Literature DB >> 33797084

Wide Bandgap Oxide Semiconductors: from Materials Physics to Optoelectronic Devices.

Jueli Shi1, Jiaye Zhang1, Lu Yang1, Mei Qu1, Dong-Chen Qi2, Kelvin H L Zhang1.   

Abstract

Wide bandgap oxide semiconductors constitute a unique class of materials that combine properties of electrical conductivity and optical transparency. They are being widely used as key materials in optoelectronic device applications, including flat-panel displays, solar cells, OLED, and emerging flexible and transparent electronics. In this article, an up-to-date review on both the fundamental understanding of materials physics of oxide semiconductors, and recent research progress on design of new materials and high-performing thin film transistor (TFT) devices in the context of fundamental understanding is presented. In particular, an in depth overview is first provided on current understanding of the electronic structures, defect and doping chemistry, optical and transport properties of oxide semiconductors, which provide essential guiding principles for new material design and device optimization. With these principles, recent advances in design of p-type oxide semiconductors, new approaches for achieving cost-effective transparent (flexible) electrodes, and the creation of high mobility 2D electron gas (2DEG) at oxide surfaces and interfaces with a wealth of fascinating physical properties of great potential for novel device design are then reviewed. Finally, recent progress and perspective of oxide TFT based on new oxide semiconductors, 2DEG, and low-temperature solution processed oxide semiconductor for flexible electronics will be reviewed.
© 2021 Wiley-VCH GmbH.

Entities:  

Keywords:  electronic structure; flexible electronics; oxide semiconductor; thin film transistor; transparent conducting oxide (TCO)

Year:  2021        PMID: 33797084     DOI: 10.1002/adma.202006230

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  5 in total

1.  Atomic Structure Evaluation of Solution-Processed a-IZO Films and Electrical Behavior of a-IZO TFTs.

Authors:  Dongwook Kim; Hyeonju Lee; Bokyung Kim; Xue Zhang; Jin-Hyuk Bae; Jong-Sun Choi; Sungkeun Baang
Journal:  Materials (Basel)       Date:  2022-05-10       Impact factor: 3.748

Review 2.  Recent advances in the fabrication of 2D metal oxides.

Authors:  Huaguang Xie; Zhong Li; Liang Cheng; Azhar Ali Haidry; Jiaqi Tao; Yi Xu; Kai Xu; Jian Zhen Ou
Journal:  iScience       Date:  2021-12-10

3.  Modulation of the Bi3+ 6s2 Lone Pair State in Perovskites for High-Mobility p-Type Oxide Semiconductors.

Authors:  Jueli Shi; Ethan A Rubinstein; Weiwei Li; Jiaye Zhang; Ye Yang; Tien-Lin Lee; Changdong Qin; Pengfei Yan; Judith L MacManus-Driscoll; David O Scanlon; Kelvin H L Zhang
Journal:  Adv Sci (Weinh)       Date:  2022-01-07       Impact factor: 16.806

4.  Structural Engineering Effects on Hump Characteristics of ZnO/InSnO Heterojunction Thin-Film Transistors.

Authors:  Qi Li; Junchen Dong; Dedong Han; Dengqin Xu; Jingyi Wang; Yi Wang
Journal:  Nanomaterials (Basel)       Date:  2022-03-31       Impact factor: 5.076

5.  Effects of Channel Thickness on Electrical Performance and Stability of High-Performance InSnO Thin-Film Transistors.

Authors:  Qi Li; Junchen Dong; Dedong Han; Yi Wang
Journal:  Membranes (Basel)       Date:  2021-11-26
  5 in total

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