| Literature DB >> 33923371 |
Sadia Iram1,2, Azhar Mahmood1, Muhammad Fahad Ehsan1, Asad Mumtaz1, Manzar Sohail1, Effat Sitara1, Syeda Aqsa Batool Bukhari1, Sumia Gul1, Syeda Arooj Fatima3, Muhammad Zarrar Khan3, Rubina Shaheen4, Sajid Nawaz Malik3, Mohammad Azad Malik2.
Abstract
This research aims to synthesize the Bis(di-isobutyldithiophosphinato) nickel (II) complex [Ni(iBu2PS2)] to be employed as a substrate for the deposition of nickel sulfide nanostructures, and to investigate its dielectric and impedance characteristics for applications in the electronic industry. Various analytical tools including elemental analysis, mass spectrometry, IR, and TGA were also used to further confirm the successful synthesis of the precursor. NiS nanostructures were grown on the glass substrates by employing an aerosol assisted chemical vapor deposition (AACVD) technique via successful decomposition of the synthesized complex under variable temperature conditions. XRD, SEM, TEM, and EDX methods were well applied to examine resultant nanostructures. Dielectric studies of NiS were carried out at room temperature within the 100 Hz to 5 MHz frequency range. Maxwell-Wagner model gave a complete explanation of the variation of dielectric properties along with frequency. The reason behind high dielectric constant values at low frequency was further endorsed by Koops phenomenological model. The efficient translational hopping and futile reorientation vibration caused the overdue exceptional drift of ac conductivity (σac) along with the rise in frequency. Two relaxation processes caused by grains and grain boundaries were identified from the fitting of a complex impedance plot with an equivalent circuit model (Rg Cg) (Rgb Qgb Cgb). Asymmetry and depression in the semicircle having center present lower than the impedance real axis gave solid justification of dielectric behavior that is non-Debye in nature.Entities:
Keywords: AACVD; dielectric behavior; impedance spectroscopy; nickel chalcogenide
Year: 2021 PMID: 33923371 DOI: 10.3390/nano11051105
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076