Literature DB >> 33566560

Low-Temperature and Large-Scale Production of a Transition Metal Sulfide Vertical Heterostructure and Its Application for Photodetectors.

Chaitanya Kaluram Kanade1, Hyunho Seok1, Vinit Kaluram Kanade1, Kubra Aydin1, Hyeong-U Kim2, Sekhar Babu Mitta1, Won Jong Yoo1, Taesung Kim1,3.   

Abstract

The conventional synthesis of two-dimensional (2D) transition metal dichalcogenide (TMDC) heterostructures is low yielding and lack the heterojunction interface quality. The chemical vapor deposition (CVD) techniques have achieved high-quality heterostructure interfaces but require a high synthesis temperature (>600 °C) and have a low yield of heterostructures. Therefore, the large scale and high interface quality of TMDC heterojunctions using low-temperature synthesis methods are in demand. Here, high-quality, wafer-scale MoS2 and WS2 heterostructures with 2D interfaces were prepared by a one-step sulfurization of the molybdenum (Mo) and tungsten (W) precursors via plasma-enhanced CVD at a relatively low temperature (150 °C). The 4 inch wafer-scale synthesis of the MoS2-WS2 heterostructures was validated using various spectroscopic and microscopic techniques. Further, the photocurrent generation and photoswitching phenomenon of the so-obtained MoS2-WS2 heterostructures were studied. The photodevice prepared by the MoS2-WS2 heterostructures at 150 °C showed a photoresponsivity of 83.75 mA/W. The excellent photoresponse and faster photoswitching highlight the advantage of MoS2-WS2 heterostructures toward advanced photodetectors.

Entities:  

Keywords:  MoS2; WS2; photosensor; plasma-enhanced chemical vapor deposition (PECVD); transition metal dichalcogenide (TMDC); vertical heterostructure

Year:  2021        PMID: 33566560     DOI: 10.1021/acsami.0c19666

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  1 in total

Review 1.  The first progress of plasma-based transition metal dichalcogenide synthesis: a stable 1T phase and promising applications.

Authors:  Hyeong-U Kim; Hyunho Seok; Woo Seok Kang; Taesung Kim
Journal:  Nanoscale Adv       Date:  2022-04-25
  1 in total

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