test 2 (Figure b), the reactor wall temperature
did not exceed the set value of Tout.
Figure 6
Dependence
of the temperature increment ΔT (a), the pressure P of the reaction mixture (b),
and the rate of pressure change dP/dt (c) on time t and the set reactor temperature Tout during the oxidation of thiophene in water
vapor in tests 6, 7, and 8 (xD = 35, 35,
and 52% mol, respectively). Time t = 0 corresponds
to the start of reactor heating. The numbers of the curves correspond
to the numbers of tests in Table .
Dependence
of the temperature increment ΔT (a), the pressure P of the reaction mixture (b),
and the rate of pressure change dP/dt (c) on time t and the set reactor temperature Tout during the oxidation of thiophene in water
vapor in tests 6, 7, and 8 (xD = 35, 35,
and 52% mol, respectively). Time t = 0 corresponds
to the start of reactor heating. The numbers of the curves correspond
to the numbers of tests in Table .The lower value of ΔTmax in test
7, than in tests 6 and 8, is explained by the greater contribution
of heterogeneous oxidation of thiophene on the surface of the cell
with CaCO3. We were not able to reliably determine the
oxidation onset temperature Tin* and, accordingly, the duration
of oxidation tox in test 7 due to the
high heat consumption for heating the cell and the predominance of
heterogeneous oxidation, which was not recorded by the Tin thermocouple. Despite the larger amount of water filled
into the reactor, the maximum temperature increment ΔTmax in test 8 was greater, and the flash occurred
at a lower temperature, Toutmax, than in test 6 (Tables and 2). This may be because an increase in the density of water vapor
suppresses heterogeneous reactions on the reactor wall (the metaloxide’s surface) due to the adsorption of water molecules.[48] In general, a comparison of the ΔT(t, Tout)
curves obtained during the oxidation of thiophene in water vapor allows
concluding that with oxygen deficiency and a stoichiometric amount
of O2, reactions on the surface of the reactor wall predominate,
while with an excess of O2, reactions on the surface of
the Pt–Rh/Pt thermocouple become dominant.The results
of the mass spectrometric analysis of gas products
(Table ) show that
an increase in the O2 content in the reaction mixture from
test 4 to test 6 (φ = 1.33–0.80) leads to an increase
in the degree of carbon burnup from 81.5 to 97% mol. However, an increase
in the water density in test 8 contributes to a decrease in the XC value to 92.9%. The largest amount of unreacted
O2 and substances formed during annealing of the reactor
was obtained in test 7, which is due to the presence of a cell with
CaCO3 in the reactor. It is obvious that the excess of
the YC over 100% in test 7 was caused
by the release of CO2 resulting from the neutralization
of sulfuric acid with calcium carbonate. Based on the values of YC and n0(C4H4S), it is easy to calculate that only 54% of the amount
of sulfuric acid formed by reaction has transformed into CaSO4 (Figure ). However, the corrosion of
stainless steel has noticeably decreased.
Figure 7
X-ray diffraction (XRD)
pattern of the sample taken from the cell
after oxidation of thiophene in water vapor and subsequent annealing
of the reactor in test 7 (a). Bar charts show the reference data[51] for (b) calcium carbonate, CaCO3 (monoclinic,
PDF card 04-012-8783); (c) anhydrite, CaSO4 (orthorhombic,
PDF card 00-003-0377).
