| Literature DB >> 33751679 |
Su Jae Kim1, Seonghoon Kim2, Jegon Lee3, Yongjae Jo4, Yu-Seong Seo3, Myounghoon Lee3, Yousil Lee1, Chae Ryong Cho5, Jong-Pil Kim6, Miyeon Cheon1, Jungseek Hwang3, Yong In Kim7,8, Young-Hoon Kim7,8, Young-Min Kim7,8, Aloysius Soon9, Myunghwan Choi10, Woo Seok Choi3, Se-Young Jeong7,11, Young Hee Lee7,8.
Abstract
Stochastic inhomogeneous oxidation is an inherent characteristic of copper (Cu), often hindering color tuning and bandgap engineering of oxides. Coherent control of the interface between metal and metal oxide remains unresolved. Coherent propagation of an oxidation front in single-crystal Cu thin film is demonstrated to achieve a full-color spectrum for Cu by precisely controlling its oxide-layer thickness. Grain-boundary-free and atomically flat films prepared by atomic-sputtering epitaxy allow tailoring of the oxide layer with an abrupt interface via heat treatment with a suppressed temperature gradient. Color tuning of nearly full-color red/green/blue indices is realized by precise control of the oxide-layer thickness; the samples cover ≈50.4% of the standard red/green/blue color space. The color of copper/copper oxide is realized by the reconstruction of the quantitative yield color from the oxide "pigment" (complex dielectric functions of Cu2 O) and light-layer interference (reflectance spectra obtained from the Fresnel equations) to produce structural color. Furthermore, laser-oxide lithography is demonstrated with micrometer-scale linewidth and depth through local phase transformation to oxides embedded in the metal, providing spacing necessary for semiconducting transport and optoelectronics functionality.Entities:
Keywords: atomic sputtering epitaxy (ASE); coherent oxidation; color control; interfaces; laser-oxide lithography; single-crystal copper thin films
Year: 2021 PMID: 33751679 DOI: 10.1002/adma.202007345
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849