Lead-halide perovskite nanocrystals are a promising material in optical devices due to their high photoluminescence (PL) quantum yield, excellent color purity, and low stimulated emission threshold. However, one problem is the stability of the nanocrystal films under different environmental conditions and under high temperatures. The latter is particularly relevant for device fabrication if further processes that require elevated temperatures are needed after the deposition of the nanocrystal film. In this work, we study the impact of a thin oxide layer of Al2O3 on the light emission properties of thin nanocrystal films. We find that nanocrystals passivated with quaternary ammonium bromide ligands maintain their advantageous optical properties in alumina-coated films and do not suffer from degradation at temperatures up to 100 °C. This is manifested by conservation of the PL peak position and line width, PL decay dynamics, and low threshold for amplified spontaneous emission. The PL remains stable for up to 100 h at a temperature of 80 °C, and the ASE intensity decreases by less than 30% under constant pumping at high fluence for 1 h. Our approach outlines that the combination of tailored surface chemistry with additional protective coating of the nanocrystal film is a feasible approach to obtain stable emission at elevated temperatures and under extended operational time scales.
Lead-halide perovskite nanocrystals are a promising material in optical devices due to their high photoluminescence (PL) quantum yield, excellent color purity, and low stimulated emission threshold. However, one problem is the stability of the nanocrystal films under different environmental conditions and under high temperatures. The latter is particularly relevant for device fabrication if further processes that require elevated temperatures are needed after the deposition of the nanocrystal film. In this work, we study the impact of a thin oxide layer of Al2O3 on the light emission properties of thin nanocrystal films. We find that nanocrystals passivated with quaternary ammonium bromide ligands maintain their advantageous optical properties in alumina-coated films and do not suffer from degradation at temperatures up to 100 °C. This is manifested by conservation of the PL peak position and line width, PL decay dynamics, and low threshold for amplified spontaneous emission. The PL remains stable for up to 100 h at a temperature of 80 °C, and the ASE intensity decreases by less than 30% under constant pumping at high fluence for 1 h. Our approach outlines that the combination of tailored surface chemistry with additional protective coating of the nanocrystal film is a feasible approach to obtain stable emission at elevated temperatures and under extended operational time scales.
Perovskite nanocrystals
(NCs)[1−5] currently show record performance in various optoelectronic devices.
Light-emitting diodes already present external quantum efficiencies
exceeding 16% in the green spectral region,[6,7] and
very recently amplified spontaneous emission under continuous-wave
excitation has been reported.[8] Such optoelectronic
performance has been reached after only a few years of intense research
following the seminal work from Protesescu et al.[9] Yet, a major hindrance of perovskite NCs is their limited
stability,[10−13] which leads to relatively short operational lifetimes of the respective
devices notwithstanding the performance.[14] In order to tackle this stability issue,[1] various computational studies have identified the NC surface as
the main culprit.[15−18] In addition, experimental studies on NCs synthesized via different
methods[19−21] have pointed out that the nature of the surface ligands
plays a major role in the material stability. In this context, postsynthetic
treatments are an interesting venue to increase the stability of perovskite
NCs as well as to improve photoluminescence quantum yield (PLQY);[22] such methods include ligand exchange procedures,[23] amines addition,[24] cross-linking,[25] MnCl2 doping,[26] potassium incorporation,[27] and more. Atomic layer deposition (ALD) of a thin Al2O3 layer on NC films provides an additional pathway
to improve stability and performance of thin films of NCs.[28−33]One important issue is the stability of the active layers
under
heating[34] and at elevated temperatures
in the range up to 100 °C. Such temperatures can occur during
possible processing steps that follow the NC deposition, as, for example,
resist baking in patterning by lithography or thermal evaporation
of additional layers, but also during operation under high current
density in LEDs or under harsh environmental conditions. The deposition
of a thin oxide film, for example Al2O3, by
ALD can be employed to improve the robustness of NC films to environmental
conditions.[28]In this work, we investigate
the impact of coating CsPbBr3 NC films with a thin Al2O3 layer via ALD.
