| Literature DB >> 32640527 |
Jin Li1, Yufan Wang1, Zhaoyu Ran1, Hang Yao1, Boxue Du1, Tatsuo Takada2.
Abstract
Surface charge accumulation on epoxy insulators is one of the most serious problems threatening the operation safety of the direct current gas-insulated transmission line (GIL), and can be efficiently inhibited by the surface modification technology. This paper investigated the mechanisms of fluorination modulated surface charge behaviors of epoxy resin through quantum chemical calculation (QCC) analysis of the molecular structure. The results show that after fluorination, the surface charge dissipation process of the epoxy sample is accelerated by the introduced shallow trap sites, which is further clarified by the carrier mobility model. The electron distribution probability of the highest occupied molecular orbitals (HOMO) under positive charging and the lowest unoccupied molecular orbitals (LUMO) under negative charging shows distinctive patterns. It is illustrated that electrons are likely to aggregate locally around benzenes for the positively charged molecular structure, while electrons tend to distribute all along the epoxy chain under negatively charging. The calculated results verify that fluorination can modulate surface charge behaviors of epoxy resin through redesigning its molecular structure, trap distribution and charging patterns.Entities:
Keywords: epoxy resin; molecular structure; quantum chemical calculation; surface charge; trap distribution
Mesh:
Substances:
Year: 2020 PMID: 32640527 PMCID: PMC7412268 DOI: 10.3390/molecules25133071
Source DB: PubMed Journal: Molecules ISSN: 1420-3049 Impact factor: 4.411
Figure 1Surface potential decay process and trap distribution of epoxy resin before and after fluorination. (a) Relationship between the decay time and the surface charge density; (b) relationship between the energy level and the trap density of epoxy samples.
Figure 2Energy level distribution and trap sites of epoxy resin before and after fluorination treatment.
Figure 3Relationship between carrier hopping process and trap sites. (a) Carrier hopping process for the shallow trap site; (b) Carrier hopping process for the deep trap site.
Figure 4Energy level distribution and molecular orbitals of epoxy resin under different charging conditions. (a) Energy level distribution of different charged epoxy; (b) molecular orbitals of LUMO under negatively charging and HOMO under positively charging.
Figure 5QCC models of epoxy resin before and after fluorination. (a) Model of epoxy resin; (b) Model of fluorinated epoxy resin.