Quantum spin Hall (QSH) insulators host edge states, where the helical locking of spin and momentum suppresses backscattering of charge carriers, promising applications from low-power electronics to quantum computing. A major challenge for applications is the identification of large gap QSH materials, which would enable room temperature dissipationless transport in their edge states. Here we show that the layered mineral jacutingaite (Pt2HgSe3) is a candidate QSH material, realizing the long sought-after Kane-Mele insulator. Using scanning tunneling microscopy, we measure a band gap in excess of 100 meV and identify the hallmark edge states. By calculating the [Formula: see text] invariant, we confirm the topological nature of the gap. Jacutingaite is stable in air, and we demonstrate exfoliation down to at least two layers and show that it can be integrated into heterostructures with other two-dimensional materials. This adds a topological insulator to the 2D quantum material library.
Quantum spin Hall (QSH) insulators host edge states, where the helical locking of spin and momentum suppresses backscattering of charge carriers, promising applications from low-power electronics to quantum computing. A major challenge for applications is the identification of large gap QSH materials, which would enable room temperature dissipationless transport in their edge states. Here we show that the layered mineral jacutingaite (Pt2HgSe3) is a candidate QSH material, realizing the long sought-after Kane-Mele insulator. Using scanning tunneling microscopy, we measure a band gap in excess of 100 meV and identify the hallmark edge states. By calculating the [Formula: see text] invariant, we confirm the topological nature of the gap. Jacutingaite is stable in air, and we demonstrate exfoliation down to at least two layers and show that it can be integrated into heterostructures with other two-dimensional materials. This adds a topological insulator to the 2D quantum material library.
The QSH state[1,2] has
first been realized experimentally, at cryogenic temperatures, in
HgTe quantum wells.[3] Interestingly, the
prototype QSH insulator is actually graphene, when it was realized
by Kane and Mele that its Dirac quasiparticles are gapped and characterized
by a topological invariant if spin orbit coupling
(SOC) is considered.[4,5] However, the low SOC in graphene
results in a gap of only a few μeV, making its topological properties
a mere theoretical curiosity. To realize a Kane–Mele insulator,
a material is needed with the honeycomb lattice of graphene, but having
large SOC.[4] In the past few years there
has been a tremendous effort to find a layered material conforming
to these requirements. From the point of view of applications, the
candidate material forming this “heavy metal graphene”,
should ideally have the following characteristics. It should have
a topological gap above room temperature, to enable room temperature
dissipationless charge transport. The van der Waals bonding between
the layers of the material should be weak enough[6] to enable exfoliation by the well-known methods developed
for 2D materials. This would enable integration into heterostructures
with the vast numbers of other 2D quantum materials discovered to
date.[7,8] Such a combination with other 2D materials
can enable a high degree of control over the edge states.[7] For example, in proximity with 2D superconductors,
Majorana quasiparticles could be formed.[9] Lastly, it should be stable in air under ambient conditions, making
the material widely usable.One possibility to realize a QSH
system, is to increase the SOC
in graphene by placing it in proximity to materials with a large atomic
number,[10−12] either with adatoms[13,14] or in a substrate.[15−17] The resulting SOC induced gap is on the order of 10 meV at best.
An alternative is to find a material with an intrinsically large topological
gap,[18] such as a bismuthhoneycomb layer
on SiC,[19,20] with a band gap of 0.8 eV. However, the
crystal structure and therefore the topological properties of this
bismuthene are linked to the SiC support, limiting its applicability.