We use CsPbBr3 NCs passivated by didodecyl dimethylammonium
bromide (DDAB) ligands (Figure ) that have demonstrated excellent stability in solution and
in films under ambient conditions.[23] We
obtain a PLQY of 75% from NC films prepared by spin-coating the colloidal
solutions on soda lime glass substrates that is maintained after the
deposition of the Al2O3 layer. We study the
temperature stability of bare and alumina-coated NC films in heating
and cooling cycles and find that the optical properties of Al2O3-coated films are not altered after a heating
cycle up to 100 °C. Exceeding this temperature leads to irreversible
reduction in emission intensity, which is analyzed in terms of PL
decay lifetimes. With pulsed laser excitation, we evaluate the amplified
spontaneous emission threshold and obtain a value of around 60 μJ/cm2 for both bare and alumina coated NC films. The PL of the
films is stable for up to hundreds of hours at a temperature of 80
°C, and the ASE manifests only a moderate decrease in performance
for optical pumping up to more than one hour. Such stability is of
great advantage for reliable device operation and for the processing
of devices that occurs after the deposition of the NC film.
Figure 1
(a) CsPbBr3 NCs passivated with Cs-oleate ligands are
obtained from synthesis and a ligand exchange to DDAB is performed
in solution. (b) Thin films of NCs are fabricated by spin coating
the ligand-exchanged solutions on glass substrates. (c) The films
are coated with a thin Al2O3 layer via atomic
layer deposition.
(a) CsPbBr3 NCs passivated with Cs-oleate ligands are
obtained from synthesis and a ligand exchange to DDAB is performed
in solution. (b) Thin films of NCs are fabricated by spin coating
the ligand-exchanged solutions on glass substrates. (c) The films
are coated with a thin Al2O3 layer via atomic
layer deposition.
Results and Discussion
Cs-oleate-capped CsPbBr3 NCs were prepared following
our previously reported secondary amine-based synthesis procedure
(see Materials and Methods for details).[35] A postsynthesis ligand exchange was used to
displace the native Cs-oleate ligands with DDAB[23] (Figure ). Contrary to the more commonly used primary alkyl ammonium or alkyl
carboxylate ions, which can lose or acquire a proton, hence becoming
charge neutral and detaching from the surface of the NCs, quaternary
ammonium ions are more stable surface-passivating agents. The surface
passivation with DDAB delivers NCs with near-unity PLQY in the solution
phase without affecting the overall morphology and structural properties
of the NCs[23] and therefore significantly
increases the brightness of the NCs with respect to their Cs-oleate
counterparts. A transmission electron microscopy image and absorption/emission
spectra recorded from DDAB-passivated NCs in solution are displayed
in Figure a,b. The
NC films were fabricated via spin-coating of concentrated solutions
(5 mg/mL) on a soda-lime glass substrate (2000 rpm for 60 s), and
a film thickness of 50 ± 5 nm was measured via atomic force microscopy
(Nanosurf, noncontact mode). The Al2O3-coated
films were treated with 200 cycles of thermal ALD that resulted in
an alumina layer thickness of 13 nm. The excellent film homogeneity
can be appreciated in the confocal fluorescence microscopy image of
the NC film in Figure S1a. Because of their
brighter emission both in solution and in films, we focus on the following
on the DDAB-passivated samples for the temperature and stability characterization.
Figure 2
Bare and
Al2O3-overcoated CsPbBr3 DDAB-capped
NC films. (a) Transmission electron microscopy image
of the CsPbBr3 NCs; scale bar is 100 nm. (b) Optical Absorption
and PL spectra recorded from the NCs in solution. (c) Normalized PL
emission of spin-coated CsPbBr3 NC films, bare (red) and
overcoated with a 13 nm thick layer of Al2O3 (blue). The inset shows an SEM image of the NC film demonstrating
the homogeneity of the deposition. Scale bar is 1 μm. (d) PL
decay traces of the bare and Al2O3-coated films.
