Literature DB >> 33800898

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method.

Mingjie Deng1,2,3, Ci Song1,2,3, Feng Shi1,2,3, Yaofei Zhang1,2,3, Ye Tian1,2,3, Wanli Zhang1,2,3.   

Abstract

The damage repair of fused silica based on the CO2 laser repair technique has been successfully applied in high-power laser systems in the controllable nuclear fusion field. However, this kind of repairing technique mainly focuses on large-scale laser damage with sizes larger than 200 μm, but ignores the influence of cluster small-scale damage with sizes smaller than 50 μm. In order to inhibit the growth of small-scale damage and further improve the effect of fused silica damage repair, this paper carried out a study on the repair of fused silica damage using the magnetorheological (MR) removing method. The feasibility of fused silica damage repairing was verified, and the evolution law of the number, morphology, and the surface roughness of small-scale damage were all analyzed. The results showed that the MR removing method was non-destructive compared to traditional repairing technologies. It not only effectively improved the whole damage repairing rate to more than 90%, but it also restored the optical properties and surface roughness of the damaged components in the repairing process. Based on the study of the MR removing repair law, a combined repairing process of 4 μm MR removal and 700 nm computer controlled optical surfacing (CCOS) removal is proposed. A typical fused silica element was experimentally repaired to verify the process parameters. The repairing rate of small-scale damage was up to 90.4%, and the surface roughness was restored to the level before repairing. The experimental results validate the effectiveness and feasibility of the combined repairing process. This work provides an effective method for the small-scale damage repairing of fused silica components.

Entities:  

Keywords:  combined repairing process; evolution law; fused silica; magnetorheological removing method; small-scale damage

Year:  2021        PMID: 33800898      PMCID: PMC7999339          DOI: 10.3390/mi12030274

Source DB:  PubMed          Journal:  Micromachines (Basel)        ISSN: 2072-666X            Impact factor:   2.891


  6 in total

1.  Localized CO2 laser damage repair of fused silica optics.

Authors:  E Mendez; K M Nowak; H J Baker; F J Villarreal; D R Hall
Journal:  Appl Opt       Date:  2006-07-20       Impact factor: 1.980

2.  Method of mitigation laser-damage growth on fused silica surface.

Authors:  Zhou Fang; Yuan'an Zhao; Shunli Chen; Wei Sun; Jianda Shao
Journal:  Appl Opt       Date:  2013-10-10       Impact factor: 1.980

3.  Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics.

Authors:  Feng Shi; Ye Tian; Xiaoqiang Peng; Yifan Dai
Journal:  Appl Opt       Date:  2014-02-01       Impact factor: 1.980

4.  Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Authors:  Feng Shi; Yaoyu Zhong; Yifan Dai; Xiaoqiang Peng; Mingjin Xu; Tingting Sui
Journal:  Opt Express       Date:  2016-09-05       Impact factor: 3.894

5.  Athermal repair of nanoscale defects in optical materials using a femtosecond laser.

Authors:  Qiang Cao; Jiajun Zhang; Jian Du; Hongming Zhao; Sheng Liu; Qing Peng
Journal:  Nanoscale       Date:  2017-11-16       Impact factor: 7.790

6.  Probability of growth of small damage sites on the exit surface of fused silica optics.

Authors:  Raluca A Negres; Ghaleb M Abdulla; David A Cross; Zhi M Liao; Christopher W Carr
Journal:  Opt Express       Date:  2012-06-04       Impact factor: 3.894

  6 in total
  1 in total

1.  Editorial for the Special Issue on "Frontiers of Ultra-Precision Machining".

Authors:  Jiang Guo; Chunjin Wang; Chenwei Kang
Journal:  Micromachines (Basel)       Date:  2022-01-29       Impact factor: 2.891

  1 in total

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