X-ray diffraction (XRD)
pattern of the sample taken from the cell
after oxidation of thiophene in water vapor and subsequent annealing
of the reactor in test 7 (a). Bar charts show the reference data[51] for (b) calcium carbonate, CaCO3 (monoclinic,
PDF card 04-012-8783); (c) anhydrite, CaSO4 (orthorhombic,
PDF card 00-003-0377).Figure shows the
phase composition of corrosion products formed during the oxidation
of thiophene in water vapor and subsequent annealing of the reactor
in tests 4 and 7. In addition to chromium ferrite, magnetite, hematite,
nickel sulfate, iron sulfate, and hydroxy sulfate, shown in the form
of bar charts in Figure b–g, the following products were detected: chromite, Cr2FeO4 (PDF card 00-024-0512); chromium oxide, Cr2O3 (PDF Card 00-059-0308); and chromium sulfate,
CrSO4 (PDF card 00-021-0244). A comparison of the XRD patterns
obtained in tests 4 and 7 shows that in the latter case, the relative
intensity of the bands corresponding to nickel and iron sulfates is
significantly less. The presence of iron, nickel, and chromium sulfates
in corrosion products can be a consequence of the interaction of sulfuric
acid with both the oxide layer on the surface of the reactor wall
and directly with stainless steel. Studies of corrosion of the nickel
alloy in an aqueous solution of sulfuric acid (T ≤
773 K, P ≤ 38 MPa) have shown[49] that the most intense corrosion occurred in liquid water
at 423–503 K due to the dissolution of the oxide layer; at T > 503 K, the alloy surface was passivated, and the
corrosion
rate significantly decreased. As applied to the results of the present
work, this means that the bulk of iron, nickel, and chromium sulfates
was formed after the end of the test during the cooling of the reactor.
Therefore, the discharge of the hot reaction mixture from the reactor
and/or the addition of neutralizing agents (hydroxides and carbonates
of alkaline or alkaline earth metals) into the reactor will reduce
the corrosion of structural materials.
Figure 8
XRD patterns of corrosion
products resulted during the oxidation
of thiophene in water vapor and subsequent annealing of the reactor
after tests 4 and 7 (a). Bar charts show the reference data[51] for (b) chromium ferrite, CrFeO3 (rhombohedral,
PDF card 04-006-8200); (c) nickel sulfate hydrate, NiSO4·4H2O (monoclinic, PDF vard 00-019-0843); (d) magnetite,
Fe2.964O4 (cubic, PDF card 04-009-2283); (e)
iron sulfate, FeSO4 (orthorhombic, PDF card 04-005-6737);
(f) iron hydroxy sulfate, Fe(SO4)(OH) (orthorhombic, PDF
card 04-012-6256); (g) hematite, Fe2O3 (rhombohedral,
PDF card 04-006-6579).
XRD patterns of corrosion
products resulted during the oxidation
of thiophene in water vapor and subsequent annealing of the reactor
after tests 4 and 7 (a). Bar charts show the reference data[51] for (b) chromium ferrite, CrFeO3 (rhombohedral,
PDF card 04-006-8200); (c) nickel sulfate hydrate, NiSO4·4H2O (monoclinic, PDF vard 00-019-0843); (d) magnetite,
Fe2.964O4 (cubic, PDF card 04-009-2283); (e)
iron sulfate, FeSO4 (orthorhombic, PDF card 04-005-6737);
(f) ironhydroxy sulfate, Fe(SO4)(OH) (orthorhombic, PDF
card 04-012-6256); (g) hematite, Fe2O3 (rhombohedral,
PDF card 04-006-6579).It should be noted that
some features of the thiophene oxidation
in water vapor, detected in this work, were observed by us during
the oxidation of dibenzothiophene under similar conditions.[15] However, due to the greater resistance of dibenzothiophene
to oxidation and the low pressure of its saturated vapor, these features
were manifested poorly, which required further research on the oxidation
of thiophene as the simplest aromatic S-containing compound. This
resulted in obtaining reliable data that broaden the understanding
of the oxidation mechanisms of thiophene derivatives in dense water
vapor.
Conclusions
In this
research, the oxidation of thiophene in argon and water
vapor at high reagent density is studied for the first time. The experimental
method is based on measuring the time dependences of the reaction
mixture temperature using a Pt–Rh/Pt thermocouple inserted
into the center of the reaction volume at uniform slow heating of
the reactor. It is established that the oxidation of thiophene in
the argon and water vapor media proceeds according to homogeneous
(in the volume of the reaction mixture) and heterogeneous (on the
surface of the reactor wall and Pt–Rh/Pt thermocouple) reactions.
In the water vapor medium, under oxygen deficiency and at a stoichiometric
amount of O2, heterogeneous oxidation of thiophene on the
surface of the reactor wall (primarily iron oxides) prevails. The
increase in water vapor density suppresses heterogeneous reactions
on the reactor wall, apparently, due to the adsorption of water molecules.
