| Literature DB >> 32385360 |
Dil K Limbu1, Stephen R Elliott2, Raymond Atta-Fynn3, Parthapratim Biswas4.
Abstract
X-ray diffraction, Amorphous silicon, Multi-objective optimization, Monte Carlo methods. This paper addresses a difficult inverse problem that involves the reconstruction of a three-dimensional model of tetrahedral amorphous semiconductors via inversion of diffraction data. By posing the material-structure determination as a multiobjective optimization program, it has been shown that the problem can be solved accurately using a few structural constraints, but no total-energy functionals/forces, which describe the local chemistry of amorphous networks. The approach yields highly realistic models of amorphous silicon, with no or only a few coordination defects (≤1%), a narrow bond-angle distribution of width 9-11.5°, and an electronic gap of 0.8-1.4 eV. These data-driven information-based models have been found to produce electronic and vibrational properties of a-Si that match accurately with experimental data and rival that of the Wooten-Winer-Weaire models. The study confirms the effectiveness of a multiobjective optimization approach to the structural determination of complex materials, and resolves a long-standing dispute concerning the uniqueness of a model of tetrahedral amorphous semiconductors obtained via inversion of diffraction data.Entities:
Year: 2020 PMID: 32385360 PMCID: PMC7210951 DOI: 10.1038/s41598-020-64327-3
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Comparison of results from various information-based approaches. N, 〈θ〉, Δθ, c4 and E indicate the size of the system, the average bond angle, the RMS width of bond angles, the percentage of 4-fold-coordinated atoms and the value of the electronic gap in electron-volt, respectively.
| Model | N | 〈 | Δ | ||
|---|---|---|---|---|---|
| CMC19 | 216 | 109.08 | 10.95 | 100 | 1.18 |
| CMC19 | 512 | 109.14 | 10.61 | 99.22 | 1.09 |
| SOAP§ | 512 | NA | NA | 95 | None |
| EX-INVERT† | 216 | NA | NA | 94-97 | NA |
| INVERT‡ | 512 | NA | NA | 92§ | None |
| RMC04* | 500 | 109.01 | 12.5 | 88 | None |
| RMC96★ | 3000 | 109.4 | 8.5 | 52 | None |
§Estimated values from supplementary information in ref. [14].
†From ref. [23].
‡From ref. [13].
*From ref. [10].
★Results for a-Ge from ref. [9].
Comparison of CMC19 models with the best available models (of a-Si) in the literature. Symbols have the same meaning as in Table 1. E and bond angles are expressed in the unit of electron-volt (eV) and degree, respectively.
| Model | N | 〈 | Δ | |||||
|---|---|---|---|---|---|---|---|---|
| CMC19 | 216 | 109.12 | 10.68 | 99.07 | 0 | 0.93 | 0 | 1.14 |
| CMC19 | 300 | 109.14 | 10.56 | 99.33 | 0 | 0.67 | 0 | 1.06 |
| CMC19 | 512 | 109.19 | 10.70 | 98.44 | 0 | 1.56 | 0 | 0.88 |
| CMC19 | 1000 | 109.13 | 11.15 | 99.10 | 0.30 | 0.60 | 0 | 0.56 |
| CMC19 | 216 | 109.08 | 10.95 | 100 | 0 | 0 | 0 | 1.18 |
| CMC19 | 300 | 109.16 | 10.19 | 99.33 | 0 | 0.67 | 0 | 1.39 |
| CMC19 | 512 | 109.14 | 10.61 | 99.22 | 0 | 0.78 | 0 | 1.09 |
| CMC19 | 1000 | 109.08 | 11.43 | 99.10 | 0.30 | 0.40 | 0.20 | 0.76 |
| BMW3§ | 512 | 109.14 | 10.36 | 100 | 0 | 0 | 0 | 1.32 |
| SWMD | 512 | 109.27 | 9.12 | 99.22 | 0 | 0.39 | 0.39 | 1.01 |
| MLMD† | 512 | 109.19 | 9.69 | 98.44 | 0 | 0.78 | 0.78 | NA |
| AIMD‡ | 64 | 108.32 | 15.5 | 96.60 | 0 | 0.20 | 3.20 | NA |
§From ref. [30].
†From ref. [27].
‡From ref. [28].
Figure 1Comparison of structural properties of a-Si from CMC19 and BMW3 models. (a) The structure factor of a 512-atom CMC19 model (blue) and a 512-atom BMW3 model (green). Experimental data (black) correspond to as-deposited samples from ref. [31]. An enlarged view of the first two peaks is shown in the inset. (b) The bond-angle distribution, B(θ), for a CMC19 model (blue) and a BMW3 model (green) of identical size. (c) The statistics of irreducible rings for CMC19 and BMW3 models. See text for details. The results presented here in (a–c) are all averaged over five (5) independent configurations.
Figure 2Electronic density of states (EDOS) of CMC19 a-Si models near the band gap. (a) The EDOS of a-Si before (upper panel) and after (lower panel) ab initio relaxation of a 512-atom CMC19 model. A few defect states (red) and a band-edge state (blue) are shown as vertical lines in the gap region. (b) The formation of a clean electronic gap in the unrelaxed 512-atom CMC19 model via hydrogenation. The upper and lower panels correspond to the EDOS before and after H passivation, respectively. (c) A defect state at −3.472 eV and (d) the associated dangling bonds (i.e., 3-fold-coordinated sites shown in red color) in real space. The other contributing sites, with 4-fold atomic coordination, are indicated in green color.
Figure 3Electronic and vibrational densities of states for a-Si from CMC19/BMW3 models. (a) A 216-atom CMC19 model and its BMW3 counterpart. (b) A 512-atom CMC19 model and a 512-atom BMW3 model, along with a few defect states (red) and band-edge states (blue and green). (c) The full EDOS of a-Si for a 512-atom CMC19 model and a BMW3 model. The vertical lines (blue) in the gap region indicate defect states. (d) The VDOS from a 512-atom CMC19 and a 512-atom BMW3 model. Experimental data (black) shown here are from inelastic neutron-scattering measurements[35].
Figure 4An illustration of the formation of voids and vacancies in a-Si via the CMC19 approach. (a) A 300-atom CMC19 model with a void of radius 4 Å at the center of the model. The atoms on the void surface (of width 2 Å) are shown in red color. (b) The same model after ab initio total-energy relaxation, showing the structural stability of the void. (c) A 512-atom CMC19 model with two monovacancies, separated by a distance of 9 Å. The blue (left) and green (right) colors indicate the atoms within the region of 4 Å from the center of the respective vacancy, which is indicated by a small (hypothetical) red sphere. (d) The ab-initio-relaxed 514-atom model obtained by adding a silicon atom (red) at the center of each vacancy in (d). The formation of a local 4-fold-coordinated network at/near the vacancy sites establishes that the vacancy region corresponds to a monovacancy site. The missing Si atoms are shown in red color.