| Literature DB >> 33525501 |
Ombeline de La Rochefoucauld1, Guillaume Dovillaire1, Fabrice Harms1, Mourad Idir2, Lei Huang2, Xavier Levecq1, Martin Piponnier1, Philippe Zeitoun3.
Abstract
For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.Entities:
Keywords: EUV wavefront sensor; Hartmann sensor; X-ray sources; X-ray wavefront sensor; metrology; phase imaging
Year: 2021 PMID: 33525501 PMCID: PMC7865934 DOI: 10.3390/s21030874
Source DB: PubMed Journal: Sensors (Basel) ISSN: 1424-8220 Impact factor: 3.576