Bare and
Al2O3-overcoated CsPbBr3 DDAB-capped
NC films. (a) Transmission electron microscopy image
of the CsPbBr3 NCs; scale bar is 100 nm. (b) Optical Absorption
and PL spectra recorded from the NCs in solution. (c) Normalized PL
emission of spin-coated CsPbBr3 NC films, bare (red) and
overcoated with a 13 nm thick layer of Al2O3 (blue). The inset shows an SEM image of the NC film demonstrating
the homogeneity of the deposition. Scale bar is 1 μm. (d) PL
decay traces of the bare and Al2O3-coated films.Figure c shows
the emission spectra of the pristine and Al2O3-coated NC films together with the PL decay traces. The PL peak position
of the Al2O3-coated film is slightly blue-shifted
with respect to that of the bare NC film, which most likely is due
to dielectric effects.[36,37] The emission intensity is not
affected by the alumina overcoating, and we obtained a PLQY of 75
± 8% at room temperature from both bare and Al2O3-coated films. The PL decay of the bare and Al2O3-coated films is very similar, with average PL decay
times of τ = 7.5 ns for bare CsPbBr3 films and τ
= 8 ns for Al2O3-coated CsPbBr3 films.
The minor change in average lifetime is mostly attributed to a small
change in the dielectric environment caused by the alumina infilling
of the voids.[37] We conclude that the photophysics
of the NC films is not affected by the coating with the Al2O3 layer. X-ray diffraction spectra recorded of bare and
Al2O3-coated films confirm the structural stability
(Figure S1b). Next, we investigate the
PL properties of the films at temperatures up to 100 and 150 °C
and how such heating affects their emission once the film is cooled
back to room temperature.Figure a,b shows
the emission spectra for heating/cooling cycles up to 100 °C
(373 K) of bare and Al2O3-coated films. With
increasing temperature, the PL signal decreases, demonstrating only
minor changes in shape and line width. The Al2O3-coated film recovers the full PL intensity (PLQY of 75%) upon cooling
back to room temperature, while the PLQY of the bare NC film is reduced
after one heating/cooling cycle to 44 ± 4%. Humidity, ambient
air, and temperature are known to influence the emission properties
of perovskiteNC films.[38−43] The temperature cycling in Figure b,d demonstrates that the film coating with the alumina
layer provides a sufficient protection that suppresses NC degradation
for temperatures up to 100 °C. We attribute the main mechanism
for the increased stability to the blocking of the desorption of the
ligands that occurs at temperatures above 80 °C[38] that preserves the efficient surface passivation of the
NCs. Similar data is shown for Cs-oleate-coated films in Figure S2, however in this case the PL intensity
was already significantly reduced by the Al2O3 coating itself, and furthermore the alumina-coated films did not
recover their full PL intensity after being cooled down to room temperature.
Another important point is the stability over time at such elevated
temperatures, which is reported in Figure e, where the PL intensity versus time under
operation at a temperature of 80 °C is plotted for up to 100
h. We find a small decrease in PL intensity in the first few hours,
and then the signal stabilizes at around 80% of its original intensity.
Figure 3
PL emission
during heating and cooling cycles of bare and Al2O3-coated CsPbBr3 NC films. (a,b) PL
spectra recorded during heating the bare (a) and Al2O3-coated (b) films up 100 °C (373 K) and cooling back
to room temperature (RT). (c,d) Normalized PL intensity obtained by
integrating the area under the PL peak for bare (c) and Al2O3-coated (d) films. The PLQY of the bare film drops from
75% to 44% after one heating/cooling cycle, while that of the Al2O3-coated film fully recovers. Here, unity in PL
intensity corresponds to PLQY of 75%. (e) PL intensity at 80 °C
(353 K) recorded over time. The emission intensity remains above 80%
for up to 100 h, and the PL decay traces recorded after 1 and 100
h (plotted in the inset) do not show any significant changes, confirming
the stability of the optical properties.