Similar constraints arise in the case of stanene[21] and other group IV honeycomb layers and perhaps for bismuth
(111) bilayers.[22,23]Among materials that exist
as freestanding single layers, the 1T′
phase of transitionmetal dichalcogenides are predicted to be QSH
insulators.[24] For MoS2, WSe2, and WTe2 the hallmark edge states have been identified
by scanning tunneling microscopy (STM)[25−29] and by charge transport measurements for WTe2.[30] However, MoS2 and
WSe2 are metastable and easily convert to the 2H phase,[31] while WTe2 is stable in the 1T′
polymorph but rapidly oxidizes in air. None of the above examples
are stable under ambient conditions, with the possible exception of
Bi14Rh3I9.[32] However, due to the complex crystal structure and ionic bonding
between the layers,[33] it is not clear if
it is possible to isolate a single layer of it.Here we present
evidence via STM measurements that jacutingaite
(Pt2HgSe3), a naturally occurring mineral,[34,35] realizes a room temperature Kane–Mele insulator, satisfying
all of the above criteria. By measuring on the basal plane of exfoliated
multilayer crystals, we identify a bulk band gap and edge states within
this gap, localized to monolayer step edges, showing a decay length
of 5 Å into the bulk. We reproduce the measured band gap and
edge states by density functional theory calculations (DFT) of the
monolayer. By calculating the invariant, we show that the band gap is
expected to be topologically nontrivial, in accordance with the previous
prediction of Marrazzo et al.[36] Within
our experiments Pt2HgSe3 has proven to be stable
under ambient conditions, on a time scale of months to a year, as
either bulk or exfoliated crystals with a thickness down to 1.3 nm,
equivalent to one or two layers. This is no surprise since jacutingaite
is a mineral;[34,35] therefore, it should be stable
not just under ambient but at pressures and temperatures relevant
to geological processes.The sample we investigated was grown
synthetically, as described
previously.[35] For preparation and characterization
details, see supplementary section S1.
Additionally, we have measured and calculated the Raman spectrum of
bulk crystals; see supplementary section S6. In the following, we focus on STM measurements of exfoliated thick
crystals on a gold surface. The measurements were carried out in UHV
at a base pressure of 5 × 10–11 Torr and a
temperature of 9 K.Jacutingaite is a ternary compound having
a “sandwich-like”
structure reminiscent of transitionmetal dichalcogenides, with a
platinum layer between selenium and mercury. It can be regarded as
“heavy metal graphene”, since states around the SOC
induced gap are localized on the honeycomb lattice formed by Pt and
Hg atoms (see bottom inset in Figure a).[36] Indeed, in the absence
of SOC these bands give rise to a Dirac cone at the K points of the
Brillouin zone (see Figure b).
Figure 1
Atomic and electronic structure of Pt2HgSe3. (a) Atomic resolution, topographic STM image of Pt2HgSe3, stabilization parameters: 10 pA, −0.8 V. Sublattices
are marked with a red triangle and rectangle, respectively. Right
inset: atomic structure of Pt2HgSe3, top and
side view. Bottom inset: Contour plot of the density of states within
the conduction band in a 200 meV interval. (b) Band structure of Pt2HgSe3 single layer, from DFT calculation, without
(gray) and with (colored) SOC. Size and color of the dots is proportional
to the weight of Pt, Hg, or Se in the respective electronic state.
(c) Comparison of measured dI/dV(V) signal (blue) and calculated (red) density of states. The measurement
was conducted on the defect free basal plane of Pt2HgSe3. The calculation is for a monolayer of Pt2HgSe3. Band gap highlighted in gray. (d) Measured dI/dV spectra as a function of distance from a step
edge on the basal plane. The spectra are offset for clarity. Topographic
STM image of the step shown on the left side of the spectra. The positions
of the spectra are shown by dots with the respective colors.
Atomic and electronic structure of Pt2HgSe3. (a) Atomic resolution, topographic STM image of Pt2HgSe3, stabilization parameters: 10 pA, −0.8 V. Sublattices
are marked with a red triangle and rectangle, respectively. Right
inset: atomic structure of Pt2HgSe3, top and
side view. Bottom inset: Contour plot of the density of states within
the conduction band in a 200 meV interval. (b) Band structure of Pt2HgSe3 single layer, from DFT calculation, without
(gray) and with (colored) SOC. Size and color of the dots is proportional
to the weight of Pt, Hg, or Se in the respective electronic state.
