| Literature DB >> 32364379 |
Qijie Liang1,2, Qian Zhang3, Jian Gou2, Tingting Song4, Hao Chen2, Ming Yang5, Sharon Xiaodai Lim2, Qixing Wang2, Rui Zhu2, Nikolai Yakovlev2,5, Swee Ching Tan3, Wenjing Zhang1, Kostya S Novoselov3, Andrew T S Wee2,6.
Abstract
Atomic-scale defects in two-dimensional transition metal dichalcogenides (TMDs) often dominate their physical and chemical properties. Introducing defects in a controllable manner can tailor properties of TMDs. For example, chalcogen atom defects in TMDs were reported to trigger phase transition, induce ferromagnetism, and drive superconductivity. However, reported strategies to induce chalcogen atom defects including postgrowth annealing, laser irradiation, or plasma usually require high temperature (such as 500 °C) or cause unwanted structural damage. Here, we demonstrate low-temperature (60 °C) partial surface oxidation in 2D PdSe2 with low disorder and good stability. The combination of scanning tunneling microscopy, X-ray photoelectron spectroscopy, and density functional theory calculations provide evidence of atomic-scale partial oxidation with both atomic resolution and chemical sensitivity. We also experimentally demonstrate that this controllable oxygen incorporation effectively tailors the electronic, optoelectronic, and catalytic activity of PdSe2. This work provides a pathway toward fine-tuning the physical and chemical properties of 2D TMDs and their applications in nanoelectronics, optoelectronics, and electrocatalysis.Entities:
Keywords: atomic-scale oxidation; basal plane activation; defect engineering; hole doping; negative photoconductance
Year: 2020 PMID: 32364379 DOI: 10.1021/acsnano.0c00180
Source DB: PubMed Journal: ACS Nano ISSN: 1936-0851 Impact factor: 15.881