PL emission
during heating and cooling cycles of bare and Al2O3-coated CsPbBr3 NC films. (a,b) PL
spectra recorded during heating the bare (a) and Al2O3-coated (b) films up 100 °C (373 K) and cooling back
to room temperature (RT). (c,d) Normalized PL intensity obtained by
integrating the area under the PL peak for bare (c) and Al2O3-coated (d) films. The PLQY of the bare film drops from
75% to 44% after one heating/cooling cycle, while that of the Al2O3-coated film fully recovers. Here, unity in PL
intensity corresponds to PLQY of 75%. (e) PL intensity at 80 °C
(353 K) recorded over time. The emission intensity remains above 80%
for up to 100 h, and the PL decay traces recorded after 1 and 100
h (plotted in the inset) do not show any significant changes, confirming
the stability of the optical properties.We have also tested the robustness of the NC film emission to temperatures
exceeding 100 °C and found that the PL intensity is significantly
reduced after heating up to 150 °C (423 K) for both bare and
Al2O3-coated films, that is, it recovered only
60% and 50% of its original value, respectively, as shown in Figure S3. We analyze the PL decay dynamics to
gain deeper insight into this loss of emission intensity. The PL decay
traces recorded over temperature displayed in Figure a,b show a maximum in PL lifetime around
100 °C (373 K). The decrease of the PL lifetime at temperatures
higher than 100 °C can be attributed to fast nonradiative decay
channels associated with heat-induced permanent defects, since in
that case the PL is drastically and irreversibly reduced when the
sample is cooled down to RT. This interpretation is supported by a
shift in the amplitudes related to the two dominating decay channels,
from τ2 (slow) to τ1 (fast), which
is in line with an increase of the commonly faster nonradiative recombination
related to defects. This effect is much more pronounced for the bare
NC films (Figure d),
for which the desorption of ligands at 150 °C is highly probable,[38] leaving nonpassivated surface regions behind.
For the Al2O3-overcoated films, the desorption
is hindered by the coating layer, but the reduction of the PLQY of
the film to 52% after cooling back to RT indicates that damage to
the NCs or their ligand passivation occurs. The average PL lifetime
measured after cooling back to room temperature is drastically different
for the bare NC films compared to the Al2O3-overcoated
ones. The bare films manifest a strongly increased PL lifetime from
7.5 to 22.1 ns after heating, while the overcoated ones experience
a small PL lifetime decrease from 8.7 to 7.9 ns (Table S1 in SI). This behavior points to the formation of
deep, long-lived traps in the bare films caused by the heating, while
for the alumina-coated films no such drastic effect occurred, and
only the already present fast nonradiative decay channel gained in
weight. This interpretation is corroborated by PL lifetimes associated
with nonradiative defects, which are typically shorter (around 2–5
ns) than those of the radiative channels (around 10–15 ns).[44]
Figure 4
(a,b) Contour plots of the PL decay traces versus temperature
of
bare and Al2O3-coated films in a heating cycle
up to 150 °C (423 K), and the related average PL life times (c,d)
obtained from fitting with three exponentials for both heating (red)
and cooling (blue) cycles.
(a,b) Contour plots of the PL decay traces versus temperature
of
bare and Al2O3-coated films in a heating cycle
up to 150 °C (423 K), and the related average PL life times (c,d)
obtained from fitting with three exponentials for both heating (red)
and cooling (blue) cycles.CsPbBr3 NC films are a very interesting material for
amplified spontaneous emission (ASE)[45−50] and lasing.[51,52] Therefore, we investigated what
effects the film protection by the alumina coating has on these properties.
In Figure a,b, we
report the ASE spectra of bare and Al2O3-coated
DDAB-capped CsPbBr3 NC films (from a different synthetic
batch as in Figures –4). In both cases, a clear ASE peak
is observed with full width at half-maximum (fwhm) of ∼4.5
nm for pump fluences exceeding 60 μJ/cm2. Thus, the
ASE threshold is not affected by the alumina coating of the NC film.
