| Literature DB >> 33615299 |
Nazanin Keshmiri1,2, Homayoon Alaghehmand1,2, Faraneh Mokhtarpour2.
Abstract
OBJECTIVES: This study aimed to evaluate the effects of hydrofluoric acid (HF) concentration and etching time on the surface roughness (SR) and three-point flexural strength of Suprinity and to analyze the surface elements before and after etching.Entities:
Keywords: Flexural Strength; Glass Ceramic; Hydrofluoric Acid; Surface Properties; VITA Suprinity
Year: 2020 PMID: 33615299 PMCID: PMC7883654 DOI: 10.18502/fid.v17i22.4316
Source DB: PubMed Journal: Front Dent ISSN: 2676-296X
Crystallization cycle of Suprinity
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| 400°C |
|---|---|
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| 8 minutes |
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| 55°C/minutes |
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| 840°C |
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| 8 minutes |
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| 680°C |
Fig. 1.Surface roughness (SR) atomic force microscopic (AFM) images before and after etching with different acid concentrations and etching times (second)
Mean and standard deviation (SD) of surface roughness (SR) in 5 and 10% hydrofluoric acid (HF) with different etching times
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|---|---|---|
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| 58.40±27.07 | 112.92±56.78 |
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| 64.24±25.15 | 137.81±80.78 |
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| 63.48±14.07 | 150.45±70.90 |
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| 16.47±6.70 | |
Different lowercase letters indicate a significant difference (P<0.05) among etching times with the same acid concentration. Different capital letters show a significant difference (P<0.05) among acid concentrations at the same time point
Mean and standard deviation (SD) of flexural strength (MPa) in different hydrofluoric (HF) concentrations and etching times
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|---|---|---|
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| 347.53±43.63 | 300.57±33.64 |
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| 302.27±30.85 | 268.54±29.67 |
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| 271.99±22.29 | 244.95±34.66 |
Different lowercase letters indicate a significant difference (P<0.05) among etching times with the same acid concentration. Different capital letters indicate a significant difference (P<0.05) among acid concentrations at the same time point
Surface element analysis of Suprinity before and after etching with different acid concentrations and etching times (second)
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| 76.83 | 73.80 | 74.78 | 72.18 | 72.44 | 68.20 | 74.52 |
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| 0.03 | 0.03 | 0.03 | 0.03 | 0.05 | 0.02 | 0.05 |
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| 1.03 | 1.03 | 0.84 | 1.00 | 0.89 | 1.27 | 0.84 |
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| 18.85 | 21.37 | 20.79 | 22.65 | 22.51 | 25.55 | 20.86 |
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| 0.59 | 1.03 | 1.11 | 1.21 | 1.41 | 1.31 | 0.95 |
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| 2.48 | 2.62 | 2.41 | 2.76 | 2.64 | 3.48 | 2.75 |
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| 00.00 | 0.12 | 0.03 | 0.17 | 0.06 | 0.15 | 0.03 |
at%: atomic percentage
O2: Oxygen; F: Fluoride; AL: Aluminium; Si: Silisium; P: Phosphor; Zr: Zirconium; La: lanthanum