Literature DB >> 33390006

Photo-Thermoelectric Conversion Using Black Silicon with Enhanced Light Trapping Performance far beyond the Band Edge Absorption.

Pengfei Cheng1, Honglei Wang1, Björn Müller2, Jens Müller2, Dong Wang1, Peter Schaaf1.   

Abstract

During the past years, much research work has been focused on efficiently harvesting solar energy with black silicon (b-Si). However, semiconductor Si can only utilize solar energy with wavelength smaller than λ = 1110 nm (bandgap Eg = 1.12 eV) for photovoltaic applications or photoelectrochemical conversions. Light with wavelength beyond the band edge (above λ = 1110 nm) cannot be used. Here, we prepared highly conductive b-Si without an apparent optical bandgap by a reactive ion etching process, which can largely absorb light with a wide range wavelength and even far into the near-infrared region (∼2500 nm). The optimized b-Si with surface texture shows the specular reflection rate lower than 0.1% and the average total reflection (specular reflectance + diffuse reflectance) is about 1.1%. Additionally, we briefly introduce the mechanism and reflection principle of surface nanostructured b-Si. By using b-Si structured material, we successfully convert the solar energy to electric power via photo-thermoelectric conversion, especially solar energy exceeding 1110 nm wavelength can also be efficiently used. The excellent light trapping of sunlight shows great potential for photothermal applications, such as photothermal imaging, seawater desalination, and further applications.

Entities:  

Keywords:  controllable fabrication of black silicon; far beyond band-edge absorption; light trapping nanostructure; photo-thermoelectric conversion

Year:  2021        PMID: 33390006     DOI: 10.1021/acsami.0c17279

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  2 in total

1.  Effect of synthesis time on plasmonic properties of Ag dendritic nanoforests.

Authors:  Hung Ji Huang; Han-Wei Chang; Chia-Yen Lee; Ming-Hua Shiao; Yen-Ling Chiu; Pee-Yew Lee; Yung-Sheng Lin
Journal:  IUCrJ       Date:  2022-04-02       Impact factor: 5.588

2.  Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching.

Authors:  Francesco Ghezzi; Matteo Pedroni; Janez Kovač; Federica Causa; Anna Cremona; Mariano Anderle; Roberto Caniello; Silvia M Pietralunga; Espedito Vassallo
Journal:  ACS Omega       Date:  2022-07-11
  2 in total

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