Furthermore, the threshold of 60 μJ/cm2 under femtosecond-excitation
is comparable to other reports[53] and roughly
1 order of magnitude higher compared to recently published results
obtained from triple cation NCs that were engineered to optimize optical
gain.[54] ASE data of Cs-oleate-capped NC
films are reported in Figure S4 and show
comparable threshold values. The ASE peak is centered at 527 nm and
therefore slightly red-shifted compared to the photoluminescence (PL)
peak, since ASE arises in a spectral range where the optical losses
are minimized, that is, in the Urbach tail where self-absorption is
reduced. The PL peak, measured in the direction normal to the substrate,
is centered at 510 nm, consistent with our previous reports,[43] while the PL peak recorded in the ASE configuration
at grazing angles (see Materials and Methods) is red-shifted to 522 nm. Such red-shift can be attributed to self-absorption
caused by the long trajectory of the emitted light within the NC film.
Stability tests of the ASE of the Al2O3-coated
NC films over time at constant fluence of 430 μJ/cm2, thus around a factor of 7 above the threshold, are shown in Figure and revealed a decrease
in ASE intensity of only 30% after 90 min (corresponding to 5.4 ×
106 laser pulses). For comparison, the PL intensity of
CsPbBr3 NCs can show a decrease of 50% (or above) under
constant optical excitation,[12] while for
PbBr2-treated CsPbBr3 NC films under femtosecond-optical
pumping (at a fluence of 1.5 times the threshold value) the ASE demonstrated
a similar decrease after 5 × 106 laser pulses.[54] De Giorgi et al.[46] estimated that ASE stability under nanosecond-excitation can be
4 orders of magnitude lower than that for femtosecond-pumping. In
fact, the authors report a decrease of ASE intensity >50% after
3500
laser pulses employing nanosecond-excitation. Such results indicate
that improvement in emission stability are required to achieve long
operational lifetime, in particular in the pumping regime with longer
laser pulses.
Figure 5
(a-b) Amplified spontaneous emission under femtosecond-pulsed
laser
at 405 nm at a frequency of 1 kHz for bare (a) and Al2O3-coated (b) films. The emission is recorded at grazing angles
to the sample surface and some selected ASE spectra for different
pump fluence are shown. (c) Emission intensity versus pump fluence
for the full data set, showing an ASE threshold around 60 μJ/cm2.
Figure 6
Emission spectra (a) and ASE peak intensity
(b) of an Al2O3 coated NC film recorded over
time under constant optical
pumping with a fluence of 430 μJ/cm2.
(a-b) Amplified spontaneous emission under femtosecond-pulsed
laser
at 405 nm at a frequency of 1 kHz for bare (a) and Al2O3-coated (b) films. The emission is recorded at grazing angles
to the sample surface and some selected ASE spectra for different
pump fluence are shown. (c) Emission intensity versus pump fluence
for the full data set, showing an ASE threshold around 60 μJ/cm2.Emission spectra (a) and ASE peak intensity
(b) of an Al2O3 coated NC film recorded over
time under constant optical
pumping with a fluence of 430 μJ/cm2.Motivated by the good stability of our NC films under high
fluence
pumping, we fabricated a distributed feedback (DFB) laser[55−57] and plot the emission spectra in Figure a. We obtained lasing with a grating periodicity d = 310 nm under a detection angle of 10° with respect
to the surface normal with a lasing threshold of 1 mJ/cm2. At the threshold, multiple peaks can be observed, markedly at 526
and 529 nm. At higher pumping fluence, the peak at 529 nm takes over
and dominates the spectrum with a narrow emission line width of ∼1.6
nm. The observed mode spacing (Δλ ∼ 2.5 nm) between
the two lasing peaks could result from an additional outcoupling mechanism.
In fact, DFB laser emission in the direction perpendicular to the
lattice plane is obtained by a second order grating that acts as a
loss channel.[58] The emission was stable
over time under lasing operation at a constant pumping fluence of
2.7 mJ/cm2 (where a single laser peak was observed), and
the peak intensity did not decrease significantly for 2.5 h (Figure b).
Figure 7
(a) Distributed feedback
lasing from DDAB-capped CsPbBr3 NC films deposited on a
silica substrate with a linear grating with
310 nm periodicity. Emission spectra for different excitation fluence
show that above a threshold of 1 mJ/cm2 lasing peaks appear.
