| Literature DB >> 33969844 |
Alexander John Cruz1, Giel Arnauts2, Martin Obst2, Dmitry E Kravchenko2, Philippe M Vereecken3, Steven De Feyter4, Ivo Stassen2, Tom Hauffman5, Rob Ameloot2.
Abstract
Chemical vapor deposition of metal-organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to a MOF through exposure to linker vapor. We herein report the impact of different metal oxide and metalcone layers as precursors for zeolitic imidazolate framework ZIF-8 films.Entities:
Year: 2021 PMID： 33969844 DOI： 10.1039/d1dt00927c
Source DB: PubMed Journal: Dalton Trans ISSN： 1477-9226 Impact factor: 4.390