(c) Comparison of measured dI/dV(V) signal (blue) and calculated (red) density of states. The measurement
was conducted on the defect free basal plane of Pt2HgSe3. The calculation is for a monolayer of Pt2HgSe3. Band gap highlighted in gray. (d) Measured dI/dV spectra as a function of distance from a step
edge on the basal plane. The spectra are offset for clarity. Topographic
STM image of the step shown on the left side of the spectra. The positions
of the spectra are shown by dots with the respective colors.The atomic resolution STM images of the basal plane
reflect this
honeycomb structure; for an example, see Figure a. The topographic image shows a sublattice
symmetry broken graphene-like arrangement of the local density of
states (LDOS), with the unit cell shown by a red rhombus. The unit
cell size is measured to be 7.3 Å, in agreement with the expected
unit cell size (7.34 Å) measured via X-ray diffraction.[35] Upon closer examination, we can observe a difference
in the apparent height of the two sublattices, marked by red squares
and triangles in Figure a. This sublattice symmetry breaking is a consequence of the buckled
honeycomb nature of the Pt–Hg lattice. The buckling means that
each inequivalent sublattice resides on opposing sides of the single
layer, similarly to silicene or germanene.Measuring the differential
tunneling conductivity (dI/dV(V)) on the defect free basal
plane reveals a bulk band gap of 110 mV, shown by the gray shading
in Figure c. Importantly,
if measured far away from any surface defects or edges, the dI/dV signal goes to zero inside the gap,
showing that this energy range is indeed devoid of electronic states.
The measured LDOS is in excellent agreement with density functional
theory (DFT) calculations of the monolayer; see red plot in Figure c. The 110 meV gap
shown here is a best case scenario, where we purposely selected an
area devoid of any surface defects. The large defect concentration
of the basal plane (see supplementary section S3) makes the local electronic structure inhomogeneous. In
order to characterize the gap rigorously, we have measured the band
gap from 982 individual spectra in an area 10 × 10 nm2. The mean gap value was found to be 78 meV, with a standard deviation
of 27 meV (for details see supplementary section S4). The topological nature of the band gap is established
by calculating the index (see supplementary section S7). By comparing the red and blue plots in Figure c, we can immediately
see that the calculated LDOS of the monolayer accurately reproduces
the dI/dV spectrum measured on the
top layer of a bulk crystal. Also considering that the measurement
is not reproduced by the calculated surface DOS of a four layer slab,
suggests that the top Pt2HgSe3 layer in our
measurement is decoupled from the bulk (see supplementary section S7.1). This is supported by our STM measurements of
the monolayer step height, which is found to be 0.7 Å larger
than the intrinsic interlayer distance of 5.3 Å (see inset in Figure a and Figure 1Sc of the Supporting Information).
Figure 2
Characterizing
the edge state. (a) Topographic STM image of a zigzag
edge. Stabilization parameters: −0.85 V bias, 30 pA. dI/dV spectra shown in (e) are measured
along the green line. Black dotted lines mark the edge, as in (a–c,
e–g). Inset: height section of the step. (b) dI/dV image, measured in the same area as the topographic
image in (a), outside the gap in the conduction band, at bias voltage
−0.85 V. (c) dI/dV image,
measured in the same area as (a, b), at a bias voltage of −1.15
V inside the gap. The position of the edge state is marked between
two dotted black lines. (d) Top: dI/dV signal modulation along the edge state. Section between the black
dotted lines in (c). Bottom: fast Fourier transform of the line section.
