| Literature DB >> 32328407 |
Ksenia S Makarenko1, Thanh Xuan Hoang2, Thorin J Duffin1,3, Andreea Radulescu1,3, Vijith Kalathingal1,4, Henri J Lezec5, Hong-Son Chu2, Christian A Nijhuis1,3,4,6.
Abstract
Surface plasmon polaritons (SPPs) are viable candidates for integration into on-chip nano-circuitry that allow access to high data bandwidths and low energy consumption. Metal-insulator-metal tunneling junctions (MIM-TJs) have recently been shown to excite and detect SPPs electrically; however, experimentally measured efficiencies and outcoupling mechanisms are not fully understood. It is shown that the MIM-TJ cavity SPP mode (MIM-SPP) can outcouple via three pathways to i) photons via scattering of MIM-SPP at the MIM-TJ interfaces, ii) SPPs at the metal-dielectric interfaces (bound-SPPs) by mode coupling through the electrodes, and iii) photons and bound-SPP modes by mode coupling at the MIM-TJ edges. It is also shown that, for Al-AlO x -Cr-Au MIM-TJs on glass, the MIM-SPP mode outcouples efficiently to bound-SPPs through either electrode (pathway 2); this outcoupling pathway can be selectively turned on and off by changing the respective electrode thickness. Outcoupling at the MIM-TJ edges (pathway 3) is efficient and sensitive to the edge topography, whereas most light emission originates from roughness-induced scattering of the MIM-SPP mode (pathway 1). Using an arbitrary roughness profile, it is demonstrated that various roughness facets can raise MIM-SPP outcoupling efficiencies to 0.62%. These results pave the way for understanding the topographical parameters needed to develop CMOS-compatible plasmonic circuitry elements.Entities:
Keywords: inelastic electron tunneling; light emission; roughness; surface plasmon polaritons; tunnel junctions
Year: 2020 PMID: 32328407 PMCID: PMC7175257 DOI: 10.1002/advs.201900291
Source DB: PubMed Journal: Adv Sci (Weinh) ISSN: 2198-3844 Impact factor: 16.806
Figure 1a) Energy level diagram of MIM‐TJ under applied bias. b) Schematic illustration of the MIM‐TJ (Al‐AlO‐Cr‐Au) connected to Al and Au metal strips that serve as plasmonic waveguides. c,d) Schematic illustrations of the cross‐sections indicated in panel (b) showing the possible SPP modes at the metal–air/glass interfaces (in blue) and the MIM‐SPP mode (in red). The three MIM‐SPP outcoupling pathways are indicated with pathway 1: photon emission from scattering off of the MIM–TJ interface roughness, pathway 2: roughness‐enhanced momentum matched spatial mode overlap of the MIM‐SPP and various bound‐SPP modes, and pathway 3: MIM‐SPP outcoupling at the MIM‐TJ edge to photons and the bound‐SPP modes.
Figure 2a) AFM image of a typical MIM‐TJ with σ = 5±2 nm. b) Measured line scan of the MIM‐TJ as indicated by the dashed line indicated in (a) showing the t eff and t. c) IV‐characteristics of the MIM‐TJs of different thicknesses. d) Differential conductance dI/dV showing parabolic bias dependence.
Metal thicknesses and effective thicknesses for each sample
| Sample |
|
|
|
|
|---|---|---|---|---|
| 1 | 20 | 155 | 14 ± 2 | 149 ± 2 |
| 2 | 65 | 155 | 59 ± 2 | 149 ± 2 |
| 3 | 90 | 155 | 84 ± 2 | 149 ± 2 |
| 4 | 40 | 55 | 34 ± 2 | 49 ± 2 |
Figure 3Wide‐field inverted optical microscopy images of the Al‐AlO‐Cr‐Au MIM‐TJs with different electrodes thickness. EMCCD images of the devices measured at V bias = −1.45 V with 155 nm thick Au top electrode and a) 20, b) 65, and c) 90 nm thick Al bottom electrode; d) device with 55 nm thick Au top and 40 nm thick bottom Al electrodes. e–h) Back focal plane (BFP) images of the corresponding MIM‐TJs; V bias = −1.5 V for (e)–(f), −1.55 V for (g), and −1.6 V for (h), and corresponding normalized simulated BFP images in i–l). All EMCCD images have had their intensity individually scaled to best show MIM‐TJ light emission and scattering at the end of the waveguides. All BFP images have had their respective intensities scaled to give the best contrast. The inner white dashed line in the BFP images refers to the critical angle of the total internal reflection at the air–glass interface (k SPP /k 0 = 1.0); the outer white dashed line indicates the maximum angle of the collected light limited by the NA of the objective (k SPP /k 0 = 1.49).
Figure 4Mode profiles of MIM‐TJs for given experimental conditions: MIM‐TJ with Al thickness of 40 nm and Au thickness of 55 nm a) with σpv = 0 nm, and b) with σpv = 25 nm. c) MIM‐TJ with Al thickness of 20 nm and Au thickness of 155 nm and d) MIM‐TJ with Al thickness of 90 nm and Au thickness of 155 nm.
Figure 5Schematics of indicating dipole positions for coupling simulations of the MIM‐SPP to the SPPAu‐glass via a) pathway 2 and b) pathways 2 and 3. The simulated corresponding coupling efficiencies for the four different MIM‐TJs with a solid line indicating rough MIM‐TJs with σ = 5 nm and a dashed line indicating smooth MIM‐TJs with σ = 0 nm are shown for c) pathway 2 and d) pathways 2 and 3.