Kelvin Elphick1, Akinobu Yamaguchi2, Akira Otsuki3,4,5, Neil Lonio Hayagan3, Atsufumi Hirohata1. 1. Department of Electronic Engineering, University of York, Heslington, York YO10 5DD, UK. 2. Laboratory of Advance Science and Technology for Industry, University of Hyogo, Hyogo 678-1205, Japan. 3. Ecole Nationale Supérieure de Géologie, GeoRessources UMR 7359 CNRS, University of Lorraine, 2 Rue du Doyen Marcel Roubault, BP 10162, 54505 Vandoeuvre-lès-Nancy, France. 4. Waste Science & Technology, Luleå University of Technology, SE 971 87 Luleå, Sweden. 5. Neutron Science Laboratory, The Institute for Solid State Physics, The University of Tokyo, Chiba 277-8581, Japan.
Abstract
Our recently developed non-destructive imaging technique was applied for the characterisation of nanoparticles synthesised by X-ray radiolysis and the sol-gel method. The interfacial conditions between the nanoparticles and the substrates were observed by subtracting images taken by scanning electron microscopy at controlled electron acceleration voltages to allow backscattered electrons to be generated predominantly below and above the interfaces. The interfacial adhesion was found to be dependent on the solution pH used for the particle synthesis or particle suspension preparation, proving the change in the particle formation/deposition processes with pH as anticipated and agreed with the prediction based on the Derjaguin-Landau-Verwey-Overbeek (DLVO) theory. We found that our imaging technique was useful for the characterisation of interfaces hidden by nanoparticles to reveal the formation/deposition mechanism and can be extended to the other types of interfaces.
Our recently developed non-destructive imaging technique was applied for the characterisation of nanoparticles synthesised by X-ray radiolypan class="Chemical">sis and the sol-gel method. The interfacial conditions between the nanoparticles and the substrates were observed by subtracting images taken by scanning electron microscopy at controlled electron acceleration voltages to allow backscattered electrons to be generated predominantly below and above the interfaces. The interfacial adhesion was found to be dependent on the solution pH used for the particle synthesis or particle suspension preparation, proving the change in the particle formation/deposition processes with pH as anticipated and agreed with the prediction based on the Derjaguin-Landau-Verwey-Overbeek (DLVO) theory. We found that our imaging technique was useful for the characterisation of interfaces hidden by nanoparticles to reveal the formation/deposition mechanism and can be extended to the other types of interfaces.
Entities:
Keywords:
backscattered electrons; electron flight simulation; nanoparticles; scanning electron microscopy; synthesis
Authors: Fabio L Leite; Carolina C Bueno; Alessandra L Da Róz; Ervino C Ziemath; Osvaldo N Oliveira Journal: Int J Mol Sci Date: 2012-10-08 Impact factor: 5.923