Literature DB >> 33586957

Complementary Driving between 2D Heterostructures and Surface Functionalization for Surpassing Binary Logic Devices.

Hyeonje Son1, Haeju Choi1, Jaeho Jeon1, Young Jae Kim1, Seunghyuk Choi1, Jeong Ho Cho2, Sungjoo Lee1,3.   

Abstract

Recently, for overcoming the fundamental limits of conventional silicon technology, multivalued logic (MVL) circuits based on two-dimensional (2D) materials have received significant attention for reducing the power consumption and the complexity of integrated circuits. Compared with the conventional silicon complementary metal oxide semiconductor technology, new functional heterostructures comprising 2D materials can be readily implemented, owing to their unique inherent electrical properties. Furthermore, their process integration does not pose issues of lattice mismatch at junction interfaces. This facilitates the realization of new functional logic gate circuit configurations. However, the reported three-valued NOT gates (ternary inverters) based on 2D materials require stringent operating conditions and complex fabrication processes to obtain three distinct logic states. Herein, a general structure of MVL devices based on a simple series connection of 2D materials with partial surface functionalization is demonstrated. By arranging three 2D materials exhibiting p-type, ambipolar, and n-type conductivities, ternary inverter circuits can be established based on the complementary driving between 2D heterotransistors. This ternary inverter circuit can be further improved for quaternary inverter circuits by controlling the charge neutral point of partial ambipolar 2D materials using surface functionalization, which is an effective and nondestructive doping method for 2D materials.

Entities:  

Keywords:  2D heterostructure; multiple-valued logic; negative differential transconductance; quaternary inverter; surface functionalization

Year:  2021        PMID: 33586957     DOI: 10.1021/acsami.0c17739

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  1 in total

1.  Ferroelectric Field-Effect-Transistor Integrated with Ferroelectrics Heterostructure.

Authors:  Sungpyo Baek; Hyun Ho Yoo; Jae Hyeok Ju; Panithan Sriboriboon; Prashant Singh; Jingjie Niu; Jin-Hong Park; Changhwan Shin; Yunseok Kim; Sungjoo Lee
Journal:  Adv Sci (Weinh)       Date:  2022-05-15       Impact factor: 17.521

  1 in total

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