With an excess of O2 in the water vapor medium and a stoichiometric
amount of O2 in the argon medium, thiophene oxidation dominates
on the surface of the Pt–Rh/Pt thermocouple. In the case of
the high density of the reagents, the latter can lead to detonation
combustion regimes. It is shown that sulfuric acid formed during the
oxidation of thiophene in water vapor causes corrosion of stainless
steel that can be reduced by adding CaCO3. The results
obtained show the need to take into account heterogeneous processes
occurring on the reactor wall when developing technologies for processing
heavy oil raw materials in SCW or dense water vapor, especially in
the case of using concentrated solutions and/or reactors with a large
ratio of the reactor wall surface to its volume.
Materials
and Methods
The experiments were carried out using the test
facility described
in detail in works.[13,14] A schematic sketch of the reactor
is shown in Figure . The reactor (with an internal diameter of 30 mm, a length of 90
mm, and wall thickness of 15 mm) and structural elements were made
of stainless steel (analogue to AISI 321H). The reactor was located
in a cylindrical furnace heated by a resistive heater. The heating
rate was controlled by a thermoprogrammer equipped with a PID controller
and a chromel–alumel thermocouple T2 mounted on the outer wall of the reactor. Additionally, the reactor
temperature was measured by two chromel–alumel thermocouples T1 and T3 located
at its butt ends. The temperature of the reaction mixture Tin was measured by a Pt–Rh/Pt thermocouple
(type S) inserted into the center of the reaction volume through the
butt end of the reactor. The choice of Pt–Rh/Pt thermocouple
to measure temperature was due to its corrosion resistance in an oxidizing
S-containing atmosphere. The Pt–Rh/Pt thermocouple was placed
in a corundum two-channel tube 2 (with an outer diameter
of 3 mm). The open end of the thermocouple protruded from the corundum
tube by 13 mm and was located in the center of the reaction volume.
The pressure of the reagents was measured by a strain gauge transducer
9 (with a measurement limit of 100 MPa). The temperature and pressure
measurement errors were ±0.5 K and ±0.03 MPa, respectively.
Time dependences of temperature and pressure were recorded in the
digital form with a frequency of 10 Hz. Reagents were fed into the
reactor through a capillary 5 welded into the central part of the
reactor sidewall through an adjusting valve 6. The reactor volume
inside the furnace (reaction volume) was 65.7 cm3, while
the reactor volume outside the furnace (the channel for entering the
thermocouple into the reactor and the capillaries connecting the reactor
to the adjusting and shut-off valves) was 1.4 cm3. Before
feeding with reagents, the reactor was evacuated using a prevacuum
pump.
Figure 9
Schematic sketch of the test facility: reactor (1); two-channel
corundum tube (2); thermocouple inserted into the reactor (Tin); measuring thermocouples (T1, T3); controlling thermocouple
(T2); sealing copper gasket (3); a cell
with CaCO3 (4); capillary for the input of reagent (5);
adjusting valve (6); rubber membrane for the input of liquid reagent
(7); shut-off valve (8); strain gauge transducer (9); indicator communicator
to pressure sensor (10).
Schematic sketch of the test facility: reactor (1); two-channel
corundum tube (2); thermocouple inserted into the reactor (Tin); measuring thermocouples (T1, T3); controlling thermocouple
(T2); sealing copper gasket (3); a cell
with CaCO3 (4); capillary for the input of reagent (5);
adjusting valve (6); rubber membrane for the input of liquid reagent
(7); shut-off valve (8); strain gauge transducer (9); indicator communicator
to pressure sensor (10).The following reagents
were used in tests: thiophene (99%, Alfa
Aesar), oxygen (99.95% vol), argon (99.99% vol), nitrogen (99.95%
vol), calcium carbonate (>99.9%), and distilled water. In tests
1
and 2, where argon was used as a diluent of the C4H4S/O2 mixture, the nonheated reactor volumes were
filled with water to prevent condensation of thiophene (the boiling
point Tb = 357.3 K).[30] To do this, water (3.0 cm3) was filled into
the reactor using a syringe through a rubber membrane 7 installed
on the nipple of the reagent supply valve 6 (Figure ). The reactor was then heated to a temperature T2 = 403 K and thermostated for 45 min. During
this time, a certain portion of the water (≈1.4 cm3) was recondensed into nonheated volumes of the reactor. Then, at Tin = 403 K, the excess water was discharged
from the reactor to a pressure of 0.1 MPa (saturated water vapor pressure
at 298 K), which allowed the water to be kept in nonheated volumes.