(e) Plot of dI/dV spectra measured
as a function of distance from the edge. The spectra are recorded
along the green line in (c). (f) Calculated LDOS of the conduction
band. (g) Calculated LDOS of the edge state, using a broadening of
2.6 Å. LDOS periodicity along the edge is equal to the unit cell
size (shown by arrowed black line). Edge state LDOS is concentrated
between the dotted black lines. (h) Averaged section across the edge
state within the purple dotted box shown in (c). The decay of the
edge state into the bulk is of the order of 5 Å, the same as
the decay in the calculation: (g) For extended data, see section 10 of the Supporting Information.
Although the measured LDOS is reproduced by the DOS of the monolayer,
the sample is heavily n doped. In the case of the
measured curve in Figure c, the Fermi level marked by zero bias is shifted above the
conduction band, leaving the band gap at −1.15 eV. A possible
source of the high n doping might be defects or inhomogeneities
in the bulk crystal (see supplementary section S3). A strong indicator of these is the presence of PtSe2 in the sample and that, in the case of all crystals, we observe
a large number of adsorbates even on the freshly cleaved basal plane.
Investigating the doping in exfoliated crystals down to the bilayer
thickness, we find that the n doping is considerably
less, with the Fermi level being at least 0.5 V closer to the topological
gap than for the bulk (see supplementary Figures 13S and 14S). This points to inhomogeneities and defects as
being the most likely cause of the doping, as well as the enlarged
interlayer spacing.Having established the location of the band
gap in the dI/dV spectra, let us
focus on investigating
the presence of the predicted QSH edge states.[36] Other QSH material candidates, such as WTe2,[29] Bi14Rh3I9,[33] and ZrTe5[37] also reproduce the LDOS of the monolayer, when measuring the top
of bulk crystals with STM. For these materials, monolayer steps on
the bulk surface show the hallmark edge states residing in the band
gap. In Figure d,
we show individual dI/dV spectra
measured near a monolayer step edge on a thick flake, having hundreds
of layers. The positions of the spectra are marked by similarly colored
dots on the STM image of the step. At a position 2 nm away from the
step edge, the spectra reproduce the LDOS measured deep in the bulk
of the sample. Moving even closer to the edge, at a distance of ∼1
nm, the LDOS inside the band gap starts to increase, indicating the
presence of an in gap state. An extra state localized to the edge
also appears above the conduction band, at −0.2 V, which is
a fingerprint of the edge structure. During our STM investigation,
straight and atomically clean edges were always of the zigzag kind.
Therefore, we checked the atomic and electronic structure of this
edge orientation terminated by Se, Pt, and Hg, by optimizing the atomic
lattice of monolayer ribbons in DFT. The only atomic configuration
that shows the hallmark edge state above the conduction band and is
energetically stable, is a Se terminated zigzag edge (see Figure and supplementary section S8). Thus, we have used
this trivial edge state above the conduction band to identify the
type of zigzag edge present in the measurement. This allows us to
accurately reproduce the LDOS of the edge in our calculations.
Figure 3
Pt2HgSe3 nanoribbon. Topological
edge states.
(a) Band structure of a 3.2 nm wide zigzag ribbon, calculated using
DFT. The topological edge state is shown in red, while the trivial
edge state above the conduction band is shown in green. (b) LDOS contour
plot of the topological edge state integrated over the whole topological
band.
