Jae Young Kim1, Shahzad Iqbal1, Hyo Jun Jang1, Eun Young Jung1, Gyu Tae Bae1, Choon Sang Park2, Bhum Jae Shin3, Heung Sik Tae1,4. 1. School of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea. 2. Department of Electrical and Computer Engineering, College of Engineering, Kansas State University, Manhattan, KS 66506, USA. 3. Department of Electronics Engineering, Sejong University, Seoul 05006, Korea. 4. School of Electronics Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea.
Abstract
The use of low-voltage-driven plasma in atmospheric pressure (AP) plasma polymerization is considered as a simple approach to reducing the reactivity of the monomer fragments in order to prevent excessive cross-linking, which would have a negative effect on the structural properties of the polymerized thin films. In this study, AP-plasma polymerization can be processed at low voltage by an AP-plasma reactor with a wire electrode configuration. A bare tungsten wire is used as a powered electrode to initiate discharge in the plasma area (defined as the area between the wide glass tube and the substrate stand), thus allowing plasma polymerization to proceed at a lower voltage compared to other AP-plasma reactors with dielectric barriers. Thus, transparent polyaniline (PANI) films are successfully synthesized. The surface morphology, roughness, and film thickness of the PANI films are characterized by field emission scanning electron microscopy and atomic force microscopy. Thus, the surface of the polymerized film is shown to be homogenous, smooth, and flat, with a low surface roughness of 1 nm. In addition, the structure and chemical properties of the PANI films are investigated by Fourier transform infrared spectroscopy, thus revealing an improvement in the degree of polymerization, even though the process was performed at low voltage.
The use of low-voltage-driven plasma in atmospheric pressure (AP) plasma polymerization is considered as a simple approach to reducing the reactivity of the monomer fragments in order to prevent excessive cross-linking, which would have a negative effect on the structural properties of the n class="Chemical">polymerized thin films. In this study, AP-plasma polymerization can be processed at low voltage by an AP-plasma reactor with a wire electrode configuration. A bare tungsten wire is used as a powered electrode to initiate discharge in the plasma area (defined as the area between the wide glass tube and the substrate stand), thus allowing plasma polymerization to proceed at a lower voltage compared to other AP-plasma reactors with dielectric barriers. Thus, transparent polyaniline (PANI) films are successfully synthesized. The surface morphology, roughness, and film thickness of the PANI films are characterized by field emission scanning electron microscopy and atomic force microscopy. Thus, the surface of the polymerized film is shown to be homogenous, smooth, and flat, with a low surface roughness of 1 nm. In addition, the structure and chemical properties of the PANI films are investigated by Fourier transform infrared spectroscopy, thus revealing an improvement in the degree of polymerization, even though the process was performed at low voltage.