After cooling the reactor to Tin = 303
K, it was filled with 0.6 or 0.8 cm3 of thiophene (with
a density of 1.059 g/cm3 at 298 K)[26] and then, argon and oxygen to a given pressure.Tests 3°
and 3 were calibration tests performed without adding
O2 to the reaction system. In these tests, N2 was used as a buffer gas since its thermophysical properties[27] are close to those of O2. The amount
of N2 (≈66 mmol) charged into the reactor corresponded
to the amount of O2 required for complete oxidation of
thiophene. In tests 3° and 3, after filling the reactor with
water (1.8 cm3), it was heated to T2 = 403 K and kept at this temperature for 45 min (at that,
a certain portion of the water (≈1.4 cm3) was recondensed
into nonheated volumes). In test 3°, after cooling the reactor
to Tin = 302 K, it was filled with 0.5
cm3 of water and nitrogen to a pressure of 2.52 MPa. In
test 3, after cooling the reactor to Tin = 303 K, 0.8 cm3 of thiophene, 0.5 cm3 of
water, and nitrogen were successively filled to a pressure of 2.58
MPa. In tests 4–8, the reactor filling procedure was similar
to that in test 3. To fill nonheated volumes, 1.8 cm3 (tests
4–7) and 2.7 cm3 (test 8) of water were filled into
the reactor. After heating the reactor to T2 = 403 K, holding at this temperature for 45 min, and cooling down
to Tin = 303 K, 0.8 cm3 of
thiophene, 0.5 cm3 of water, and oxygen were successively
fed into the reactor to a given pressure, that is, in tests 4–7
and 8, the heated part of the reactor contained ≈50 and 100
mmol of water, respectively. In test 7, thiophene oxidation was conducted
in the presence of CaCO3. Calcium carbonate was fed into
the reactor in a square cell 4 (with a length of 25 mm, and wall height
of 5 mm) made of 0.2 mm thick stainless-steel sheet. After filling
with reagents, the reactor was heated to 823 K at a rate of 1 K/min.The amounts of reagents and diluent were determined based on their
temperature and partial pressure, as well as the reactor volume using
the reference P–ρ–T data.[27] The value of n0(CaCO3) corresponds to two times the amount
of CaCO3 required to neutralize sulfuric acid resulting
from thiophene oxidation during the reactionThe choice of CaCO3 as a
neutralizing agent is due to
its low solubility in water (1.4·10–2 g/dm3 at 298 K).[38]After turning
off the heating, the reactor in the furnace was cooled
to room temperature for more than 12 h. Then, the composition and
amount of volatile oxidation products were determined using the MS
7303 mass spectrometer according to the method.[50] The amount of carbon in the composition of nonreacted substances
was determined as follows. The reactor was charged with oxygen (≈50
mmol), heated to 873 K, and kept at this temperature for 90 min. After
cooling the reactor to room temperature, a mass-spectrometric analysis
of volatile products was carried out. The carbon burnup degree XC and carbon balance YC were calculated according to the formulaewhere n(C) is the number of moles of the carbon-containing substance,
detected during the mass spectrometric analysis; j is the stoichiometric coefficient; subscript R corresponds to the
products obtained upon annealing of the reactor at 873 K.Since
in the context of this work, corrosion of the reactor wall
occurred, before running each test, the inner surface of the reactor
and the heated parts of the setup were mechanically cleaned of the
corrosion layer. Then, to obtain a dense oxide layer, the inner surface
of the reactor was annealed in an O2 environment (≈0.7
MPa at 298 K) at a temperature of 873 K for 60 min. Due to the interaction
with the reaction mixture, a bloom appeared on the Pt–Rh/Pt
thermocouple. This bloom was removed by annealing the thermocouple
and ceramic shell in a muffle furnace in the air at 1103 K for 100
min. Note that the temperature Tin in
all the tests was measured using just a single Pt–Rh/Pt thermocouple.
The composition of solid products was analyzed using a powder X-ray
diffractometer X’TRA Thermo (phase identification was carried
out according to the reference data[51]).