The inset shows the PL amplitude and that of the two lasing peaks
(Peak1 @ 526 nm; Peak2 @ 529 nm) versus excitation fluence. (b) Stability
of the DFB laser device over time under constant pumping.
(a) Distributed feedback
lasing from DDAB-capped CsPbBr3 NC films deposited on a
silica substrate with a linear grating with
310 nm periodicity. Emission spectra for different excitation fluence
show that above a threshold of 1 mJ/cm2 lasing peaks appear.
The inset shows the PL amplitude and that of the two lasing peaks
(Peak1 @ 526 nm; Peak2 @ 529 nm) versus excitation fluence. (b) Stability
of the DFB laser device over time under constant pumping.
Conclusions
We have demonstrated that the coating of CsPbBr3 NC
films with a thin Al2O3 layer improved the robustness
of the optical properties to elevated temperatures. Here, at temperatures
up to 100 °C the film remained unaltered, demonstrated by full
recovery of the high PLQY of 75% when cooling back to RT. Heating/cooling
cycles to higher temperatures revealed that above 100 °C irreversible
changes occur in the film that reduce the emission intensity, which
is much more pronounced in bare NC films compared to the alumina-coated
ones. Furthermore, also the threshold of ASE was unaffected by the
alumina coating. The robustness of NC films up to 100 °C is highly
favorable for technological applications, as many processing steps
in device technology such as optical or electron-beam lithography
and metal deposition rely on temperatures in this range. Also, toward
the stability of optoelectronic devices under operation, heating of
the active material can occur and there such robustness is paramount
for stable performance. Therefore, we can foresee the exploitation
of our processing technique in the stabilization of light-emitting
diodes or solar cells.
Materials and Methods
Chemicals
Lead acetate trihydrate ((PbAc2·3H2O),
99.99%), cesium carbonate (Cs2CO3, reagent Plus,
99%), benzoyl bromide (C6H5COBr, 97%), ethyl
acetate (98.8%), toluene (anhydrous,
99.5%), didodecyldimethylammonium bromide (DDDMAB), oleylamine (70%),
octadecene (ODE, technical grade, 90%), and oleic acid (OA, 90%) were
purchased from Sigma-Aldrich. Didodecylamine (DDDAm, 97%) was purchased
from TCI. All chemicals were used without any further purification.
Synthesis of Cs-Oleate-Capped CsPbBr3 NCs
Cs-oleate-capped
CsPbBr3 NCs were synthesized following
our previously reported secondary amine-based synthesis approach.[35] Briefly, lead(II) acetate trihydrate (76 mg),
cesium carbonate (16 mg), and octadecene (10 mL) were combined in
a 25 mL three-neck flask equipped with a thermocouple and a magnetic
stirrer. The reaction mixture was degassed for 5 min at room temperature
and then for 1 h at 115 °C. Then, a ligand mixture containing
oleic acid (1.5 mL, previously degassed for an hour at 120 °C
and stored in a glovebox) and didodecylamine (1.25 mmol, 443 mg) dissolved
in 1 mL of anhydrous toluene was rapidly injected under nitrogen.
After the complete dissolution of the metal precursors, the temperature
was decreased to 70 °C and a solution of benzoyl bromide (50
μL) in anhydrous toluene (500 μL) was swiftly injected.
After 60 s, the reaction mixture was cooled down by using a water
bath and was directly used for ligand exchange reactions.
Ligand Exchange
Reactions
DDAB-capped CsPbBr3 NCs were prepared
following previously reported ligand exchange
strategy.[23] All ligand exchange reactions
were performed under air. Briefly, the crude reaction mixture containing
the CsPbBr3 NCs (3 mL) was treated with an anhydrous toluene
solution containing the DDAB salt (2 mL, 0.025 M) and the mixture
was vigorously stirred for 1 min. Subsequently, the NCs were precipitated
by the addition of 15 mL of ethyl acetate followed by centrifugation
at 6000 rpm for 10 min. A second cycle of ligand exchange was carried
out by redispersing the NCs in a toluene solution containing the DDAB
salt (1 mL, 2 mM) and washing the NC dispersion with 6 mL of ethyl
acetate and redispersion in toluene.
