Literature DB >> 32946424

Wafer-scale graphene-ferroelectric HfO2/Ge-HfO2/HfO2 transistors acting as three-terminal memristors.

M Dragoman1, A Dinescu, D Dragoman, C Palade, A Moldovan, M Dinescu, V S Teodorescu, M L Ciurea.   

Abstract

In this paper we report a set of experiments at the wafer level regarding field-effect transistors with a graphene monolayer channel transferred on the ferroelectric HfO2/Ge-HfO2/HfO2 three-layer structure. This kind of transistor has a switching ratio of 103 between on and off states due to the bandgap in graphene induced by the ferroelectric structure. Both top and back gates effectively control the carriers' charge flow in graphene. The transistor acts as a three-terminal memristor, termed a memtransistor, with applications in neuromorphic computation.

Entities:  

Year:  2020        PMID: 32946424     DOI: 10.1088/1361-6528/abb2bf

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  1 in total

1.  Graphene/Ferroelectric (Ge-Doped HfO2) Adaptable Transistors Acting as Reconfigurable Logic Gates.

Authors:  Mircea Dragoman; Adrian Dinescu; Daniela Dragoman; Cătălin Palade; Valentin Şerban Teodorescu; Magdalena Lidia Ciurea
Journal:  Nanomaterials (Basel)       Date:  2022-01-17       Impact factor: 5.076

  1 in total

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