In the following we examine in more detail the increased LDOS near
the monolayer step edge. In Figure c we show an image of the dI/dV signal at a voltage inside the gap, measured along an
edge shown in Figure a. An increased dI/dV signal indicates
an increased LDOS near the step. In all panels on Figure the black dotted lines mark
the position of the edge. The decay of the edge state into the bulk
is found to be on the order of 5 Å, in agreement with prediction.[36] Taking a section between the dotted black lines
(Figure d), one observes
that the edge LDOS is modulated by the atomic periodicity, as expected
for a topological edge state.[20,38] A further hallmark
of topological edge states is that the state is not perturbed by the
presence of a defect, visible in the top-right area of Figure a. If backscattering would
take place due to the defect this would result in a modulation of
the local density of states along the edge. The wavelength of this
modulation is determined by the change is crystal momentum of the
scattered electron, which can be obtained from the dispersion relation
along the edge, shown in Figure a. The voltage used in the
measurement (−1.15 V) corresponds to an energy in the middle
of the gap. At this energy, the change in crystal momentum would result
in a periodicity of 13.1 Å related to intraband scattering.[20] To check the presence of backscattering, we
show the Fourier transform of the dI/dV signal along the edge in Figure d. We observe the peak corresponding to 1/0.73 nm–1 unit cell periodicity, but the peak for backscattering
is clearly absent. This conclusion is further strengthened by additional
Fourier analysis on a longer, irregular edge (see supplementary section S5). This analysis is essentially a
1D analogue of probing the suppression of backscattering on the 2D
surface state of strong topological insulators by STM measurement
of quasiparticle interference patterns.[39]Characterizing
the edge state. (a) Topographic STM image of a zigzag
edge. Stabilization parameters: −0.85 V bias, 30 pA. dI/dV spectra shown in (e) are measured
along the green line. Black dotted lines mark the edge, as in (a–c,
e–g). Inset: height section of the step. (b) dI/dV image, measured in the same area as the topographic
image in (a), outside the gap in the conduction band, at bias voltage
−0.85 V. (c) dI/dV image,
measured in the same area as (a, b), at a bias voltage of −1.15
V inside the gap. The position of the edge state is marked between
two dotted black lines. (d) Top: dI/dV signal modulation along the edge state. Section between the black
dotted lines in (c). Bottom: fast Fourier transform of the line section.
(e) Plot of dI/dV spectra measured
as a function of distance from the edge. The spectra are recorded
along the green line in (c). (f) Calculated LDOS of the conduction
band. (g) Calculated LDOS of the edge state, using a broadening of
2.6 Å. LDOS periodicity along the edge is equal to the unit cell
size (shown by arrowed black line). Edge state LDOS is concentrated
between the dotted black lines. (h) Averaged section across the edge
state within the purple dotted box shown in (c). The decay of the
edge state into the bulk is of the order of 5 Å, the same as
the decay in the calculation: (g) For extended data, see section 10 of the Supporting Information.Pt2HgSe3 nanoribbon. Topological
edge states.
(a) Band structure of a 3.2 nm wide zigzag ribbon, calculated using
DFT. The topological edge state is shown in red, while the trivial
edge state above the conduction band is shown in green. (b) LDOS contour
plot of the topological edge state integrated over the whole topological
band.Finally, comparing the dI/dV images
with the calculated LDOS map inside the topological gap (Figure g) and of the complete
valence band (Figure f), we find that there is good agreement with the measurements. The
calculated LDOS maps reproduce both the atomic periodicity along the
edge state, as well as its decay length of 5 Å. With such a small
decay length, it is expected that the edge state would start to develop
at defect sites inside the basal plane, such as in the bottom-right
corner of Figure c.