Transmission Electron Microscopy
(TEM)
Bright-field
TEM images were acquired on samples prepared by drop-casting diluted
colloidal solutions on carbon film-coated 200 mesh copper grids, using
a JEOL-1100 microscope operating at an acceleration voltage of 100
kV.
Film Preparation and Characterization
CsPbBr3 NC solutions were spin-coated on glass substrate at 2000 rpm for
1 min, which resulted in a film thickness of 50 ± 5 nm.
Atomic
Layer Deposition
Atomic layer deposition was
carried out in a Flexal ALD system from Oxford Instruments by using
a thermal recipe with a stage temperature of 80 °C. Trimethyl
aluminate (TMA) and H2O were used as precursors. Before
starting the alumina deposition, a preheating step of 300 s was performed.
Each ALD cycle consisted of an H2O/purge/TMA/purge with
a pulse duration of 0.12/30/0.020/10 s, respectively. The process
resulted in an alumina deposition rate of 0.065 nm/cycle.
Optical Characterization
PL measurements of the films
were carried out with an Edinburgh Instruments fluorescence spectrometer
(FLS920). The system included a xenon lamp with monochromator for
steady-state PL excitation, a calibrated integrating sphere for PL
quantum yield (PLQY) measurements and a time-correlated single-photon-counting
unit coupled with a pulsed laser diode (λ= 405 nm, pulse width
= 50 ps) for time-resolved PL studies.
Heating and Cooling Experiments
High-temperature heating
cooling measurements were performed inside Edinburgh fluorescence
spectrometer (FLS920) with customized temperature-controlled holder
from CaLCTec srl. Measurements were performed on spin-coated and ALD-coated
film on glass substrate of size 1.6 × 1.3 cm2 in ambient
atmospheric conditions by ramping the temperature from 300 to 373
K (Cycle 1) and 300 to 423 K (cycle 2) with a step of 5–10
K followed by a natural cooling cycle. PL and lifetime were measured
at each of the temperature intervals both in heating and cooling cycles.
Distributed Feedback Laser Fabrication
The lasing structures
were prepared by drop-casting the CsPbBr3 NC solution on
a fused silica grating. The grating was bought from NIL Technology
and presented linear grating intrusions within the fused silica substrate
in an area of 200 μm × 400 μm.
Amplified
Spontaneous Emission and Lasing Measurements
Films of CsPbBr3 NCs were fabricated by drop casting (with
thickness of few μm) excited at a wavelength of λ = 405
nm using an amplified Ti:sapphire laser (Coherent Legend Elite seeded
by a Ti:sapphire fs laser) with a 70 fs pulse (fwhm) and a repetition
rate of 1 kHz. The ASE measurements were performed by focusing the
excitation beam with a cylindrical lens onto the sample, thus obtaining
a stripe-shaped beam profile. All ASE spectra were collected at 90°
with respect to the excitation beam using an Ocean Optics HR4000 spectrometer
coupled to an optical fiber. The lasing measurements were carried
out using a spherical lens for focusing the beam and placing the DFB
structure 80° with respect to the excitation beam (100°
with respect to the collection optics).
Authors: Fei Yan; Jun Xing; Guichuan Xing; Lina Quan; Swee Tiam Tan; Jiaxin Zhao; Rui Su; Lulu Zhang; Shi Chen; Yawen Zhao; Alfred Huan; Edward H Sargent; Qihua Xiong; Hilmi Volkan Demir Journal: Nano Lett Date: 2018-04-05 Impact factor: 11.189
Authors: Maryna I Bodnarchuk; Simon C Boehme; Stephanie Ten Brinck; Caterina Bernasconi; Yevhen Shynkarenko; Franziska Krieg; Roland Widmer; Beat Aeschlimann; Detlef Günther; Maksym V Kovalenko; Ivan Infante Journal: ACS Energy Lett Date: 2018-11-27 Impact factor: 23.101