A better example of this effect can be observed in the supplementary Figure 4Sd.The relatively
weak van der Waals bond between the monolayers of
Pt2HgSe3 makes it possible to exfoliate the
material, potentially to the monolayer limit.[6] We demonstrated this possibility by using the standard “scotch
tape method” to exfoliate thin flakes onto a SiO2 substrate or a polymer stack, as used in dry stacking of 2D materials[40] (see Figure a–c). Using dry stacking, it should be possible
to place Pt2HgSe3 on the surface of a high Tc superconductor, enabling the investigation
of high temperature Majorana zero modes.[9] The thinnest crystals we were able to prepare by conventional scotch
tape exfoliation onto SiO2 substrates was 5 layers. However,
these crystals have lateral sizes below 1 μm (see Figure c), severely limiting their
usefulness. Exfoliating onto fresh gold surfaces[41] increases the lateral size of the flakes significantly
and their thickness, measured by AFM is 1.3 nm (see Figure d,e). However, these thin flakes
are found to be highly disordered. For more details, see supplementary section S9. These results show
that it should be possible to exfoliate single layers of Pt2HgSe3 onto SiO2 and especially gold substrates,
but the material homogeneity and defect density of the bulk crystals
needs to be improved significantly. Further improvements in crystal
quality could also be a key to probing the dual topological nature[42,43] of Pt2HgSe3 such as in the case of Bi2TeI.[44] This is because Pt2HgSe3 is predicted to not only be the long sought after
Kane–Mele insulator, but in bulk form it is also a topological
crystalline insulator and a insulator.[42,43,45]
Figure 4
Exfoliation
of Pt2HgSe3. (a) Stack of jacutingaite
on graphite, prepared by dry stacking. (b) AFM image of the flake
before the transfer supported on a PMMA substrate. (c) AFM image of
a thin flake, having a thickness of 2.6 nm, corresponding to approximately
five single layers. Inset: height section of the flake along the green
line. (d) Exfoliation of jacutingaite onto a gold (111) surface. The
thinnest flakes are marked by the red dotted line. (e) AFM image of
the thinnest flakes, inside the area marked with red in (d). Inset:
height section along the blue line.
Exfoliation
of Pt2HgSe3. (a) Stack of jacutingaite
on graphite, prepared by dry stacking. (b) AFM image of the flake
before the transfer supported on a PMMA substrate. (c) AFM image of
a thin flake, having a thickness of 2.6 nm, corresponding to approximately
five single layers. Inset: height section of the flake along the green
line. (d) Exfoliation of jacutingaite onto a gold (111) surface. The
thinnest flakes are marked by the red dotted line. (e) AFM image of
the thinnest flakes, inside the area marked with red in (d). Inset:
height section along the blue line.One of the most promising QSH materials is monolayer 1T′-WTe2, but the chemical stability of Pt2HgSe3 in air and it is band gap above room temperature, clearly sets it
aside. The main difference being that WTe2 rapidly oxidizes
under ambient conditions and shows the QSH effect only below a temperature
of 100 K.[30] Our results establish that
jacutingaite is a new and widely accessible platform to explore the
properties of helical one-dimensional electron systems[20,46] and should be available for charge transport measurements, even
in the monolayer, if the defect concentration and sample homogeneity
can be improved. Recent theoretical studies highlight the possibility
of superconductivity in doped Pt2HgSe3,[47] this could open a way to explore the coexistence
of topological edge states in proximity to a superconductor in the
same material system. Additionally, a nonzero index[48] makes
Pt2HgSe3 a fertile playground to explore higher
order topology. In our samples the Fermi level is already shifted
above the type-II van Hove singularity where superconductivity is
expected, possibly due to the presence of lattice defects. Our results
hint at the possibility that tuning the composition, may be an effective
tool to control the doping of Pt2HgSe3, similarly
to quaternary topological insulators.[49]
Authors: Pedram Roushan; Jungpil Seo; Colin V Parker; Y S Hor; D Hsieh; Dong Qian; Anthony Richardella; M Z Hasan; R J Cava; Ali Yazdani Journal: Nature Date: 2009-08-09 Impact factor: 49.962
Authors: M G Vergniory; L Elcoro; Claudia Felser; Nicolas Regnault; B Andrei Bernevig; Zhijun Wang Journal: Nature Date: 2019-02-27 Impact factor: 49.962
Authors: A Avsar; J Y Tan; T Taychatanapat; J Balakrishnan; G K W Koon; Y Yeo; J Lahiri; A Carvalho; A S Rodin; E C T O'Farrell; G Eda; A H Castro Neto; B Özyilmaz Journal: Nat Commun Date: 2014-09-26 Impact factor: 14.919
Authors: Gábor Zsolt Magda; János Pető; Gergely Dobrik; Chanyong Hwang; László P Biró; Levente Tapasztó Journal: Sci Rep Date: 2015-10-07 Impact factor: 4.379